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Table Of Contents

1. INTRODUCTION
2. OXIDE SEMICONDUCTORS AND THIN-FILM TRANSISTORS
2.1 Oxide semiconductors
2.1.1 Transparent conducting oxides overview
2.1.2 Zinc oxide
2.1.3 Amorphous oxide semiconductors
2.1.4 Zinc tin oxide
2.1.5 Indium gallium zinc oxide
2.2 Oxide semiconductor devices: Thin-film transistors
2.2.1 Thin-film transistors
2.2.2.1 TFTs with simple oxide layers: ZnO
2.2.2.2 TFTs with simple oxide layers: In2O3, SnO2, Ga2O3
2.2.2.3 TFTs with multicomponent oxide layers: ZTO
2.2.2.4 TFTs with multicomponent oxide layers: ZIO
2.2.2.5 TFTs with multicomponent oxide layers: IGO
2.2.2.6 TFTs with multicomponent oxide layers: IGZO
2.3 Conclusions
3. TFT FABRICATION AND CHARACTERIZATION
3.1 Thin-film deposition and processing
3.1.1 Evaporation
3.1.2 Sputtering
3.1.3 Plasma-enhanced chemical vapor deposition (PECVD)
3.1.4 Atomic layer deposition (ALD)
3.1.5 Post-deposition thermal processing
3.3.1 Fully-transparent TTFT
3.3.2 Non-transparent TFT
3.4 Transistor overview
3.5 Thin-film transistor device characteristics
3.5.1 DC current-voltage measurements
3.5.2 Threshold voltage and turn-on voltage
3.5.3 Mobility
3.5.4 Drain current swing and drain current on-to-off ratio
3.6 Conclusions
4. REACTIVE SPUTTERING OF OXIDE SEMICONDUCTORS
4.1 Introduction
4.2 Reactive Zinc Oxide
4.3 Reactive Zinc Tin Oxide
4.4 Conclusion
5. THIN-FILM TRANSISTOR DIELECTRIC PERFORMANCE
5.1 Introduction
5.2 Experimental
5.3 Chemical Vapor Deposited (CVD) Silicon Dioxide
5.4 Silicon Dioxide, Aluminum Oxide, and Silicon Nitride
5.5 Silane and Tetraethyl Orthosilicate (TEOS)-based CVD
BIBLIOGRAPHY
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Fabrication and Characterization of Thin-Film Transistor Materials and Devices

Fabrication and Characterization of Thin-Film Transistor Materials and Devices

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Published by: Shahzada Qamar Hussain on Jul 14, 2011
Copyright:Attribution Non-commercial

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02/02/2013

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