High-speed Process Monitoring and Control System for Reactive Physical Vapour Deposition.
Plasma Emission Monitoring. PEM. Reactive Gas Control. Voltage Control. Reactive Magnetron Sputtering. PVD. PECVD. PEALD. Vacuum Arc.
High-speed Process Monitoring and Control System for Reactive Physical Vapour Deposition.
Plasma Emission Monitoring. PEM. Reactive Gas Control. Voltage Control. Reactive Magnetron Sputtering. PVD. PECVD. PEALD. Vacuum Arc.
High-speed Process Monitoring and Control System for Reactive Physical Vapour Deposition.
Plasma Emission Monitoring. PEM. Reactive Gas Control. Voltage Control. Reactive Magnetron Sputtering. PVD. PECVD. PEALD. Vacuum Arc.
FloTron™ ®, Novanszicn
ECONOMY MULTI-CHANNEL PROCESS CONTROL AND PLASMA MONITORING SYSTEM
‘5 KEY FloTron™ ADVANTAGES
Applications: Reactive Magnetron Sputtering Vacuum A 8 evaporation, IBS, PECVD &PERLD processes
High accuracy and excellent ong term proces stability and pracesst-proces(batchto batch)
reproducibility
Acostetfecve and easy to integrate solution
Dramaticprocesimprovements- higher deposton rate g. 2-3 times), thin flm properties (a.m k),
reduced arcing and number of mio &maco defects
> Advanced software features, eg enhanced Dual Sensor made, process set-up automation, ec.
TOKEY FloTron™ FEATURES
3, 5and9 (mult signal} Actuator ports on standard loton” systems
Single wavelength PMT fier type Optical inputs (0)
Mpls for multi-zne proces control on cathodesupto4.0mlong FloTron™
Inteligent sensor technology fr HIPIMS plasma monitoring and reactive gas contol veeterenns
> 0-5V,0-10Vanalogyeltage and (optional) 4-20 mA caren inputs
> 3 cant algorithms: PID & POF for cosed-lop control and EP for endpoint detection
Sy Buln automated sensor and proces libration procedures
sy -5V,0-10V analog vltage outputs for high speed data acquisition (DAQ) ofsensosgnals or analysis by high frequency instrumentation (9. 05¢-
Ioscope)
PROFIBUS & PROFNE optional industal communication interfaces
FREEJAVA based Foon” Graphical User Interface anda smart on™ Archive appliation fr ofne review and organisation of logged process data
IMPORTANT SPECIFICATIONS
Fotion 3 5 ’
3 5 .
upton
(exh roves pow, =/-15¥ 12 nal cig and communication ers)
Aral npatsBNC 0-5 or OVC,
lepton} 420 DC ‘ “ al
Opting (MA 05) PT fer opto pied aptes
til ints secarangeandresitin 200-860 / 109m
emote cant an stats: : 5 :
gal inpusiewous (0)
(otal agrthns 3 ronan PD 0
‘ater omerequrement Pome spy Iput og: 80 26 Input quency 47063
@icompatbity Windows or equles a uate nvonent UREA)
nn CPUC, 3, RAM, 05320 bi endo orate, VGA adapter any.
camper egaenens Tepimal @U Qua. Cr7, 3 SG, RAM 68, 054 bit Wands orate
ok adapter: eu 8 an 10 seis righ,
ae (rin) 12801080
Mente reat egrenes recommended] 19205180
[standard thee
‘Corman teas [oponl PROFIBUS, PROFNET or ancherindsti
owing Capac, raged Aedes wit enhancedpretecton fom sho rate
Dimensions with andbeght) 19°xS7 (80x 145)
{6 t012 (53 mt 305 rm} depending on conga.
2S, depending on cnfiguatn,
OA CLC nard
ao
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