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2005.04.06 Mse376 l03 Advanced Lithography

2005.04.06 Mse376 l03 Advanced Lithography

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Published by kaushik4208

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Categories:Types, Research, Science
Published by: kaushik4208 on May 31, 2009
Copyright:Attribution Non-commercial

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05/11/2014

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Department of Materials Science and Engineering, Northwestern University
Nanomaterials
Lecture 3: Advanced Lithography
 
Department of Materials Science and Engineering, Northwestern University
Deep UV
Excimer Laser Sources:XeF
351 nmXeCl
308 nmKrF
248 nmArF
193 nmF
2
157 nmFused silica / quartz optics
}
CaF optics
difficult to grind and polish due tohygroscopic (water-absorbing) properties
Deep Ultra-Violet Lithography
 
Department of Materials Science and Engineering, Northwestern University
Minimizes diffraction effects but complicates mask making
R. Waser (ed.),
 Nanoelectronics and Information Technology
, Chapter 9
Phase Shifting Masks

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