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) The FJP method originatedfrom the demand for miniaturized optical elements in recentyears and the inability of the conventional polishing methodcan not satisfy the fabrication requirements of thoseelements. The FJP method facilitates the removal of nanometer deep material, subsequently correcting errors inthe optical elements. However, the FJP method fails tocomply with the requirement of a higher pressure, i.e. >6bar, to pump the slurry in order to remove the material of elements. Additionally, the shape that the FJP produces onthe surface is not the Gaussian distribution, thus making itextremely difficult to more accurately control formcorrection.
Therefore, this work itroduces a modifiedFJP method to ensure not only that the shape is close toGaussian distribution with a low pressure air source, butalso that the resolution of material removal should be smalland stable.