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Table Of Contents

2.1. Nanostructured materials
2.2. Free standing shapes
2.3. Rapid prototyping
3. Advantages and disadvantages of CVD
4. Thin film and coating applications
5. CVD system
5.1. Chemical vapour precursor supply system
5.2. CVD reactor
5.3. The effluent gas handling system
6. Process principles and deposition mechanism
7. Chemical precursors and reaction chemistry
8. Thermodynamics, kinetics and mass transport phenomena
8.1. Thermodynamics
8.1.1. Reaction feasibility
8.1.2. CVD phase diagram
8.2. Kinetics
9.2. Coating–substrate adhesion
9.3. Uniformity of coating composition
10. Process monitoring and measurement of the CVD process
10.1. Temperature
10.2. Chemical species
10.3. Fluid flow
11. Process/microstructure/property relationships in CVD
11.1. Epitaxial growth
11.2. Polycrystalline growth
11.3. Whiskers
11.4. Amorphous
12. Variants of CVD methods
12.1. Thermally activated chemical vapour deposition
optoelectronics or energy conversion devices
12.1.2. Ceramic protective coatings
12.1.3. Diffusion coating
12.1.4. Optical fibres
12.1.5. Ceramic monofilament fibres
12.1.6. Fibre coating
12.2. Plasma enhanced chemical vapour deposition
12.2.1. Process principles
12.2.2. Disadvantages and advantages of PECVD
12.2.3. Examples of applications
12.3. Photo-assisted chemical vapour deposition
12.3.1. Photo-thermal
12.3.2. Photolytic
12.3.3. Advantages
12.4. Atomic layer epitaxy process
12.5. Metalorganic chemical vapour deposition
12.5.1. Definition
12.5.2. Process characteristics and advantages
12.5.3. Limitations
12.5.4. Applications
12.6. Pulsed injection metalorganic chemical vapour deposition
12.6.3. Pulsed injection MOCVD
12.7. Aerosol assisted chemical vapour deposition
12.7.1. Pyrosol
12.7.2. Electrostatic assisted vapour deposition
12.8. Flame assisted chemical vapour deposition
12.8.1. Flame-assisted vapour deposition
12.8.2. Combustion chemical vapour deposition
12.9. Electrochemical vapour deposition
12.9.1. Process principle
12.9.2. Kinetics and growth
12.9.3. Comparison of CVD and EVD processes
12.9.4. Advantages
12.9.5. Technological status
12.9.6. Other variants
12.10. Chemical vapour infiltration (CVI)
12.10.1. Applications
12.10.2. Methodology
12.10.3. Various CVI processes
13. Comparison of various CVD methods
14. Comparison of CVD with other coating techniques
15. Conclusions and outlook
Acknowledgements
References
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Chemical vapour deposition of coatings

Chemical vapour deposition of coatings

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Published by Mahmudul Islam-topu
Chemical vapour deposition of coatings
Chemical vapour deposition of coatings

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Published by: Mahmudul Islam-topu on Feb 03, 2013
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02/03/2013

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