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Hair Tuning - Sound Sensor

Hair Tuning - Sound Sensor

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Published by Abhishek Ghosh

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Published by: Abhishek Ghosh on Jun 12, 2012
Copyright:Attribution Non-commercial


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Term Paper 
Submitted to:Dr. Ekta Singla(Course Instructor)Submitted by:P2009ME1074Abhishek GhoshP2009ME1081Tahir Sheikh
In recent times, several attempts have been made by man to mimic natural biomechanics. Natural sense organs have also been targeted. Some of these mechanisms showexceptional sensory performance. The sound sense organ in crickets comes under thiscategory. The cricket intercepts vibrations using an array of hair strands. These hair strands oscillate in response to an incoming signal and produce electrical output for transmission to the cricket’s brain. The performance of this natural sensory organsurpasses that of the modern sound sensors with respect to sensitivity, dynamic range,frequency filtering, and selectivity. This paper brings up the recent development of a biomimetic hair flow sensor working on the same principle.
Bio mimetic hair flow sensors are being developed to act as sound sensors. These sensorswork with micro level hair strands as their receptors. In addition to the resonantamplification obtained by the present day hair sensors, the new sensor aims to providenon resonant amplification. This will allow the sensors to provide selective gain andtunable filtering.
Figure 1. MEMS hair flow sensors fabricated by surface micromachining and using SU-8 Lithography
The general procedure for making MEMS (Microelectromechanical systems) consists of Lithography. The hair strands for this biomimetic sensor are fabricated using a specialtype of lithography called SU-8 Lithography.
consists of the transfer of a pattern onto a substrate by means of anetching process (figure 2). Resist lithography makes use of an irradiation source and a photosensitive polymer material to perform the pattern transfer. Selective irradiationinitiates a series of photochemical processes in the resist which alter the physical andchemical properties of the exposed areas such that they can be differentiated in asubsequent image development step. Most commonly, the solubility of the film ismodified by either increasing the solubility of exposed areas (yielding a positive imageafter develop) or decreasing the solubility to yield a negative-tone image. Developmentof the imaged substrate reveals a pattern on the resist layer which corresponds to thegeometry of the mask.
Figure 2.Photolithographic Steps

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