HIGH DENSITY PLASMASOURCES
Design, Physics and Performance
Edited by
Oleg A. Popov
Matsushita Electric WorksWoburn, Massachusetts
NOYES PUBLICATIONS
Park Ridge, New Jersey, U.S.A.
Copyright 8 1995 by Noyes PublicationsNo part of this book may be reproduced or utilizedin any form or by any means, electronic ormechanical, including photocopying, recording orby any information storage and retrieval system,without permission in writing from the Publisher.Library of Congress Catalog Card Number: 95-49 18ISBN: 0-8155-1377-lPrinted in the United StatesPublished in the United States of America byNoyes PublicationsMill Road, Park Ridge, New Jersey 0765610987654321Library of Congress Cataloging-in-Publication DataHigh density plasma sources
:
edited by Oleg A. PopovP.cm.Includes bibliographical references and index.ISBN 0-8155-1377-l1. Plasma density. 2. Plasma generators. 3. High temperatureplasmas. 1. Popov, Oleg A.QC718.5.D4H54 1995621.044--dcZO95-4918CIP
Editors
Rointan F. Bunshah, University of California, Los Angeles (Series
Editor)
Gary E. McGuire, Microelectronics Center of North Carolina (Series
Editor)
Stephen M. Rossnagel, IBM Thomas J. Watson Research Center
(Consutting Editor)
Electronic Materials and Process Technology
HANDBOOK OF DEPOSITION TECHNOLOGIES FOR FILMS AND COATINGS, SecondEdition: edited by Rointan F. BunshahCHEMICAL VAPOR DEPOSITION FOR MICROELECTRONICS: by Arthur ShermanSEMICONDUCTOR MATERIALS AND PROCESS TECHNOLOGY HANDBOOK: editedby Gary E. McGuireHYBRID MICROCIRCUITTECHNOLOGY HANDBOOK: byJames J. Licari and Leonard R.EnlowHANDBOOK OF THIN FILM DEPOSITION PROCESSES AND TECHNIQUES: edited byKlaus K. SchuegrafIONIZED-CLUSTER BEAM DEPOSITION AND EPITAXY: by Toshinori TakagiDIFFUSION PHENOMENA IN THIN FILMS AND MICROELECTRONIC MATERIALS:edited by Devendra Gupta and Paul S. HoHANDBOOK OF CONTAMINATION CONTROL IN MICROELECTRONICS: edited byDonald L. TolliverHANDBOOK OF ION BEAM PROCESSING TECHNOLOGY: edited by Jerome J. Cuomo,Stephen M. Rossnagel, and Harold R. KaufmanCHARACTERIZATION OF SEMICONDUCTOR MATERIALS, Volume 1: edited by Gary E.McGuireHANDBOOKOF PLASMA PROCESSINGTECHNOLOGY: edited
by
StephenM. Rossnagel,Jerome J. Cuomo, and William D. WestwoodHANDBOOK OF SEMICONDUCTOR SILICON TECHNOLOGY: edited by William C.O’Mara, Robert B. Herring, and Lee P. HuntHANDBOOK OF POLYMER COATINGS FOR ELECTRONICS, 2nd Edition: by JamesLicari and Laura A. HughesHANDBOOK OF SPUTTER DEPOSITION TECHNOLOGY: by
Kiyotaka
Wasaand ShigeruHayakawaHANDBOOK OF VLSI MICROLITHOGRAPHY: edited by William B. Glendinning and JohnN. HelbertCHEMISTRY OF SUPERCONDUCTOR MATERIALS: edited by Terre11 A. VanderahCHEMICAL VAPOR DEPOSITION OF TUNGSTEN AND TUNGSTEN SILICIDES: by JohnE. J. SchmitzELECTROCHEMISTRY OF SEMICONDUCTORS AND ELECTRONICS: edited by JohnMcHardy and Frank Ludwig
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3.5 ECR Source Designs With All Permanent Magnets for High Density Plasma Sources
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