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https://www.scribd.com/doc/75331741/53326496PowerElectronicsMohan2ndEditionSolution
02/28/2014
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191. Intrinsic temperature is reached when the intrinsic carrier density n
i
equals the lowest
doping density in the pn juinction structure (the nside in this problem). Thus
n
i
(T
i
) = N
d
= 10
14
= 10
10
exp
˚

qE
g
2k
˛
1
T
i

1
300
Solving for T
i
using E
g
= 1.1 eV, k = 1.4x10
23
[1/°K] yields
T
i
= 262 °C or 535 °K.
192. Nside resistivity
n
=
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 43.5 ohmcm
Pside resistivity
p
=
1
q
p
N
a
=
1
(1.6x10
19
)(500)(10
18
)
= 0.013 ohmcm
193. Material is ntype with N
d
= 10
13
cm
3
>> n
i
= 10
10
cm
3
. Hence use approximate
formulas given in Chapter 19.
n = N
d
= 10
13
cm
3
; p =
n
2
i
N
d
=
10
20
10
13
= 10
7
cm
3
194. p
o
=
n
2
i
[300]
N
d
; 2p
o
=
n
2
i
[300+T]
N
d
2 n
2
i
[300] = n
2
i
[300 + T] ; 2x10
10
= 10
10
exp
˚

qE
g
2k
˛
1
T

1
300
Solving for T yields T =
qE
g
300
(qE
g
k300ln(2))
= 305.2 °K
T = 305.2  300 = 5.2 °K.
195. I
1
= I
s
exp(
qV
1
kT
; 10 I
1
= I
s
exp(
qV
1
+ V
kT
) ; V =
kT
q
ln(10) = 60 mV
196. (a) x
n
(0) = depletion layer width on nside at zero bias; x
p
(0) = depletion layer width
on pside at zero bias.
Chapter 19 Problem Solutions
191. Intrinsic temperature is reached when the intrinsic carrier density n
i
equals the lowest
doping density in the pn juinction structure (the nside in this problem). Thus
n
i
(T
i
) = N
d
= 10
14
= 10
10
exp
˚

qE
g
2k
˛
1
T
i

1
300
Solving for T
i
using E
g
= 1.1 eV, k = 1.4x10
23
[1/°K] yields
T
i
= 262 °C or 535 °K.
192. Nside resistivity
n
=
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 43.5 ohmcm
Pside resistivity
p
=
1
q
p
N
a
=
1
(1.6x10
19
)(500)(10
18
)
= 0.013 ohmcm
193. Material is ntype with N
d
= 10
13
cm
3
>> n
i
= 10
10
cm
3
. Hence use approximate
formulas given in Chapter 19.
n = N
d
= 10
13
cm
3
; p =
n
2
i
N
d
=
10
20
10
13
= 10
7
cm
3
194. p
o
=
n
2
i
[300]
N
d
; 2p
o
=
n
2
i
[300+T]
N
d
2 n
2
i
[300] = n
2
i
[300 + T] ; 2x10
10
= 10
10
exp
˚

qE
g
2k
˛
1
T

1
300
Solving for T yields T =
qE
g
300
(qE
g
k300ln(2))
= 305.2 °K
T = 305.2  300 = 5.2 °K.
195. I
1
= I
s
exp(
qV
1
kT
; 10 I
1
= I
s
exp(
qV
1
+ V
kT
) ; V =
kT
q
ln(10) = 60 mV
196. (a) x
n
(0) = depletion layer width on nside at zero bias; x
p
(0) = depletion layer width
on pside at zero bias.
Chapter 19 Problem Solutions
191. Intrinsic temperature is reached when the intrinsic carrier density n
i
equals the lowest
doping density in the pn juinction structure (the nside in this problem). Thus
n
i
(T
i
) = N
d
= 10
14
= 10
10
exp
˚

qE
g
2k
˛
1
T
i

1
300
Solving for T
i
using E
g
= 1.1 eV, k = 1.4x10
23
[1/°K] yields
T
i
= 262 °C or 535 °K.
192. Nside resistivity
n
=
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 43.5 ohmcm
Pside resistivity
p
=
1
q
p
N
a
=
1
(1.6x10
19
)(500)(10
18
)
= 0.013 ohmcm
193. Material is ntype with N
d
= 10
13
cm
3
>> n
i
= 10
10
cm
3
. Hence use approximate
formulas given in Chapter 19.
n = N
d
= 10
13
cm
3
; p =
n
2
i
N
d
=
10
20
10
13
= 10
7
cm
3
194. p
o
=
n
2
i
[300]
N
d
; 2p
o
=
n
2
i
[300+T]
N
d
2 n
2
i
[300] = n
2
i
[300 + T] ; 2x10
10
= 10
10
exp
˚

qE
g
2k
˛
1
T

1
300
Solving for T yields T =
qE
g
300
(qE
g
k300ln(2))
= 305.2 °K
T = 305.2  300 = 5.2 °K.
195. I
1
= I
s
exp(
qV
1
kT
; 10 I
1
= I
s
exp(
qV
1
+ V
kT
) ; V =
kT
q
ln(10) = 60 mV
196. (a) x
n
(0) = depletion layer width on nside at zero bias; x
p
(0) = depletion layer width
on pside at zero bias.
Chapter 19 Problem Solutions
191. Intrinsic temperature is reached when the intrinsic carrier density n
i
equals the lowest
doping density in the pn juinction structure (the nside in this problem). Thus
n
i
(T
i
) = N
d
= 10
14
= 10
10
exp
˚

qE
g
2k
˛
1
T
i

1
300
Solving for T
i
using E
g
= 1.1 eV, k = 1.4x10
23
[1/°K] yields
T
i
= 262 °C or 535 °K.
192. Nside resistivity
n
=
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 43.5 ohmcm
Pside resistivity
p
=
1
q
p
N
a
=
1
(1.6x10
19
)(500)(10
18
)
= 0.013 ohmcm
193. Material is ntype with N
d
= 10
13
cm
3
>> n
i
= 10
10
cm
3
. Hence use approximate
formulas given in Chapter 19.
n = N
d
= 10
13
cm
3
; p =
n
2
i
N
d
=
10
20
10
13
= 10
7
cm
3
194. p
o
=
n
2
i
[300]
N
d
; 2p
o
=
n
2
i
[300+T]
N
d
2 n
2
i
[300] = n
2
i
[300 + T] ; 2x10
10
= 10
10
exp
˚

qE
g
2k
˛
1
T

1
300
Solving for T yields T =
qE
g
300
(qE
g
k300ln(2))
= 305.2 °K
T = 305.2  300 = 5.2 °K.
195. I
1
= I
s
exp(
qV
1
kT
; 10 I
1
= I
s
exp(
qV
1
+ V
kT
) ; V =
kT
q
ln(10) = 60 mV
196. (a) x
n
(0) = depletion layer width on nside at zero bias; x
p
(0) = depletion layer width
on pside at zero bias.
Chapter 19 Problem Solutions
191. Intrinsic temperature is reached when the intrinsic carrier density n
i
equals the lowest
doping density in the pn juinction structure (the nside in this problem). Thus
n
i
(T
i
) = N
d
= 10
14
= 10
10
exp
˚

qE
g
2k
˛
1
T
i

1
300
Solving for T
i
using E
g
= 1.1 eV, k = 1.4x10
23
[1/°K] yields
T
i
= 262 °C or 535 °K.
192. Nside resistivity
n
=
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 43.5 ohmcm
Pside resistivity
p
=
1
q
p
N
a
=
1
(1.6x10
19
)(500)(10
18
)
= 0.013 ohmcm
193. Material is ntype with N
d
= 10
13
cm
3
>> n
i
= 10
10
cm
3
. Hence use approximate
formulas given in Chapter 19.
n = N
d
= 10
13
cm
3
; p =
n
2
i
N
d
=
10
20
10
13
= 10
7
cm
3
194. p
o
=
n
2
i
[300]
N
d
; 2p
o
=
n
2
i
[300+T]
N
d
2 n
2
i
[300] = n
2
i
[300 + T] ; 2x10
10
= 10
10
exp
˚

qE
g
2k
˛
1
T

1
300
Solving for T yields T =
qE
g
300
(qE
g
k300ln(2))
= 305.2 °K
T = 305.2  300 = 5.2 °K.
195. I
1
= I
s
exp(
qV
1
kT
; 10 I
1
= I
s
exp(
qV
1
+ V
kT
) ; V =
kT
q
ln(10) = 60 mV
196. (a) x
n
(0) = depletion layer width on nside at zero bias; x
p
(0) = depletion layer width
on pside at zero bias.
Chapter 19 Problem Solutions
191. Intrinsic temperature is reached when the intrinsic carrier density n
i
equals the lowest
doping density in the pn juinction structure (the nside in this problem). Thus
n
i
(T
i
) = N
d
= 10
14
= 10
10
exp
˚

qE
g
2k
˛
1
T
i

1
300
Solving for T
i
using E
g
= 1.1 eV, k = 1.4x10
23
[1/°K] yields
T
i
= 262 °C or 535 °K.
192. Nside resistivity
n
=
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 43.5 ohmcm
Pside resistivity
p
=
1
q
p
N
a
=
1
(1.6x10
19
)(500)(10
18
)
= 0.013 ohmcm
193. Material is ntype with N
d
= 10
13
cm
3
>> n
i
= 10
10
cm
3
. Hence use approximate
formulas given in Chapter 19.
n = N
d
= 10
13
cm
3
; p =
n
2
i
N
d
=
10
20
10
13
= 10
7
cm
3
194. p
o
=
n
2
i
[300]
N
d
; 2p
o
=
n
2
i
[300+T]
N
d
2 n
2
i
[300] = n
2
i
[300 + T] ; 2x10
10
= 10
10
exp
˚

qE
g
2k
˛
1
T

1
300
Solving for T yields T =
qE
g
300
(qE
g
k300ln(2))
= 305.2 °K
T = 305.2  300 = 5.2 °K.
195. I
1
= I
s
exp(
qV
1
kT
; 10 I
1
= I
s
exp(
qV
1
+ V
kT
) ; V =
kT
q
ln(10) = 60 mV
196. (a) x
n
(0) = depletion layer width on nside at zero bias; x
p
(0) = depletion layer width
on pside at zero bias.
x
n
(0) + x
p
(0) = W
o
=
2
c
(N
a
+N
d
)
qN
a
N
d
(1)
c
=
kT
q
ln
˚
N
a
N
d
n
2
i
= 0.026 ln
˚
10
14
10
15
10
20
= 0.54 eV
Conservation of charge: q N
a
x
p
= q N
d
x
n (2)
Solving (1) and (2) simultaneously gives using the numerical values given in the problem
statement gives:
W
o
= 2.8 microns ; x
n
(0) = 2.55 microns ; x
p
(0) = 0.25 microns
(b) Electric field profile triangularshaped as shown in Fig. 199b. Maximum electric at
zero bias given by
E
max
=
2
c
W
o
=
(2)(0.54)
(2.8x10
4
)
= 3,900 V/cm
(c) From part a)
c
= 0.54 eV
(d)
C(V)
A
=
W
o
1+
V
c
; C(V) = spacecharge capacitance at reverse voltage V.
C(0)
A
=
(11.7)(8.9x10
14
)
2.8x10
4
= 3.7x10
9
F/cm
2
C(50)
A
=
(11.7)(8.9x10
14
)
2.8x10
4
1+
50
0.54
= 3.8x10
10
F/cm
2
(e) I = I
s
exp(
qV
kT
) ; exp(
qV
kT
) = exp (
0.7
0.026
) = 5x10
11
I
s
= q n
2
i
˚
D
n
N
a
+
D
p
N
d
A
= (1.6x10
19
)(10
20
)
˚
(38)(10
6
)
(10
15
)(10
6
)
+
(13)(10
6
)
(10
14
)(10
6
)
(2)
2
I
s
= 6.7x10
14
A ;
I = (6.7x10
14
)(5x10
11
) = 34 mA
197. Resistance R =
L
A
;
L
A
=
0.02
0.01
= 2 cm
1
At 25 °C, N
d
= 10
14
>> n
i
so =
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 41.7 cm
R(25 °C) = (41.7)(2) = 83.4 ohms
At 250 °C (523 °K), n
i
[523] = 10
10
exp
˚

(1.6x10
19
)(1.1)
(2)(1.4x10
23
)
˛
1
523

1
300
=
(10
10
)(7.6x10
3
) = 7.6x10
13
which is an appreciable fraction of N
d
= 10
14
. Thus we
should solve Eqs. (192) and (193) exactly for n
o
and p
o
rather than using equations
similiar to Eq. (194). Solving Eqs. (192) and (193) for N
d
>> N
a
yields
n
o
=
N
d
2
˚
1+ 1+
4n
2
i
N
2
d
and p
o
=
n
2
i
n
o
. Putting in numerical values yields
n
o
=
10
14
2
˚
1+ 1+
(4)(7.6x10
13
)
2
(10
14
)
2
= 1.4x10
14
and
p
o
=
5.8x10
27
10
14
= 5.8x10
13
Assuming temperatureindependent mobilities (not a valid assumption but no other
information is given in text or the problem statement), resistance is
R(250 °C) =
(250° C)L
A
; (250 °C) ≈
1
q
n
n
o
+q
p
p
o
=
1
(1.6x10
19
)(1500)(1.4x10
14
)+(1.6x10
19
)(500)(5.8x10
13
)
= 26.2 cm ;
R(250 °C) ≈ (26.2)(2) = 52.4 ohms
198. BV
BD
=
(N
a
+N
d
)E
2
BD
2qN
a
N
d
=
(11.7)(8.9x10
14
)(10
15
+10
14
)(3x10
5
)
2
(2)(1.6x10
19
)(10
15
)(10
14
)
= 3,340 volts
197. Resistance R =
L
A
;
L
A
=
0.02
0.01
= 2 cm
1
At 25 °C, N
d
= 10
14
>> n
i
so =
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(10
14
)
= 41.7 cm
R(25 °C) = (41.7)(2) = 83.4 ohms
At 250 °C (523 °K), n
i
[523] = 10
10
exp
˚

(1.6x10
19
)(1.1)
(2)(1.4x10
23
)
˛
1
523

1
300
=
(10
10
)(7.6x10
3
) = 7.6x10
13
which is an appreciable fraction of N
d
= 10
14
. Thus we
should solve Eqs. (192) and (193) exactly for n
o
and p
o
rather than using equations
similiar to Eq. (194). Solving Eqs. (192) and (193) for N
d
>> N
a
yields
n
o
=
N
d
2
˚
1+ 1+
4n
2
i
N
2
d
and p
o
=
n
2
i
n
o
. Putting in numerical values yields
n
o
=
10
14
2
˚
1+ 1+
(4)(7.6x10
13
)
2
(10
14
)
2
= 1.4x10
14
and
p
o
=
5.8x10
27
10
14
= 5.8x10
13
Assuming temperatureindependent mobilities (not a valid assumption but no other
information is given in text or the problem statement), resistance is
R(250 °C) =
(250° C)L
A
; (250 °C) ≈
1
q
n
n
o
+q
p
p
o
=
1
(1.6x10
19
)(1500)(1.4x10
14
)+(1.6x10
19
)(500)(5.8x10
13
)
= 26.2 cm ;
R(250 °C) ≈ (26.2)(2) = 52.4 ohms
198. BV
BD
=
(N
a
+N
d
)E
2
BD
2qN
a
N
d
=
(11.7)(8.9x10
14
)(10
15
+10
14
)(3x10
5
)
2
(2)(1.6x10
19
)(10
15
)(10
14
)
= 3,340 volts
199. E
2
max
= E
2
BD
≈
4f
2
c
BV
BD
W
2
o
f
c
; Eq. (1913); or
W
2
o
f
c
=
4BV
BD
E
2
BD
W
2
(BV
BD
) =
W
2
o
BV
BD
f
c
; E q. (19 11) ; Inserting
W
2
o
f
c
=
4BV
BD
E
2
BD
and taking
the square root yields W
(BV
BD
) ≈
2BV
BD
E
2
BD
.
1910. L
p
= D
p
t = (13)(10
6
) = 36 microns ; L
n
= D
n
t = (39)(10
6
) = 62 microns
1911. Assume a onesided step junction with N
a
>> N
d
I
1
= q n
2
i
A
D
p
t
1
N
d
t
1
exp(
qV
kT
) ; I
2
= q n
2
i
A
D
p
t
2
N
d
t
2
exp(
qV
kT
)
I
2
I
1
= 2 =
t
1
t
2
; Thus 4 t
2
= t
1
1912. s = q m
p
p + q m
n
n ; np = n
2
i
; Combining yeilds s = q m
p
n
2
i
n
+ q m
n
n
ds
dn
= 0 =  q m
p
n
2
i
n
2
+ q m
n
; Solving for n yields n = n
i
m
p
m
n
and p = n
i
m
n
m
p
p = 10
10
1500
500
= 1.7x10
10
cm
3
; n = 10
10
500
1500
= 6x10
9
cm
3
;
Thus minimum conductivity realized when silicon is slightly ptype.
Inserting p and n back into the equation for conductivity yields s
min
= 2 q n
i
m
p
m
n
.
Putting in numerical values s
min
= (2)(1.6x10
19
)(10
10
)
(500)(1500)
= 2.8x10
6
mhoscm
199. E
2
max
= E
2
BD
≈
4f
2
c
BV
BD
W
2
o
f
c
; Eq. (1913); or
W
2
o
f
c
=
4BV
BD
E
2
BD
W
2
(BV
BD
) =
W
2
o
BV
BD
f
c
; E q. (19 11) ; Inserting
W
2
o
f
c
=
4BV
BD
E
2
BD
and taking
the square root yields W
(BV
BD
) ≈
2BV
BD
E
2
BD
.
1910. L
p
= D
p
t = (13)(10
6
) = 36 microns ; L
n
= D
n
t = (39)(10
6
) = 62 microns
1911. Assume a onesided step junction with N
a
>> N
d
I
1
= q n
2
i
A
D
p
t
1
N
d
t
1
exp(
qV
kT
) ; I
2
= q n
2
i
A
D
p
t
2
N
d
t
2
exp(
qV
kT
)
I
2
I
1
= 2 =
t
1
t
2
; Thus 4 t
2
= t
1
1912. s = q m
p
p + q m
n
n ; np = n
2
i
; Combining yeilds s = q m
p
n
2
i
n
+ q m
n
n
ds
dn
= 0 =  q m
p
n
2
i
n
2
+ q m
n
; Solving for n yields n = n
i
m
p
m
n
and p = n
i
m
n
m
p
p = 10
10
1500
500
= 1.7x10
10
cm
3
; n = 10
10
500
1500
= 6x10
9
cm
3
;
Thus minimum conductivity realized when silicon is slightly ptype.
Inserting p and n back into the equation for conductivity yields s
min
= 2 q n
i
m
p
m
n
.
Putting in numerical values s
min
= (2)(1.6x10
19
)(10
10
)
(500)(1500)
= 2.8x10
6
mhoscm
199. E
2
max
= E
2
BD
≈
4f
2
c
BV
BD
W
2
o
f
c
; Eq. (1913); or
W
2
o
f
c
=
4BV
BD
E
2
BD
W
2
(BV
BD
) =
W
2
o
BV
BD
f
c
; E q. (19 11) ; Inserting
W
2
o
f
c
=
4BV
BD
E
2
BD
and taking
the square root yields W
(BV
BD
) ≈
2BV
BD
E
2
BD
.
1910. L
p
= D
p
t = (13)(10
6
) = 36 microns ; L
n
= D
n
t = (39)(10
6
) = 62 microns
1911. Assume a onesided step junction with N
a
>> N
d
I
1
= q n
2
i
A
D
p
t
1
N
d
t
1
exp(
qV
kT
) ; I
2
= q n
2
i
A
D
p
t
2
N
d
t
2
exp(
qV
kT
)
I
2
I
1
= 2 =
t
1
t
2
; Thus 4 t
2
= t
1
1912. s = q m
p
p + q m
n
n ; np = n
2
i
; Combining yeilds s = q m
p
n
2
i
n
+ q m
n
n
ds
dn
= 0 =  q m
p
n
2
i
n
2
+ q m
n
; Solving for n yields n = n
i
m
p
m
n
and p = n
i
m
n
m
p
p = 10
10
1500
500
= 1.7x10
10
cm
3
; n = 10
10
500
1500
= 6x10
9
cm
3
;
Thus minimum conductivity realized when silicon is slightly ptype.
Inserting p and n back into the equation for conductivity yields s
min
= 2 q n
i
m
p
m
n
.
Putting in numerical values s
min
= (2)(1.6x10
19
)(10
10
)
(500)(1500)
= 2.8x10
6
mhoscm
199. E
2
max
= E
2
BD
≈
4f
2
c
BV
BD
W
2
o
f
c
; Eq. (1913); or
W
2
o
f
c
=
4BV
BD
E
2
BD
W
2
(BV
BD
) =
W
2
o
BV
BD
f
c
; E q. (19 11) ; Inserting
W
2
o
f
c
=
4BV
BD
E
2
BD
and taking
the square root yields W
(BV
BD
) ≈
2BV
BD
E
2
BD
.
1910. L
p
= D
p
t = (13)(10
6
) = 36 microns ; L
n
= D
n
t = (39)(10
6
) = 62 microns
1911. Assume a onesided step junction with N
a
>> N
d
I
1
= q n
2
i
A
D
p
t
1
N
d
t
1
exp(
qV
kT
) ; I
2
= q n
2
i
A
D
p
t
2
N
d
t
2
exp(
qV
kT
)
I
2
I
1
= 2 =
t
1
t
2
; Thus 4 t
2
= t
1
1912. s = q m
p
p + q m
n
n ; np = n
2
i
; Combining yeilds s = q m
p
n
2
i
n
+ q m
n
n
ds
dn
= 0 =  q m
p
n
2
i
n
2
+ q m
n
; Solving for n yields n = n
i
m
p
m
n
and p = n
i
m
n
m
p
p = 10
10
1500
500
= 1.7x10
10
cm
3
; n = 10
10
500
1500
= 6x10
9
cm
3
;
Thus minimum conductivity realized when silicon is slightly ptype.
Inserting p and n back into the equation for conductivity yields s
min
= 2 q n
i
m
p
m
n
.
Putting in numerical values s
min
= (2)(1.6x10
19
)(10
10
)
(500)(1500)
= 2.8x10
6
mhoscm
Chapter 20 Problem Solutions
201. N
d
=
1.3x10
17
BV
BD
=
1.3x10
17
2500
= 5x10
13
cm
3
; W(2500 V) = (10
5
)(2500) = 250
microns
202. Drift region length of 50 microns is much less than the 250 microns found in the previous
problem (201) for the same drift region doping density. Hence this must be a punch
through structure and Eq. (209) applies.
BV
BD
= (2x10
5
)(5x10
3
) 
(1.6x10
19
)(5x10
13
)(5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 900 V
203. V
on
= V
j
+ V
drift
; V
j
=
kT
q
ln
Î ˚
I
I
s
; For onesided step junction I
s
=
qAn
2
i
L
p
N
d
t
o
;
Evaluating I
s
yields
(1.6x10
19
)(2)(10
10
)
2
(13)(2x10
6
)
(5x10
13
)(2x10
6
)
= 1.6x10
 9
A
V
d
= K
1
I + K
2
(I)
2/3
Eq. (2016) with I = forward bias current through the diode.
K
1
=
W
d
qm
o
An
b
=
5x10
3
(1.6x10
19
)(900)(2)(10
17
)
= 1.7x10
4
K
2
=
3
W
4
d
q
2
m
3
o
n
2
b
A
2
t
o
=
3
(5x10
3
)
4
(1.6x10
19
)
2
(900)
3
(10
17
)
2
(2)
2
(2x10
6
)
= 7.5x10
4
Chapter 20 Problem Solutions
201. N
d
=
1.3x10
17
BV
BD
=
1.3x10
17
2500
= 5x10
13
cm
3
; W(2500 V) = (10
5
)(2500) = 250
microns
202. Drift region length of 50 microns is much less than the 250 microns found in the previous
problem (201) for the same drift region doping density. Hence this must be a punch
through structure and Eq. (209) applies.
BV
BD
= (2x10
5
)(5x10
3
) 
(1.6x10
19
)(5x10
13
)(5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 900 V
203. V
on
= V
j
+ V
drift
; V
j
=
kT
q
ln
Î ˚
I
I
s
; For onesided step junction I
s
=
qAn
2
i
L
p
N
d
t
o
;
Evaluating I
s
yields
(1.6x10
19
)(2)(10
10
)
2
(13)(2x10
6
)
(5x10
13
)(2x10
6
)
= 1.6x10
 9
A
V
d
= K
1
I + K
2
(I)
2/3
Eq. (2016) with I = forward bias current through the diode.
K
1
=
W
d
qm
o
An
b
=
5x10
3
(1.6x10
19
)(900)(2)(10
17
)
= 1.7x10
4
K
2
=
3
W
4
d
q
2
m
3
o
n
2
b
A
2
t
o
=
3
(5x10
3
)
4
(1.6x10
19
)
2
(900)
3
(10
17
)
2
(2)
2
(2x10
6
)
= 7.5x10
4
Chapter 20 Problem Solutions
201. N
d
=
1.3x10
17
BV
BD
=
1.3x10
17
2500
= 5x10
13
cm
3
; W(2500 V) = (10
5
)(2500) = 250
microns
202. Drift region length of 50 microns is much less than the 250 microns found in the previous
problem (201) for the same drift region doping density. Hence this must be a punch
through structure and Eq. (209) applies.
BV
BD
= (2x10
5
)(5x10
3
) 
(1.6x10
19
)(5x10
13
)(5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 900 V
203. V
on
= V
j
+ V
drift
; V
j
=
kT
q
ln
˚
I
I
s
; For onesided step junction I
s
=
qAn
2
i
L
p
N
d
o
;
Evaluating I
s
yields
(1.6x10
19
)(2)(10
10
)
2
(13)(2x10
6
)
(5x10
13
)(2x10
6
)
= 1.6x10
9
V
d
= K
1
I + K
2
(I)
2/3
Eq. (2016) with I = forward bias current through the diode.
K
1
=
W
d
q
o
An
b
·
5x10
3
(1.6x10
19
)(900)(2)(10
17
)
= 1.7x10
4
K
2
=
3
W
4
d
q
2
3
o
n
2
b
A
2
o
=
3
(5x10
3
)
4
(1.6x10
19
)
2
(900)
3
(10
17
)
2
(2)
2
(2x10
6
)
= 7.5x10
4
I V
j
V
drift
V
on
0 A 0 V 0 V 0 V
1 0.53 0.001 0.53
10 0.59 0.005 0.59
100 0.65 0.033 0.68
1000 0.71 0.25 0.96
3000 0.74 0.67 1.41
•
•
•
•
•
0
0.2
0.4
0.6
0.8
1
1.2
1.4
1.6
1 10 100 1000 10000
V
on
in volts
Forward current in amperes
204. a) V
on
(t) = R
drift
I(t) >> V
j
≈ 1 V ; R
drift
=
L
A
; =
1
q
n
N
d
=
1
(1.6x10
19
)(1500)(5x10
13
)
= 85 ohmcm ;
L
A
=
5x10
3
2
= 2.5x10
3
R
drift
= (85)(2.5x10
3
) = 0.21 ohms ; I(t) = 2.5x10
8
t ; 0 < t < 4 microseconds
V
on
(t) = (0.21)(2.5x10
8
t ) = 5.3x10
7
t Volts ; 0 < t < 4 microseconds
V
on
(4 s) = (5.3x10
7
)(4x10
6
) = 212 volts
b) V
on
(t) = R
drift
(t) I(t) ; R
drift
(t) = 0.21[1  2.5x10
7
t]
V
on
(t) = {0.21[1  2.5x10
7
t]} { 2.5x10
8
t } = 53[t  0.25 t
2
] ; t in microseconds
I V
j
V
drift
V
on
0 A 0 V 0 V 0 V
1 0.53 0.001 0.53
10 0.59 0.005 0.59
100 0.65 0.033 0.68
1000 0.71 0.25 0.96
3000 0.74 0.67 1.41
•
•
•
•
•
0
0.2
0.4
0.6
0.8
1
1.2
1.4
1.6
1 10 100 1000 10000
V
on
in volts
Forward current in amperes
204. a) V
on
(t) = R
drift
I(t) >> V
j
≈ 1 V ; R
drift
= r
L
A
; r =
1
qm
n
N
d
r =
1
(1.6x10
19
)(1500)(5x10
13
)
= 85 ohmcm ;
L
A
=
5x10
3
2
= 2.5x10
3
R
drift
= (85)(2.5x10
3
) = 0.21 ohms ; I(t) = 2.5x10
8
t ; 0 < t < 4 microseconds
V
on
(t) = (0.21)(2.5x10
8
t ) = 5.3x10
7
t Volts ; 0 < t < 4 microseconds
V
on
(4 m s) = (5.3x10
7
)(4x10
6
) = 212 volts
b) V
on
(t) = R
drift
(t) I(t) ; R
drift
(t) = 0.21[1  2.5x10
7
t]
V
on
(t) = {0.21[1  2.5x10
7
t]} { 2.5x10
8
t } = 53[t  0.25 t
2
] ; t in microseconds
0
50
100
150
200
250
0 0.5 1 1.5 2 2.5 3 3.5 4
Von
in
volts
With carrier injection
No carrier injection
205. t
off
= t
rr
+ t
3
= t
rr
+
I
F
di
R
/dt
= t
rr
+
2000
2.5x10
8
= t
rr
+ 8 m s
t
rr
=
2t I
F
di
R
/dt
; t = 4x10
12
(BV
BD
)
2 =
4x10
12
(2000)
2
= 16 m s
t
rr
=
(2)(1.6x10
5
)(2x10
3
)
2.5x10
8
= 16 m s ; t
off
= 8 m s + 16 m s = 24 m s
206. Assume a nonpunchthrough structure for the Schottky diode.
N
d
=
1.3x10
17
BV
BD
=
1.3x10
17
150
= 8.7x10
14
cm
3
W
d
= 10
5
BV
BD
= (10
5
) (150) = 15 microns
207. V
drift
= (100 A) (R
drift
) = 2 V ; R
drift
= 0.02 ohms ; 0.02 =
1
qm
n
N
d
L
A
A =
2x10
3
(1.6x10
19
)(1500)(10
15
)(2x10
2
)
= 0.42 cm
2
0
50
100
150
200
250
0 0.5 1 1.5 2 2.5 3 3.5 4
Von
in
volts
With carrier injection
No carrier injection
205. t
off
= t
rr
+ t
3
= t
rr
+
I
F
di
R
/dt
= t
rr
+
2000
2.5x10
8
= t
rr
+ 8 m s
t
rr
=
2t I
F
di
R
/dt
; t = 4x10
12
(BV
BD
)
2 =
4x10
12
(2000)
2
= 16 m s
t
rr
=
(2)(1.6x10
5
)(2x10
3
)
2.5x10
8
= 16 m s ; t
off
= 8 m s + 16 m s = 24 m s
206. Assume a nonpunchthrough structure for the Schottky diode.
N
d
=
1.3x10
17
BV
BD
=
1.3x10
17
150
= 8.7x10
14
cm
3
W
d
= 10
5
BV
BD
= (10
5
) (150) = 15 microns
207. V
drift
= (100 A) (R
drift
) = 2 V ; R
drift
= 0.02 ohms ; 0.02 =
1
qm
n
N
d
L
A
A =
2x10
3
(1.6x10
19
)(1500)(10
15
)(2x10
2
)
= 0.42 cm
2
0
50
100
150
200
250
0 0.5 1 1.5 2 2.5 3 3.5 4
Von
in
volts
With carrier injection
No carrier injection
205. t
off
= t
rr
+ t
3
= t
rr
+
I
F
di
R
/dt
= t
rr
+
2000
2.5x10
8
= t
rr
+ 8 m s
t
rr
=
2t I
F
di
R
/dt
; t = 4x10
12
(BV
BD
)
2 =
4x10
12
(2000)
2
= 16 m s
t
rr
=
(2)(1.6x10
5
)(2x10
3
)
2.5x10
8
= 16 m s ; t
off
= 8 m s + 16 m s = 24 m s
206. Assume a nonpunchthrough structure for the Schottky diode.
N
d
=
1.3x10
17
BV
BD
=
1.3x10
17
150
= 8.7x10
14
cm
3
W
d
= 10
5
BV
BD
= (10
5
) (150) = 15 microns
207. V
drift
= (100 A) (R
drift
) = 2 V ; R
drift
= 0.02 ohms ; 0.02 =
1
qm
n
N
d
L
A
A =
2x10
3
(1.6x10
19
)(1500)(10
15
)(2x10
2
)
= 0.42 cm
2
0
50
100
150
200
250
0 0.5 1 1.5 2 2.5 3 3.5 4
Von
in
volts
With carrier injection
No carrier injection
205. t
off
= t
rr
+ t
3
= t
rr
+
I
F
di
R
/dt
= t
rr
+
2000
2.5x10
8
= t
rr
+ 8 m s
t
rr
=
2t I
F
di
R
/dt
; t = 4x10
12
(BV
BD
)
2 =
4x10
12
(2000)
2
= 16 m s
t
rr
=
(2)(1.6x10
5
)(2x10
3
)
2.5x10
8
= 16 m s ; t
off
= 8 m s + 16 m s = 24 m s
206. Assume a nonpunchthrough structure for the Schottky diode.
N
d
=
1.3x10
17
BV
BD
=
1.3x10
17
150
= 8.7x10
14
cm
3
W
d
= 10
5
BV
BD
= (10
5
) (150) = 15 microns
207. V
drift
= (100 A) (R
drift
) = 2 V ; R
drift
= 0.02 ohms ; 0.02 =
1
qm
n
N
d
L
A
A =
2x10
3
(1.6x10
19
)(1500)(10
15
)(2x10
2
)
= 0.42 cm
2
208. Use Eq. (209) to solve for N
d
; N
d
= [E
BD
W
d
 BV
BD
]
Î ˚
2e
qW
2
d
= [(2x10
5
)(2x10
3
)  300]
(2)(11.7)(8.9x10
14
)
(1.6x10
19
)(2x10
3
)
2
= N
d
= 3.4x10
14
cm
3
209.
R
A
npt
=
W
d
(npt)
qm
n
N
npt
; N
npt
= N
d
of nonpunchthrouth (npt) diode
R
A
pt
=
W
d
(pt)
qm
n
N
pt
; N
pt
= N
d
of punchthrough (pt) diode
W
d
(npt) =
e E
BD
qN
npt
; Derived from Eqs. (1911), (1912), and (1913)
W
d
(pt) =
e E
BD
qN
pt
Î ˚
1+ _ 1
2qN
pt
BV
BD
e E
2
BD
2qN
pt
BV
BD
e E
2
BD
=
qN
pt
e E
BD
N
npt
N
npt
2BV
BD
E
BD
=
qN
npt
e E
BD
2BV
BD
E
BD
N
pt
N
npt
=
1
W
d
(npt)
W
d
(npt)
N
pt
N
npt
= x =
N
pt
N
npt
; W
d
(pt) = W
d
(npt)
1
x
[ ]
1+ _ 1x
If N
pt
<< N
npt
(x << 1) W
d
(pt) ≈ 0.5 W
d
(npt) ; Eq. (2010)
Limit of
1
x
[ ]
1+ _ 1x as x approaches is infinite for the plus root and 0.5 for the
minus root. Hence the minus root is the correct choice to use.
R
A
pt
=
W
d
(npt)
1
x
[ ]
1 1x
qm
n
N
pt
=
W
d
(npt)
1
x
[ ]
1 1x
qm
n
N
pt
N
npt
N
npt
=
W
d
(npt)
qm
n
N
npt
1
x
2
[1  1x ] =
R
A
npt
1
x
2
[1  1x ]
d
dx
Î ˚
1
x
2
1x = 0 =
2
x
3
[1  1x ] +
1
2x
2
1x
Solving for x yields x =
8
9
i.e. N
pt
=
8
9
N
npt
; W
d
(pt) = 0.75 W
d
(npt)
208. Use Eq. (209) to solve for N
d
; N
d
= [E
BD
W
d
 BV
BD
]
˚
2
qW
2
d
= [(2x10
5
)(2x10
3
)  300]
(2)(11.7)(8.9x10
14
)
(1.6x10
19
)(2x10
3
)
2
= N
d
= 3.4x10
14
cm
3
209.
R
A
npt
=
W
d
(npt)
q
n
N
npt
; N
npt
= N
d
of nonpunchthrouth (npt) diode
R
A
pt
=
W
d
(pt)
q
n
N
pt
; N
pt
= N
d
of punchthrough (pt) diode
W
d
(npt) =
E
BD
qN
npt
; Derived from Eqs. (1911), (1912), and (1913)
W
d
(pt) =
E
BD
qN
pt
˚
1+ _ 1
2qN
pt
BV
BD
E
2
BD
2qN
pt
BV
BD
E
2
BD
=
qN
pt
E
BD
N
npt
N
npt
2BV
BD
E
BD
=
qN
npt
E
BD
2BV
BD
E
BD
N
pt
N
npt
=
1
W
d
(npt)
W
d
(npt)
N
pt
N
npt
= x =
N
pt
N
npt
; W
d
(pt) = W
d
(npt)
1
x
[ ]
1+ _ 1x
If N
pt
<< N
npt
(x << 1) W
d
(pt) ≈ 0.5 W
d
(npt) ; Eq. (2010)
Limit of
1
x
[ ]
1+ _ 1x as x approaches is infinite for the plus root and 0.5 for the
minus root. Hence the minus root is the correct choice to use.
R
A
pt
=
W
d
(npt)
1
x
[ ]
1 1x
q
n
N
pt
=
W
d
(npt)
1
x
[ ]
1 1x
q
n
N
pt
N
npt
N
npt
=
W
d
(npt)
q
n
N
npt
1
x
2
[1  1x ] =
R
A
npt
1
x
2
[1  1x ]
d
dx
˚
1
x
2
1x = 0 =
2
x
3
[1  1x ] +
1
2x
2
1x
Solving for x yields x =
8
9
i.e. N
pt
=
8
9
N
npt
; W
d
(pt) = 0.75 W
d
(npt)
R
A
npt
= 0.84
R
A
npt
2010. C
jo
=
A
W
d
(0)
; Area A determined by onstate voltage and current. Depletionlayer
width W
d
(0) set by breakdown voltage. W
d
(0) same for both diodes.
W
d
(150) = W
d
(0) 1+
150
0.7
= (10
5
)(150) = 15 m ;
W
d
(0) =
15
(150)/(0.7)
≈ 1 m
Schottky diode area ; V
drift
= 2 volts =
W
d
(150)
q
n
N
d
A
Schottky
I
F
Drift region doping density N
d
same for both diodes. N
d
=
1.3x10
17
150
= 8.7x10
14
cm
3
A
Schottky
=
(1.5x10
3
)(300)
(2)(1.6x10
19
)(1500)(8.7x10
14
)
= 1.07 cm
2
PN junction diode area: V
drift
= 2 volts = K
1
I
F
+ K
2
(I
F
)
2/3 ;
Eq. (2016)
K
1
=
W
d
(150)
q
o
A
pn
n
b
·
1.5x10
3
(1.6x10
19
)(900)(A
pn
)(10
17
)
=
10
4
A
pn
K
2
=
3
W
4
d
(150)
q
2
3
o
n
2
b
A
2
pn
o
=
3
(1.5x10
3
)
4
(1.6x10
19
)
2
(900)
3
(10
17
)
2
(A
2
pn
)(2x10
6
)
K
2
= 2.4x10
4
(A
pn
)
0.67
; 2 volts =
10
4
A
pn
(300) + 2.4x10
4
(A
pn
)
0.67
(300)
0.67
A
pn
= 0.015 + 0.00154 (A
pn
)
0.333
; Solve by successive approximation ;
A
pn
≈ 0.017 cm
2
Schottky diode C
jo
=
(11.7)(8.9x10
14
)(1.07)
10
4
≈ 11 nF = 0.011 F
R
A
npt
= 0.84
R
A
npt
2010. C
jo
=
e A
W
d
(0)
; Area A determined by onstate voltage and current. Depletionlayer
width W
d
(0) set by breakdown voltage. W
d
(0) same for both diodes.
W
d
(150) = W
d
(0) 1+
150
0.7
= (10
5
)(150) = 15 m m ;
W
d
(0) =
15
(150)/(0.7)
≈ 1 m m
Schottky diode area ; V
drift
= 2 volts =
W
d
(150)
qm
n
N
d
A
Schottky
I
F
Drift region doping density N
d
same for both diodes. N
d
=
1.3x10
17
150
= 8.7x10
14
cm
3
A
Schottky
=
(1.5x10
3
)(300)
(2)(1.6x10
19
)(1500)(8.7x10
14
)
= 1.07 cm
2
PN junction diode area: V
drift
= 2 volts = K
1
I
F
+ K
2
(I
F
)
2/3 ;
Eq. (2016)
K
1
=
W
d
(150)
qm
o
A
pn
n
b
=
1.5x10
3
(1.6x10
19
)(900)(A
pn
)(10
17
)
=
10
4
A
pn
K
2
=
3
W
4
d
(150)
q
2
m
3
o
n
2
b
A
2
pn
t
o
=
3
(1.5x10
3
)
4
(1.6x10
19
)
2
(900)
3
(10
17
)
2
(A
2
pn
)(2x10
6
)
K
2
= 2.4x10
4
(A
pn
)
0.67
; 2 volts =
10
4
A
pn
(300) + 2.4x10
4
(A
pn
)
0.67
(300)
0.67
A
pn
= 0.015 + 0.00154 (A
pn
)
0.333
; Solve by successive approximation ;
A
pn
≈ 0.017 cm
2
Schottky diode C
jo
=
(11.7)(8.9x10
14
)(1.07)
10
4
≈ 11 nF = 0.011 m F
PN junction diode C
jo
=
(11.7)(8.9x10
14
)(0.017)
10
4
≈ 180 pF
2011.
BV
cyl
BV
p
= 2 r
2
(1 +
1
r
) ln (1 +
1
r
)  2r
•
•
•
•
•
•
•
•
•
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
0.1 1 10
BV
cyl
/ BV
p
r = R/(2W
n
)
2012.
BV
cyl
BV
p
=
950
1000
= 0.95 ; From graph in problem 2011, r ≈ 6 =
R
2W
n
R ≈ 12 W
n
PN junction diode C
jo
=
(11.7)(8.9x10
14
)(0.017)
10
4
≈ 180 pF
2011.
BV
cyl
BV
p
= 2 r
2
(1 +
1
r
) ln (1 +
1
r
)  2r
•
•
•
•
•
•
•
•
•
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
0.1 1 10
BV
cyl
/ BV
p
r = R/(2W
n
)
2012.
BV
cyl
BV
p
=
950
1000
= 0.95 ; From graph in problem 2011, r ≈ 6 =
R
2W
n
R ≈ 12 W
n
PN junction diode C
jo
=
(11.7)(8.9x10
14
)(0.017)
10
4
≈ 180 pF
2011.
BV
cyl
BV
p
= 2 r
2
(1 +
1
r
) ln (1 +
1
r
)  2r
•
•
•
•
•
•
•
•
•
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
0.1 1 10
BV
cyl
/ BV
p
r = R/(2W
n
)
2012.
BV
cyl
BV
p
=
950
1000
= 0.95 ; From graph in problem 2011, r ≈ 6 =
R
2W
n
R ≈ 12 W
n
Chapter 21 Problem Solutions
211. NPN BJT ; BV
CEO
=
BV
CBO
b
1/4
; PNP BJT ; BV
CEO
=
BV
CBO
b
1/6
B
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
J
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
1 10 100
BV
CEO
BV
CBO
PNP
NPN
212. The flow of large reverse base currents when emitter current is still flowing in the
forward direction will lead to emitter current crowding towards the center of the emitter.
This accenuates the possibility of second breakdown. See Fig. 218b.
When emitteropen switching is used, there is no emitter current and thus no emitter
current crowding and second breakdown is much less likely to occur.
213. a) Idealized BJT current and voltage waveforms in stepdown converter
Chapter 21 Problem Solutions
211. NPN BJT ; BV
CEO
=
BV
CBO
b
1/4
; PNP BJT ; BV
CEO
=
BV
CBO
b
1/6
B
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
J
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
1 10 100
BV
CEO
BV
CBO
PNP
NPN
212. The flow of large reverse base currents when emitter current is still flowing in the
forward direction will lead to emitter current crowding towards the center of the emitter.
This accenuates the possibility of second breakdown. See Fig. 218b.
When emitteropen switching is used, there is no emitter current and thus no emitter
current crowding and second breakdown is much less likely to occur.
213. a) Idealized BJT current and voltage waveforms in stepdown converter
Chapter 21 Problem Solutions
211. NPN BJT ; BV
CEO
=
BV
CBO
b
1/4
; PNP BJT ; BV
CEO
=
BV
CBO
b
1/6
B
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
*
J
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
•
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
1 10 100
BV
CEO
BV
CBO
PNP
NPN
212. The flow of large reverse base currents when emitter current is still flowing in the
forward direction will lead to emitter current crowding towards the center of the emitter.
This accenuates the possibility of second breakdown. See Fig. 218b.
When emitteropen switching is used, there is no emitter current and thus no emitter
current crowding and second breakdown is much less likely to occur.
213. a) Idealized BJT current and voltage waveforms in stepdown converter
T/2
I
o
V
d
V (t)
CE
i (t)
C
t
d,off
t
rv
t
fi
t
d,on
t
ri
t
fv
BJT power dissipation P
c
=
1
T
ı
0
T
v
CE
(t)i
C
(t)dt = {E
on
+ E
sw
}f
s
; f
s
=
1
T
E
on
= V
CE,on
I
o
{
T
2
+ t
d,off
 t
d,on
} ≈ (2)(40)
1
2f
s
=
40
f
s
Joules
E
sw
= E
ri
+ E
fv
+ E
rv
+ E
fi
E
ri
=
V
d
I
o
t
ri
2
=
(100)(40)(2x10
7
)
2
= 4x10
4
Joules
E
fv
=
V
d
I
o
t
fv
2
=
(100)(40)(1x10
7
)
2
= 2x10
4
Joules
E
rv
=
V
d
I
o
t
rv
2
=
(100)(40)(1x10
7
)
2
= 2x10
4
Joules
E
fi
=
V
d
I
o
t
fi
2
=
(100)(40)(2x10
7
)
2
= 4x10
4
Joules
E
sw
= 1.2x10
3
Joules ; P
c
= [
40
f
s
+ 1.2x10
3
] f
s
= 40 + 1.2x10
3
f
s
40
80
0
33 kHz
f
s
[watts]
P
c
b) T
j
= R
q ja
P
c
+ T
a
; P
c,max
=
15025
1
= 125 watts = 40 + 1.2x10
3
f
s,max
f
s,max
=
(12540)
1.2x10
3
= 71 kHz
214. From problem 213, P
c
= {E
on
+ E
sw
}f
s
where E
sw
is proportional to the switching
times. If the switching times vary with temperature then E
sw
can be written as
E
sw
(T
j
) = E
sw
(25 °C){1 + a[T
j
 25]} with a =
0.4
(12525)
= 4x10
3
110  50 = R
q ja
{40 + 1.2x10
3
[1+0.004(11025)] (2.5x10
4
)}
R
q ja
= 0.75 °C/watt ; This represents an upper limit.
215. Beta begins to drop when the excessd carrier density in the base becomes comparable to
the doping density in the base, i.e. n
base
(x) ≈ N
a
in an NPN BJT.
I
C
=
qD
n
N
a
A
W
b
=
(1.6x10
19
)(38)(10
16
)(1)
(3x10
4
)
= 200 A
216. The diode can carry the larger current. The lateral voltage drops in the BJT base limit the
maximum current that the transistor can carry. These lateral voltage drops lead to emitter
current crowding. The diode has no such limitation.
217. The base doping is not much larger than the collector doping so that the CB depletion
layer protrudes a significant amount into the base. This encroachment may stretch across
the base and reach the EB depletion layer before the desired blocking voltage is reached.
At reachthrough x
p
will equal the difference between the base width W
B
and the base
side protusion of the baseemitter depletion layer width W
EB,depl
.The reachthrough
voltage is approximately estimated as shown below.
Estimate of baseemitter baseside protusion = W
EB,depl
at zero bias.
40
80
0
33 kHz
f
s
[watts]
P
c
b) T
j
= R
q ja
P
c
+ T
a
; P
c,max
=
15025
1
= 125 watts = 40 + 1.2x10
3
f
s,max
f
s,max
=
(12540)
1.2x10
3
= 71 kHz
214. From problem 213, P
c
= {E
on
+ E
sw
}f
s
where E
sw
is proportional to the switching
times. If the switching times vary with temperature then E
sw
can be written as
E
sw
(T
j
) = E
sw
(25 °C){1 + a[T
j
 25]} with a =
0.4
(12525)
= 4x10
3
110  50 = R
q ja
{40 + 1.2x10
3
[1+0.004(11025)] (2.5x10
4
)}
R
q ja
= 0.75 °C/watt ; This represents an upper limit.
215. Beta begins to drop when the excessd carrier density in the base becomes comparable to
the doping density in the base, i.e. n
base
(x) ≈ N
a
in an NPN BJT.
I
C
=
qD
n
N
a
A
W
b
=
(1.6x10
19
)(38)(10
16
)(1)
(3x10
4
)
= 200 A
216. The diode can carry the larger current. The lateral voltage drops in the BJT base limit the
maximum current that the transistor can carry. These lateral voltage drops lead to emitter
current crowding. The diode has no such limitation.
217. The base doping is not much larger than the collector doping so that the CB depletion
layer protrudes a significant amount into the base. This encroachment may stretch across
the base and reach the EB depletion layer before the desired blocking voltage is reached.
At reachthrough x
p
will equal the difference between the base width W
B
and the base
side protusion of the baseemitter depletion layer width W
EB,depl
.The reachthrough
voltage is approximately estimated as shown below.
Estimate of baseemitter baseside protusion = W
EB,depl
at zero bias.
40
80
0
33 kHz
f
s
[watts]
P
c
b) T
j
= R
q ja
P
c
+ T
a
; P
c,max
=
15025
1
= 125 watts = 40 + 1.2x10
3
f
s,max
f
s,max
=
(12540)
1.2x10
3
= 71 kHz
214. From problem 213, P
c
= {E
on
+ E
sw
}f
s
where E
sw
is proportional to the switching
times. If the switching times vary with temperature then E
sw
can be written as
E
sw
(T
j
) = E
sw
(25 °C){1 + a[T
j
 25]} with a =
0.4
(12525)
= 4x10
3
110  50 = R
q ja
{40 + 1.2x10
3
[1+0.004(11025)] (2.5x10
4
)}
R
q ja
= 0.75 °C/watt ; This represents an upper limit.
215. Beta begins to drop when the excessd carrier density in the base becomes comparable to
the doping density in the base, i.e. n
base
(x) ≈ N
a
in an NPN BJT.
I
C
=
qD
n
N
a
A
W
b
=
(1.6x10
19
)(38)(10
16
)(1)
(3x10
4
)
= 200 A
216. The diode can carry the larger current. The lateral voltage drops in the BJT base limit the
maximum current that the transistor can carry. These lateral voltage drops lead to emitter
current crowding. The diode has no such limitation.
217. The base doping is not much larger than the collector doping so that the CB depletion
layer protrudes a significant amount into the base. This encroachment may stretch across
the base and reach the EB depletion layer before the desired blocking voltage is reached.
At reachthrough x
p
will equal the difference between the base width W
B
and the base
side protusion of the baseemitter depletion layer width W
EB,depl
.The reachthrough
voltage is approximately estimated as shown below.
Estimate of baseemitter baseside protusion = W
EB,depl
at zero bias.
40
80
0
33 kHz
f
s
[watts]
P
c
b) T
j
= R
q ja
P
c
+ T
a
; P
c,max
=
15025
1
= 125 watts = 40 + 1.2x10
3
f
s,max
f
s,max
=
(12540)
1.2x10
3
= 71 kHz
214. From problem 213, P
c
= {E
on
+ E
sw
}f
s
where E
sw
is proportional to the switching
times. If the switching times vary with temperature then E
sw
can be written as
E
sw
(T
j
) = E
sw
(25 °C){1 + a[T
j
 25]} with a =
0.4
(12525)
= 4x10
3
110  50 = R
q ja
{40 + 1.2x10
3
[1+0.004(11025)] (2.5x10
4
)}
R
q ja
= 0.75 °C/watt ; This represents an upper limit.
215. Beta begins to drop when the excessd carrier density in the base becomes comparable to
the doping density in the base, i.e. n
base
(x) ≈ N
a
in an NPN BJT.
I
C
=
qD
n
N
a
A
W
b
=
(1.6x10
19
)(38)(10
16
)(1)
(3x10
4
)
= 200 A
216. The diode can carry the larger current. The lateral voltage drops in the BJT base limit the
maximum current that the transistor can carry. These lateral voltage drops lead to emitter
current crowding. The diode has no such limitation.
217. The base doping is not much larger than the collector doping so that the CB depletion
layer protrudes a significant amount into the base. This encroachment may stretch across
the base and reach the EB depletion layer before the desired blocking voltage is reached.
At reachthrough x
p
will equal the difference between the base width W
B
and the base
side protusion of the baseemitter depletion layer width W
EB,depl
.The reachthrough
voltage is approximately estimated as shown below.
Estimate of baseemitter baseside protusion = W
EB,depl
at zero bias.
40
80
0
33 kHz
f
s
[watts]
P
c
b) T
j
= R
q ja
P
c
+ T
a
; P
c,max
=
15025
1
= 125 watts = 40 + 1.2x10
3
f
s,max
f
s,max
=
(12540)
1.2x10
3
= 71 kHz
214. From problem 213, P
c
= {E
on
+ E
sw
}f
s
where E
sw
is proportional to the switching
times. If the switching times vary with temperature then E
sw
can be written as
E
sw
(T
j
) = E
sw
(25 °C){1 + a[T
j
 25]} with a =
0.4
(12525)
= 4x10
3
110  50 = R
q ja
{40 + 1.2x10
3
[1+0.004(11025)] (2.5x10
4
)}
R
q ja
= 0.75 °C/watt ; This represents an upper limit.
215. Beta begins to drop when the excessd carrier density in the base becomes comparable to
the doping density in the base, i.e. n
base
(x) ≈ N
a
in an NPN BJT.
I
C
=
qD
n
N
a
A
W
b
=
(1.6x10
19
)(38)(10
16
)(1)
(3x10
4
)
= 200 A
216. The diode can carry the larger current. The lateral voltage drops in the BJT base limit the
maximum current that the transistor can carry. These lateral voltage drops lead to emitter
current crowding. The diode has no such limitation.
217. The base doping is not much larger than the collector doping so that the CB depletion
layer protrudes a significant amount into the base. This encroachment may stretch across
the base and reach the EB depletion layer before the desired blocking voltage is reached.
At reachthrough x
p
will equal the difference between the base width W
B
and the base
side protusion of the baseemitter depletion layer width W
EB,depl
.The reachthrough
voltage is approximately estimated as shown below.
Estimate of baseemitter baseside protusion = W
EB,depl
at zero bias.
W
o,EB
=
2e f
c
(N
aB
+N
dE
)
qN
aB
N
dE
; f
cE
=
kT
q
ln
Î ˚
N
aB
N
dE
n
2
i
f
cE
= 0.26 ln
Î ˚
10
34
10
20
= 0.84 V
W
o,EB
=
(2)(11.7)(8.9x10
14
)(0.84)(10
19
+10
15
)
(1.6x10
19
)(10
19
)(10
15
)
= 0.33 microns
Estimate of collectorbase baseside protusion of W
CB,depl
.
CB depletion layer thickness W(V) = W
o,CB
1+
V
f
c
= x
p
+ x
n
;
x
p
= protrusion of CB depletion layer into ptype base region. x
p
=
W(V)
11
using x
p
N
a
= x
n
N
d
(charge neutrality).
W
o,CB
=
2e f
cC
(N
aB
+N
dC
)
qN
aB
N
dC
; f
cC
=
kT
q
ln
Î ˚
N
aB
N
dC
n
2
i
f
cC
= 0.26 ln
Î ˚
10
29
10
20
= 0.54 V
W
o,CB
=
(2)(11.7)(8.9x10
14
)(0.54)(10
14
+10
15
)
(1.6x10
19
)(10
14
)(10
15
)
= 2.8 microns
{(3  0.33)x10
4
}(11) = 2.8x10
4
1+
V
0.54
: Solving for V yields V = 59 volts.
Reachthrough voltage of 59 V is much less than the expected value of BV
BD
= 1000 V.
218. BV
EBO
= 10 V =
1.3x10
17
N
aB
; N
aB
= acceptor doping density in base = 1.3x10
16
cm
3
BV
CBO
= b
1/4
BV
CEO
= (5)
1/4
(1000) = ≈ 1500 Volts ≈
1.3x10
17
N
dC
N
dC
= collector drift region donor density = 8.7x10
13
cn
3
W
o,EB
=
2e f
c
(N
aB
+N
dE
)
qN
aB
N
dE
; f
cE
=
kT
q
ln
Î ˚
N
aB
N
dE
n
2
i
f
cE
= 0.26 ln
Î ˚
10
34
10
20
= 0.84 V
W
o,EB
=
(2)(11.7)(8.9x10
14
)(0.84)(10
19
+10
15
)
(1.6x10
19
)(10
19
)(10
15
)
= 0.33 microns
Estimate of collectorbase baseside protusion of W
CB,depl
.
CB depletion layer thickness W(V) = W
o,CB
1+
V
f
c
= x
p
+ x
n
;
x
p
= protrusion of CB depletion layer into ptype base region. x
p
=
W(V)
11
using x
p
N
a
= x
n
N
d
(charge neutrality).
W
o,CB
=
2e f
cC
(N
aB
+N
dC
)
qN
aB
N
dC
; f
cC
=
kT
q
ln
Î ˚
N
aB
N
dC
n
2
i
f
cC
= 0.26 ln
Î ˚
10
29
10
20
= 0.54 V
W
o,CB
=
(2)(11.7)(8.9x10
14
)(0.54)(10
14
+10
15
)
(1.6x10
19
)(10
14
)(10
15
)
= 2.8 microns
{(3  0.33)x10
4
}(11) = 2.8x10
4
1+
V
0.54
: Solving for V yields V = 59 volts.
Reachthrough voltage of 59 V is much less than the expected value of BV
BD
= 1000 V.
218. BV
EBO
= 10 V =
1.3x10
17
N
aB
; N
aB
= acceptor doping density in base = 1.3x10
16
cm
3
BV
CBO
= b
1/4
BV
CEO
= (5)
1/4
(1000) = ≈ 1500 Volts ≈
1.3x10
17
N
dC
N
dC
= collector drift region donor density = 8.7x10
13
cn
3
Set base width W
base
by calculating the protrusion, x
p
, of the CB depletion layer into the
base at V
CB
= 1500 volts = BV
CBO
; W
base
= x
p
(BV
CBO
)
Approximate width of CB depletion layer at breakdown W
CB
(BV
CBO
) ≈ (10
5
)(1500)
= 150 m m
x
p
(BV
CBO
) =
x
n
(BV
CBO
)N
dC
N
aB
= x
n
(BV
CBO
)
8.7x10
13
1.3x10
16
= x
n
(BV
CBO
) 6.7x10
3
x
p
(BV
CBO
) << x
n
(BV
CBO
) so x
n
(BV
CBO
) ≈ W
CB
(BV
CBO
) ≈ 150 m m
Hence x
p
(BV
CBO
) = (1.5x10
2
cm)(6.7x10
3
) = 1 micron = W
base
219. Beta = 150 = b
D
b
M
+ b
D
+ b
M
= 20 b
M
+ 20 + b
M
b
M
=
15020
21
= 6.2
2110. Must first ascertain the operating states of the two transistors.Two likely choices
including (1) driver BJT saturated and main BJT active and (2) driver BJT and main BJT
both saturated. Initially assume driver BJT saturated and main BJT active.
10 I
B,M
B,M
I
0.02 W
0.8 V
0.6 V
0.8 V

+

+

+
C
B
E
10 I
B,M
+ I
B,M
= 100 A
I
B,M
= I
C,D
= 9.1A
I
C,M
= 91 A
V
CE,D
= 0.2 +(.02)(9.1) = 0.382 V
V
CE,M
= V
CE,D
+ 0.8 V = 1.18 v
But a saturated main BJT with I
C,M
= 91 A
going through 0.02 ohms generates
a voltage drop of 1.8 V which is > 1.18 V.
Hence main BJT must be saturated.
Set base width W
base
by calculating the protrusion, x
p
, of the CB depletion layer into the
base at V
CB
= 1500 volts = BV
CBO
; W
base
= x
p
(BV
CBO
)
Approximate width of CB depletion layer at breakdown W
CB
(BV
CBO
) ≈ (10
5
)(1500)
= 150 m m
x
p
(BV
CBO
) =
x
n
(BV
CBO
)N
dC
N
aB
= x
n
(BV
CBO
)
8.7x10
13
1.3x10
16
= x
n
(BV
CBO
) 6.7x10
3
x
p
(BV
CBO
) << x
n
(BV
CBO
) so x
n
(BV
CBO
) ≈ W
CB
(BV
CBO
) ≈ 150 m m
Hence x
p
(BV
CBO
) = (1.5x10
2
cm)(6.7x10
3
) = 1 micron = W
base
219. Beta = 150 = b
D
b
M
+ b
D
+ b
M
= 20 b
M
+ 20 + b
M
b
M
=
15020
21
= 6.2
2110. Must first ascertain the operating states of the two transistors.Two likely choices
including (1) driver BJT saturated and main BJT active and (2) driver BJT and main BJT
both saturated. Initially assume driver BJT saturated and main BJT active.
10 I
B,M
B,M
I
0.02 W
0.8 V
0.6 V
0.8 V

+

+

+
C
B
E
10 I
B,M
+ I
B,M
= 100 A
I
B,M
= I
C,D
= 9.1A
I
C,M
= 91 A
V
CE,D
= 0.2 +(.02)(9.1) = 0.382 V
V
CE,M
= V
CE,D
+ 0.8 V = 1.18 v
But a saturated main BJT with I
C,M
= 91 A
going through 0.02 ohms generates
a voltage drop of 1.8 V which is > 1.18 V.
Hence main BJT must be saturated.
Set base width W
base
by calculating the protrusion, x
p
, of the CB depletion layer into the
base at V
CB
= 1500 volts = BV
CBO
; W
base
= x
p
(BV
CBO
)
Approximate width of CB depletion layer at breakdown W
CB
(BV
CBO
) ≈ (10
5
)(1500)
= 150 m m
x
p
(BV
CBO
) =
x
n
(BV
CBO
)N
dC
N
aB
= x
n
(BV
CBO
)
8.7x10
13
1.3x10
16
= x
n
(BV
CBO
) 6.7x10
3
x
p
(BV
CBO
) << x
n
(BV
CBO
) so x
n
(BV
CBO
) ≈ W
CB
(BV
CBO
) ≈ 150 m m
Hence x
p
(BV
CBO
) = (1.5x10
2
cm)(6.7x10
3
) = 1 micron = W
base
219. Beta = 150 = b
D
b
M
+ b
D
+ b
M
= 20 b
M
+ 20 + b
M
b
M
=
15020
21
= 6.2
2110. Must first ascertain the operating states of the two transistors.Two likely choices
including (1) driver BJT saturated and main BJT active and (2) driver BJT and main BJT
both saturated. Initially assume driver BJT saturated and main BJT active.
10 I
B,M
B,M
I
0.02 W
0.8 V
0.6 V
0.8 V

+

+

+
C
B
E
10 I
B,M
+ I
B,M
= 100 A
I
B,M
= I
C,D
= 9.1A
I
C,M
= 91 A
V
CE,D
= 0.2 +(.02)(9.1) = 0.382 V
V
CE,M
= V
CE,D
+ 0.8 V = 1.18 v
But a saturated main BJT with I
C,M
= 91 A
going through 0.02 ohms generates
a voltage drop of 1.8 V which is > 1.18 V.
Hence main BJT must be saturated.
B,M
I
0.02 W
0.8 V
0.6 V
0.8 V

+

+

+
C
B
E
0.02 W
0.6 V

+
I
C,M
Neglecting I
B,D
I
C,M
+ I
C,D
= 100 A
(.02)I
C,M
0.6 = (.02) I
C,D
+0.2
I
C,D
= 30 A ; I
C,M
= 70 A
V
CE,M
= 0.2 + (70)(.02) = 1.6 V
P
Darl
= V
CE,M
[I
C,M
+ I
C,D
]
P
Darl
= (1.6 V)(100 A) = 160 W
2111. C
EBO
=
e A
E
W
EBO
;
C
CBO
=
e A
C
W
CBO
W
EBO
= zerobias emitterbase depletion layer thickness
W
CBO
= zerobias collectorbase depletion layer thickness
W
EBO
=
2e f
cE
(N
aB
+N
dE
)
qN
aB
N
dE
; f
cE
=
kT
q
ln
Î ˚
N
aB
N
dE
n
2
i
f
cE
= 0.026 ln
Î ˚
(10
19
)(10
16
)
10
20
= 0.89 V ;
W
EBO
=
(2)(11.7)(8.9x10
14
)(0.89)(10
19
+10
16
)
(1.6x10
19
)(10
19
)(10
16
)
= 0.34 microns
C
EBO
=
(11.7)(8.9x10
14
)(0.3)
3.4x10
5
= 9.2 nF
W
CBO
=
2e f
cC
(N
aB
+N
dC
)
qN
aB
N
dC
; f
cC
=
kT
q
ln
Î ˚
N
aB
N
dC
n
2
i
f
cC
= 0.026 ln
Î ˚
(1.3x10
16
)(8.7x10
13
)
10
20
= 0.6 V ;
B,M
I
0.02 W
0.8 V
0.6 V
0.8 V

+

+

+
C
B
E
0.02 W
0.6 V

+
I
C,M
Neglecting I
B,D
I
C,M
+ I
C,D
= 100 A
(.02)I
C,M
0.6 = (.02) I
C,D
+0.2
I
C,D
= 30 A ; I
C,M
= 70 A
V
CE,M
= 0.2 + (70)(.02) = 1.6 V
P
Darl
= V
CE,M
[I
C,M
+ I
C,D
]
P
Darl
= (1.6 V)(100 A) = 160 W
2111. C
EBO
=
e A
E
W
EBO
;
C
CBO
=
e A
C
W
CBO
W
EBO
= zerobias emitterbase depletion layer thickness
W
CBO
= zerobias collectorbase depletion layer thickness
W
EBO
=
2e f
cE
(N
aB
+N
dE
)
qN
aB
N
dE
; f
cE
=
kT
q
ln
Î ˚
N
aB
N
dE
n
2
i
f
cE
= 0.026 ln
Î ˚
(10
19
)(10
16
)
10
20
= 0.89 V ;
W
EBO
=
(2)(11.7)(8.9x10
14
)(0.89)(10
19
+10
16
)
(1.6x10
19
)(10
19
)(10
16
)
= 0.34 microns
C
EBO
=
(11.7)(8.9x10
14
)(0.3)
3.4x10
5
= 9.2 nF
W
CBO
=
2e f
cC
(N
aB
+N
dC
)
qN
aB
N
dC
; f
cC
=
kT
q
ln
Î ˚
N
aB
N
dC
n
2
i
f
cC
= 0.026 ln
Î ˚
(1.3x10
16
)(8.7x10
13
)
10
20
= 0.6 V ;
W
CBO
=
(2)(11.7)(8.9x10
14
)(0.6)(1.3x10
16
+8.7x10
13
)
(1.6x10
19
)(1.3x10
16
)(8.7x10
13
)
= 2.1 microns
C
CBO
=
(11.7)(8.9x10
14
)(3)
2.1x10
4
= 14.8 nF
2112. Equivalent circuit for turnon delay time, t
d,on
, calculation.
+

10 W
C
CB
C
BE
V
BE
V
in
+

8 V
8 V
V
in
t
V
BE
(t) = 8  16 exp
Î ˚
t
t
; t = (10 W )(C
BE
+ C
CB
)
At t = t
d,on
V
BE
(t
d,on
) = 0.7 V ; t
d,on
= t ln
Î ˚
16
7.3
The spacecharge capacitances are nonlinear functions of the voltages across them. Need
to find an average value for each of the two capacitors. During the t
d,on
interval, the
voltage V
CB
changes from 108 V to 100 volts and thus will be considered a constant.
Hence C
CB
will be given by
C
CB
=
C
CBO
1+
V
CB
f
cC
=
1.5x10
8
1+
100
0.6
= 1.2 nF
The voltage V
BE
changes from 8 V to 0.7 volts during the same interval. We must find
the average value of C
BE
.
W
CBO
=
(2)(11.7)(8.9x10
14
)(0.6)(1.3x10
16
+8.7x10
13
)
(1.6x10
19
)(1.3x10
16
)(8.7x10
13
)
= 2.1 microns
C
CBO
=
(11.7)(8.9x10
14
)(3)
2.1x10
4
= 14.8 nF
2112. Equivalent circuit for turnon delay time, t
d,on
, calculation.
+

10 W
C
CB
C
BE
V
BE
V
in
+

8 V
8 V
V
in
t
V
BE
(t) = 8  16 exp
˚
t
; = (10 )(C
BE
+ C
CB
)
At t = t
d,on
V
BE
(t
d,on
) = 0.7 V ; t
d,on
= ln
˚
16
7.3
The spacecharge capacitances are nonlinear functions of the voltages across them. Need
to find an average value for each of the two capacitors. During the t
d,on
interval, the
voltage V
CB
changes from 108 V to 100 volts and thus will be considered a constant.
Hence C
CB
will be given by
C
CB
=
C
CBO
1+
V
CB
cC
=
1.5x10
8
1+
100
0.6
= 1.2 nF
The voltage V
BE
changes from 8 V to 0.7 volts during the same interval. We must find
the average value of C
BE
.
C
BE
=
ı
8
0
C
EBO
1+
V
EB
cE
dV
EB
ı
8
0
dV
EB
=
C
EBO
cE
( 8)
˚
1+
0
cE
 1+
8
cE
C
BE
=
(9.2x10
9
)(0.89)
8
[ 1+
8
0.89
 1] = 2.2 nF
t
d,on
= (10) [2.2x10
9
+ 1.2x10
9
] ln
˚
16
7.3
= (3.4x10
8
)(0.78) ≈ 27 nanoseconds
Chapter 22 Problem Solutions
221. The capacitance of the gatesource terminals can be modeled as two capacitors connected
electrically in series. C
ox
is the capacitance of the oxide layer and is a constant
independent of v
GS
. C
depl
(v
GS
) is the capacitance of the depletion layer which
increases in thickness as V
GS
increases as is shown in Fig. 226. Any increase in the
depletion layer thickness reduces the value of C
depl
(v
GS
) and hence the atotal gate
source capacitance C
gs
. However once v
GS
becomes equal to or greater than V
GS(th)
,
the depletion layer thickness becomes constant because the formation of the inversion
layer jillustrated in Fig. 226c shields the depletion layer from further increases in v
GS
(any additional increase in v
GS
is dropped across the oxide layer). Thus both
components of C
gs
are constant for v
GS
> V
GS(th)
.
222. a) Idealized MOSFET waveforms shown below. To dimensions the waveforms, we
need the numerical values of the various waveform parameters. The voltage and current
amplitude parameters are given in the problem statement as: V
d
= 300 V, V
GS(th)
= 4 V, V
GS,Io
= 7 V, I
o
= 10 A. To complete the dimensioning, we must calculate the
various switching times.
Chapter 22 Problem Solutions
221. The capacitance of the gatesource terminals can be modeled as two capacitors connected
electrically in series. C
ox
is the capacitance of the oxide layer and is a constant
independent of v
GS
. C
depl
(v
GS
) is the capacitance of the depletion layer which
increases in thickness as V
GS
increases as is shown in Fig. 226. Any increase in the
depletion layer thickness reduces the value of C
depl
(v
GS
) and hence the atotal gate
source capacitance C
gs
. However once v
GS
becomes equal to or greater than V
GS(th)
,
the depletion layer thickness becomes constant because the formation of the inversion
layer jillustrated in Fig. 226c shields the depletion layer from further increases in v
GS
(any additional increase in v
GS
is dropped across the oxide layer). Thus both
components of C
gs
are constant for v
GS
> V
GS(th)
.
222. a) Idealized MOSFET waveforms shown below. To dimensions the waveforms, we
need the numerical values of the various waveform parameters. The voltage and current
amplitude parameters are given in the problem statement as: V
d
= 300 V, V
GS(th)
= 4 V, V
GS,Io
= 7 V, I
o
= 10 A. To complete the dimensioning, we must calculate the
various switching times.
T/2
I
o
V
d
V (t)
CE
i (t)
C
t
d,off
t
rv
t
fi
t
d,on
t
ri
t
fv
V
GG
0
V
GS(th)
V
GS,Io
V
GG
V (t)
GS
t
d,on
estimate  Use equivalent circuit of Fig. 2212a.
Governing equation is
dv
GS
dt
+
v
GS
R
G
(C
gs
+C
gd
)
=
V
GG
R
G
(C
gs
+C
gd
)
;
Boundary condition v
GS
(0) =  V
GG
Solution is v
GS
(t) = V
GG
 2 V
GG
e
t/t
; t = R
G
(C
gs
+ C
gd
) ;
At t = t
d,on
, v
GS
= V
GS(th)
. Solving for t
d,on
yields
t
d,on
= R
G
(C
gs
+ C
gd
) ln
Î ˚
2V
GG
V
GG
V
GS(th)
t
d,on
= (50) (1.15x10
9
) ln
Î ˚
(2)(15)
(154)
= 58 ns
t
ri
estimate  Use equivalent circuit of Fig. 2212b.
v
GS
(t) still given by governing equation given above in t
d,on
estimate. Changing time
origin to when v
GS
= V
GS(th)
yields;
v
GS
(t) = V
GG
+ [V
GG
 V
GS(th)
] e
t/t
. T he drain current is given by
i
D
(t) = C
gd
d(V
d
v
GS
)
dt
+ g
m
[v
GS
(t)  V
Gs(th)
] ; g
m
=
10
74
= 3.3 mhos
At t = t
ri
, i
D
= I
o
. Substituting v
GS
(t) into i
D
(t) and solving for t
ri
yields
t
ri
= R
G
(C
gs
+ C
gd
) ln
Î ˚
(V
GG
V
GS(th)
){g
m
+
C
gd
R
G
(C
gs
+C
gd
)
}
g
m
(V
GG
V
GS(th)
)I
o
t
ri
= (50)(1.15x10
9
) ln Î ˚
(154)(3.3+
1.5x10
10
(50)(1.15x10
9
)
)
(3.3)(154)10
= 21 ns
t
fv
estimate  Use equivalent circuit of Fig. 2212c.
v
GS
approximately constant at V
GS,Io
=
I
o
g
m
+ V
GS(th)
during this interval.
Governing equation is C
gd
dv
DS
dt
= 
Î ˚
V
GG
V
GS(th)

I
o
g
m
R
G
with v
DS
(0) = V
d
.
Solution is given by
v
DS
(t) = V
d

Î ˚
V
GG
V
GS(th)

I
o
g
m
t
R
G
C
gd
; At t = t
fv
, v
DS
= 0.
Solving for t
fv
yields
t
fv
=
R
G
C
gd
V
d
V
GG
V
GS(th)

I
o
g
m
= (50)(1.5x10
10
)
300
(1543)
= 300 ns
t
d,off
estimate  use equivalent circuit of Fig. 2212d with the input voltagge V
GG
reversed.
v
GS
(t) =  V
GG
+ 2 V
GG
e
t/t
; At t = t
d,off
,
v
GS
= V
GS,Io
. Solving for t
d,off
t
d,off
= R
G
(C
gs
+ C
gd
) ln
Î ˚
2V
GG
V
GG
+V
GS(th)
+
I
o
g
m
= (50)(1.15x10
9
) ln
Î ˚
(2)(15)
10
3.3
+4+15
= 18 ns
t
rv
estimate  Use equivalent circuit of Fig. 2212c with the input voltage V
GG
reversed. v
GS
approximately constant at V
GS,Io
as in previous of t
fv
. Governing
equation is
C
gd
d{v
DS
V
GS,Io
}
dt
=
V
GG
+V
GS,Io
R
G
with v
DS
(0) = 0. Solution given by
v
DS
(t) =
V
GG
+V
GS,Io
R
G
C
gd
t . At t = t
rv
, v
DS
= V
d
. Solving for t
rv
yields
t
rv
=
V
d
R
G
C
gd
V
GG
+V
GS,Io
=
(300)(50)(1.5x10
10
)
(15+7)
= 100 ns
t
fi
estimate  use equivalent circuit of Fig. 2212b with the input voltage V
GG
reversed. Governing equation the same as in previous calculation of t
ri
. At t = 0, v
GS
(0)
= V
GS,Io
. Solution in this caae is given by
v
GS
(t) =  V
GG
+ [V
GS,Io
+ V
GG
] e
t/t
; At t = t
fi
, v
GS
= V
GS(th)
. Solving for t
fi
t
fi
= R
G
(C
gs
+ C
gd
) ln
Î ˚
V
GG
+V
GS,Io
V
GG
+V
GS(th)
= (50)(1.15x10
9
)ln
Î ˚
15+7
15+4
= 9 ns
b) Estimate the power dissipated in the MOSFET in the same manner as was done for the
BJT in problem 213.Waveforms for the MOSFET are the same as for the BJT except for
appropriate relabeling of the currents and voltages.
E
ri
= (0.5)(300)(10)(2.1x10
8
) = 3x10
5
Joules
E
fv
= (0.5)(300)(10)(3x10
7
) = 4.5x10
4
Joules
E
on
= I
o
V
DS,on
[0.5 T  t
d,on
+ t
d,off
] ; V
DS,on
= I
o
r
DS,on
= (10)(0.5) = 5 V
T >> t
d,on
and t
d,off
E
on
= (10)(300)(0.5)(5x10
5
) = 1.25x10
3
Joules
E
rv
= (0.5)(300)(10)(10
7
) = 1.5x10
4
Joules
E
fi
= (0.5)(300)(10)(9x10
9
) = 1.5x10
5
Joules
P
c
= (1.95x10
3
)(2x10
4
) = 39 watts
223. Use test conditons to estimate C
gd
. Then estimate the switching times in the circuit with
the 150 ohm load. Test circuit waveforms are shown below.
E
ri
= (0.5)(300)(10)(2.1x10
8
) = 3x10
5
Joules
E
fv
= (0.5)(300)(10)(3x10
7
) = 4.5x10
4
Joules
E
on
= I
o
V
DS,on
[0.5 T  t
d,on
+ t
d,off
] ; V
DS,on
= I
o
r
DS,on
= (10)(0.5) = 5 V
T >> t
d,on
and t
d,off
E
on
= (10)(300)(0.5)(5x10
5
) = 1.25x10
3
Joules
E
rv
= (0.5)(300)(10)(10
7
) = 1.5x10
4
Joules
E
fi
= (0.5)(300)(10)(9x10
9
) = 1.5x10
5
Joules
P
c
= (1.95x10
3
)(2x10
4
) = 39 watts
223. Use test conditons to estimate C
gd
. Then estimate the switching times in the circuit with
the 150 ohm load. Test circuit waveforms are shown below.
V (t)
G
V
GG
V (t)
GS
V
GS(th)
V
GS,Io
t
t
d,on
t = t
r i f v
t = t
f i r v
t
d,off
t
V
GG
V
d
V (t)
DS
I
o
i (t)
D
t
Equivalent circuit during voltage and current rise and fall intervals:
+
 C
gs
C
gd
V (t)
G
R
D
V
d
g (V  V )
m
GS GS(th)
R
G
Governing equation using Miller capacitance approximation:
dv
GS
dt
+
v
GS
=
V
G
(t)
; = R
G
[C
gs
+ C
gd
{1 + g
m
R
D
}] ;
During t
ri
= t
fv
interval, V
G
(t) = V
GG
. Solution is
v
GS
(t) = V
GG
+ {V
GS(th)
 V
GG
} e
t/
; At t = t
ri
, V
GS
= V
GS(th)
+
V
d
g
m
R
D
;
Solving for t
ri
= t
fv
yields
t
ri
= t
fv
= ln
˚
V
GG
V
GS(th)
V
GG
V
GS(th)

V
d
g
m
R
D
During t
rv
= t
fi
, v
G
(t) = 0 and solution is v
GS
(t) = V
GS,Io
e
t/
.
At t = t
rv
, v
GS
(t) = V
GS(th)
. Solving for t
rv
yields
t
rv
= ln
˚
V
GS(th)
+
V
d
g
m
R
D
V
GS(th)
. Invert equation for t
ri
to find C
gd
. Result is
C
gd
=
˛
t
ri
ln
˚
V
GG
V
GS(th)
V
GG
V
GS(th)

V
d
g
m
R
D
R
G
C
gs
˛
1
R
G
(1+g
m
R
D
)
C
gd
=
˛
˝
3x10
8
ln
˚
154
1541
5x10
9
˛
1
5(1+25)
= 2.3x10
9
F = 2.3 nF
Solving for switching times in circuit with R
D
= 150 ohms.
= [10
9
+ 2.3x10
9
{1 + 150}][100] = 35 s
t
ri
= 3.5x10
5
ln
˚
154
1542
= 7 s ; t
rv
= 3.5x10
5
ln
˚
4+2
4
= 14 s
224. Waveforms for v
DS
(t) and i
D
(t) shown in previous problem. Power dissipation in
MOSFET given by
<P
MOSFET
> = [E
on
+ E
sw
] f
s
; f
s
=
1
T
; E
on
= [I
D
]
2
r
DS,on
(T
j
)
T
2
;
dv
GS
dt
+
v
GS
=
V
G
(t)
; = R
G
[C
gs
+ C
gd
{1 + g
m
R
D
}] ;
During t
ri
= t
fv
interval, V
G
(t) = V
GG
. Solution is
v
GS
(t) = V
GG
+ {V
GS(th)
 V
GG
} e
t/
; At t = t
ri
, V
GS
= V
GS(th)
+
V
d
g
m
R
D
;
Solving for t
ri
= t
fv
yields
t
ri
= t
fv
= ln
˚
V
GG
V
GS(th)
V
GG
V
GS(th)

V
d
g
m
R
D
During t
rv
= t
fi
, v
G
(t) = 0 and solution is v
GS
(t) = V
GS,Io
e
t/
.
At t = t
rv
, v
GS
(t) = V
GS(th)
. Solving for t
rv
yields
t
rv
= ln
˚
V
GS(th)
+
V
d
g
m
R
D
V
GS(th)
. Invert equation for t
ri
to find C
gd
. Result is
C
gd
=
˛
t
ri
ln
˚
V
GG
V
GS(th)
V
GG
V
GS(th)

V
d
g
m
R
D
R
G
C
gs
˛
1
R
G
(1+g
m
R
D
)
C
gd
=
˛
˝
3x10
8
ln
˚
154
1541
5x10
9
˛
1
5(1+25)
= 2.3x10
9
F = 2.3 nF
Solving for switching times in circuit with R
D
= 150 ohms.
= [10
9
+ 2.3x10
9
{1 + 150}][100] = 35 s
t
ri
= 3.5x10
5
ln
˚
154
1542
= 7 s ; t
rv
= 3.5x10
5
ln
˚
4+2
4
= 14 s
224. Waveforms for v
DS
(t) and i
D
(t) shown in previous problem. Power dissipation in
MOSFET given by
<P
MOSFET
> = [E
on
+ E
sw
] f
s
; f
s
=
1
T
; E
on
= [I
D
]
2
r
DS,on
(T
j
)
T
2
;
I
D
=
V
d
R
D
=
300
150
= 2 A ; r
DS,on
(T
j
) = 2
˚
1+
T
j
25
150
= 2
˚
0.833+
T
j
150
E
on
= (4)(2)
˚
0.833+
T
j
150
1
2f
s
= {3.32 + 0.027 T
j
}
1
f
s
E
sw
=
1
T
ı
0
t
ri
V
d
I
D
(1
t
t
ri
)(
t
t
ri
)dt +
1
T
ı
0
t
fi
V
d
I
D
(1
t
t
fi
)(
t
t
fi
)dt =
V
d
I
D
6
[t
ri
+ t
fi
]
E
sw
=
(300)(2)
6
[7x10
6
+ 14x10
6
] = 2.1x10
3
joules
<P
MOSFET
> = {3.32 + 0.027 T
j
}
1
f
s
f
s
+ 2.1x10
3
f
s
<P
MOSFET
> = {3.32 + 0.027 T
j
} +[ 2.1x10
3
][10
4
] = 24.3 + 0.027 T
j
B
B
B
B
B
0
5
10
15
20
25
30
0 10 20 30 40 50 60 70 80 90 100
P
MOSFET
Watts
Temperature [ °K]
225. V
on
= onstate voltage of three MOSFETs in parallel = I
o
r
eff
I
D
=
V
d
R
D
=
300
150
= 2 A ; r
DS,on
(T
j
) = 2
Î ˚
1+
T
j
25
150
= 2
Î ˚
0.833+
T
j
150
E
on
= (4)(2)
Î ˚
0.833+
T
j
150
1
2f
s
= {3.32 + 0.027 T
j
}
1
f
s
E
sw
=
1
T
ı
0
t
ri
V
d
I
D
(1
t
t
ri
)(
t
t
ri
)dt +
1
T
ı
0
t
fi
V
d
I
D
(1
t
t
fi
)(
t
t
fi
)dt =
V
d
I
D
6
[t
ri
+ t
fi
]
E
sw
=
(300)(2)
6
[7x10
6
+ 14x10
6
] = 2.1x10
3
joules
<P
MOSFET
> = {3.32 + 0.027 T
j
}
1
f
s
f
s
+ 2.1x10
3
f
s
<P
MOSFET
> = {3.32 + 0.027 T
j
} +[ 2.1x10
3
][10
4
] = 24.3 + 0.027 T
j
B
B
B
B
B
0
5
10
15
20
25
30
0 10 20 30 40 50 60 70 80 90 100
P
MOSFET
Watts
Temperature [ °K]
225. V
on
= onstate voltage of three MOSFETs in parallel = I
o
r
eff
r
eff
=
r
1
r
2
r
3
r
1
r
2
+r
2
r
3
+r
3
r
1
; r
1
etc. = onstate resistance of MOSFET #1 etc.
r
1
(T
j
) = r
1
(25 °C)
Î ˚
1+0.8
T
j
25
100
; r
1
(105 °C) = (1.64) r
1
(25 °C) etc.
r
1
(105 °C) = 2.95 W ; r
2
(105 °C) = 3.28 W ; r
3
(105 °C) = 3.61 W
r
eff
(105 °C) =
(2.95)(3.28)(3.61)
[(2.95)(3.28)+(3.28)(3.61)+(3.61)(2.95)]
= 1.09 ohms
For the ith MOSFET, P
i
=
V
on
2
2r
i
=
I
o
2
r
eff
2
2r
i
; Assume a 50% duty cycle and ignore
switching losses.
P
1
=
(5)
2
(1.09)
2
(2)(2.95)
= 5 W ; P
2
=
(5)
2
(1.09)
2
(2)(3.28)
= 4.5 W ; P
3
=
(5)
2
(1.09)
2
(2)(3.61)
= 4.1 W
226. Hybrid switch would combine the low onstate losses of the BJT and the faster switching
of the MOSFET. In order to obtain these advantages, The MOSFET would be turned on
before the BJT and turned off after the BJT. The waveforms shown below indicate the
relative timing. The switch blocks V
d
volts in the offstate and conducts I
o
amps in the
onstate.
r
eff
=
r
1
r
2
r
3
r
1
r
2
+r
2
r
3
+r
3
r
1
; r
1
etc. = onstate resistance of MOSFET #1 etc.
r
1
(T
j
) = r
1
(25 °C)
Î ˚
1+0.8
T
j
25
100
; r
1
(105 °C) = (1.64) r
1
(25 °C) etc.
r
1
(105 °C) = 2.95 W ; r
2
(105 °C) = 3.28 W ; r
3
(105 °C) = 3.61 W
r
eff
(105 °C) =
(2.95)(3.28)(3.61)
[(2.95)(3.28)+(3.28)(3.61)+(3.61)(2.95)]
= 1.09 ohms
For the ith MOSFET, P
i
=
V
on
2
2r
i
=
I
o
2
r
eff
2
2r
i
; Assume a 50% duty cycle and ignore
switching losses.
P
1
=
(5)
2
(1.09)
2
(2)(2.95)
= 5 W ; P
2
=
(5)
2
(1.09)
2
(2)(3.28)
= 4.5 W ; P
3
=
(5)
2
(1.09)
2
(2)(3.61)
= 4.1 W
226. Hybrid switch would combine the low onstate losses of the BJT and the faster switching
of the MOSFET. In order to obtain these advantages, The MOSFET would be turned on
before the BJT and turned off after the BJT. The waveforms shown below indicate the
relative timing. The switch blocks V
d
volts in the offstate and conducts I
o
amps in the
onstate.
v = v
DS
CE
i
D
i
C
v
GS
v
BE
V
DS,on
V
CE,on
I
o
I ; r < 1
o
(1  r )I
o
227. BV
DSS
≈
1.3x10
17
N
drift
= 750 volts ; N
drift
= 1.7x10
14
cm
3
W
drift
≈ (10
5
)(750) = 75 microns ;
W
d,body
= protrusion of drain depletion layer into body region
≈
W
drift
N
drift
N
body
=
(75)(1.7x10
14
)
5x10
16
≈ 0.3 microns
Even though bodysource junction is shorted, there is a depletion layer associated with it
which is contained entirely on the body side of the junction. This must be included in the
estimate of the required length of the body region.
W
s,body
≈
2e f
c
qN
a,body
; f
c
=
kT
q
ln
Î ˚
N
a
N
d
n
i
2
;
v = v
DS
CE
i
D
i
C
v
GS
v
BE
V
DS,on
V
CE,on
I
o
I ; r < 1
o
(1  r )I
o
227. BV
DSS
≈
1.3x10
17
N
drift
= 750 volts ; N
drift
= 1.7x10
14
cm
3
W
drift
≈ (10
5
)(750) = 75 microns ;
W
d,body
= protrusion of drain depletion layer into body region
≈
W
drift
N
drift
N
body
=
(75)(1.7x10
14
)
5x10
16
≈ 0.3 microns
Even though bodysource junction is shorted, there is a depletion layer associated with it
which is contained entirely on the body side of the junction. This must be included in the
estimate of the required length of the body region.
W
s,body
≈
2e f
c
qN
a,body
; f
c
=
kT
q
ln
Î ˚
N
a
N
d
n
i
2
;
f
c
= 0.026 ln
Î ˚
(10
19
)(5x10
16
)
(10
20
)
= 0.94
W
s,body
≈
(2)(11.7)(8.9x10
14
)(0.94)
(1.6x10
19
)(5x10
16
)
≈ 0.16 microns
In order to avoid reachthrough , W
body
> W
d,body
+ W
s,body
= 0.3 + 0.16 = 0.46 microns
228. Displacement current = C
gd
dv
GD
dt
≈ C
gd
dv
DS
dt
; v
DS
≈ v
GD
>> v
GS
BJT will turn on if R
body
C
gd
dv
DS
dt
= 0.7 V
dv
DS
dt
>
0.7
R
body
C
gd
will turn on the BJT.
229. V
GS,max
= (0.67) E
BD
t
ox
= (0.67) (5x10
6
) (5x10
6
) = 16.7 volts
2210. a) i
D
=
m
n
C
ox
NW
cell
(v
GS
V
GS(th)
)
2L
C
ox
=
e
t
ox
=
(11.7)(8.9x10
14
)
10
5
= 1.04x10
7
F/cm
2
N =
2i
D
L
m
n
C
ox
W
cell
(v
GS
V
GS(th)
)
N =
(2)(100)(10
4
)
(1500)(1.04x10
7
)(2x10
3
)(154)
≈ 5,800 cells
b) I
cell
=
100
5800
= 17 milliamps
2211. V
on
= 4 volts = I
on
R
on
= (10 A) R
on
; R
on
= 0.4 ohms
R
on
=
W
drift
qm
n
N
d
A
: W
drift
= 10
5
BV
DSS
= (10
5
)(800) = 80 microns
f
c
= 0.026 ln
Î ˚
(10
19
)(5x10
16
)
(10
20
)
= 0.94
W
s,body
≈
(2)(11.7)(8.9x10
14
)(0.94)
(1.6x10
19
)(5x10
16
)
≈ 0.16 microns
In order to avoid reachthrough , W
body
> W
d,body
+ W
s,body
= 0.3 + 0.16 = 0.46 microns
228. Displacement current = C
gd
dv
GD
dt
≈ C
gd
dv
DS
dt
; v
DS
≈ v
GD
>> v
GS
BJT will turn on if R
body
C
gd
dv
DS
dt
= 0.7 V
dv
DS
dt
>
0.7
R
body
C
gd
will turn on the BJT.
229. V
GS,max
= (0.67) E
BD
t
ox
= (0.67) (5x10
6
) (5x10
6
) = 16.7 volts
2210. a) i
D
=
m
n
C
ox
NW
cell
(v
GS
V
GS(th)
)
2L
C
ox
=
e
t
ox
=
(11.7)(8.9x10
14
)
10
5
= 1.04x10
7
F/cm
2
N =
2i
D
L
m
n
C
ox
W
cell
(v
GS
V
GS(th)
)
N =
(2)(100)(10
4
)
(1500)(1.04x10
7
)(2x10
3
)(154)
≈ 5,800 cells
b) I
cell
=
100
5800
= 17 milliamps
2211. V
on
= 4 volts = I
on
R
on
= (10 A) R
on
; R
on
= 0.4 ohms
R
on
=
W
drift
qm
n
N
d
A
: W
drift
= 10
5
BV
DSS
= (10
5
)(800) = 80 microns
f
c
= 0.026 ln
Î ˚
(10
19
)(5x10
16
)
(10
20
)
= 0.94
W
s,body
≈
(2)(11.7)(8.9x10
14
)(0.94)
(1.6x10
19
)(5x10
16
)
≈ 0.16 microns
In order to avoid reachthrough , W
body
> W
d,body
+ W
s,body
= 0.3 + 0.16 = 0.46 microns
228. Displacement current = C
gd
dv
GD
dt
≈ C
gd
dv
DS
dt
; v
DS
≈ v
GD
>> v
GS
BJT will turn on if R
body
C
gd
dv
DS
dt
= 0.7 V
dv
DS
dt
>
0.7
R
body
C
gd
will turn on the BJT.
229. V
GS,max
= (0.67) E
BD
t
ox
= (0.67) (5x10
6
) (5x10
6
) = 16.7 volts
2210. a) i
D
=
m
n
C
ox
NW
cell
(v
GS
V
GS(th)
)
2L
C
ox
=
e
t
ox
=
(11.7)(8.9x10
14
)
10
5
= 1.04x10
7
F/cm
2
N =
2i
D
L
m
n
C
ox
W
cell
(v
GS
V
GS(th)
)
N =
(2)(100)(10
4
)
(1500)(1.04x10
7
)(2x10
3
)(154)
≈ 5,800 cells
b) I
cell
=
100
5800
= 17 milliamps
2211. V
on
= 4 volts = I
on
R
on
= (10 A) R
on
; R
on
= 0.4 ohms
R
on
=
W
drift
qm
n
N
d
A
: W
drift
= 10
5
BV
DSS
= (10
5
)(800) = 80 microns
f
c
= 0.026 ln
Î ˚
(10
19
)(5x10
16
)
(10
20
)
= 0.94
W
s,body
≈
(2)(11.7)(8.9x10
14
)(0.94)
(1.6x10
19
)(5x10
16
)
≈ 0.16 microns
In order to avoid reachthrough , W
body
> W
d,body
+ W
s,body
= 0.3 + 0.16 = 0.46 microns
228. Displacement current = C
gd
dv
GD
dt
≈ C
gd
dv
DS
dt
; v
DS
≈ v
GD
>> v
GS
BJT will turn on if R
body
C
gd
dv
DS
dt
= 0.7 V
dv
DS
dt
>
0.7
R
body
C
gd
will turn on the BJT.
229. V
GS,max
= (0.67) E
BD
t
ox
= (0.67) (5x10
6
) (5x10
6
) = 16.7 volts
2210. a) i
D
=
m
n
C
ox
NW
cell
(v
GS
V
GS(th)
)
2L
C
ox
=
e
t
ox
=
(11.7)(8.9x10
14
)
10
5
= 1.04x10
7
F/cm
2
N =
2i
D
L
m
n
C
ox
W
cell
(v
GS
V
GS(th)
)
N =
(2)(100)(10
4
)
(1500)(1.04x10
7
)(2x10
3
)(154)
≈ 5,800 cells
b) I
cell
=
100
5800
= 17 milliamps
2211. V
on
= 4 volts = I
on
R
on
= (10 A) R
on
; R
on
= 0.4 ohms
R
on
=
W
drift
qm
n
N
d
A
: W
drift
= 10
5
BV
DSS
= (10
5
)(800) = 80 microns
f
c
= 0.026 ln
Î ˚
(10
19
)(5x10
16
)
(10
20
)
= 0.94
W
s,body
≈
(2)(11.7)(8.9x10
14
)(0.94)
(1.6x10
19
)(5x10
16
)
≈ 0.16 microns
In order to avoid reachthrough , W
body
> W
d,body
+ W
s,body
= 0.3 + 0.16 = 0.46 microns
228. Displacement current = C
gd
dv
GD
dt
≈ C
gd
dv
DS
dt
; v
DS
≈ v
GD
>> v
GS
BJT will turn on if R
body
C
gd
dv
DS
dt
= 0.7 V
dv
DS
dt
>
0.7
R
body
C
gd
will turn on the BJT.
229. V
GS,max
= (0.67) E
BD
t
ox
= (0.67) (5x10
6
) (5x10
6
) = 16.7 volts
2210. a) i
D
=
m
n
C
ox
NW
cell
(v
GS
V
GS(th)
)
2L
C
ox
=
e
t
ox
=
(11.7)(8.9x10
14
)
10
5
= 1.04x10
7
F/cm
2
N =
2i
D
L
m
n
C
ox
W
cell
(v
GS
V
GS(th)
)
N =
(2)(100)(10
4
)
(1500)(1.04x10
7
)(2x10
3
)(154)
≈ 5,800 cells
b) I
cell
=
100
5800
= 17 milliamps
2211. V
on
= 4 volts = I
on
R
on
= (10 A) R
on
; R
on
= 0.4 ohms
R
on
=
W
drift
qm
n
N
d
A
: W
drift
= 10
5
BV
DSS
= (10
5
)(800) = 80 microns
N
d
=
1.3x10
17
BV
DSS
=
1.3x10
17
800
≈ 1.6x10
14
cm
3
A =
8x10
3
(1.6x10
19
)(1500)(1.6x10
14
)(0.4)
≈ 0.5 cm
2
10A
0.5cm
2
= 20
A
cm
2
<< the allowable maximum of 200
A
cm
2
, so estimate is alright.
2212. C
gs
≈ C
ox
N W
cell
L = (1.04x10
7
)(5.8x10
3
)(2x10
3
)(10
4
) = 121 pF
2213. Two overstress possibilities, overvoltage across drainsource terminals because of stray
inductance and excessive power dissipation. Check for overvoltage first.
V
DS
(turnoff) = V
d
+ L
di
dt
= 100 + (10
7
)
Î ˚
100
5x10
8
= 300 V > BV
DSS
= 150 V
Check for excessive power dissipation.
P
allowed
=
T
j,max
T
a
R
q ,ja
=
15050
1
= 100 watts ; P
dissipated
= [E
on
+ E
sw
] f
s
E
on
f
s
=
I
o
2
r
DS(on)
2
=
(100)
2
(0.01)
2
= 50 watts
E
sw
=
V
d
I
o
2
[t
ri
+ t
fi
+ t
rv
+t
fv
] =
(100)(100)
2
[(2)(5x10
8
) + (2)(2x10
7
)]
E
sw
= 2.5x10
3
joules ; E
sw
f
s
= (2.5x10
3
)(3x10
4
) = 75 watts
P
dissipated
= 50 + 75 = 125 watts > P
allowed
= 100 watts
MOSFET overstressed by both overvoltages and excessive power dissipation.
2214. Gate current which charges/discharges C
gs
and C
gd
during turnon and turnoff is
approximately constant during the four time intervals. However during the current rise
and fall times the voltages V
GS
and V
GD
change by only a few tens of volts. However
during the voltage rise and fall times V
GD
changes by approximately V
d
which is much
larger than a few tens of volts. Thus we have:
N
d
=
1.3x10
17
BV
DSS
=
1.3x10
17
800
≈ 1.6x10
14
cm
3
A =
8x10
3
(1.6x10
19
)(1500)(1.6x10
14
)(0.4)
≈ 0.5 cm
2
10A
0.5cm
2
= 20
A
cm
2
<< the allowable maximum of 200
A
cm
2
, so estimate is alright.
2212. C
gs
≈ C
ox
N W
cell
L = (1.04x10
7
)(5.8x10
3
)(2x10
3
)(10
4
) = 121 pF
2213. Two overstress possibilities, overvoltage across drainsource terminals because of stray
inductance and excessive power dissipation. Check for overvoltage first.
V
DS
(turnoff) = V
d
+ L
di
dt
= 100 + (10
7
)
Î ˚
100
5x10
8
= 300 V > BV
DSS
= 150 V
Check for excessive power dissipation.
P
allowed
=
T
j,max
T
a
R
q ,ja
=
15050
1
= 100 watts ; P
dissipated
= [E
on
+ E
sw
] f
s
E
on
f
s
=
I
o
2
r
DS(on)
2
=
(100)
2
(0.01)
2
= 50 watts
E
sw
=
V
d
I
o
2
[t
ri
+ t
fi
+ t
rv
+t
fv
] =
(100)(100)
2
[(2)(5x10
8
) + (2)(2x10
7
)]
E
sw
= 2.5x10
3
joules ; E
sw
f
s
= (2.5x10
3
)(3x10
4
) = 75 watts
P
dissipated
= 50 + 75 = 125 watts > P
allowed
= 100 watts
MOSFET overstressed by both overvoltages and excessive power dissipation.
2214. Gate current which charges/discharges C
gs
and C
gd
during turnon and turnoff is
approximately constant during the four time intervals. However during the current rise
and fall times the voltages V
GS
and V
GD
change by only a few tens of volts. However
during the voltage rise and fall times V
GD
changes by approximately V
d
which is much
larger than a few tens of volts. Thus we have:
N
d
=
1.3x10
17
BV
DSS
=
1.3x10
17
800
≈ 1.6x10
14
cm
3
A =
8x10
3
(1.6x10
19
)(1500)(1.6x10
14
)(0.4)
≈ 0.5 cm
2
10A
0.5cm
2
= 20
A
cm
2
<< the allowable maximum of 200
A
cm
2
, so estimate is alright.
2212. C
gs
≈ C
ox
N W
cell
L = (1.04x10
7
)(5.8x10
3
)(2x10
3
)(10
4
) = 121 pF
2213. Two overstress possibilities, overvoltage across drainsource terminals because of stray
inductance and excessive power dissipation. Check for overvoltage first.
V
DS
(turnoff) = V
d
+ L
di
dt
= 100 + (10
7
)
Î ˚
100
5x10
8
= 300 V > BV
DSS
= 150 V
Check for excessive power dissipation.
P
allowed
=
T
j,max
T
a
R
q ,ja
=
15050
1
= 100 watts ; P
dissipated
= [E
on
+ E
sw
] f
s
E
on
f
s
=
I
o
2
r
DS(on)
2
=
(100)
2
(0.01)
2
= 50 watts
E
sw
=
V
d
I
o
2
[t
ri
+ t
fi
+ t
rv
+t
fv
] =
(100)(100)
2
[(2)(5x10
8
) + (2)(2x10
7
)]
E
sw
= 2.5x10
3
joules ; E
sw
f
s
= (2.5x10
3
)(3x10
4
) = 75 watts
P
dissipated
= 50 + 75 = 125 watts > P
allowed
= 100 watts
MOSFET overstressed by both overvoltages and excessive power dissipation.
2214. Gate current which charges/discharges C
gs
and C
gd
during turnon and turnoff is
approximately constant during the four time intervals. However during the current rise
and fall times the voltages V
GS
and V
GD
change by only a few tens of volts. However
during the voltage rise and fall times V
GD
changes by approximately V
d
which is much
larger than a few tens of volts. Thus we have:
N
d
=
1.3x10
17
BV
DSS
=
1.3x10
17
800
≈ 1.6x10
14
cm
3
A =
8x10
3
(1.6x10
19
)(1500)(1.6x10
14
)(0.4)
≈ 0.5 cm
2
10A
0.5cm
2
= 20
A
cm
2
<< the allowable maximum of 200
A
cm
2
, so estimate is alright.
2212. C
gs
≈ C
ox
N W
cell
L = (1.04x10
7
)(5.8x10
3
)(2x10
3
)(10
4
) = 121 pF
2213. Two overstress possibilities, overvoltage across drainsource terminals because of stray
inductance and excessive power dissipation. Check for overvoltage first.
V
DS
(turnoff) = V
d
+ L
di
dt
= 100 + (10
7
)
Î ˚
100
5x10
8
= 300 V > BV
DSS
= 150 V
Check for excessive power dissipation.
P
allowed
=
T
j,max
T
a
R
q ,ja
=
15050
1
= 100 watts ; P
dissipated
= [E
on
+ E
sw
] f
s
E
on
f
s
=
I
o
2
r
DS(on)
2
=
(100)
2
(0.01)
2
= 50 watts
E
sw
=
V
d
I
o
2
[t
ri
+ t
fi
+ t
rv
+t
fv
] =
(100)(100)
2
[(2)(5x10
8
) + (2)(2x10
7
)]
E
sw
= 2.5x10
3
joules ; E
sw
f
s
= (2.5x10
3
)(3x10
4
) = 75 watts
P
dissipated
= 50 + 75 = 125 watts > P
allowed
= 100 watts
MOSFET overstressed by both overvoltages and excessive power dissipation.
2214. Gate current which charges/discharges C
gs
and C
gd
during turnon and turnoff is
approximately constant during the four time intervals. However during the current rise
and fall times the voltages V
GS
and V
GD
change by only a few tens of volts. However
during the voltage rise and fall times V
GD
changes by approximately V
d
which is much
larger than a few tens of volts. Thus we have:
Current rise/fall times proportional to [C
gs
+ C
gd
]
V
GG
I
G
Voltage rise/fall times proportional to C
gd
V
d
I
G
C
gs
roughly the same size as C
gd
and V
d
>> V
GG
Hence voltage switching times much greater than current switching times.
Chapter 23 Problem Solutions
231. v
s
(t) = 2 V
s
sin( t) ; i
L
(t) =
v
s
(t)
R
L
; < t <
<P
SCR
> =
1
2
ı
[(1)i
L
( t)+{i
L
( t)}
2
R
on
]d( t)
<P
SCR
> =
V
s
2 R
L
{1 + cos( )} +
1
π
˚
V
s
R
L
2
R
on
[π  +
sin(2 )
2
]
232. 120 °F = 49 °C ; T
j,max
= 125 °C ; <P
SCR
>
max
=
T
j,max
T
a,max
R
ja
<P
SCR
>
max
=
12549
0.1
= 760 Watts
Check <P
SCR
> at = 0
<P
SCR
> =
220
2π (1)
[1 + cos(0)] +
1
π
˚
220
1
2
(2x10
3
)[π  0 +
sin(0)
2
] = 107 watts
<P
SCR
> = 107 watts less than the allowable 760 watts. Hence trigger angle of zero
where maximum load power is delivered is permissible.
Average load power <P
L
> =
1
2π
ı
π
{i
L
( t)}
2
R
L
d( t) ; i
L
( t) = 2 (220) sin( t)
<P
L
> =
1
2π
ı
π
{ 2(220)}
2
sin
2
( t)d( t) =
(220)
2
6.28
[3.14  +
sin(2 )
2
]
For = 0 <P
L
> = 24.2 kW
233. P
SCR
(t) = instantaneous power dissipated in the SCR during turnon.
P
SCR
(t) = v
AK
(t) i
A
(t) = V
AK
{1 
t
t
f
}
dI
dt
t during t
f
P(t) = power density =
P
SCR
(t)
A(t)
= watts per cm
2
; A(t) = conducting area of SCR
Chapter 23 Problem Solutions
231. v
s
(t) = 2 V
s
sin( t) ; i
L
(t) =
v
s
(t)
R
L
; < t <
<P
SCR
> =
1
2
ı
[(1)i
L
( t)+{i
L
( t)}
2
R
on
]d( t)
<P
SCR
> =
V
s
2 R
L
{1 + cos( )} +
1
π
˚
V
s
R
L
2
R
on
[π  +
sin(2 )
2
]
232. 120 °F = 49 °C ; T
j,max
= 125 °C ; <P
SCR
>
max
=
T
j,max
T
a,max
R
ja
<P
SCR
>
max
=
12549
0.1
= 760 Watts
Check <P
SCR
> at = 0
<P
SCR
> =
220
2π (1)
[1 + cos(0)] +
1
π
˚
220
1
2
(2x10
3
)[π  0 +
sin(0)
2
] = 107 watts
<P
SCR
> = 107 watts less than the allowable 760 watts. Hence trigger angle of zero
where maximum load power is delivered is permissible.
Average load power <P
L
> =
1
2π
ı
π
{i
L
( t)}
2
R
L
d( t) ; i
L
( t) = 2 (220) sin( t)
<P
L
> =
1
2π
ı
π
{ 2(220)}
2
sin
2
( t)d( t) =
(220)
2
6.28
[3.14  +
sin(2 )
2
]
For = 0 <P
L
> = 24.2 kW
233. P
SCR
(t) = instantaneous power dissipated in the SCR during turnon.
P
SCR
(t) = v
AK
(t) i
A
(t) = V
AK
{1 
t
t
f
}
dI
dt
t during t
f
P(t) = power density =
P
SCR
(t)
A(t)
= watts per cm
2
; A(t) = conducting area of SCR
Chapter 23 Problem Solutions
231. v
s
(t) = 2 V
s
sin( t) ; i
L
(t) =
v
s
(t)
R
L
; < t <
<P
SCR
> =
1
2
ı
[(1)i
L
( t)+{i
L
( t)}
2
R
on
]d( t)
<P
SCR
> =
V
s
2 R
L
{1 + cos( )} +
1
π
˚
V
s
R
L
2
R
on
[π  +
sin(2 )
2
]
232. 120 °F = 49 °C ; T
j,max
= 125 °C ; <P
SCR
>
max
=
T
j,max
T
a,max
R
ja
<P
SCR
>
max
=
12549
0.1
= 760 Watts
Check <P
SCR
> at = 0
<P
SCR
> =
220
2π (1)
[1 + cos(0)] +
1
π
˚
220
1
2
(2x10
3
)[π  0 +
sin(0)
2
] = 107 watts
<P
SCR
> = 107 watts less than the allowable 760 watts. Hence trigger angle of zero
where maximum load power is delivered is permissible.
Average load power <P
L
> =
1
2π
ı
π
{i
L
( t)}
2
R
L
d( t) ; i
L
( t) = 2 (220) sin( t)
<P
L
> =
1
2π
ı
π
{ 2(220)}
2
sin
2
( t)d( t) =
(220)
2
6.28
[3.14  +
sin(2 )
2
]
For = 0 <P
L
> = 24.2 kW
233. P
SCR
(t) = instantaneous power dissipated in the SCR during turnon.
P
SCR
(t) = v
AK
(t) i
A
(t) = V
AK
{1 
t
t
f
}
dI
dt
t during t
f
P(t) = power density =
P
SCR
(t)
A(t)
= watts per cm
2
; A(t) = conducting area of SCR
A(t) = π [r
o
+ u
s
t]
2
 π r
o
2
= π [2 r
o
u
s
t + (u
s
t)
2
]
T
j
=
1
C
v
ı
0
t
f
P(t)dt =
1
C
v
ı
0
t
f
V
AK
{1
t
t
f
}
dI
dt
t
π [2r
o
u
s
t+(u
s
t)
2
]
dt
T
j
=
1
C
v
V
AK
2π r
o
u
s
dI
dt
ı
0
t
f
˚
1
t
t
f
1+
u
s
t
2r
o
dt ; Let a = a' = 1, b =
1
t
f
, and b' =
u
s
2r
o
Integral becomes ı
0
t
f
˚
a+bt
a'+b't
dt ; Using integral tables
ı
0
t
f
˚
a+bt
a'+b't
dt =
bt
f
b'
+
[ab'ab]
[b']
2
ln[a' + b' t
f
] ;
b = 
1
2x10
5
=  5x10
4
sec
1
; b' =
10
4
(2)(0.5)
= 10
4
sec
1
Evaluating the integral yields
ı
0
t
f
˚
a+bt
a'+b't
dt =
1
10
4
+
˚
10
4
+
5x10
4
10
8
ln[1 + (10
4
)(2x10
5
)] = 9.4x10
6
sec
With C
v
= 1.75 Joule/(°Ccm
3
), the expression for T
j
becomes
T
j
=
(10
3
)(9.4x10
6)
(2π )(1.75)(10
4
)(0.5)
dI
dt
= 125  25 = 100 °C ; Solving for
dI
dt
yields
dI
dt
=
100
1.7x10
7
= 590 A/ s
234. Advantages  Shorter N

region length W
d
means shorter carrier lifetimes can be
accomodated and thus faster switching times.
Disadvantages  Junction J
1
is now a P
+
 N
+
junction with a low breakdown voltage.
Since J
3
already has a low breakdown voltage, the modified thyristor has no significant
reverse blocking capability.
235. t
on
=
(40.5)cm
u
s
=
3.5
10
4
= 350 microseconds
236. Lateral voltage drops caused by base currents cause current density nonuniformities. At
large currents, these nonuniformities become severe and the increasing possibility of
second breakdown limit the total current that the BJT can safely conduct.
In the thyristor, no significant gate current is needed to keep the thyristor on and there is
consequently no lateral current flow and thus lateral voltage drop. The current density is
uniform across the entire crosssectional area of the thyristor and there is much less
likelyhood of second breakdown.
237. a) Breakover in a thyristor is not due to impact ionization. However in a welldesigned
thyristor, the value of the breakover voltage is an appreciable fraction of the actual
avalanche breakdown voltage. Thus an estimate of the n
1
thickness and doping level
based avalanche breakdown would be a reasonable first attempt.
N
d
=
1.3x10
17
2x10
3
= 6.5x10
13
cm
3
; W
d
≈ (10
5
)(2x10
3
) = 200 microns
b) t =
qW
d
2
kT(m
n
+m
p
)
=
(1.6x10
19
)(2x10
2
)
2
(1.4x10
23
)(300)(900)
= 17 microseconds
Used (m
n
+ m
p
) = 900 cm
2
/Vsec which is value appropriate to large excess carrier
densities (approaching 10
17
cm
3
)
c) V
on
= I
R
drift
; Ignore I
2/3
contribution as it is usually small compared to the linear
term.
R
drift
≈
W
d
q(m
n
+m
p
)n
b
A
;
2
2000
= 10
3
=
0.02
(1.6x10
19
)(900)(10
17
)A
;
Solving for A gives A =
0.02
(1.6x10
19
)(900)(10
17
)(10
3
)
= 1.4 cm
2
234. Advantages  Shorter N

region length W
d
means shorter carrier lifetimes can be
accomodated and thus faster switching times.
Disadvantages  Junction J
1
is now a P
+
 N
+
junction with a low breakdown voltage.
Since J
3
already has a low breakdown voltage, the modified thyristor has no significant
reverse blocking capability.
235. t
on
=
(40.5)cm
u
s
=
3.5
10
4
= 350 microseconds
236. Lateral voltage drops caused by base currents cause current density nonuniformities. At
large currents, these nonuniformities become severe and the increasing possibility of
second breakdown limit the total current that the BJT can safely conduct.
In the thyristor, no significant gate current is needed to keep the thyristor on and there is
consequently no lateral current flow and thus lateral voltage drop. The current density is
uniform across the entire crosssectional area of the thyristor and there is much less
likelyhood of second breakdown.
237. a) Breakover in a thyristor is not due to impact ionization. However in a welldesigned
thyristor, the value of the breakover voltage is an appreciable fraction of the actual
avalanche breakdown voltage. Thus an estimate of the n
1
thickness and doping level
based avalanche breakdown would be a reasonable first attempt.
N
d
=
1.3x10
17
2x10
3
= 6.5x10
13
cm
3
; W
d
≈ (10
5
)(2x10
3
) = 200 microns
b) t =
qW
d
2
kT(m
n
+m
p
)
=
(1.6x10
19
)(2x10
2
)
2
(1.4x10
23
)(300)(900)
= 17 microseconds
Used (m
n
+ m
p
) = 900 cm
2
/Vsec which is value appropriate to large excess carrier
densities (approaching 10
17
cm
3
)
c) V
on
= I
R
drift
; Ignore I
2/3
contribution as it is usually small compared to the linear
term.
R
drift
≈
W
d
q(m
n
+m
p
)n
b
A
;
2
2000
= 10
3
=
0.02
(1.6x10
19
)(900)(10
17
)A
;
Solving for A gives A =
0.02
(1.6x10
19
)(900)(10
17
)(10
3
)
= 1.4 cm
2
234. Advantages  Shorter N

region length W
d
means shorter carrier lifetimes can be
accomodated and thus faster switching times.
Disadvantages  Junction J
1
is now a P
+
 N
+
junction with a low breakdown voltage.
Since J
3
already has a low breakdown voltage, the modified thyristor has no significant
reverse blocking capability.
235. t
on
=
(40.5)cm
u
s
=
3.5
10
4
= 350 microseconds
236. Lateral voltage drops caused by base currents cause current density nonuniformities. At
large currents, these nonuniformities become severe and the increasing possibility of
second breakdown limit the total current that the BJT can safely conduct.
In the thyristor, no significant gate current is needed to keep the thyristor on and there is
consequently no lateral current flow and thus lateral voltage drop. The current density is
uniform across the entire crosssectional area of the thyristor and there is much less
likelyhood of second breakdown.
237. a) Breakover in a thyristor is not due to impact ionization. However in a welldesigned
thyristor, the value of the breakover voltage is an appreciable fraction of the actual
avalanche breakdown voltage. Thus an estimate of the n
1
thickness and doping level
based avalanche breakdown would be a reasonable first attempt.
N
d
=
1.3x10
17
2x10
3
= 6.5x10
13
cm
3
; W
d
≈ (10
5
)(2x10
3
) = 200 microns
b) t =
qW
d
2
kT(m
n
+m
p
)
=
(1.6x10
19
)(2x10
2
)
2
(1.4x10
23
)(300)(900)
= 17 microseconds
Used (m
n
+ m
p
) = 900 cm
2
/Vsec which is value appropriate to large excess carrier
densities (approaching 10
17
cm
3
)
c) V
on
= I
R
drift
; Ignore I
2/3
contribution as it is usually small compared to the linear
term.
R
drift
≈
W
d
q(m
n
+m
p
)n
b
A
;
2
2000
= 10
3
=
0.02
(1.6x10
19
)(900)(10
17
)A
;
Solving for A gives A =
0.02
(1.6x10
19
)(900)(10
17
)(10
3
)
= 1.4 cm
2
234. Advantages  Shorter N

region length W
d
means shorter carrier lifetimes can be
accomodated and thus faster switching times.
Disadvantages  Junction J
1
is now a P
+
 N
+
junction with a low breakdown voltage.
Since J
3
already has a low breakdown voltage, the modified thyristor has no significant
reverse blocking capability.
235. t
on
=
(40.5)cm
u
s
=
3.5
10
4
= 350 microseconds
236. Lateral voltage drops caused by base currents cause current density nonuniformities. At
large currents, these nonuniformities become severe and the increasing possibility of
second breakdown limit the total current that the BJT can safely conduct.
In the thyristor, no significant gate current is needed to keep the thyristor on and there is
consequently no lateral current flow and thus lateral voltage drop. The current density is
uniform across the entire crosssectional area of the thyristor and there is much less
likelyhood of second breakdown.
237. a) Breakover in a thyristor is not due to impact ionization. However in a welldesigned
thyristor, the value of the breakover voltage is an appreciable fraction of the actual
avalanche breakdown voltage. Thus an estimate of the n
1
thickness and doping level
based avalanche breakdown would be a reasonable first attempt.
N
d
=
1.3x10
17
2x10
3
= 6.5x10
13
cm
3
; W
d
≈ (10
5
)(2x10
3
) = 200 microns
b) t =
qW
d
2
kT(m
n
+m
p
)
=
(1.6x10
19
)(2x10
2
)
2
(1.4x10
23
)(300)(900)
= 17 microseconds
Used (m
n
+ m
p
) = 900 cm
2
/Vsec which is value appropriate to large excess carrier
densities (approaching 10
17
cm
3
)
c) V
on
= I
R
drift
; Ignore I
2/3
contribution as it is usually small compared to the linear
term.
R
drift
≈
W
d
q(m
n
+m
p
)n
b
A
;
2
2000
= 10
3
=
0.02
(1.6x10
19
)(900)(10
17
)A
;
Solving for A gives A =
0.02
(1.6x10
19
)(900)(10
17
)(10
3
)
= 1.4 cm
2
Resulting current density is
2000
1.4
= 1430 A/cm
2
which is excessively large. Probably
should use n
b
≈ 10
16
cm
3
which would give a current density of 140 A/cm
2
, a more
realistic value.
238. Cathode area =
3000
200
= 15 cm
2
= 0.65 A
si
; A
si
=
15
0.65
= 23 cm
2
23 cm
2
= π R
si
2
; R
si
=
23
π
= 2.7 cm
239.
dv
AK
dt

max
≈
I
BO
C
j2
(0)
; C
j2
(0) = zero bias value of junction J
2
space charge capacitance
C
j2
(0) ≈
e A
W
depl
(0)
; W
depl
(0) ≈
2e f
j2
qN
d
; f
j2
=
kT
q
ln[
N
a
N
d
n
i
2
]
f
j2
= 0.026 ln[
(10
14
)(10
17
)
(10
20
)
] = 0.66 V ;
W
depl
(0) ≈
(2)(11.7)(8.9x10
14
)(0.66)
(1.6x10
19
)(10
14
)
= 2.9 microns
C
j2
(0) =
(11.7)(8.9x10
14
)(10)
2.9x10
4
= 36 nF
dv
AK
dt

max
=
0.05
3.6x10
8
= 1.4x10
6
V/sec or 1.4 V per microsecond
Resulting current density is
2000
1.4
= 1430 A/cm
2
which is excessively large. Probably
should use n
b
≈ 10
16
cm
3
which would give a current density of 140 A/cm
2
, a more
realistic value.
238. Cathode area =
3000
200
= 15 cm
2
= 0.65 A
si
; A
si
=
15
0.65
= 23 cm
2
23 cm
2
= π R
si
2
; R
si
=
23
π
= 2.7 cm
239.
dv
AK
dt

max
≈
I
BO
C
j2
(0)
; C
j2
(0) = zero bias value of junction J
2
space charge capacitance
C
j2
(0) ≈
e A
W
depl
(0)
; W
depl
(0) ≈
2e f
j2
qN
d
; f
j2
=
kT
q
ln[
N
a
N
d
n
i
2
]
f
j2
= 0.026 ln[
(10
14
)(10
17
)
(10
20
)
] = 0.66 V ;
W
depl
(0) ≈
(2)(11.7)(8.9x10
14
)(0.66)
(1.6x10
19
)(10
14
)
= 2.9 microns
C
j2
(0) =
(11.7)(8.9x10
14
)(10)
2.9x10
4
= 36 nF
dv
AK
dt

max
=
0.05
3.6x10
8
= 1.4x10
6
V/sec or 1.4 V per microsecond
Resulting current density is
2000
1.4
= 1430 A/cm
2
which is excessively large. Probably
should use n
b
≈ 10
16
cm
3
which would give a current density of 140 A/cm
2
, a more
realistic value.
238. Cathode area =
3000
200
= 15 cm
2
= 0.65 A
si
; A
si
=
15
0.65
= 23 cm
2
23 cm
2
= π R
si
2
; R
si
=
23
π
= 2.7 cm
239.
dv
AK
dt

max
≈
I
BO
C
j2
(0)
; C
j2
(0) = zero bias value of junction J
2
space charge capacitance
C
j2
(0) ≈
e A
W
depl
(0)
; W
depl
(0) ≈
2e f
j2
qN
d
; f
j2
=
kT
q
ln[
N
a
N
d
n
i
2
]
f
j2
= 0.026 ln[
(10
14
)(10
17
)
(10
20
)
] = 0.66 V ;
W
depl
(0) ≈
(2)(11.7)(8.9x10
14
)(0.66)
(1.6x10
19
)(10
14
)
= 2.9 microns
C
j2
(0) =
(11.7)(8.9x10
14
)(10)
2.9x10
4
= 36 nF
dv
AK
dt

max
=
0.05
3.6x10
8
= 1.4x10
6
V/sec or 1.4 V per microsecond
Chapter 24 Problem Solutions
241. Crosssectional view of GTO gatecathode area with reverse gate current flowing.
N
2
P
2
Gate
Cathode
Center
Line
t
+
+ 

v
GK
v
GK
R
R
i
G
The negative gate current, i
G
, flowing through the P
2
layher beneath the N
2
cathode
layer develops a lateral voltage drop v
GK
as indicated. Maximum negative v
GK
= BV
J3
v
GK
 = I
G,max
 R
GK
< BV
J3
in order to avoid breakdown or I
G,max
<
BV
J3
R
GK
R
GK
=
R
2N
=
r
p2
W
4NLt
; N = number of cathode islands in parallel.
I
G,max
=
BV
J3
R
GK
=
I
A,max
b
off
: Solving for I
A,max
yields
I
A,max
=
4NLtb
off
BV
J3
r
p2
W
242. Assume that the current is communtated from the GTO to the turnoff snubber and
associated stray inductance linearly as a function of time. That is the inductor current
Chapter 24 Problem Solutions
241. Crosssectional view of GTO gatecathode area with reverse gate current flowing.
N
2
P
2
Gate
Cathode
Center
Line
t
+
+ 

v
GK
v
GK
R
R
i
G
The negative gate current, i
G
, flowing through the P
2
layher beneath the N
2
cathode
layer develops a lateral voltage drop v
GK
as indicated. Maximum negative v
GK
= BV
J3
v
GK
 = I
G,max
 R
GK
< BV
J3
in order to avoid breakdown or I
G,max
<
BV
J3
R
GK
R
GK
=
R
2N
=
r
p2
W
4NLt
; N = number of cathode islands in parallel.
I
G,max
=
BV
J3
R
GK
=
I
A,max
b
off
: Solving for I
A,max
yields
I
A,max
=
4NLtb
off
BV
J3
r
p2
W
242. Assume that the current is communtated from the GTO to the turnoff snubber and
associated stray inductance linearly as a function of time. That is the inductor current
i
Ls
= I
o
t
t
fi
; Assume that just prior to the end of the current fall time interval, the
voltage across the snubber capacitor has built up to approximately V
d
.
v
AK,max
= 1.5 V
d
= L
s
di
Ls
dt
+ v
cap
= L
s
I
o
t
fi
+ V
d
; Solving for L
s
yields
L
s
=
V
d
t
fi
2I
o
243. Equivalent circuit during t
gq
shown below.

+
V
GG
L
G
P
N
P
N
J3 forward
biased during
t
gq
i (t)
G
L
G
di
G
dt
=  V
GG
; i
G
(t) =
V
GG
L
G
t ; At t = t
gq
want i
G
= 
I
o
b
off
; Solve for L
G
L
G
=
b
off
V
GG
t
gq
I
o
=
(5)(15)(5x10
6
)
(500)
= 0.75 microhenries
Equivalent circuit during t
w2
interval.
i
Ls
= I
o
t
t
fi
; Assume that just prior to the end of the current fall time interval, the
voltage across the snubber capacitor has built up to approximately V
d
.
v
AK,max
= 1.5 V
d
= L
s
di
Ls
dt
+ v
cap
= L
s
I
o
t
fi
+ V
d
; Solving for L
s
yields
L
s
=
V
d
t
fi
2I
o
243. Equivalent circuit during t
gq
shown below.

+
V
GG
L
G
P
N
P
N
J3 forward
biased during
t
gq
i (t)
G
L
G
di
G
dt
=  V
GG
; i
G
(t) =
V
GG
L
G
t ; At t = t
gq
want i
G
= 
I
o
b
off
; Solve for L
G
L
G
=
b
off
V
GG
t
gq
I
o
=
(5)(15)(5x10
6
)
(500)
= 0.75 microhenries
Equivalent circuit during t
w2
interval.

+
V
GG
L
G
i (t)
G
+

BV
J3
L
G
di
G
dt
= BV
J3
 V
GG
; i
G
(0) = 
I
o
b
off
; i
G
(t) = 
I
o
b
off
+
BV
J3
V
GG
L
G
t
At t = t
w2
, i
G
= 0 ; solving for t
w2
yields
t
w2
=
I
o
L
G
b
off
[BV
J3
V
GG
]
=
(500)(7.5x10
7
)
(5)(2515)
= 7.5 microseconds
Chapter 25 Problem Solutions
251.
R
on
(MOS)
A
proprotional to
1
m
majority
; m
n
= 3 m
p
; Hence
R
on
(pchannel)
A
= 3
R
on
(nchannel)
A
R
on
(IGBT)
A
proportional to
1
d n(m
n
+m
p
)
; d n = excess carrier density
d n = d p so pchannel IGBTs have the same R
on
as nchannel IGBTs
252. Turnoff waveforms of short versus long lifetime IGBTs
i
D
long lifetime
short lifetime
I (long)
BJT
I (short)
BJT
t
Long lifetime IGBT 
a. BJT portion of the device has a larger beta and thus the BJT section carries the largest
fraction of the IGBT current. Thus I
BJT
(long) > I
BJT
(short).
b. Longer lifetime leads to longer BJT turnoff times.
Short lifetime IGBT 
a. BJT beta smaller. MOSFET section of the device carries most of the current.
b. Shorter lifetime means less stored charge in the BJT section and thus faster turnoff.
Chapter 25 Problem Solutions
251.
R
on
(MOS)
A
proprotional to
1
m
majority
; m
n
= 3 m
p
; Hence
R
on
(pchannel)
A
= 3
R
on
(nchannel)
A
R
on
(IGBT)
A
proportional to
1
d n(m
n
+m
p
)
; d n = excess carrier density
d n = d p so pchannel IGBTs have the same R
on
as nchannel IGBTs
252. Turnoff waveforms of short versus long lifetime IGBTs
i
D
long lifetime
short lifetime
I (long)
BJT
I (short)
BJT
t
Long lifetime IGBT 
a. BJT portion of the device has a larger beta and thus the BJT section carries the largest
fraction of the IGBT current. Thus I
BJT
(long) > I
BJT
(short).
b. Longer lifetime leads to longer BJT turnoff times.
Short lifetime IGBT 
a. BJT beta smaller. MOSFET section of the device carries most of the current.
b. Shorter lifetime means less stored charge in the BJT section and thus faster turnoff.
253.
P
P
+
N

Body region of
MOSFET section
of IGBT
Collector junction of
pnp BJT section of IGBT
Base of pnp BJT
Emitter of pnp BJT
V
DS1
V > V
DS1 DS2
Depletion layer
Effective
base width
Drain of
IGBT
Significant encroachment intoa the base of the PNP BJT section by the depletion layer of
the blocking junction. The effective base width is thus lowered and the beta increases as
v
DS
increases. This is base width modulation and it results in a lower output resistance
r
o
(steeper slope in the active region of the i
D
v
DS
characteristics).
P
P
+
N

Body region of
MOSFET section
of IGBT
Collector junction of
pnp BJT section of IGBT
Base of pnp BJT
Emitter of pnp BJT
Depletion layer
Drain of
IGBT
N
+
V
DS
Effective base
width independent
of V
DS
Depletion encroaches into the N

layer but the advance is halted at moderate v
DS
values
by the N
+
buffer layer. The PNP base width becomes constant and so the effective
resistance r
o
remains large.
254. One dimensional model of nchannel IGBT
P
P
+
N

N
+
Source
Drain
10
17
10
14
10
19
10
19
25 m m
N
+
10
19
Reverse blocking junction is the P
+
 N
+
junction because of bodysource short.
BV
RB
≈
1.3x10
17
10
19
< 1 volt. No reverse blocking capability.
Forward breakdown  limited by P  N

junction.
P
P
+
N

Body region of
MOSFET section
of IGBT
Collector junction of
pnp BJT section of IGBT
Base of pnp BJT
Emitter of pnp BJT
Depletion layer
Drain of
IGBT
N
+
V
DS
Effective base
width independent
of V
DS
Depletion encroaches into the N

layer but the advance is halted at moderate v
DS
values
by the N
+
buffer layer. The PNP base width becomes constant and so the effective
resistance r
o
remains large.
254. One dimensional model of nchannel IGBT
P
P
+
N

N
+
Source
Drain
10
17
10
14
10
19
10
19
25 m m
N
+
10
19
Reverse blocking junction is the P
+
 N
+
junction because of bodysource short.
BV
RB
≈
1.3x10
17
10
19
< 1 volt. No reverse blocking capability.
Forward breakdown  limited by P  N

junction.
BV
FB
=
1.3x10
17
10
14
≈ 1300 volts ; But W
depl
(1300 V) = (10
5
)(1300) = 130 microns
130 microns > 25 micron drift region length. Hence forward blocking limited by
punchthrough.
BV
FB
= (2x10
5
)(2.5x10
3
) 
(1.6x10
19
)(10
14
)(2.5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 453 volts
255. IGBT current  I
on,IGBT
; V
on
(IGBT) = V
j
+ I
on,IGBT
R
on,IGBT
Assume V
j
≈ 0.8 V ; Exact value not critical to an approximate estimate of I
on,IGBT
.
I
on,IGBT
≈
30.8
R
on,IGBT
; R
on,IGBT
≈
W
d
q(m
n
+m
p
)n
b
A
W
d
= (10
5
)(750) = 75 m m ; R
on,IGBT
=
7.5x10
3
(1.6x10
19
)(900)(10
16
)(2)
= 2.6x10
3
W
I
on,IGBT
≈
2.2
2.6x10
3
≈ 850 amps
MOSFET current  I
on,MOS
; V
on
(MOS) = I
on,MOS
R
on,MOS
I
on,MOS
=
V
on
(MOS)
R
on,MOS
; R
on,MOS
=
W
d
qm
n
N
d
A
; W
d
= 75 m m
N
d
=
1.3x10
17
750
= 1.7x10
14
cm
3
R
on,MOS
=
7.5x10
3
(1.6x10
19
)(1.5x10
3
)(1.7x10
14
)(2)
= 0.09 ohms
I
on,MOS
=
3
0.09
= 33 amps
256. V
on
(PT) = V
j,PT
+ I
on,PT
R
on,PT
= V
j,NPT
+ I
on,NPT
R
on,NPT
I
on,PT
I
on,NPT
≈
R
on,NPT
R
on,PT
since V
j,NPT
≈ V
j,PT
BV
FB
=
1.3x10
17
10
14
≈ 1300 volts ; But W
depl
(1300 V) = (10
5
)(1300) = 130 microns
130 microns > 25 micron drift region length. Hence forward blocking limited by
punchthrough.
BV
FB
= (2x10
5
)(2.5x10
3
) 
(1.6x10
19
)(10
14
)(2.5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 453 volts
255. IGBT current  I
on,IGBT
; V
on
(IGBT) = V
j
+ I
on,IGBT
R
on,IGBT
Assume V
j
≈ 0.8 V ; Exact value not critical to an approximate estimate of I
on,IGBT
.
I
on,IGBT
≈
30.8
R
on,IGBT
; R
on,IGBT
≈
W
d
q(m
n
+m
p
)n
b
A
W
d
= (10
5
)(750) = 75 m m ; R
on,IGBT
=
7.5x10
3
(1.6x10
19
)(900)(10
16
)(2)
= 2.6x10
3
W
I
on,IGBT
≈
2.2
2.6x10
3
≈ 850 amps
MOSFET current  I
on,MOS
; V
on
(MOS) = I
on,MOS
R
on,MOS
I
on,MOS
=
V
on
(MOS)
R
on,MOS
; R
on,MOS
=
W
d
qm
n
N
d
A
; W
d
= 75 m m
N
d
=
1.3x10
17
750
= 1.7x10
14
cm
3
R
on,MOS
=
7.5x10
3
(1.6x10
19
)(1.5x10
3
)(1.7x10
14
)(2)
= 0.09 ohms
I
on,MOS
=
3
0.09
= 33 amps
256. V
on
(PT) = V
j,PT
+ I
on,PT
R
on,PT
= V
j,NPT
+ I
on,NPT
R
on,NPT
I
on,PT
I
on,NPT
≈
R
on,NPT
R
on,PT
since V
j,NPT
≈ V
j,PT
BV
FB
=
1.3x10
17
10
14
≈ 1300 volts ; But W
depl
(1300 V) = (10
5
)(1300) = 130 microns
130 microns > 25 micron drift region length. Hence forward blocking limited by
punchthrough.
BV
FB
= (2x10
5
)(2.5x10
3
) 
(1.6x10
19
)(10
14
)(2.5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 453 volts
255. IGBT current  I
on,IGBT
; V
on
(IGBT) = V
j
+ I
on,IGBT
R
on,IGBT
Assume V
j
≈ 0.8 V ; Exact value not critical to an approximate estimate of I
on,IGBT
.
I
on,IGBT
≈
30.8
R
on,IGBT
; R
on,IGBT
≈
W
d
q(m
n
+m
p
)n
b
A
W
d
= (10
5
)(750) = 75 m m ; R
on,IGBT
=
7.5x10
3
(1.6x10
19
)(900)(10
16
)(2)
= 2.6x10
3
W
I
on,IGBT
≈
2.2
2.6x10
3
≈ 850 amps
MOSFET current  I
on,MOS
; V
on
(MOS) = I
on,MOS
R
on,MOS
I
on,MOS
=
V
on
(MOS)
R
on,MOS
; R
on,MOS
=
W
d
qm
n
N
d
A
; W
d
= 75 m m
N
d
=
1.3x10
17
750
= 1.7x10
14
cm
3
R
on,MOS
=
7.5x10
3
(1.6x10
19
)(1.5x10
3
)(1.7x10
14
)(2)
= 0.09 ohms
I
on,MOS
=
3
0.09
= 33 amps
256. V
on
(PT) = V
j,PT
+ I
on,PT
R
on,PT
= V
j,NPT
+ I
on,NPT
R
on,NPT
I
on,PT
I
on,NPT
≈
R
on,NPT
R
on,PT
since V
j,NPT
≈ V
j,PT
R
on,NPT
R
on,PT
=
W
d,NPT
W
d,PT
≈ 2 assuming doping level in PT drift region is much less than
the doping level in the NPT drift region.
Hence
I
on,PT
I
on,NPT
≈ 2
257. C
v
d T = d Q ; d Q =
P
V
d t ; P = power dissipated in IGBT during overcurrent transient.
V = volume in IGBT where power is dissipated.Duration of transient = d t.
P = I
ov
2
R
on
; I
ov
=
VC
v
d T
d tR
on
; V ≈ A W
drift
R
on
=
W
drift
q(m
n
+m
p
)n
b
A
; I
ov
=
q(m
n
+m
p
)n
b
A
2
C
v
d T
d t
I
ov
=
(1.6x10
19
)(900)(10
16
)(0.5)
2
(1.75)(100)
(10
5
)
≈ 2.5x10
3
amps
Estimate is overly optimistic because it ignores any other ohmic losses in the device such
as channel resistance or resistance of the heavily doped source and drain diffusions.
However IGBTs nominally rated at 100 A have repeatedly been tested at 1000 A for 10
microseconds or less and survived.
258. The IGBT has the smaller values of C
gd
and C
gs
because its effective crosssectional
area is smaller than that of the MOSFET. The IGBT has a smaller area even though its
current rating is identical to the MOSFET's rating because the IGBT utilizes conductivity
modulation of the drift region to significantly reduce the specific onstate resistance.
259. Check
dv
DS
dt
at turnoff ;
dv
DS
dt
=
V
d
t
rv
; t
rv
< 0.75 microseconds
dv
DS
dt
>
V
d
t
off
=
700
3x10
7
= 2330 V/m s > 800 V/m s limit.
Device is overstressed by an overly large
dv
DS
dt
.
R
on,NPT
R
on,PT
=
W
d,NPT
W
d,PT
≈ 2 assuming doping level in PT drift region is much less than
the doping level in the NPT drift region.
Hence
I
on,PT
I
on,NPT
≈ 2
257. C
v
d T = d Q ; d Q =
P
V
d t ; P = power dissipated in IGBT during overcurrent transient.
V = volume in IGBT where power is dissipated.Duration of transient = d t.
P = I
ov
2
R
on
; I
ov
=
VC
v
d T
d tR
on
; V ≈ A W
drift
R
on
=
W
drift
q(m
n
+m
p
)n
b
A
; I
ov
=
q(m
n
+m
p
)n
b
A
2
C
v
d T
d t
I
ov
=
(1.6x10
19
)(900)(10
16
)(0.5)
2
(1.75)(100)
(10
5
)
≈ 2.5x10
3
amps
Estimate is overly optimistic because it ignores any other ohmic losses in the device such
as channel resistance or resistance of the heavily doped source and drain diffusions.
However IGBTs nominally rated at 100 A have repeatedly been tested at 1000 A for 10
microseconds or less and survived.
258. The IGBT has the smaller values of C
gd
and C
gs
because its effective crosssectional
area is smaller than that of the MOSFET. The IGBT has a smaller area even though its
current rating is identical to the MOSFET's rating because the IGBT utilizes conductivity
modulation of the drift region to significantly reduce the specific onstate resistance.
259. Check
dv
DS
dt
at turnoff ;
dv
DS
dt
=
V
d
t
rv
; t
rv
< 0.75 microseconds
dv
DS
dt
>
V
d
t
off
=
700
3x10
7
= 2330 V/m s > 800 V/m s limit.
Device is overstressed by an overly large
dv
DS
dt
.
R
on,NPT
R
on,PT
=
W
d,NPT
W
d,PT
≈ 2 assuming doping level in PT drift region is much less than
the doping level in the NPT drift region.
Hence
I
on,PT
I
on,NPT
≈ 2
257. C
v
d T = d Q ; d Q =
P
V
d t ; P = power dissipated in IGBT during overcurrent transient.
V = volume in IGBT where power is dissipated.Duration of transient = d t.
P = I
ov
2
R
on
; I
ov
=
VC
v
d T
d tR
on
; V ≈ A W
drift
R
on
=
W
drift
q(m
n
+m
p
)n
b
A
; I
ov
=
q(m
n
+m
p
)n
b
A
2
C
v
d T
d t
I
ov
=
(1.6x10
19
)(900)(10
16
)(0.5)
2
(1.75)(100)
(10
5
)
≈ 2.5x10
3
amps
Estimate is overly optimistic because it ignores any other ohmic losses in the device such
as channel resistance or resistance of the heavily doped source and drain diffusions.
However IGBTs nominally rated at 100 A have repeatedly been tested at 1000 A for 10
microseconds or less and survived.
258. The IGBT has the smaller values of C
gd
and C
gs
because its effective crosssectional
area is smaller than that of the MOSFET. The IGBT has a smaller area even though its
current rating is identical to the MOSFET's rating because the IGBT utilizes conductivity
modulation of the drift region to significantly reduce the specific onstate resistance.
259. Check
dv
DS
dt
at turnoff ;
dv
DS
dt
=
V
d
t
rv
; t
rv
< 0.75 microseconds
dv
DS
dt
>
V
d
t
off
=
700
3x10
7
= 2330 V/m s > 800 V/m s limit.
Device is overstressed by an overly large
dv
DS
dt
.
R
on,NPT
R
on,PT
=
W
d,NPT
W
d,PT
≈ 2 assuming doping level in PT drift region is much less than
the doping level in the NPT drift region.
Hence
I
on,PT
I
on,NPT
≈ 2
257. C
v
d T = d Q ; d Q =
P
V
d t ; P = power dissipated in IGBT during overcurrent transient.
V = volume in IGBT where power is dissipated.Duration of transient = d t.
P = I
ov
2
R
on
; I
ov
=
VC
v
d T
d tR
on
; V ≈ A W
drift
R
on
=
W
drift
q(m
n
+m
p
)n
b
A
; I
ov
=
q(m
n
+m
p
)n
b
A
2
C
v
d T
d t
I
ov
=
(1.6x10
19
)(900)(10
16
)(0.5)
2
(1.75)(100)
(10
5
)
≈ 2.5x10
3
amps
Estimate is overly optimistic because it ignores any other ohmic losses in the device such
as channel resistance or resistance of the heavily doped source and drain diffusions.
However IGBTs nominally rated at 100 A have repeatedly been tested at 1000 A for 10
microseconds or less and survived.
258. The IGBT has the smaller values of C
gd
and C
gs
because its effective crosssectional
area is smaller than that of the MOSFET. The IGBT has a smaller area even though its
current rating is identical to the MOSFET's rating because the IGBT utilizes conductivity
modulation of the drift region to significantly reduce the specific onstate resistance.
259. Check
dv
DS
dt
at turnoff ;
dv
DS
dt
=
V
d
t
rv
; t
rv
< 0.75 microseconds
dv
DS
dt
>
V
d
t
off
=
700
3x10
7
= 2330 V/m s > 800 V/m s limit.
Device is overstressed by an overly large
dv
DS
dt
.
Check switching losses P
sw
= V
d
I
o
t
ri
+t
rv
+t
fi
+t
fv
2
f
s
P
sw
= (700)(100)
(3x10
7
+7.5x10
7
)
2
(2.5x10
4
) = 875 W
Allowable power loss =
T
j,max
T
a
R
q ja
=
15025
0.5
= 250 watts
Switching losses exceed allowable losses. Module is overstressed by too much
power dissipation.
Chapter 26 Problem Solutions
261. Equivalent circuit for JFET in active region.
+

C
GD
C
GS
r
o
m v
GS
v
GS
v
DS
+

+

Equivelent circuit for JFET Linearized IV characteristics
in the blocking state.
C
GD
C
GS
v
GS
v
DS
+

+

0
V
GS2
GS1
V
i
D
V
DS1
V
DS2
0
262. Drive circuit configuration
+

V
DD
R
L
2
R
1
R
V
drive
MOSFET off
V
DS
= V
KG
=  V
GK
=
V
DD
R
2
R
1
+R
2
Negative enough to insure that
the FCT is off.
MOSFET on
V
DS
= V
KG
=  V
GK
= 0
and FCT is on.
Chapter 26 Problem Solutions
261. Equivalent circuit for JFET in active region.
+

C
GD
C
GS
r
o
m v
GS
v
GS
v
DS
+

+

Equivelent circuit for JFET Linearized IV characteristics
in the blocking state.
C
GD
C
GS
v
GS
v
DS
+

+

0
V
GS2
GS1
V
i
D
V
DS1
V
DS2
0
262. Drive circuit configuration
+

V
DD
R
L
2
R
1
R
V
drive
MOSFET off
V
DS
= V
KG
=  V
GK
=
V
DD
R
2
R
1
+R
2
Negative enough to insure that
the FCT is off.
MOSFET on
V
DS
= V
KG
=  V
GK
= 0
and FCT is on.
MOSFET characteirstics:
 High current sinking capability
 Low R
on
; Low BV
Dss
263. V
drift
=
W
d
2
(m
n
+m
p
)t
; BV
BD
=
E
BD
W
d
2
; V
drift,GaAs
= V
drift,Si
W
d
2
(Si)
(m
n
+m
p
)
Si
t
Si
=
W
d
2
(GaAs)
(m
n
+m
p
)
GaAs
t
GaAs
t
GaA
t
Si
=
(m
n
+m
p
)
Si
(m
n
+m
p
)
GaAs
Î ˚
E
BD
(Si)
E
BD
(GaAs)
2
(m
n
+ m
p
)
Si
= 2000 cm
2
/Vsec ; (m
n
+ m
p
)
GaAs
= 9000 cm
2
/Vsec
E
BD
(Si) = 300 kV/cm ; E
BD
(GaAs) = 400 kV/cm
t
GaA
t
Si
=
2
9
Î ˚
3
4
2
= 0.125 ; GaAs has the shorter lifetime.
264. E
BD
= 10
7
V/cm ; BV
BD
= E
BD
t
ox
t
ox
=
10
3
10
7
= 10
4
cm = 1 micron
265. I
A,max
= (10
5
)(1.5x10
2
) = 1500 amperes
266. PMCT fabricated in silicon can turnoff three times more current than an identical
NMCT due to the difference between the mobilities in the nchannel OFFFET in the
PMCT and pchannel OFFFET in the NMCT. Hence
I
A,max
= (3)(10
5
)(1.5x10
2
) = 4500 amperes
267. Assume an ntype drift region since m
n
> m
p
.
MOSFET characteirstics:
 High current sinking capability
 Low R
on
; Low BV
Dss
263. V
drift
=
W
d
2
(m
n
+m
p
)t
; BV
BD
=
E
BD
W
d
2
; V
drift,GaAs
= V
drift,Si
W
d
2
(Si)
(m
n
+m
p
)
Si
t
Si
=
W
d
2
(GaAs)
(m
n
+m
p
)
GaAs
t
GaAs
t
GaA
t
Si
=
(m
n
+m
p
)
Si
(m
n
+m
p
)
GaAs
Î ˚
E
BD
(Si)
E
BD
(GaAs)
2
(m
n
+ m
p
)
Si
= 2000 cm
2
/Vsec ; (m
n
+ m
p
)
GaAs
= 9000 cm
2
/Vsec
E
BD
(Si) = 300 kV/cm ; E
BD
(GaAs) = 400 kV/cm
t
GaA
t
Si
=
2
9
Î ˚
3
4
2
= 0.125 ; GaAs has the shorter lifetime.
264. E
BD
= 10
7
V/cm ; BV
BD
= E
BD
t
ox
t
ox
=
10
3
10
7
= 10
4
cm = 1 micron
265. I
A,max
= (10
5
)(1.5x10
2
) = 1500 amperes
266. PMCT fabricated in silicon can turnoff three times more current than an identical
NMCT due to the difference between the mobilities in the nchannel OFFFET in the
PMCT and pchannel OFFFET in the NMCT. Hence
I
A,max
= (3)(10
5
)(1.5x10
2
) = 4500 amperes
267. Assume an ntype drift region since m
n
> m
p
.
MOSFET characteirstics:
 High current sinking capability
 Low R
on
; Low BV
Dss
263. V
drift
=
W
d
2
(m
n
+m
p
)t
; BV
BD
=
E
BD
W
d
2
; V
drift,GaAs
= V
drift,Si
W
d
2
(Si)
(m
n
+m
p
)
Si
t
Si
=
W
d
2
(GaAs)
(m
n
+m
p
)
GaAs
t
GaAs
t
GaA
t
Si
=
(m
n
+m
p
)
Si
(m
n
+m
p
)
GaAs
Î ˚
E
BD
(Si)
E
BD
(GaAs)
2
(m
n
+ m
p
)
Si
= 2000 cm
2
/Vsec ; (m
n
+ m
p
)
GaAs
= 9000 cm
2
/Vsec
E
BD
(Si) = 300 kV/cm ; E
BD
(GaAs) = 400 kV/cm
t
GaA
t
Si
=
2
9
Î ˚
3
4
2
= 0.125 ; GaAs has the shorter lifetime.
264. E
BD
= 10
7
V/cm ; BV
BD
= E
BD
t
ox
t
ox
=
10
3
10
7
= 10
4
cm = 1 micron
265. I
A,max
= (10
5
)(1.5x10
2
) = 1500 amperes
266. PMCT fabricated in silicon can turnoff three times more current than an identical
NMCT due to the difference between the mobilities in the nchannel OFFFET in the
PMCT and pchannel OFFFET in the NMCT. Hence
I
A,max
= (3)(10
5
)(1.5x10
2
) = 4500 amperes
267. Assume an ntype drift region since m
n
> m
p
.
MOSFET characteirstics:
 High current sinking capability
 Low R
on
; Low BV
Dss
263. V
drift
=
W
d
2
(m
n
+m
p
)t
; BV
BD
=
E
BD
W
d
2
; V
drift,GaAs
= V
drift,Si
W
d
2
(Si)
(m
n
+m
p
)
Si
t
Si
=
W
d
2
(GaAs)
(m
n
+m
p
)
GaAs
t
GaAs
t
GaA
t
Si
=
(m
n
+m
p
)
Si
(m
n
+m
p
)
GaAs
Î ˚
E
BD
(Si)
E
BD
(GaAs)
2
(m
n
+ m
p
)
Si
= 2000 cm
2
/Vsec ; (m
n
+ m
p
)
GaAs
= 9000 cm
2
/Vsec
E
BD
(Si) = 300 kV/cm ; E
BD
(GaAs) = 400 kV/cm
t
GaA
t
Si
=
2
9
Î ˚
3
4
2
= 0.125 ; GaAs has the shorter lifetime.
264. E
BD
= 10
7
V/cm ; BV
BD
= E
BD
t
ox
t
ox
=
10
3
10
7
= 10
4
cm = 1 micron
265. I
A,max
= (10
5
)(1.5x10
2
) = 1500 amperes
266. PMCT fabricated in silicon can turnoff three times more current than an identical
NMCT due to the difference between the mobilities in the nchannel OFFFET in the
PMCT and pchannel OFFFET in the NMCT. Hence
I
A,max
= (3)(10
5
)(1.5x10
2
) = 4500 amperes
267. Assume an ntype drift region since m
n
> m
p
.
MOSFET characteirstics:
 High current sinking capability
 Low R
on
; Low BV
Dss
263. V
drift
=
W
d
2
(m
n
+m
p
)t
; BV
BD
=
E
BD
W
d
2
; V
drift,GaAs
= V
drift,Si
W
d
2
(Si)
(m
n
+m
p
)
Si
t
Si
=
W
d
2
(GaAs)
(m
n
+m
p
)
GaAs
t
GaAs
t
GaA
t
Si
=
(m
n
+m
p
)
Si
(m
n
+m
p
)
GaAs
Î ˚
E
BD
(Si)
E
BD
(GaAs)
2
(m
n
+ m
p
)
Si
= 2000 cm
2
/Vsec ; (m
n
+ m
p
)
GaAs
= 9000 cm
2
/Vsec
E
BD
(Si) = 300 kV/cm ; E
BD
(GaAs) = 400 kV/cm
t
GaA
t
Si
=
2
9
Î ˚
3
4
2
= 0.125 ; GaAs has the shorter lifetime.
264. E
BD
= 10
7
V/cm ; BV
BD
= E
BD
t
ox
t
ox
=
10
3
10
7
= 10
4
cm = 1 micron
265. I
A,max
= (10
5
)(1.5x10
2
) = 1500 amperes
266. PMCT fabricated in silicon can turnoff three times more current than an identical
NMCT due to the difference between the mobilities in the nchannel OFFFET in the
PMCT and pchannel OFFFET in the NMCT. Hence
I
A,max
= (3)(10
5
)(1.5x10
2
) = 4500 amperes
267. Assume an ntype drift region since m
n
> m
p
.
MOSFET characteirstics:
 High current sinking capability
 Low R
on
; Low BV
Dss
263. V
drift
=
W
d
2
(m
n
+m
p
)t
; BV
BD
=
E
BD
W
d
2
; V
drift,GaAs
= V
drift,Si
W
d
2
(Si)
(m
n
+m
p
)
Si
t
Si
=
W
d
2
(GaAs)
(m
n
+m
p
)
GaAs
t
GaAs
t
GaA
t
Si
=
(m
n
+m
p
)
Si
(m
n
+m
p
)
GaAs
Î ˚
E
BD
(Si)
E
BD
(GaAs)
2
(m
n
+ m
p
)
Si
= 2000 cm
2
/Vsec ; (m
n
+ m
p
)
GaAs
= 9000 cm
2
/Vsec
E
BD
(Si) = 300 kV/cm ; E
BD
(GaAs) = 400 kV/cm
t
GaA
t
Si
=
2
9
Î ˚
3
4
2
= 0.125 ; GaAs has the shorter lifetime.
264. E
BD
= 10
7
V/cm ; BV
BD
= E
BD
t
ox
t
ox
=
10
3
10
7
= 10
4
cm = 1 micron
265. I
A,max
= (10
5
)(1.5x10
2
) = 1500 amperes
266. PMCT fabricated in silicon can turnoff three times more current than an identical
NMCT due to the difference between the mobilities in the nchannel OFFFET in the
PMCT and pchannel OFFFET in the NMCT. Hence
I
A,max
= (3)(10
5
)(1.5x10
2
) = 4500 amperes
267. Assume an ntype drift region since m
n
> m
p
.
R
drift
=
W
d
qm
n
N
d
A
; R
drift,sp
= R
drift
A =
W
d
qm
n
N
d
Using Eq. (201) N
d
=
e E
BD
2
2qBV
BD
; Using Eq. (203) W
d
=
2BV
BD
E
BD
Substituting into the expression for R
drift,sp
yields
R
drift,sp
=
2BV
BD
E
BD
1
qe
2qBV
BD
e E
BD
2
=
4(BV
BD
)
2
e m
n
(E
BD
)
3
268. Silicon : R
drift,sp
=
(4)(500)
2
(11.7)(1500)(8.9x10
14
)(3x10
5
)
3
= 0.024 ohmscm
2
GaAs: R
drift,sp
=
(4)(500)
2
(12.8)(8500)(8.9x10
14
)(4x10
5
)
3
= 0.0016 ohmscm
2
6HSiC: R
drift,sp
=
(4)(500)
2
(10)(600)(8.9x10
14
)(2x10
6
)
3
= 2.3x10
4
ohmscm
2
Diamond: R
drift,sp
=
(4)(500)
2
(5.5)(2200)(8.9x10
14
)(10
7
)
3
= 9.3x10
7
ohmscm
2
269. Diamond is the most suitable material for high temperature operation. It has the largest
bandgap (by almost a factor of two) and thus the smallest intrinsic carrier density at any
given temperature. This statement presumes that the phase change listed for diamond in
the table of material properties exceeds the sublimation temperature of SiC (1800 °C).
2610. Eq. (201): N
d
=
e E
BD
2
2qBV
BD
For GaAs: N
d
=
(12.8)(8.9x10
14
)(4x10
5
)
2
(2)(1.6x10
19
)(BV
BD
)
=
5.7x10
17
BV
BD
For 6HSiC: N
d
=
(10)(8.9x10
14
)(2x10
6
)
2
(2)(1.6x10
19
)(BV
BD
)
=
1.1x10
19
BV
BD
R
drift
=
W
d
qm
n
N
d
A
; R
drift,sp
= R
drift
A =
W
d
qm
n
N
d
Using Eq. (201) N
d
=
e E
BD
2
2qBV
BD
; Using Eq. (203) W
d
=
2BV
BD
E
BD
Substituting into the expression for R
drift,sp
yields
R
drift,sp
=
2BV
BD
E
BD
1
qe
2qBV
BD
e E
BD
2
=
4(BV
BD
)
2
e m
n
(E
BD
)
3
268. Silicon : R
drift,sp
=
(4)(500)
2
(11.7)(1500)(8.9x10
14
)(3x10
5
)
3
= 0.024 ohmscm
2
GaAs: R
drift,sp
=
(4)(500)
2
(12.8)(8500)(8.9x10
14
)(4x10
5
)
3
= 0.0016 ohmscm
2
6HSiC: R
drift,sp
=
(4)(500)
2
(10)(600)(8.9x10
14
)(2x10
6
)
3
= 2.3x10
4
ohmscm
2
Diamond: R
drift,sp
=
(4)(500)
2
(5.5)(2200)(8.9x10
14
)(10
7
)
3
= 9.3x10
7
ohmscm
2
269. Diamond is the most suitable material for high temperature operation. It has the largest
bandgap (by almost a factor of two) and thus the smallest intrinsic carrier density at any
given temperature. This statement presumes that the phase change listed for diamond in
the table of material properties exceeds the sublimation temperature of SiC (1800 °C).
2610. Eq. (201): N
d
=
e E
BD
2
2qBV
BD
For GaAs: N
d
=
(12.8)(8.9x10
14
)(4x10
5
)
2
(2)(1.6x10
19
)(BV
BD
)
=
5.7x10
17
BV
BD
For 6HSiC: N
d
=
(10)(8.9x10
14
)(2x10
6
)
2
(2)(1.6x10
19
)(BV
BD
)
=
1.1x10
19
BV
BD
R
drift
=
W
d
qm
n
N
d
A
; R
drift,sp
= R
drift
A =
W
d
qm
n
N
d
Using Eq. (201) N
d
=
e E
BD
2
2qBV
BD
; Using Eq. (203) W
d
=
2BV
BD
E
BD
Substituting into the expression for R
drift,sp
yields
R
drift,sp
=
2BV
BD
E
BD
1
qe
2qBV
BD
e E
BD
2
=
4(BV
BD
)
2
e m
n
(E
BD
)
3
268. Silicon : R
drift,sp
=
(4)(500)
2
(11.7)(1500)(8.9x10
14
)(3x10
5
)
3
= 0.024 ohmscm
2
GaAs: R
drift,sp
=
(4)(500)
2
(12.8)(8500)(8.9x10
14
)(4x10
5
)
3
= 0.0016 ohmscm
2
6HSiC: R
drift,sp
=
(4)(500)
2
(10)(600)(8.9x10
14
)(2x10
6
)
3
= 2.3x10
4
ohmscm
2
Diamond: R
drift,sp
=
(4)(500)
2
(5.5)(2200)(8.9x10
14
)(10
7
)
3
= 9.3x10
7
ohmscm
2
269. Diamond is the most suitable material for high temperature operation. It has the largest
bandgap (by almost a factor of two) and thus the smallest intrinsic carrier density at any
given temperature. This statement presumes that the phase change listed for diamond in
the table of material properties exceeds the sublimation temperature of SiC (1800 °C).
2610. Eq. (201): N
d
=
e E
BD
2
2qBV
BD
For GaAs: N
d
=
(12.8)(8.9x10
14
)(4x10
5
)
2
(2)(1.6x10
19
)(BV
BD
)
=
5.7x10
17
BV
BD
For 6HSiC: N
d
=
(10)(8.9x10
14
)(2x10
6
)
2
(2)(1.6x10
19
)(BV
BD
)
=
1.1x10
19
BV
BD
R
drift
=
W
d
qm
n
N
d
A
; R
drift,sp
= R
drift
A =
W
d
qm
n
N
d
Using Eq. (201) N
d
=
e E
BD
2
2qBV
BD
; Using Eq. (203) W
d
=
2BV
BD
E
BD
Substituting into the expression for R
drift,sp
yields
R
drift,sp
=
2BV
BD
E
BD
1
qe
2qBV
BD
e E
BD
2
=
4(BV
BD
)
2
e m
n
(E
BD
)
3
268. Silicon : R
drift,sp
=
(4)(500)
2
(11.7)(1500)(8.9x10
14
)(3x10
5
)
3
= 0.024 ohmscm
2
GaAs: R
drift,sp
=
(4)(500)
2
(12.8)(8500)(8.9x10
14
)(4x10
5
)
3
= 0.0016 ohmscm
2
6HSiC: R
drift,sp
=
(4)(500)
2
(10)(600)(8.9x10
14
)(2x10
6
)
3
= 2.3x10
4
ohmscm
2
Diamond: R
drift,sp
=
(4)(500)
2
(5.5)(2200)(8.9x10
14
)(10
7
)
3
= 9.3x10
7
ohmscm
2
269. Diamond is the most suitable material for high temperature operation. It has the largest
bandgap (by almost a factor of two) and thus the smallest intrinsic carrier density at any
given temperature. This statement presumes that the phase change listed for diamond in
the table of material properties exceeds the sublimation temperature of SiC (1800 °C).
2610. Eq. (201): N
d
=
e E
BD
2
2qBV
BD
For GaAs: N
d
=
(12.8)(8.9x10
14
)(4x10
5
)
2
(2)(1.6x10
19
)(BV
BD
)
=
5.7x10
17
BV
BD
For 6HSiC: N
d
=
(10)(8.9x10
14
)(2x10
6
)
2
(2)(1.6x10
19
)(BV
BD
)
=
1.1x10
19
BV
BD
For diamond: N
d
=
(5.5)(8.9x10
14
)(10
7
)
2
(2)(1.6x10
19
)(BV
BD
)
=
1.5x10
20
BV
BD
Eq. (203): W
d
=
2BV
BD
E
BD
For GaAs: W
d
=
2BV
BD
4x10
5
= 5x10
6
BV
BD
[cm]
For 6HSiC: W
d
=
2BV
BD
2x10
6
= 10
6
BV
BD
[cm]
For diamond: W
d
=
2BV
BD
10
7
= 2x10
7
BV
BD
[cm]
2611. Use equations from problem 2610.
Material N
d
W
d
GaAs
2.9x10
15
cm
3
10
2
cm
6HSiC
5.5x10
16
cm
3
2x10
3
cm
Diamond
7.5x10
17
cm
3
4x10
5
cm
2612. T
j
= R
q jc
P
diode
+ T
case
: R
q jc
= C.• (k )
1
k = thermal conductivity and C = constant
Using silicon diode data: C =
(T
j
T
case
)k
P
diode
=
(15050)(1.5)
200
= 0.75 cm
1
R
q jc
(GaAs) =
0.75
0.5
= 1.5 °C/W : R
q jc
(SiC) =
0.75
5
= 0.15°C/W
R
q jc
(diamond) =
0.75
20
= 0.038°C/W
T
j
(GaAs) = (1.5)(200) + 50 = 350 °C : T
j
(SiC) = (0.15)(200) + 50 = 80 °C
For diamond: N
d
=
(5.5)(8.9x10
14
)(10
7
)
2
(2)(1.6x10
19
)(BV
BD
)
=
1.5x10
20
BV
BD
Eq. (203): W
d
=
2BV
BD
E
BD
For GaAs: W
d
=
2BV
BD
4x10
5
= 5x10
6
BV
BD
[cm]
For 6HSiC: W
d
=
2BV
BD
2x10
6
= 10
6
BV
BD
[cm]
For diamond: W
d
=
2BV
BD
10
7
= 2x10
7
BV
BD
[cm]
2611. Use equations from problem 2610.
Material N
d
W
d
GaAs
2.9x10
15
cm
3
10
2
cm
6HSiC
5.5x10
16
cm
3
2x10
3
cm
Diamond
7.5x10
17
cm
3
4x10
5
cm
2612. T
j
= R
q jc
P
diode
+ T
case
: R
q jc
= C.• (k )
1
k = thermal conductivity and C = constant
Using silicon diode data: C =
(T
j
T
case
)k
P
diode
=
(15050)(1.5)
200
= 0.75 cm
1
R
q jc
(GaAs) =
0.75
0.5
= 1.5 °C/W : R
q jc
(SiC) =
0.75
5
= 0.15°C/W
R
q jc
(diamond) =
0.75
20
= 0.038°C/W
T
j
(GaAs) = (1.5)(200) + 50 = 350 °C : T
j
(SiC) = (0.15)(200) + 50 = 80 °C
For diamond: N
d
=
(5.5)(8.9x10
14
)(10
7
)
2
(2)(1.6x10
19
)(BV
BD
)
=
1.5x10
20
BV
BD
Eq. (203): W
d
=
2BV
BD
E
BD
For GaAs: W
d
=
2BV
BD
4x10
5
= 5x10
6
BV
BD
[cm]
For 6HSiC: W
d
=
2BV
BD
2x10
6
= 10
6
BV
BD
[cm]
For diamond: W
d
=
2BV
BD
10
7
= 2x10
7
BV
BD
[cm]
2611. Use equations from problem 2610.
Material N
d
W
d
GaAs
2.9x10
15
cm
3
10
2
cm
6HSiC
5.5x10
16
cm
3
2x10
3
cm
Diamond
7.5x10
17
cm
3
4x10
5
cm
2612. T
j
= R
q jc
P
diode
+ T
case
: R
q jc
= C.• (k )
1
k = thermal conductivity and C = constant
Using silicon diode data: C =
(T
j
T
case
)k
P
diode
=
(15050)(1.5)
200
= 0.75 cm
1
R
q jc
(GaAs) =
0.75
0.5
= 1.5 °C/W : R
q jc
(SiC) =
0.75
5
= 0.15°C/W
R
q jc
(diamond) =
0.75
20
= 0.038°C/W
T
j
(GaAs) = (1.5)(200) + 50 = 350 °C : T
j
(SiC) = (0.15)(200) + 50 = 80 °C
T
j
(diamond) = (0.038)(200) + 50 = 57.4 °C
2613. Pinchoff of the channel occurs when the depletion region of the gatechannel (P
+
N

)
junction is equal to W/2 where W is the width of the channel. Occurs at a gatesource
voltage of V
p
. The other half of the channel is depleted by the depletion region from
the gatechannel junction on the other side of the channel. See Figs. 261 and 263.
W
2
= W
o
1+
V
p
f
c
; f
c
=
kT
q
ln
Î ˚
N
a
N
d
n
i
2
; W
o
=
2e f
c
qN
d
Solving for V
p
yields V
p
= f
c
Î ˚
W
2W
o
2
 f
c
f
c
= 0.026 ln
Î ˚
(10
19
)(2x10
14
)
10
10
= 0.8 V
W
o
=
(2)(11.7)(8.9x10
14
)(0.8)
(1.6x10
19
)(2x10
14
)
= 2.3 microns
V
p
= (0.8)
Î ˚
10
(2)(2.3)
2
 0.8 = 3.8  0.8 = 3 V
2614. Single cell of the multicell JFET shown below. See Fig. 261 for a fuller picture of the
multicell nature of the JFET. The diagram on the left indicates the various
contributions to the onstate resistance and the figure on the right shows the various
geometrical factors that determine the resistance. Each cell is d centimeters deep in the
direction perpendicular to the plane (page) of the diagram. The gatesource voltage is
set at zero.
T
j
(diamond) = (0.038)(200) + 50 = 57.4 °C
2613. Pinchoff of the channel occurs when the depletion region of the gatechannel (P
+
N

)
junction is equal to W/2 where W is the width of the channel. Occurs at a gatesource
voltage of V
p
. The other half of the channel is depleted by the depletion region from
the gatechannel junction on the other side of the channel. See Figs. 261 and 263.
W
2
= W
o
1+
V
p
f
c
; f
c
=
kT
q
ln
Î ˚
N
a
N
d
n
i
2
; W
o
=
2e f
c
qN
d
Solving for V
p
yields V
p
= f
c
Î ˚
W
2W
o
2
 f
c
f
c
= 0.026 ln
Î ˚
(10
19
)(2x10
14
)
10
10
= 0.8 V
W
o
=
(2)(11.7)(8.9x10
14
)(0.8)
(1.6x10
19
)(2x10
14
)
= 2.3 microns
V
p
= (0.8)
Î ˚
10
(2)(2.3)
2
 0.8 = 3.8  0.8 = 3 V
2614. Single cell of the multicell JFET shown below. See Fig. 261 for a fuller picture of the
multicell nature of the JFET. The diagram on the left indicates the various
contributions to the onstate resistance and the figure on the right shows the various
geometrical factors that determine the resistance. Each cell is d centimeters deep in the
direction perpendicular to the plane (page) of the diagram. The gatesource voltage is
set at zero.
T
j
(diamond) = (0.038)(200) + 50 = 57.4 °C
2613. Pinchoff of the channel occurs when the depletion region of the gatechannel (P
+
N

)
junction is equal to W/2 where W is the width of the channel. Occurs at a gatesource
voltage of V
p
. The other half of the channel is depleted by the depletion region from
the gatechannel junction on the other side of the channel. See Figs. 261 and 263.
W
2
= W
o
1+
V
p
f
c
; f
c
=
kT
q
ln
Î ˚
N
a
N
d
n
i
2
; W
o
=
2e f
c
qN
d
Solving for V
p
yields V
p
= f
c
Î ˚
W
2W
o
2
 f
c
f
c
= 0.026 ln
Î ˚
(10
19
)(2x10
14
)
10
10
= 0.8 V
W
o
=
(2)(11.7)(8.9x10
14
)(0.8)
(1.6x10
19
)(2x10
14
)
= 2.3 microns
V
p
= (0.8)
Î ˚
10
(2)(2.3)
2
 0.8 = 3.8  0.8 = 3 V
2614. Single cell of the multicell JFET shown below. See Fig. 261 for a fuller picture of the
multicell nature of the JFET. The diagram on the left indicates the various
contributions to the onstate resistance and the figure on the right shows the various
geometrical factors that determine the resistance. Each cell is d centimeters deep in the
direction perpendicular to the plane (page) of the diagram. The gatesource voltage is
set at zero.
R
d
R
t
R
c
R
s
P
+
P
+
drain
source
P
+
P
+
W  2W
o
W
W + W
g
W + W /2
o g
l
c
l
gs
W
g
l  W  W /2
gd o
g
R
s
=
l
gs
qm
n
N
d
dW
=
10
3
(1.6x10
19
)(1500)(2x10
14
)(0.07)(10
3
)
= 298 ohms
R
c
=
l
c
qm
n
N
d
d(W2W
o
)
=
10
3
(1.6x10
19
)(1500)(2x10
14
)(0.07)(10
3
4.6x10
4
)
= 552 ohms
R
t
estimate. Treat the region of thickness W
o
+ W
g
/2 as though it has an average width
given by
(W2W
o
)+(W+W
g
)
2
= W + W
g
/2  W
o
. R
t
now approximately given by
R
t
=
W
o
+W
g
/2
qm
n
N
d
d(W+W
g
/2W
o
)
R
t
=
(10
3
+5x10
4
)
(1.6x10
19
)(1500)(2x10
14
)(0.07)(10
3
+5x10
4
2.3x10
4
)
= 351 ohms
R
d
=
(l
gd
W
o
W
g
/2)
qm
n
N
d
d(W+W
g
)
=
R
d
=
(35x10
4
2.3x10
4
5x10
4
)
(1.6x10
19
)(1500)(2x10
14
)(0.07)(10
3
+10
3
)
= 412 ohms
Total resistance of a single cell is R
cell
= R
s
+ R
c
+ R
t
+ R
d
R
cell
= 298 + 552 + 351 + 412 = 1613 ohms
There are N = 28 cells in parallel so the the net onstate resistance is
R
on
=
R
cell
N
=
1613
28
= 58 ohms
2615. As the drainsource voltage increases, the reversebias on the gatedrain pn junction
increases. The depletion region of the two adjacent P
+
regions merge and then grow
towards the drain. The drift region of length l
gd
and doping N
d
must contain this
depletion region and will determine the breakdown voltage. The short length of the
drift region suggests that punchthrough will limit the breakdown voltage. Check for
this possibility first.
Nonpunchthrough estimate:
BV =
1.3x10
17
2x10
14
= 650 V ; W
d
> (10
5
)(6.5x10
2
) = 65 microns > 35 microns
Hence this is a punchthrough structure. Use Eq. (2121) and E
BD
= 2x10
5
V/cm
BV = (2x10
5
)(3.5x10
3
) 
(1.6x10
19
)(2x10
14
)(3.5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 700  189
BV = 511 V
R
cell
= 298 + 552 + 351 + 412 = 1613 ohms
There are N = 28 cells in parallel so the the net onstate resistance is
R
on
=
R
cell
N
=
1613
28
= 58 ohms
2615. As the drainsource voltage increases, the reversebias on the gatedrain pn junction
increases. The depletion region of the two adjacent P
+
regions merge and then grow
towards the drain. The drift region of length l
gd
and doping N
d
must contain this
depletion region and will determine the breakdown voltage. The short length of the
drift region suggests that punchthrough will limit the breakdown voltage. Check for
this possibility first.
Nonpunchthrough estimate:
BV =
1.3x10
17
2x10
14
= 650 V ; W
d
> (10
5
)(6.5x10
2
) = 65 microns > 35 microns
Hence this is a punchthrough structure. Use Eq. (2121) and E
BD
= 2x10
5
V/cm
BV = (2x10
5
)(3.5x10
3
) 
(1.6x10
19
)(2x10
14
)(3.5x10
3
)
2
(2)(11.7)(8.9x10
14
)
= 700  189
BV = 511 V
Chapter 27 Problem Solutions
271. a. During turnoff of the GTO, I
o
communtates linearly to C
s
.
C
s
dv
C
dt
= I
o
t
t
fi
;
dv
C
dt
=
dv
AK
dt
=
I
o
t
C
s
t
fi
< 5x10
7
V/s
Maximum
dv
AK
dt
occurs at t
fi
. Solving for C
s
yields
C
s
> I
o
Î ˚
dv
AK
dt
1
=
500
5x10
7
= 10 microfarads
R
s
chosen on basis of limiting discharge current from C
s
to safe level when GTO
turns on. I
Cs,max
= I
AM
 I
o
 I
rr
. Assume i
rr
= 0.2 I
o
. Then
I
Cs,max
= 1000  500 100 = 400 A
R
s
=
500
400
≈ 1.3 ohms
Snubber recovery time = 2.3 R
s
C
s
= (2.3)(10
5
)(1.3) = 30 microseconds.
b. Power dissipated in snubber P
Rs
≈
f
sw
C
s
V
d
2
2
P
Rs
= (0.5)(10
3
)(10
5
)(500)
2
= 1.25 kW
272. L
s
di
A
dt
max
= V
d
; L
s
≈
500
3x10
8
≈ 1.7 microhenries.
Voltage across GTO at turnoff = V
d
+ I
o
R
s
: Assume I
o
R
s
= 0.2 V
d
R
s
=
(0.2)(500)
(500)
= 0.2 ohms.
273. v
Cs
(t) = V
d
 V
d
cos(w
o
t) + V
d
C
base
C
s
sin(w
o
t) = V
d
+ K sin(w
o
t  f )
v
Cs,max
= V
d
+ K ; K sin(w
o
t  f ) = K sin(w
o
t) cos(f )  Kcos(w
o
t) sin(f )
Chapter 27 Problem Solutions
271. a. During turnoff of the GTO, I
o
communtates linearly to C
s
.
C
s
dv
C
dt
= I
o
t
t
fi
;
dv
C
dt
=
dv
AK
dt
=
I
o
t
C
s
t
fi
< 5x10
7
V/s
Maximum
dv
AK
dt
occurs at t
fi
. Solving for C
s
yields
C
s
> I
o
Î ˚
dv
AK
dt
1
=
500
5x10
7
= 10 microfarads
R
s
chosen on basis of limiting discharge current from C
s
to safe level when GTO
turns on. I
Cs,max
= I
AM
 I
o
 I
rr
. Assume i
rr
= 0.2 I
o
. Then
I
Cs,max
= 1000  500 100 = 400 A
R
s
=
500
400
≈ 1.3 ohms
Snubber recovery time = 2.3 R
s
C
s
= (2.3)(10
5
)(1.3) = 30 microseconds.
b. Power dissipated in snubber P
Rs
≈
f
sw
C
s
V
d
2
2
P
Rs
= (0.5)(10
3
)(10
5
)(500)
2
= 1.25 kW
272. L
s
di
A
dt
max
= V
d
; L
s
≈
500
3x10
8
≈ 1.7 microhenries.
Voltage across GTO at turnoff = V
d
+ I
o
R
s
: Assume I
o
R
s
= 0.2 V
d
R
s
=
(0.2)(500)
(500)
= 0.2 ohms.
273. v
Cs
(t) = V
d
 V
d
cos(w
o
t) + V
d
C
base
C
s
sin(w
o
t) = V
d
+ K sin(w
o
t  f )
v
Cs,max
= V
d
+ K ; K sin(w
o
t  f ) = K sin(w
o
t) cos(f )  Kcos(w
o
t) sin(f )
Chapter 27 Problem Solutions
271. a. During turnoff of the GTO, I
o
communtates linearly to C
s
.
C
s
dv
C
dt
= I
o
t
t
fi
;
dv
C
dt
=
dv
AK
dt
=
I
o
t
C
s
t
fi
< 5x10
7
V/s
Maximum
dv
AK
dt
occurs at t
fi
. Solving for C
s
yields
C
s
> I
o
Î ˚
dv
AK
dt
1
=
500
5x10
7
= 10 microfarads
R
s
chosen on basis of limiting discharge current from C
s
to safe level when GTO
turns on. I
Cs,max
= I
AM
 I
o
 I
rr
. Assume i
rr
= 0.2 I
o
. Then
I
Cs,max
= 1000  500 100 = 400 A
R
s
=
500
400
≈ 1.3 ohms
Snubber recovery time = 2.3 R
s
C
s
= (2.3)(10
5
)(1.3) = 30 microseconds.
b. Power dissipated in snubber P
Rs
≈
f
sw
C
s
V
d
2
2
P
Rs
= (0.5)(10
3
)(10
5
)(500)
2
= 1.25 kW
272. L
s
di
A
dt
max
= V
d
; L
s
≈
500
3x10
8
≈ 1.7 microhenries.
Voltage across GTO at turnoff = V
d
+ I
o
R
s
: Assume I
o
R
s
= 0.2 V
d
R
s
=
(0.2)(500)
(500)
= 0.2 ohms.
273. v
Cs
(t) = V
d
 V
d
cos(w
o
t) + V
d
C
base
C
s
sin(w
o
t) = V
d
+ K sin(w
o
t  f )
v
Cs,max
= V
d
+ K ; K sin(w
o
t  f ) = K sin(w
o
t) cos(f )  Kcos(w
o
t) sin(f )
K sin(w
o
t) cos(f )  K cos(w
o
t) sin(f ) = V
d
C
base
C
s
sin(w
o
t)  V
d
cos(w
o
t)
K cos(f ) = V
d
C
base
C
s
and K sin(f ) = V
d
;
[ ]
Kcos(f )
2
+
[ ]
Ksin(f )
2
= K
2
= V
d
2
C
base
C
s
+ V
d
2
v
Cs,max
= V
d
+ K = V
d
+ V
d
1+
C
base
C
s
274. a. Equivalent circuit after diode reverse recovery.
L = 10 m H
R
s
C
s
200 V
+

i
L
i
L
(0
+
) = I
rr
; During reverse recovery L
di
R
dt
= 200 V
di
R
dt
=
I
rr
t
rr
=
200
10
5
= 2x10
7
A/sec ; I
rr
= (2x10
7
)(3x10
7
) = 6 A
b. v
Cs,max
= 500 V = 200 + 200 1+
C
base
C
s
1+
C
base
C
s
= 1.5 ;
C
base
C
s
= 1.5 ≈ 1.25
C
base
= (10
5
)
Î ˚
6
2
(200)
2
= 9 nF
C
s
=
9nF
1.25
≈ 7 nF
K sin(w
o
t) cos(f )  K cos(w
o
t) sin(f ) = V
d
C
base
C
s
sin(w
o
t)  V
d
cos(w
o
t)
K cos(f ) = V
d
C
base
C
s
and K sin(f ) = V
d
;
[ ]
Kcos(f )
2
+
[ ]
Ksin(f )
2
= K
2
= V
d
2
C
base
C
s
+ V
d
2
v
Cs,max
= V
d
+ K = V
d
+ V
d
1+
C
base
C
s
274. a. Equivalent circuit after diode reverse recovery.
L = 10 m H
R
s
C
s
200 V
+

i
L
i
L
(0
+
) = I
rr
; During reverse recovery L
di
R
dt
= 200 V
di
R
dt
=
I
rr
t
rr
=
200
10
5
= 2x10
7
A/sec ; I
rr
= (2x10
7
)(3x10
7
) = 6 A
b. v
Cs,max
= 500 V = 200 + 200 1+
C
base
C
s
1+
C
base
C
s
= 1.5 ;
C
base
C
s
= 1.5 ≈ 1.25
C
base
= (10
5
)
Î ˚
6
2
(200)
2
= 9 nF
C
s
=
9nF
1.25
≈ 7 nF
275. Use the circuit shown in problem 274.
C
s
= C
base
= (10
5
)
Î ˚
6
2
(200)
2
= 9 nF
R
s
= 1.3 R
base
= (1.3)
Î ˚
200
6
= 43 ohms
v
Cs,max
= (1.5)(200) = 300 V
276. P = W
R
f
sw
=
Î ˚
L
s
I
rr
2
+C
s
V
in
2
2
f
sw
W
R
= (0.5)(10
5
)(6)
2
+ (0.5)(9x10
9
)(200)
2
= 3.6x10
4
Joules
P = W
R
f
sw
= (3.6x10
4
)(2x10
4
) = 7.2 watts
277. a. BJT waveforms (t
rv
assumed to be zero for C
s
= 0)
I
o
i
Cs
t
t
f i
t
v
CE
V
d
C = 0
s
C > 0
s
0
0
Power dissipation for C
s
= 0 is P
c
=
V
d
I
o
t
fi
2
f
sw
275. Use the circuit shown in problem 274.
C
s
= C
base
= (10
5
)
Î ˚
6
2
(200)
2
= 9 nF
R
s
= 1.3 R
base
= (1.3)
Î ˚
200
6
= 43 ohms
v
Cs,max
= (1.5)(200) = 300 V
276. P = W
R
f
sw
=
Î ˚
L
s
I
rr
2
+C
s
V
in
2
2
f
sw
W
R
= (0.5)(10
5
)(6)
2
+ (0.5)(9x10
9
)(200)
2
= 3.6x10
4
Joules
P = W
R
f
sw
= (3.6x10
4
)(2x10
4
) = 7.2 watts
277. a. BJT waveforms (t
rv
assumed to be zero for C
s
= 0)
I
o
i
Cs
t
t
f i
t
v
CE
V
d
C = 0
s
C > 0
s
0
0
Power dissipation for C
s
= 0 is P
c
=
V
d
I
o
t
fi
2
f
sw
275. Use the circuit shown in problem 274.
C
s
= C
base
= (10
5
)
Î ˚
6
2
(200)
2
= 9 nF
R
s
= 1.3 R
base
= (1.3)
Î ˚
200
6
= 43 ohms
v
Cs,max
= (1.5)(200) = 300 V
276. P = W
R
f
sw
=
Î ˚
L
s
I
rr
2
+C
s
V
in
2
2
f
sw
W
R
= (0.5)(10
5
)(6)
2
+ (0.5)(9x10
9
)(200)
2
= 3.6x10
4
Joules
P = W
R
f
sw
= (3.6x10
4
)(2x10
4
) = 7.2 watts
277. a. BJT waveforms (t
rv
assumed to be zero for C
s
= 0)
I
o
i
Cs
t
t
f i
t
v
CE
V
d
C = 0
s
C > 0
s
0
0
Power dissipation for C
s
= 0 is P
c
=
V
d
I
o
t
fi
2
f
sw
P
c
=
(200)(25)(4x10
7
)
2
(2x10
4
) = 20 W
Power dissipation for C
s
= C
s1
P
c
= W
c
f
sw
; W
c
=
ı
0
t
fi
I
o
(1
t
t
fi
)
I
o
2C
s1
t
2
t
fi
dt =
V
d
I
o
t
fi
12
P
c
=
(200)(25)(4x10
7
)(2x10
4
)
12
= 3.3 watts
Factor of six reduction in the turnoff losses.
b. BJT losses increase at turnon only becaue of energy stored in C
s
being dissipated
in the BJT, but also because the time to complete turnon is extended as shown in
Fig. 2714a. This extended duration of traversal of the active region also increases
the turnon losses.
During the turnon interval, the collectoremitter voltage is given by (assuming
that the external circuit dominates the transient)
C
s1
dv
CE
dt
= 
di
C
dt
t  I
rr
; v
CE
(t) = V
d

di
C
dt
t
2
2C
s1
 I
rr
t
C
s1
Seting the expression for
v
CE
(t) equal to zero and solving for the time
D T = t
2
 (t
ri
+ t
rr
) (see Fig. 2714a) required for v
CE
to reach zero yields
D T = 
I
rr
di
C
/dt
+
Î ˚
I
rr
di
C
/dt
2
+
2V
d
C
s1
di
C
/dt
Note that D T = 0 if C
s1
= 0 which is consistent with the assumption that the
external circuit and not the BJT that dominates the turnon transient. Extra energy
disspated in the BJT at turnon due to C
s1
is thus
ı
0
D T
v
CE
(t)i
C
(t)dt = V
d
I
rr
D T +
Î ˚
V
d
2
di
C
dt

[I
o
+I
rr
]I
rr
2C
s1
D T
2

(I
o
+3I
rr
)
2C
s1
di
C
dt
D T
3
 Î ˚
di
C
dt
2
D T
4
8C
s1
The increase in the BJT loss is
Î ˚
ı
0
D T
v
CE
(t)i
C
(t)dt f
s
where f
s
is the switching
frequency. Numerical evaluation of D T gives D T = 0.29 m s (I
rr
= 10 A and C
s1
=
25 nF).
Evaluation of the loss gives 1.3x10
3
f
s
= 26.5 watts
278. a. D
s
shorts out the snubber resistance during the BJT turnoff. Hence C
s1
is
directly across the BJT as in problem 277a. Thus the loss reduction is the same as
in problem 277a.
b. Equivalent circuit during BJT turnoff after freewheeling diode reverse recovery
is shown below.
R
s
s
C
I + t
r r
di
C
dt
v
CE
+

v
C
+

v (0 ) = V
+
C
d
v
CE
= C
s
R
s
dv
C
dt
+ v
C ;
; C
s
dv
C
dt
=  I
rr

di
C
dt
t
Combining equations and solving for v
CE
(t) yields
v
CE
(t) = V
d
 I
rr
R
s

Î ˚
I
rr
C
s
+R
s
di
C
dt
t 
di
C
dt
t
2
2C
s
At t = D T, v
CE
= 0 and turnon is completed.
D T = 
I
rr
+R
s
C
s
di
C
dt
di
C
dt
+
Î ˚
I
rr
+R
s
C
s
di
C
dt
di
C
dt
2
+
2C
s
di
C
dt
[V
d
I
rr
R
s
]
D T goes to zero when R
s
=
V
d
I
rr
. hence there is no increase in power dissipation
in the BJT due to the presence of C
s
.
The increase in the BJT loss is
Î ˚
ı
0
D T
v
CE
(t)i
C
(t)dt f
s
where f
s
is the switching
frequency. Numerical evaluation of D T gives D T = 0.29 m s (I
rr
= 10 A and C
s1
=
25 nF).
Evaluation of the loss gives 1.3x10
3
f
s
= 26.5 watts
278. a. D
s
shorts out the snubber resistance during the BJT turnoff. Hence C
s1
is
directly across the BJT as in problem 277a. Thus the loss reduction is the same as
in problem 277a.
b. Equivalent circuit during BJT turnoff after freewheeling diode reverse recovery
is shown below.
R
s
s
C
I + t
r r
di
C
dt
v
CE
+

v
C
+

v (0 ) = V
+
C
d
v
CE
= C
s
R
s
dv
C
dt
+ v
C ;
; C
s
dv
C
dt
=  I
rr

di
C
dt
t
Combining equations and solving for v
CE
(t) yields
v
CE
(t) = V
d
 I
rr
R
s

Î ˚
I
rr
C
s
+R
s
di
C
dt
t 
di
C
dt
t
2
2C
s
At t = D T, v
CE
= 0 and turnon is completed.
D T = 
I
rr
+R
s
C
s
di
C
dt
di
C
dt
+
Î ˚
I
rr
+R
s
C
s
di
C
dt
di
C
dt
2
+
2C
s
di
C
dt
[V
d
I
rr
R
s
]
D T goes to zero when R
s
=
V
d
I
rr
. hence there is no increase in power dissipation
in the BJT due to the presence of C
s
.
279. a. Proposed snubber circuit configuration shown below.
1
2
3
4
L
s
R
s
C
s
I
o
2 V
s
Equivalent circuit swith SCRs 3 & 4 on and 1&2 going off or viceversa.
Continuous flow of load current formces SCRs 1 & 2 to remain on past the time
of natural commutation (when v
s
(t) goes through zero and becomes negative).
L
s
R
s
C
s
2 V
s
3 or 4
1 or 2
I
r r
With 3 & 4 on, 1 & 2 are off, and effectively in parallel with the R
s
C
s
snubber.
same is true when 1 & 2 are on and 3 & 4 are off. Thus the R
s
C
s
snubber
functions as a turnoff snubber.
b. w L
s
=
0.05V
s
I
a1
; worst case situation (maximum reverse voltage across SCR
which is turning off) occurs when SCR which is turning on is triggered with a
delay angle of 90°. During reverse recovery of SCR1, L
s
di
dt
= 2 V
s
and
di
dt
=
I
rr
t
rr
. Solving for I
rr
yields
I
rr
=
2w t
rr
I
a1
0.05
; C
base
= L
s
Î ˚
I
rr
2V
s
2
=
w I
a1
t
rr
2
0.05V
s
Smallest overvoltage occurs when C
s
= C
base
. Putting in numerical values
C
s
= 0.9933 I
a1
m F
R
base
=
2V
s
I
rr
=
0.05V
s
w t
rr
I
a1
=
(0.05)(230)
(377)(10
5
)I
a1
=
3050
I
a1
ohms
R
s,opt
= 1.3 R
base
=
4000
I
a1
ohms
c. Peak line voltage = 2 (230) = 322 V
Smallest overvoltage = (1.5)(322) = 483 V which occurs when C
s
= C
base
and R
s
= 1.3 R
base
. For I
a1
= 100 A
R
s,opt
= 1.3 R
base
=
4000
100
= 40 ohms ; C
s
= (0.0033)(100) = 0.33 m F
2710. The resistor in the BJT/MOSFET snubber must be shorted out during the device
turnoff so that the snubber capacitance is in parallel with the device. The uncharged
capacitor delays the buildup of the large V
d
voltage across the BJT/MOSFET until
most of the current has been diverted from the switch. The snubber diode is forward
biased during turnoff, thus providing the shorting of the snubber resistor as required.
The turnoff of the thyristor limits overvoltages arising from the interruption of current
through the stray inductance in series with the thyristor. Lowest overvoltages are
obtained when R
s
= 1.3 R
base
and C
s
= C
base.
Overvoltages are 70% larger if R
s
is
zero. Hence a diode in parallel with the resistor is not desirable.
2711. a. Check
dv
DS
dt
at turnoff;
dv
DS
dt
=
V
d
t
rv
; t
rv
< 0.75 microseconds
dv
DS
dt
>
700
7.5x10
7
= 930 V/m s > 800 V/m s limit so snubber is needed.
Not enough information available to check on power dissipation or overcurrents.
di
dt
=
I
rr
t
rr
. Solving for I
rr
yields
I
rr
=
2w t
rr
I
a1
0.05
; C
base
= L
s
Î ˚
I
rr
2V
s
2
=
w I
a1
t
rr
2
0.05V
s
Smallest overvoltage occurs when C
s
= C
base
. Putting in numerical values
C
s
= 0.9933 I
a1
m F
R
base
=
2V
s
I
rr
=
0.05V
s
w t
rr
I
a1
=
(0.05)(230)
(377)(10
5
)I
a1
=
3050
I
a1
ohms
R
s,opt
= 1.3 R
base
=
4000
I
a1
ohms
c. Peak line voltage = 2 (230) = 322 V
Smallest overvoltage = (1.5)(322) = 483 V which occurs when C
s
= C
base
and R
s
= 1.3 R
base
. For I
a1
= 100 A
R
s,opt
= 1.3 R
base
=
4000
100
= 40 ohms ; C
s
= (0.0033)(100) = 0.33 m F
2710. The resistor in the BJT/MOSFET snubber must be shorted out during the device
turnoff so that the snubber capacitance is in parallel with the device. The uncharged
capacitor delays the buildup of the large V
d
voltage across the BJT/MOSFET until
most of the current has been diverted from the switch. The snubber diode is forward
biased during turnoff, thus providing the shorting of the snubber resistor as required.
The turnoff of the thyristor limits overvoltages arising from the interruption of current
through the stray inductance in series with the thyristor. Lowest overvoltages are
obtained when R
s
= 1.3 R
base
and C
s
= C
base.
Overvoltages are 70% larger if R
s
is
zero. Hence a diode in parallel with the resistor is not desirable.
2711. a. Check
dv
DS
dt
at turnoff;
dv
DS
dt
=
V
d
t
rv
; t
rv
< 0.75 microseconds
dv
DS
dt
>
700
7.5x10
7
= 930 V/m s > 800 V/m s limit so snubber is needed.
Not enough information available to check on power dissipation or overcurrents.
di
dt
=
I
rr
t
rr
. Solving for I
rr
yields
I
rr
=
2w t
rr
I
a1
0.05
; C
base
= L
s
Î ˚
I
rr
2V
s
2
=
w I
a1
t
rr
2
0.05V
s
Smallest overvoltage occurs when C
s
= C
base
. Putting in numerical values
C
s
= 0.9933 I
a1
m F
R
base
=
2V
s
I
rr
=
0.05V
s
w t
rr
I
a1
=
(0.05)(230)
(377)(10
5
)I
a1
=
3050
I
a1
ohms
R
s,opt
= 1.3 R
base
=
4000
I
a1
ohms
c. Peak line voltage = 2 (230) = 322 V
Smallest overvoltage = (1.5)(322) = 483 V which occurs when C
s
= C
base
and R
s
= 1.3 R
base
. For I
a1
= 100 A
R
s,opt
= 1.3 R
base
=
4000
100
= 40 ohms ; C
s
= (0.0033)(100) = 0.33 m F
2710. The resistor in the BJT/MOSFET snubber must be shorted out during the device
turnoff so that the snubber capacitance is in parallel with the device. The uncharged
capacitor delays the buildup of the large V
d
voltage across the BJT/MOSFET until
most of the current has been diverted from the switch. The snubber diode is forward
biased during turnoff, thus providing the shorting of the snubber resistor as required.
The turnoff of the thyristor limits overvoltages arising from the interruption of current
through the stray inductance in series with the thyristor. Lowest overvoltages are
obtained when R
s
= 1.3 R
base
and C
s
= C
base.
Overvoltages are 70% larger if R
s
is
zero. Hence a diode in parallel with the resistor is not desirable.
2711. a. Check
dv
DS
dt
at turnoff;
dv
DS
dt
=
V
d
t
rv
; t
rv
< 0.75 microseconds
dv
DS
dt
>
700
7.5x10
7
= 930 V/m s > 800 V/m s limit so snubber is needed.
Not enough information available to check on power dissipation or overcurrents.
b.
dv
DS
dt
=
I
o
C
s
= 400 V/m s ; C
s
=
100
4x10
8
= 0.25 m F
Choose R
s
to limit total current I
D
to less than 150 A
150 A = 100 +
700
R
s
; R
s
=
700
150100
= 14 ohms
Check snubber recovery time = 2.3 R
s
C
s
= (2.3)(14)(2.5x10
7
) = 8 m s
Off time of the IGBT is 10 microseconds which is greater than the snubber
recovery time. Hence choice of R
s
is fine.
Chapater 28 Problem Solutions
281. Schematic of drive circuit shown below.
R
G
V
GG+
V
GG
V
DS
100 A
100 V
+

v
DS
(t) waveform same as in problem 222.
During MOSFET turnon
dv
DS
dt
=
V
d
t
fv
< 500 V/m s
From problem 222,
V
d
t
fv
=
Î ˚
V
GG+
V
GSth

I
o
g
m
R
G
C
gd
During MOSFET turnoff,
dv
DS
dt
=
V
d
t
rv
< 500 V/m s
From problem 232,
V
d
t
rv
=
Î ˚
V
GG
+V
GSth
+
I
o
g
m
R
G
C
gd
g
m
=
I
o
V
GS
V
GSth
=
60
74
= 20 A/V
Estimate of R
G
for MOSFET turnon:
5x10
8
V/sec >
V
GG+
4
100
20
(R
G
)(4x10
10
)
; V
GG+,min
= V
GSth
+
I
o
g
m
= 4 +
100
20
= 9 V
Choose V
GG+
= 15 V to insure that MOSFET driven well into ohmic range to
minimize onstate losses.
R
G
>
159
(4x10
10
)(5x10
8
)
= 30 ohms
Estimate of R
G
at MOSFET turnoff:
5x10
8
V/sec >
V
GG
+4+
100
20
(R
G
)(4x10
10
)
Choose V
GG
= 15 V to insure that MOSFET is held in offstate and to minimize
turnoff times.
R
G
>
15+9
(4x10
10
)(5x10
8
)
= 115 ohms
Satisfy both turnon and turnjoff requirements by choosing V
GG+
= V
GG
= 15 V and R
G
> 115 ohms.
282. a. Circuit diagram shown below.
R
G1
R
G2
Q
s
T
sw
D
f
+

I
o
= 200 A
V
d
= 1000 V
When FCT is off we need V
KG
= (1.25)
1000
40
= 31.25 V = (1000)
R
G2
R
G1
+R
G2
Now R
G1
+ R
G2
= 10
6
ohms so 31.25 = (1000) (10
6
) R
G2
R
G2
= 31.25 kW and R
G1
= 969 kW
Choose V
GG+
= 15 V to insure that MOSFET driven well into ohmic range to
minimize onstate losses.
R
G
>
159
(4x10
10
)(5x10
8
)
= 30 ohms
Estimate of R
G
at MOSFET turnoff:
5x10
8
V/sec >
V
GG
+4+
100
20
(R
G
)(4x10
10
)
Choose V
GG
= 15 V to insure that MOSFET is held in offstate and to minimize
turnoff times.
R
G
>
15+9
(4x10
10
)(5x10
8
)
= 115 ohms
Satisfy both turnon and turnjoff requirements by choosing V
GG+
= V
GG
= 15 V and R
G
> 115 ohms.
282. a. Circuit diagram shown below.
R
G1
R
G2
Q
s
T
sw
D
f
+

I
o
= 200 A
V
d
= 1000 V
When FCT is off we need V
KG
= (1.25)
1000
40
= 31.25 V = (1000)
R
G2
R
G1
+R
G2
Now R
G1
+ R
G2
= 10
6
ohms so 31.25 = (1000) (10
6
) R
G2
R
G2
= 31.25 kW and R
G1
= 969 kW
b. MOSFET characteristics
 large onstate current capability
 low R
on

low BV
DSS
(BV
DSS
of 50100 V should work)
Chapter 29 Problem Solutions
291. Assume T
s
= 120 °C and T
a
= 20 °C.
R
q ,rad
≈
0.12
A
; A in m
2
; Eq. (2918)
R
q ,conv
≈
1
(1.34)(A)
Î ˚
d
vert
D T
1/4
; Eq. (2920)
R
q ,conv
≈
0.24
A
[d
vert
]
1/4
for D T = 100 °C.
A cube having a side of length d
vert
has a surface area A = 6 [d
vert
]
2
R
q ,conv
≈
0.4
[d
vert
]
1.75
; R
q ,rad
≈
0.02
[d
vert
]
2
R
q ,sa
= net surfacetoambient thermal resistance =
R
q ,conv
R
q ,rad
R
q ,conv
+R
q ,rad
R
q ,sa
=
0.04
[d
vert
]
1.75
+2[d
vert
]
2
Heat Sink # 1 2 3 5 6
Volume [m]
3
7.6x10
5
10
4
1.8x10
4
2x10
4
3x10
4
d
v
= (vol.)
1/3
[m]
0.042 0.046 0.057 0.058 0.067
A = 6 [d
v
]
2
[m]
2 0.011 0.013 0.019 0.002 0.027
d
v
1.75 0.004 0.046 0.0066 0.0069 0.0088
d
v
2 0.0018 0.0021 0.0032 0.0034 0.0045
R
q ,sa
[°C/W] 5.3 4.5 3.1 2.9 2.3
R
q ,sa
(measured) 3.2 2.3 2.2 2.1 1.7
Heat Sink # 7 8 9 10 11 12
Volume [m]
3
4.4x10
4
6.810
4
6.1x10
4
6.3x10
4
7x10
4
1.4x10
3
d
v
= (vol.)
1/3
[m]
0.076 0.088 0.085 0.086 0.088 0.11
A = 6 [d
v
]
2
[m]
2 0.034 0.046 0.043 0.044 0.047 0.072
d
v
1.75 0.011 0.014 0.013 0.014 0.014 0.021
d
v
2 0.0058 0.0078 0.0071 0.0073 0.0078 0.012
R
q ,sa
[°C/W] 1.8 1.4 1.5 1.4 1.3 0.9
R
q ,sa
(measured) 1.3 1.3 1.25 1.2 0.8 0.65
Heat sink #9 is relatively large and cubical in shape with only a few cooling fins.
Heat sink #9 is small and flat with much more surface area compared to its volume.
Large surfacetovolume ratios give smaller values of R
q ,sa
.
292. R
q ,conv
≈
0.24
A
[d
vert
]
1/4
for D T = 100 °C ; From problem 291
R
q ,conv
≈ 24 0 [d
vert
]
1/4
for D T = 100 °C and A = 10 cm
2
= 10
3
m
2
d
vert
R
q ,conv
1 cm 76 °C/W
5 cm 113 °C/W
12 cm 141 °C/W
20 cm 160 °C/W
Volume [m]
3
4.4x10
4
6.810
4
6.1x10
4
6.3x10
4
7x10
4
1.4x10
3
d
v
= (vol.)
1/3
[m]
0.076 0.088 0.085 0.086 0.088 0.11
A = 6 [d
v
]
2
[m]
2 0.034 0.046 0.043 0.044 0.047 0.072
d
v
1.75 0.011 0.014 0.013 0.014 0.014 0.021
d
v
2 0.0058 0.0078 0.0071 0.0073 0.0078 0.012
R
q ,sa
[°C/W] 1.8 1.4 1.5 1.4 1.3 0.9
R
q ,sa
(measured) 1.3 1.3 1.25 1.2 0.8 0.65
Heat sink #9 is relatively large and cubical in shape with only a few cooling fins.
Heat sink #9 is small and flat with much more surface area compared to its volume.
Large surfacetovolume ratios give smaller values of R
q ,sa
.
292. R
q ,conv
≈
0.24
A
[d
vert
]
1/4
for D T = 100 °C ; From problem 291
R
q ,conv
≈ 24 0 [d
vert
]
1/4
for D T = 100 °C and A = 10 cm
2
= 10
3
m
2
d
vert
R
q ,conv
1 cm 76 °C/W
5 cm 113 °C/W
12 cm 141 °C/W
20 cm 160 °C/W
B
B
B
B
0
20
40
60
80
100
120
140
160
0 2 4 6 8 10 12 14 16 18 20
q
°C/W
d
vert
[cm]
R
,conv
293. R
q ,conv
≈
1
(1.34)(A)
Î ˚
d
vert
D T
1/4
; Eq. (2920)
R
q ,conv
≈ 353 [D T]
.25
A = 10 cm
2
and d
vert
= 5 cm
D T R
q ,conv
60 °C 127 °C/W
80 °C 118 °C/W
100 °C 112 °C/W
120 °C 107 °C/W
B
B
B
B
0
20
40
60
80
100
120
140
160
0 2 4 6 8 10 12 14 16 18 20
q
°C/W
d
vert
[cm]
R
,conv
293. R
,conv
≈
1
(1.34)(A)
˚
d
vert
T
1/4
; Eq. (2920)
R
,conv
≈ 353 [ T]
.25
A = 10 cm
2
and d
vert
= 5 cm
T R
,conv
60 °C 127 °C/W
80 °C 118 °C/W
100 °C 112 °C/W
120 °C 107 °C/W
B
B
B
B
0
20
40
60
80
100
120
140
60 70 80 90 100 110 120
R
,conv
°C/W
D T [°C]
294. R
,rad
=
T
5.1A
T
s
100
4

T
a
100
4
; Eq. (2917)
R
,rad
= 196
120T
a
(° C)
˚
239
˚
T
a
(° K)
100
4
; A = 10 cm
2
and T
s
= 120 °C
T
a
R
,rad
0 °C 128 °C/W
10 °C 123 °C/W
20 °C 119 °C/W
40 °C 110 °C/W
B
B
B
B
0
20
40
60
80
100
120
140
60 70 80 90 100 110 120
R
,conv
°C/W
D T [°C]
294. R
,rad
=
T
5.1A
T
s
100
4

T
a
100
4
; Eq. (2917)
R
,rad
= 196
120T
a
(° C)
˚
239
˚
T
a
(° K)
100
4
; A = 10 cm
2
and T
s
= 120 °C
T
a
R
,rad
0 °C 128 °C/W
10 °C 123 °C/W
20 °C 119 °C/W
40 °C 110 °C/W
B
B
B
B
0
20
40
60
80
100
120
140
0 5 10 15 20 25 30 35 40
T
a
[°C]
R
,rad
[ °C/W]
q
295. R
,rad
=
T
5.1A
T
s
100
4

T
a
100
4
; Eq. (2917)
R
,rad
= 196
T
s
(° C)40
˚ ˚
T
s
(° K)
100
4
96
; A = 10 cm
2
and T
a
= 40 °C
T
s
R
,rad
80 °C 114 °C/W
100 °C 120 °C/W
120 °C 110 °C/W
140 °C 101 °C/W
B
B
B
B
0
20
40
60
80
100
120
140
0 5 10 15 20 25 30 35 40
T
a
[°C]
R
,rad
[ °C/W]
q
295. R
,rad
=
T
5.1A
T
s
100
4

T
a
100
4
; Eq. (2917)
R
,rad
= 196
T
s
(° C)40
˚ ˚
T
s
(° K)
100
4
96
; A = 10 cm
2
and T
a
= 40 °C
T
s
R
,rad
80 °C 114 °C/W
100 °C 120 °C/W
120 °C 110 °C/W
140 °C 101 °C/W
B
B
B
B
0
20
40
60
80
100
120
80 90 100 110 120 130 140
T
s
[ °C]
R
q ,rad
[ °C/W]
296. P
MOSFET,max
=
150° C50° C
1° C/W
= 100 W ; 100 W = 50 + 10
3
f
s
Solving for f
s
yields f
s
= 50 kHz
297. P
MOSFET
= 50 +
10
3
• 2.5x10
4
= 75 W
R
,ja
= R
,jc
+ R
,ca
=
150° C35° C
75W
= 1.53 °C/W
R
,ca
= 1.53  1.00 = 0.53 °C/W
B
B
B
B
0
20
40
60
80
100
120
80 90 100 110 120 130 140
T
s
[ °C]
R
q ,rad
[ °C/W]
296. P
MOSFET,max
=
150° C50° C
1° C/W
= 100 W ; 100 W = 50 + 10
3
f
s
Solving for f
s
yields f
s
= 50 kHz
297. P
MOSFET
= 50 +
10
3
• 2.5x10
4
= 75 W
R
q ,ja
= R
q ,jc
+ R
q ,ca
=
150° C35° C
75W
= 1.53 °C/W
R
q ,ca
= 1.53  1.00 = 0.53 °C/W
B
B
B
B
0
20
40
60
80
100
120
80 90 100 110 120 130 140
T
s
[ °C]
R
q ,rad
[ °C/W]
296. P
MOSFET,max
=
150° C50° C
1° C/W
= 100 W ; 100 W = 50 + 10
3
f
s
Solving for f
s
yields f
s
= 50 kHz
297. P
MOSFET
= 50 +
10
3
• 2.5x10
4
= 75 W
R
q ,ja
= R
q ,jc
+ R
q ,ca
=
150° C35° C
75W
= 1.53 °C/W
R
q ,ca
= 1.53  1.00 = 0.53 °C/W
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2k ÌT .191. Intrinsic temperature is reached when the intrinsic carrier density ni equals the lowest doping density in the pn juinction structure (the nside in this problem).300˝˙ Î Ó i ˛˚ Solving for Ti using Eg = 1.1 eV.4x1023 [1/°K] yields Ti = 262 °C or 535 °K. k = 1. Thus È q Eg 1 1 ˘ Ï ¸ ni(Ti) = Nd = 1014 = 1010 exp Í . .
5 ohmcm (1.6x10 n d 1 1 Pside resistivity rp = q m N = = 0.6x1019)(500)(1018) .013 ohmcm p a (1.192. 1 1 Nside resistivity rn = q m N = 19)(1500)(1014) = 43.
193. Material is ntype with Nd = 1013 cm3 >> ni = 1010 cm3. 2 ni n = Nd = 1013 cm3 . p = N d 1020 = 1013 = 107 cm3 . Hence use approximate formulas given in Chapter 19.
2 °K g DT = 305.300˝˙ Î ˚ Ó ˛ 2 2 2 ni [300] = ni [300 + T] q Eg 300 Solving for T yields T = (q E . 2po = 2 ni [300 + T] Nd .300 = 5.2k ÌT . .k 300 ln(2)) = 305. po = 2 ni [300] Nd .194.2 .2 °K. È q Eg Ï1 1 ¸˘ 2x1010 = 1010 exp Í .
q V1 I1 = Is exp( k T q V1 + dV . kT dV = q ln(10) = 60 mV . 10 I1 = Is exp( k T ) .195.
. xp(0) = depletion layer width on pside at zero bias. (a) xn(0) = depletion layer width on nside at zero bias.196.
Maximum electric at zero bias given by 2 fc (2) (0.026 ) = 5x1011 È Dpt˘ ˙ 2 Í Dnt Is = q ni Í N t + N t ˙ A Î a d ˚ È ˘ Í (38)(106) (13)(106) ˙ 2 ˙ = (1.54 eV (d) C(V) A = Wo C(0) A e V 1+f c . 199b.7x109 F/cm2 2.54 qV qV 0.xn(0) + xp(0) = Wo = 2 e fc (Na + Nd) q Na Nd (1) È 1014 1015˘ k T È Na Nd˘ Í ˙ ˙ = 0.7)(8.8x104) o (c) From part a) fc = 0. .7x1014 A .9x1014) C(50) = = 3. exp( kT ) = exp (0.6x1019)(1020) Í Î (1015)(106) + (1014)(106)˚ (2) I = (6.54) = 3. xp(0) = 0. (11. xn(0) = 2.7)(8.8x1010 F/cm2 A 50 2.54 eV Î ni ˚ Conservation of charge: q Na xp = q Nd xn (2) Solving (1) and (2) simultaneously gives using the numerical values given in the problem statement gives: W o = 2.9x1014) = = 3.7 (e) I = Is exp(kT ) .55 microns .026 ln Í fc = q ln Í 2 ˙ Î 1020 ˚ = 0.7x1014 )(5x1011) = 34 mA Is = 6. C(V) = spacecharge capacitance at reverse voltage V.8x104 (11.8 microns .25 microns (b) Electric field profile triangularshaped as shown in Fig.8x104 1 + 0.900 V/cm Emax = W = (2.
6x1019) (1. (194).2)(2) = 52.8x1013 ) R(250 °C) ≈ (26. r(250 °C) ≈ q m n + q m p A n o p o 1 = = 26. (192) and (193) exactly for no and po rather than using equations similiar to Eq.02 Resistance R = A .2 Wcm .7)(2) = 83.8x1027 13 14 = 5. ni[523] = 1010 exp Í . Thus we should solve Eqs.6x1013 which is an appreciable fraction of Nd = 1014.6x103) = 7.7 Wcm R(25 °C) = (41. rL L 0. Putting in numerical values yields o Nd ˚ ˘ (4)(7. resistance is R(250 °C) = r(250 ° C) L 1 .6x10 = 41. Solving Eqs. Nd = 1014 >> ni so r = q m N = 19)(1500)(1014 ) n d (1.4 ohms È (1.6x1019)(1500)(1. (1.6x1013)2 ˙ ˙ = 1.4x1023) Ó523 ˛˚ (1010)(7. A = 0.6x1019)(500)(5.4 ohms . (192) and (193) for Nd >> Na yields Nd È no = 2 Í1 + Î È 1014 Í no = 2 Í 1 + Î po = 2˘ 2 4 ni ni 1 + 2 ˙ and po = n .300˝˙ = Î (2)(1.197.01 = 2 cm1 1 1 At 25 °C.8x10 10 Assuming temperatureindependent mobilities (not a valid assumption but no other information is given in text or the problem statement).4x1014 ) + (1.4x1014 and 1+ 14)2 ˚ (10 5.1) Ï 1 1 ¸˘ Ì At 250 °C (523 °K).
2 e (Na + Nd) EBD (11.6x1019)(1015)(1014) = 3.7)(8.198.340 volts .9x1014)(1015 + 1014)(3x105)2 BVBD = = 2 q Na Nd (2)(1.
(1913). . Eq. 2 4 fc BVBD 2 2 Emax = EBD ≈ 2 W o fc 2 4 BVBD Wo .199. Eq. or f = 2 c EBD 2 2 4 BVBD W o BVBD Wo . Inserting f = and taking W 2(BVBD) = fc 2 c EBD 2 BVBD the square root yields W (BVBD) ≈ 2 EBD. (1911) .
1910. Ln = Dn t = (39)(106) = 62 microns . Lp = Dp t = (13)(106) = 36 microns .
I2 = q ni A N t exp(k T ) d 1 d 2 I2 I1 = 2 = t1 t2 . Assume a onesided step junction with Na >> Nd Dp t1 Dp t2 qV 2 qV 2 I1 = q ni A N t exp(k T ) .1911. Thus 4 t2 = t1 .
6x1019)(1010) (500)(1500) = 2. np = ni . Solving for n yields n = ni p = 1010 1500 10 3 10 500 = 1. Thus minimum conductivity realized when silicon is slightly ptype.q mp n2 + q mn . Inserting p and n back into the equation for conductivity yields smin = 2 q ni mp mn .1912. n = 10 500 9 3 1500 = 6x10 cm . Putting in numerical values smin = (2)(1.7x10 cm . Combining yeilds s = q mp n + q mn n 2 mp mn ni ds mn and p = ni mp dn = 0 = .8x106 mhoscm . 2 ni 2 s = q mp p + q mn n .
3x1017 1. W(2500 V) = (105)(2500) = 250 Nd = BV BD .201. microns 1.3x1017 = 2500 = 5x1013 cm3 .
Hence this must be a punchthrough structure and Eq. (209) applies. Drift region length of 50 microns is much less than the 250 microns found in the previous problem (201) for the same drift region doping density.7)(8.(1.202.9x1014) .6x10 )(5x10 )(5x10 ) = 900 V BVBD = (2x10 (2)(11. 19 13 3 2 5)(5x103) .
Wd 5x103 K1 = q m A n = o b (1. Von = Vj + Vdrift . (2016) with I = forward bias current through the diode.6x109 A 13)(2x106) (5x10 Vd = K1 I + K2 (I)2/3 Eq.5x104 = 1.6x1019)(2)(1010)2 (13)(2x106) Evaluating Is yields = 1. For onesided step junction Is = N t Î s˚ d o (1.7x104 4 3 Wd (5x103)4 = 3 2 (1.6x1019)2 (900)3 (1017)2 (2)2 (2x106) q2 mo nb A2 to .6x1019)(900)(2)(1017) 3 K2 = = 7. 2 q A ni Lp kT È I˘ .203. Vj = q ln Í I ˙ .
59 0.65 0.001 0.033 0.68 0.4 0.6 1.Von in volts 1.53 0.4 I 0A 1 10 100 1000 3000 Vj 0V 0.8 0.2 0 1 10 100 1000 10000 Forward current in amperes • • • • • .6 0.2 1 0.59 0.96 1.74 Vdrift 0V 0.53 0.25 0.67 Von 0V 0.71 0.41 1.005 0.
a) L 1 Von(t) = Rdrift I(t) >> Vj ≈ 1 V .5x103 r= 19)(1500)(5x1013) = 85 ohmcm .5x103) = 0.25 t2] .5x108 t } = 53[t . A = 2 (1.6x10 Rdrift = (85)(2.0.21)(2. Rdrift (t) = 0.5x107 t]} { 2.5x107 t] Von(t) = {0.2.21 ohms .3x107 t Volts .204.2.5x108 t ) = 5. t in microseconds .21[1 . r = q m N n d 3 L 5x10 1 = 2.21[1 .3x107)(4x106) = 212 volts b) Von(t) = Rdrift (t) I(t) . 0 < t < 4 microseconds Von(4 ms) = (5.5x108 t . Rdrift = r A . 0 < t < 4 microseconds Von(t) = (0. I(t) = 2.
5 1 1.5 4 .5 3 3.250 200 Von in volts No carrier injection 150 100 50 With carrier injection 0 0 0.5 2 2.
5x108 trr = .5x108 2 t IF 12 2 = 4x1012(2000)2 = 16 ms trr = diR/dt . IF 2000 toff = trr + t3 = trr + di /dt = trr + = trr + 8 ms R 2.6x105)(2x103) = 16 ms .205. t = 4x10 (BVBD) (2)(1. toff = 8 ms + 16 ms = 24 ms 2.
Assume a nonpunchthrough structure for the Schottky diode.3x1017 = 150 = 8.3x1017 Nd = BV BD 1. 1.206.7x1014 cm3 W d = 105 BVBD = (105) (150) = 15 microns .
207. Vdrift = (100 A) (Rdrift) = 2 V .42 cm2 (1.02 ohms .02 = = 0. Rdrift = 0. 0.6x1019)(1500)(1015)(2x102) 2x103 1 L q mn Nd A A = .
9x10 ) = N = 3. (209) to solve for Nd .4x1014 cm3 = [(2x10 d (1.6x1019)(2x103)2 .300] (2)(11.BVBD] Í 2˙ Í Î q Wd˚ 14 5)(2x103) .7)(8. È 2e ˘ ˙ Use Eq.208. Nd = [EBD Wd .
Derived from Eqs. (1912).1 . and (1913) npt e EBD W d(pt) = q N pt È Í + Í1 _ Î 2 q Npt BVBD˘ ˙ 1˙ 2 ˚ e EBD q Npt Nnpt 2 BVBD q Nnpt 2 BVBD Npt 2 q Npt BVBD = eE = eE 2 BD Nnpt EBD BD EBD Nnpt e EBD Npt Npt 1 = W (npt) Wd(npt) N =x= N d npt npt 1 . Wd(pt) = Wd(npt) x [ 1 _ 1 . Nnpt = Nd of nonpunchthrouth (npt) diode Npt = Nd of punchthrough (pt) diode e EBD W d(npt) = q N .x] + If Npt << Nnpt (x << 1) Wd(pt) ≈ 0. Wd(pt) = 0. (2010) 1 + Limit of x [ 1 _ 1 .x] Nnpt Nnpt q mn Npt q mn Npt W d(npt) 1 R 1 [1 .e.x ] q mn Nnpt x2 npt x2 ˘ 2 1 1 .x] = 1 W d(npt) x [ 1 1 .x ] = A [1 .x ] + ˚ 2 1x x 2x d È 1 Í dx Î x2 8 8 Solving for x yields x = 9 i.75 Wd(npt) .5 for the minus root. R A pt = = 1 W d(npt) x [ 1 1 . W d(npt) R A npt = q mn Nnpt W d(pt) R = qm N A pt n pt .x ˙ = 0 = 3 [1 . (1911).x] as x approaches is infinite for the plus root and 0.1 .5 Wd(npt) .209. Hence the minus root is the correct choice to use. Eq.1 . . Npt = 9 Nnpt .
84 A npt .R R A npt = 0.
017 cm2 (11. Solve by successive approximation .67 . Depletionlayer d width Wd(0) set by breakdown voltage. eA Cjo = W (0) .9x1014)(1.7 ≈ 1 mm = (105)(150) = 15 mm .67 pn 0.011 mF .07) Schottky diode Cjo = 104 ≈ 11 nF = 0. Wd(0) same for both diodes. 2 volts = A (300) + 2.7x1014 cm3 1.6x1019)(1500)(8. Eq. Nd = = 8.5x103)4 2 (1.2010. Vdrift = 2 volts = q m N A I n d Schottky F Drift region doping density Nd same for both diodes.5x103)(300) ASchottky = = 1.07 cm2 (2)(1.7)(8.7) 150 1 + 0. Area A determined by onstate voltage and current.333 .67 (300)0. (2016) W d(150) 1.4x104 (Apn)0.00154 (Apn) Apn ≈ 0. W d(150) Schottky diode area .3x1017 150 (1.7x1014) PN junction diode area: Vdrift = 2 volts = K1 IF + K2 (IF)2/3 .5x103 K1 = q m A n = o pn b (1. Apn = 0.6x1019)2 (900)3 (1017)2 (Apn) (2x106) 104 K2 = 2.4x104 (Apn)0.015 + 0.6x1019)(900)(Apn)(1017) 3 K2 = 4 W d(150) = 2 m3 n2 A2 t q o b pn o 3 104 = A pn (1. W d(150) = Wd(0) W d(0) = 15 (150)/(0.
PN junction diode Cjo = (11.9x1014)(0.7)(8.017) ≈ 180 pF 104 .
6 0.1 0 0.2011.9 0. BVcyl BVp 1 1 = 2 r2 (1 + r ) ln (1 + r ) .4 0.5 0.2r BVcyl / BVp 1 0.7 0.3 0.1 1 r = R/(2W n ) 10 • • • • • • • • • .2 0.8 0.
95 . BVcyl BVp 950 R = 1000 = 0. From graph in problem 2011.2012. r ≈ 6 = 2 W n R ≈ 12 Wn .
5 0.2 0.3 0.9 0.211.6 0. BVCBO BVCBO .4 0.1 0 1 • • •• * •• * * * ** * • * PNP • * NPN • • • •• • * * * ** * 10 100 . PNP BJT . BVCEO = NPN BJT .7 • * • * • BVCEO BVCBO 0.8 0. BVCEO = b 1/6 b 1/4 1J B 0.
212. The flow of large reverse base currents when emitter current is still flowing in the forward direction will lead to emitter current crowding towards the center of the emitter. 218b. When emitteropen switching is used. This accenuates the possibility of second breakdown. . there is no emitter current and thus no emitter current crowding and second breakdown is much less likely to occur. See Fig.
213. a) Idealized BJT current and voltage waveforms in stepdown converter .
fs = T ı 0 T 1 40 Eon = VCE.td.T/2 i (t) C V (t) CE V I d o t d.2x103 Joules .off t rv t fi 1 T 1 BJT power dissipation Pc = T Û vCE(t) iC(t) dt = {Eon + Esw }fs .on Io {2 + td.on} ≈ (2)(40) 2 f = f Joules s s Esw = Eri + Efv + Erv + Efi Eri = Vd Io tri 2 = (100)(40)(2x107) = 4x104 Joules 2 Vd Io tfv Efv = 2 Vd Io trv Erv = 2 Efi = Vd Io tfi 2 (100)(40)(1x107) = = 2x104 Joules 2 (100)(40)(1x107) = = 2x104 Joules 2 (100)(40)(2x107) = = 4x104 Joules 2 40 Esw = 1.2x103 fs s .2x103] fs = 40 + 1.off .on t ri t fv t d. Pc = [ f + 1.
2x103 .2x103 fs.P c 80 [watts] 40 0 33 kHz b) Tj = Rqja Pc + Ta .max = 1.max = = 71 kHz 150 .40) fs.max (125 . Pc.25 1 f s = 125 watts = 40 + 1.
If the switching times vary with temperature then Esw can be written as 0.004(11025)] (2.25) = 4x103 110 .75 °C/watt .5x104)} Rqja = 0. From problem 213.2x103[1+0. .214. This represents an upper limit. Pc = {Eon + Esw }fs where Esw is proportional to the switching times.50 = Rqja {40 + 1.4 Esw(Tj) = Esw(25 °C){1 + a[Tj .25]} with a = (125 .
i.215.6x1019)(38)(1016)(1) IC = = = 200 A Wb (3x104) . q Dn Na A (1. nbase(x) ≈ Na in an NPN BJT.e. Beta begins to drop when the excessd carrier density in the base becomes comparable to the doping density in the base.
These lateral voltage drops lead to emitter current crowding. The diode has no such limitation. The diode can carry the larger current. .216. The lateral voltage drops in the BJT base limit the maximum current that the transistor can carry.
217. At reachthrough xp will equal the difference between the base width WB and the baseside protusion of the baseemitter depletion layer width WEB. Estimate of baseemitter baseside protusion = WEB. This encroachment may stretch across the base and reach the EB depletion layer before the desired blocking voltage is reached. .depl at zero bias.depl.The reachthrough voltage is approximately estimated as shown below. The base doping is not much larger than the collector doping so that the CB depletion layer protrudes a significant amount into the base.
c W(V) xp = protrusion of CB depletion layer into ptype base region.33)x104}(11) = 2.CB 2 e fcC (NaB + NdC) È NaB NdC˘ kT Í ˙ . fcC = q ln Í W o.54 : Solving for V yields V = 59 volts.CB = V {(3 .8 microns (1.7)(8.6x1019)(1019)(1015) W o.0.26 ln Í 20˚ = 0.33 microns (1.84)(1019 + 1015) = 0.7)(8.CB = q NaB NdC 2 ˙ Î ˚ ni È 1029˘ ˙ fcC = 0. V 1 + f = xp + xn .W o.6x1019)(1014)(1015) = W o.26 ln Í 20˚ = 0. .depl.EB = 2 e fc (NaB + NdE) È NaB NdE˘ kT Í ˙ . xp = 11 using xp Na xn Nd (charge neutrality).54)(1014 + 1015) = 2.8x104 1 + 0. fcE = q ln Í q NaB NdE 2 ˙ Î ˚ ni È 1034˘ ˙ fcE = 0.EB = Estimate of collectorbase baseside protusion of WCB. CB depletion layer thickness W(V) = Wo.9x1014)(0.84 V Î 10 (2)(11.9x1014)(0.54 V Î 10 (2)(11. Reachthrough voltage of 59 V is much less than the expected value of BVBD = 1000 V.
1. NaB = acceptor doping density in base = 1.3x10 BVCBO = b NdC CEO = (5) NdC = collector drift region donor density = 8.3x1016 cm3 aB 17 1/4 BV 1/4(1000) = ≈ 1500 Volts ≈ 1.3x1017 BVEBO = 10 V = N .218.7x1013 cn 3 .
7x103 xp(BVCBO) = NaB 1. Wbase = xp(BVCBO) Approximate width of CB depletion layer at breakdown WCB(BVCBO) ≈ (105)(1500) = 150 mm xn(BVCBO) NdC 8.3x1016 xp(BVCBO) << xn(BVCBO) so xn(BVCBO) ≈ WCB(BVCBO) ≈ 150 mm Hence xp(BVCBO) = (1.5x102 cm)(6. of the CB depletion layer into the base at VCB = 1500 volts = BVCBO.7x1013 = xn(BVCBO) = xn(BVCBO) 6.Set base width Wbase by calculating the protrusion.7x103) = 1 micron = Wbase . xp.
219.2 21 . Beta = 150 = bD bM + b D + b M = 20 bM + 20 + b M bM = 150 .20 = 6.
M = VCE. Hence main BJT must be saturated.382 V VCE.M = 100 A IB.M = 91 A going through 0.8 V I B.D = 0.8 V E 10 IB.D + 0.2110.8 V = 1. C B 0. .02 W 0.02)(9.6 V + + 0.M + 0.M = 91 A VCE.18 v But a saturated main BJT with I C.18 V.2 +(.1) = 0.1A IC. Must first ascertain the operating states of the two transistors.Two likely choices including (1) driver BJT saturated and main BJT active and (2) driver BJT and main BJT both saturated.8 V which is > 1. Initially assume driver BJT saturated and main BJT active.M + IB.M 10 I B.D = 9.02 ohms generates a voltage drop of 1.M = IC.
M + 0.M 0.6 = (.M = 70 A VCE.8 V E Neglecting IB.8 V I B.D ] PDarl = (1.6 V + I C.D +0.M + IC.6 V)(100 A) = 160 W .C B 0.6 V + + 0.D = 100 A (.D = 30 A .M = 0.02 W 0.2 IC.02) = 1.D IC.6 V PDarl = VCE. IC.02)I C.02 W 0.2 + (70)(.M 0.M [IC.02) I C.M + IC.
e AE CEBO = W EBO . fcE = q ln Í q NaB NdE 2 ˙ Î ˚ ni È (1019)(1016)˘ ˙ = 0.89)(1019 + 1016) = 0.9x1014)(0.4x105 2 e fcC (NaB + NdC) È NaB NdC˘ kT Í ˙ W CBO = .9x1014)(0.2111. fcC = q ln Í q NaB NdC 2 ˙ Î ˚ ni È (1.7)(8. fcE = 0.2 nF CEBO = 3.6x1019)(1019)(1016) (11. fcC = 0.026 ln Í Î ˚ 1020 .6 V .026 ln Í 20 Î ˚ 10 W EBO = W EBO = (2)(11.3x1016)(8.3) = 9.89 V .7x1013)˘ ˙ = 0. e AC CCBO = W CBO W EBO = zerobias emitterbase depletion layer thickness W CBO = zerobias collectorbase depletion layer thickness 2 e fcE (NaB + NdE) È NaB NdE˘ kT Í ˙ .7)(8.34 microns (1.
7)(8.1 microns (1.1x104 .7x1013) = 2.6x1019)(1.9x1014)(0.8 nF CCBO = 2.3x1016 + 8.7)(8.3x1016)(8.7x1013) (11.W CBO = (2)(11.9x1014)(3) = 14.6)(1.
Need to find an average value for each of the two capacitors.5x108 = 100 1 + 0. We must find the average value of CBE. t = (10 W)(CBE + CCB) È 16 ˘ At t = td. During the td.7 V .on VBE(td.on interval. V C CB + 8V in 10 W C V in +  BE  VBE 8 V t . .3˙ Î ˚ The spacecharge capacitances are nonlinear functions of the voltages across them.on = t ln Í 7.2112.7 volts during the same interval. Hence CCB will be given by CCB = CCBO VCB 1+ f cC 1.on.on) = 0.6 = 1. calculation.2 nF È t ˘ VBE(t) = 8 . Equivalent circuit for turnon delay time. td. the voltage VCB changes from 108 V to 100 volts and thus will be considered a constant.16 exp Í t˙ Î ˚ The voltage VBE changes from 8 V to 0. td.
3˙ = (3.on = (10) [2.2x109 + 1.2 nF È 16 ˘ td.89) [ 8 8 1 + 0.78) ≈ 27 nanoseconds Î ˚ .2x109)(0.1] = 2.2x109] ln Í 7.4x108)(0.89 .Û Ù Ù ı CBE = 8 0 CEBO VEB 1+ f cE 0 ÛdV ı EB 8 dVEB CEBO fcE È Í (8) Î 0 1+f cE 8 ˘ 1+f ˙ cE˚ = CBE = (9.
the depletion layer thickness becomes constant because the formation of the inversion layer jillustrated in Fig.221. Cdepl(vGS) is the capacitance of the depletion layer which increases in thickness as VGS increases as is shown in Fig. Cox is the capacitance of the oxide layer and is a constant independent of vGS. . However once vGS becomes equal to or greater than VGS(th). Any increase in the depletion layer thickness reduces the value of Cdepl(vGS) and hence the atotal gatesource capacitance Cgs. Thus both components of Cgs are constant for vGS > VGS(th). 226. 226c shields the depletion layer from further increases in vGS (any additional increase in vGS is dropped across the oxide layer). The capacitance of the gatesource terminals can be modeled as two capacitors connected electrically in series.
Io = 10 A. VGS. To dimensions the waveforms.Io = 7 V. .222. we need the numerical values of the various waveform parameters. a) Idealized MOSFET waveforms shown below. VGS(th) = 4 V. To complete the dimensioning. we must calculate the various switching times. The voltage and current amplitude parameters are given in the problem statement as: Vd = 300 V.
on .on estimate . At t = td.on V GG t ri t fv V (t) GS t d. vGS = VGS(th). dvGS vGS VGG Governing equation is dt + R (C + C ) = R (C + C ) .off t rv t fi V GS.on yields . Solving for td. t = RG(Cgs + Cgd) .T/2 i (t) C V (t) CE V I d o t d.Use equivalent circuit of Fig.2 VGG et/t . G gs gd G gs gd Boundary condition vGS(0) = . 2212a.VGG Solution is vGS(t) = VGG .Io V GS(th) 0 V GG td.
È 2 VGG ˘ ˙ td,on = RG(Cgs + Cgd) ln Í V Î GG  VGS(th)˚ È (2)(15) ˘ td,on = (50) (1.15x109) ln Í (15  4)˙ = 58 ns Î ˚ tri estimate  Use equivalent circuit of Fig. 2212b. vGS(t) still given by governing equation given above in td,on estimate. Changing time origin to when vGS = VGS(th) yields; vGS(t) = VGG + [VGG  VGS(th)] et/t . The drain current is given by d(Vd  vGS) 10 iD(t) = Cgd + gm[vGS(t)  VGs(th)] ; gm = 7  4 = 3.3 mhos dt At t = tri, iD = Io. Substituting vGS(t) into iD(t) and solving for tri yields Cgd È (V  V ˘ GG GS(th)){gm + RG(Cgs + Cgd)}˙ Í tri = RG(Cgs + Cgd) ln Î ˚ gm(VGG  VGS(th))  Io È 10 ˘ Í (15  4)(3.3 + 1.5x10 )˙ Í (50)(1.15x109) ˙ ˚ = 21 ns tri = (50)(1.15x109) ln Î (3.3)(15  4)  10 tfv estimate  Use equivalent circuit of Fig. 2212c. Io vGS approximately constant at VGS,Io = g + VGS(th) during this interval. m Io ˘ ÈV V Í GG GS(th)  gm˙ Î ˚ RG
Governing equation is Cgd Solution is given by
dvDS =dt
with vDS(0) = Vd.
È Io ˘ t vDS(t) = Vd  Í VGG  VGS(th)  g ˙ R C ; At t = tfv, vDS = 0. Î m˚ G gd Solving for tfv yields
tfv =
300 10 Io = (50)(1.5x10 ) (15  4  3) VGG  VGS(th)  g m
RG Cgd Vd
= 300 ns
td,off estimate  use equivalent circuit of Fig. 2212d with the input voltagge VGG reversed. vGS(t) =  VGG + 2 VGG et/t ; At t = td,off, vGS = VGS,Io. Solving for td,off td,off = RG(Cgs + Cgd) ln 2 VGG È ˘ Io ˙ Í Î VGG + VGS(th) + gm˚
È (2)(15) ˘ ˙ = 18 ns = (50)(1.15x109) ln Í 10 Í ˙ Î 3.3 + 4 + 15˚
trv estimate  Use equivalent circuit of Fig. 2212c with the input voltage VGG reversed. vGS approximately constant at VGS,Io as in previous of tfv. Governing equation is VGG + VGS,Io d{vDS  VGS,Io} = with vDS(0) = 0. Solution given by Cgd RG dt VGG + VGS,Io t . At t = trv , vDS = Vd . Solving for trv yields vDS(t) = RG Cgd Vd RG Cgd (300)(50)(1.5x1010) = = 100 ns trv = V (15 + 7) GG + VGS,Io tfi estimate  use equivalent circuit of Fig. 2212b with the input voltage VGG reversed. Governing equation the same as in previous calculation of tri. At t = 0, vGS(0) = VGS,Io. Solution in this caae is given by vGS(t) =  VGG + [VGS,Io + VGG] et/t ; At t = tfi, vGS = VGS(th). Solving for tfi È VGG + VGS,Io ˘ È ˘ ˙ = (50)(1.15x109)ln Í 15 + 7˙ = 9 ns tfi = RG(Cgs + Cgd) ln Í V + V Î 15 + 4˚ Î GG GS(th)˚ b) Estimate the power dissipated in the MOSFET in the same manner as was done for the BJT in problem 213.Waveforms for the MOSFET are the same as for the BJT except for appropriate relabeling of the currents and voltages.
Eri = (0.5)(300)(10)(2.1x108) = 3x105 Joules Efv = (0.5)(300)(10)(3x107) = 4.5x104 Joules Eon = Io VDS,on [0.5 T  td,on + td,off] ; VDS,on = Io rDS,on = (10)(0.5) = 5 V T >> td,on and td,off Eon = (10)(300)(0.5)(5x105) = 1.25x103 Joules Erv = (0.5)(300)(10)(107) = 1.5x104 Joules Efi = (0.5)(300)(10)(9x109) = 1.5x105 Joules Pc = (1.95x103)(2x104) = 39 watts
223.
Use test conditons to estimate Cgd. Then estimate the switching times in the circuit with the 150 ohm load. Test circuit waveforms are shown below.
V V (t) G
GG t
VGS,Io V GS(th) V (t) GS t d,on t ri = t fv
V
GG t d,off t f i = tr v t
V (t) DS
i (t) D Io V d
t Equivalent circuit during voltage and current rise and fall intervals: RG + C gd R
D
V (t) G
C gs
V d
g (V  V ) GS(th) m GS Governing equation using Miller capacitance approximation:
vGS VG(t) dvGS + t = t ; t = RG [Cgs + Cgd{1 + gmRD}] ; dt During tri = tfv interval, VG(t) = VGG. Solution is Vd t/t ; At t = t , V vGS(t) = VGG + {VGS(th)  VGG} e ri GS = VGS(th) + gmRD ; Solving for tri = tfv yields tri = tfv = t ln VGG  VGS(th) È ˘ Vd ˙ Í Î VGG  VGS(th)  gm RD˚
During trv = tfi, vG(t) = 0 and solution is vGS(t) = VGS,Io et/t . At t = trv, vGS(t) = VGS(th). Solving for trv yields Vd ˘ ÈV + g R Í GS(th) m D˙ Î ˚. VGS(th)
trv = t ln
Invert equation for tri to find Cgd. Result is 1 ¸Ï ¸  RG CgsÔ ÌR (1 + g R )˝ Ó G m D˛
Cgd =
tri Ï Ô È VGG  VGS(th) ˘ Ì ln Í Vd ˙ Ô ÎV V Ó GG GS(th)  gm RD˚
˝ Ô ˛
Ï ¸ ¸ 1 Ô 3x108 9Ô Ï Cgd = Ì È  5x10 ˝ Ì5(1 + 25)˝ = 2.3x109 F = 2.3 nF 15  4 ˘ Ó ˛ ˙ Ô ln Í Ô Ó Î 15  4  1˚ ˛ Solving for switching times in circuit with RD = 150 ohms. t = [109 + 2.3x109 {1 + 150}][100] = 35 ms È 15  4 ˘ È 4 + 2˘ ˙ tri = 3.5x105 ln Í 15  4  2˙ = 7 ms ; trv = 3.5x105 ln Í 4 ˚ Î ˚ Î = 14 ms
224.
Waveforms for vDS(t) and iD(t) shown in previous problem. Power dissipation in MOSFET given by 1 T <PMOSFET> = [Eon + Esw] fs ; fs = T ; Eon = [ID]2 rDS,on(Tj) 2 ;
Vd È Tj  25˘ È Tj ˘ 300 Í ˙ Í ˙ ID = R = 150 = 2 A ; rDS,on(Tj) = 2 Î 1 + 150 ˚ = 2 Î 0.833 + 150˚ D È Tj ˘ 1 1 Í ˙ Eon = (4)(2) Î 0.833 + 150˚ 2f = {3.32 + 0.027 Tj} f s s tri 1 Û t t Esw = T ÙVd ID(1  t )(t )dt + ı ri ri 0 Esw = tfi V I 1 Û ÙV I (1  t )( t )dt = d D [t + t ] T ı d D 6 tfi tfi ri fi 0
(300)(2) [7x106 + 14x106] = 2.1x103 joules 6
1 <PMOSFET> = {3.32 + 0.027 Tj} f fs + 2.1x103 fs s <PMOSFET> = {3.32 + 0.027 Tj} +[ 2.1x103][104] = 24.3 + 0.027 Tj PMOSFET 30 25 20 Watts 15 10 5 0 0 10 20 30 40 50 60 70 80 90 100 Temperature [ °K] B B B B B
225.
Von = onstate voltage of three MOSFETs in parallel = Io reff
95)(3.r1 r2 r3 reff = r r + r r + r r .09)2 P1 = (2)(2.95) = 5 W . 1 2 2 3 3 1 È Tj . r1(105 °C) = 2. Pi = 2 r = 2 r .09)2 (5)2(1.61 W (2.28)(3.25˘ Í ˙ r1(Tj) = r1(25 °C) Î 1 + 0.5 W .28 W . (5)2(1. r1 etc.95)(3.61) + (3.61) = 4.8 100 ˚ . r3(105 °C) = 3.09)2 (5)2(1. r1(105 °C) = (1. Assume a 50% duty cycle and ignore i i switching losses.1 W .09 ohms Von2 Io2 reff2 For the ith MOSFET.61)(2. P3 = (2)(3.64) r1(25 °C) etc.28) = 4. r2(105 °C) = 3.28)(3. = onstate resistance of MOSFET #1 etc.95)] = 1.28) + (3.61) reff(105 °C) = [(2. P2 = (2)(3.95 W .
226. Hybrid switch would combine the low onstate losses of the BJT and the faster switching of the MOSFET. The waveforms shown below indicate the relative timing. In order to obtain these advantages. The switch blocks Vd volts in the offstate and conducts Io amps in the onstate. . The MOSFET would be turned on before the BJT and turned off after the BJT.
on v =v CE DS r I o.r)I o C v GS v BE .VDS. r < 1 iD Io i (1 .on V CE.
W drift ≈ (10 W d. 2 e fc k T È Na Nd˘ Í ˙ q Na. Ndrift = 1.body ≈ .3x1017 BVDSS ≈ N = 750 volts .7x1014 cm3 drift 5)(750) = 75 microns . 1.7x1014) ≈ = ≈ 0. fc = q ln Í n 2 ˙ .body = protrusion of drain depletion layer into body region W drift Ndrift (75)(1.3 microns Nbody 5x1016 Even though bodysource junction is shorted. there is a depletion layer associated with it which is contained entirely on the body side of the junction.body . This must be included in the estimate of the required length of the body region. Î i ˚ W s.227.
È (1019)(5x1016)˘ ˙ = 0.16 = 0.9x1014)(0.7)(8.3 + 0.46 microns .body + Ws. Wbody > Wd.body ≈ (2)(11.026 ln Í 20) Î ˚ (10 W s.16 microns (1.94) ≈ 0.body = 0.94 fc = 0.6x1019)(5x1016) In order to avoid reachthrough .
228.7 V dvDS 0.7 dt > Rbody Cgd will turn on the BJT. . vDS ≈ vGD>> vGS dt dvDS BJT will turn on if Rbody Cgd dt = 0. Displacement current = Cgd dvDS dvGD ≈ Cgd dt .
67) (5x106) (5x106) = 16.67) EBD tox = (0.7 volts .229.max = (0. VGS.
04x107)(2x103)(15 . a) iD = mn Cox N Wcell (vGS .4) 100 b) Icell = 5800 = 17 milliamps .800 cells N = (1500)(1.VGS(th)) (2)(100)(104) ≈ 5.7)(8.VGS(th)) 2L e (11.9x1014) Cox = t = = 1.04x107 F/cm2 105 ox 2 iD L N=m C W n ox cell (vGS .2210.
4 ohms W drift Ron = q m N A n d : Wdrift = 105 BVDSS = (105)(800) = 80 microns .2211. Von = 4 volts = Ion Ron = (10 A) Ron . Ron = 0.
3x1017 Nd = BV DSS A= = 1.6x1014)(0. so estimate is alright.4) 10 A A A = 20 2 << the allowable maximum of 200 .5 cm2 cm cm2 .6x1014 cm3 8x103 ≈ 0.3x1017 800 ≈ 1.5 cm2 (1.1.6x1019)(1500)(1. 0.
8x103)(2x103)(104) = 121 pF . Cgs ≈ Cox N Wcell L = (1.04x107)(5.2212.
Eswfs = (2.5x103 joules . overvoltage across drainsource terminals because of stray inductance and excessive power dissipation.2213.Ta 150 . Pdissipated = [Eon + Esw] fs 1 Rq. Check for overvoltage first. È 100 ˘ di ˙ VDS(turnoff) = Vd + L dt = 100 + (107) Í Î 5x108˚ = 300 V > BVDSS = 150 V Check for excessive power dissipation. Pallowed = Tj.5x103)(3x104) = 75 watts Pdissipated = 50 + 75 = 125 watts > Pallowed = 100 watts MOSFET overstressed by both overvoltages and excessive power dissipation.ja Io2 rDS(on) (100)2(0. .50 = = 100 watts .01) = = 50 watts Eonfs = 2 2 Esw = Vd Io (100)(100) [(2)(5x108) + (2)(2x107)] 2 [tri + tfi + trv +tfv] = 2 Esw = 2. Two overstress possibilities.max .
Gate current which charges/discharges Cgs and Cgd during turnon and turnoff is approximately constant during the four time intervals. Thus we have: .2214. However during the current rise and fall times the voltages VGS and VGD change by only a few tens of volts. However during the voltage rise and fall times VGD changes by approximately Vd which is much larger than a few tens of volts.
.VGG Current rise/fall times proportional to [Cgs + Cgd] I G Vd Voltage rise/fall times proportional to Cgd I G Cgs roughly the same size as Cgd and Vd >> VGG Hence voltage switching times much greater than current switching times.
a < wt < p vs(t) = 2 Vs sin(wt) . vs(t) . iL(t) = R L p 1 Û <PSCR> = 2p ı[(1)iL(wt) + {iL(wt)}2Ron] d(wt) a Vs sin(2a) 1 È Vs ˘ 2 {1 + cos(a)} + π Í R ˙ Ron [π .231.a + <PSCR> = 2 ] Î L˚ 2 pRL .
14 .0 + 2 ] = 107 watts <PSCR> = Î ˚ 2π (1) <PSCR> = 107 watts less than the allowable 760 watts. <PSCR>max = Rqja <PSCR>max = 125 .28 2 a For a = 0 <PL> = 24.Ta.2 kW .49 = 760 Watts 0. iL(wt) = 2 (220) sin(wt) a π 2 sin(2a) 1 Û ı{ 2 (220)}2sin2(wt) d(wt) = (220) [3.max 120 °F = 49 °C . π 1 Û Average load power <PL> = 2π ı{iL(wt)}2RL d(wt) .232.a + <PL> = 2π ] 6.max . Hence trigger angle of zero where maximum load power is delivered is permissible. Tj. Tj.max = 125 °C .1 Check <PSCR> at a = 0 1 È 220˘ 2 sin(0) 220 [1 + cos(0)] + π Í 1 ˙ (2x103)[π .
A(t) = conducting area of SCR A(t) . PSCR(t) = instantaneous power dissipated in the SCR during turnon.t } dt t during tf f P(t) = power density = PSCR(t) = watts per cm2 . t dI PSCR(t) = vAK(t) iA(t) = VAK {1 .233.
75 Joule/(°Ccm3).ab] ln[a' + b' t ] . Solving for dt yields (2π)(1.4x106 sec ı Î a' + b't˚ Î 104 108 ˚ 0 With Cv = 1. Let a = a' = 1.A(t) = π [ro + us t]2 . Using integral tables Î ˚ 0 tf bt Û È a + bt ˘ ÙÍ ˙ dt = f + [ab' . ı Î a' + b't˚ b' f [b']2 0 1 b= 2x105 4 4 sec1 .5) dt = 125 .5x10 (2)(0.7x107 = 590 A/ms .5) = 104 sec1 Evaluating the integral yields tf È 4˘ Û È a + bt ˘ ÙÍ ˙ dt = 1 + Í 104 + 5x10 ˙ ln[1 + (104)(2x105)] = 9.π ro2 = π [2 ro us t + (us t)2] Û V {1 .tt } dI t tf f dt 1 Ù AK 1 Û ıP(t) dt = C dt dTj = C v ıπ [2 ro us t + (us t)2] v 0 0 1 VAK dI dTj = C 2πr u dt o s v tf Û È 1 .tt ˘ ÙÍ f ˙ ust ˙ dt ÙÍ ı Î 1 + 2ro˚ tf us 1 .25 = 100 °C . b = t . and b' = 2r f o 0 tf Û Ù È a + bt ˘ Integral becomes ı Í a' + b't˙ dt . b' = 10 = . the expression for dTj becomes (103)( 9.4x106) dI dI dTj = 4)(0.75)(10 dI 100 dt = 1.
N+ junction with a low breakdown voltage. Since J3 already has a low breakdown voltage.region length Wd means shorter carrier lifetimes can be accomodated and thus faster switching times. Disadvantages . Advantages . .234.Junction J1 is now a P+ . the modified thyristor has no significant reverse blocking capability.Shorter N.
235.5) cm us = 3.0.5 = 350 microseconds 104 . ton = (4 .
236. these nonuniformities become severe and the increasing possibility of second breakdown limit the total current that the BJT can safely conduct. . In the thyristor. Lateral voltage drops caused by base currents cause current density nonuniformities. The current density is uniform across the entire crosssectional area of the thyristor and there is much less likelyhood of second breakdown. no significant gate current is needed to keep the thyristor on and there is consequently no lateral current flow and thus lateral voltage drop. At large currents.
Wd 2 0.6x1019)(2x102)2 b) t = kT(m + m ) = = 17 microseconds (1. (1. 2000 = 103 = 19)(900)(1017) A .3x1017 13 3 5 3 3 = 6.237.4x1023)(300)(900) n p Used (mn + m p) = 900 cm2/Vsec which is value appropriate to large excess carrier densities (approaching 1017 cm3) c) Von = I Rdrift . Nd = 1. However in a welldesigned thyristor. Thus an estimate of the n1 thickness and doping level based avalanche breakdown would be a reasonable first attempt. the value of the breakover voltage is an appreciable fraction of the actual avalanche breakdown voltage.4 cm (1.5x10 cm . a) Breakover in a thyristor is not due to impact ionization.02 Rdrift ≈ q (m + m ) n A . Ignore I2/3 contribution as it is usually small compared to the linear term.6x10 n p b Solving for A gives A = 0.6x10 .02 2 19)(900)(1017)(103) = 1. Wd ≈ (10 )(2x10 ) = 200 microns 2x10 qWd2 (1.
4 = 1430 A/cm2 which is excessively large. a more realistic value.2000 Resulting current density is 1. . Probably should use nb ≈ 1016 cm3 which would give a current density of 140 A/cm2.
15 3000 Cathode area = 200 = 15 cm2 = 0.65 = 23 cm2 23 cm2 = π Rsi2 .65 Asi .7 cm . Rsi = 23 π = 2. Asi = 0.238.
Wdepl(0) ≈ 2 e fj2 q Nd NaNd kT .9x104 dvAK 0.9x1014)(0.05 6 dt max = 3. (1020) W depl(0) ≈ (2)(11.4 V per microsecond  .9x1014)(10) = 36 nF 2. dvAK IBO ≈ C (0) . fj2 = q ln[ 2 ] ni (1014)(1017) fj2 = 0.026 ln[ ] = 0.66) = 2.9 microns (1.6x108 = 1. Cj2(0) = zero bias value of junction J2 space charge capacitance dt max j2  eA Cj2(0) ≈ W depl(0) .7)(8.66 V .7)(8.6x1019)(1014) Cj2(0) = (11.4x10 V/sec or 1.239.
Cathode i N 2 R + vGK t G R P 2 v GK + Center Line The negative gate current.max RGK < BVJ3 in order to avoid breakdown or IG.max < R GK r p2 W R RGK = 2 N = 4 N L t .max = R GK IA.max yields = 4 N L t boff BVJ3 r p2 W . Gate Crosssectional view of GTO gatecathode area with reverse gate current flowing.max = IA. iG. N = number of cathode islands in parallel. flowing through the P2 layher beneath the N2 cathode layer develops a lateral voltage drop vGK as indicated. Maximum negative vGK = BVJ3 BVJ3 vGK = IG.max b off : Solving for IA.241. BVJ3 IG.
That is the inductor current . Assume that the current is communtated from the GTO to the turnoff snubber and associated stray inductance linearly as a function of time.242.
t iLs = Io t .5 Vd = Ls dt + vcap = Ls t + Vd . Solving for Ls yields fi Vd tfi Ls = 2 I o . diLs Io vAK. the fi voltage across the snubber capacitor has built up to approximately Vd.max = 1. Assume that just prior to the end of the current fall time interval.
At t = tgq want iG = . iG(t) = L t ..tgq Io = (5)(15)(5x106) (500) = 0.VGG.75 microhenries Equivalent circuit during tw2 interval.243. Equivalent circuit during tgq shown below. P i (t) G L G V GG+ N P N J3 forward biased during t gq . Solve for LG off G LG = b off VGG.VGGIo diG LG dt = . .b .
VGGdiG LG dt = BVJ3 .VGG.b . iG(0) = .b + t LG off off At t = tw2 . solving for tw2 yields Io LG tw2 = b [BV .5x107) = = 7.i (t) G L G + BV J3 V GG+ Io Io BVJ3 . iG = 0 .5 microseconds (5)(25 .V off J3 GG] (500)(7.15) .. iG(t) = .
dn = excess carrier density A n p dn = dp so pchannel IGBTs have the same Ron as nchannel IGBTs . mn = 3 mp . Hence A majority Ron(nchannel) Ron(pchannel) = 3 A A Ron(IGBT) 1 proportional to dn(m + m ) . Ron(MOS) 1 proprotional to m .251.
Longer lifetime leads to longer BJT turnoff times. b. Shorter lifetime means less stored charge in the BJT section and thus faster turnoff. Turnoff waveforms of short versus long lifetime IGBTs i D long lifetime I I (long) BJT (short) BJT short lifetime t Long lifetime IGBT a.252. Short lifetime IGBT a. . BJT beta smaller. MOSFET section of the device carries most of the current. b. BJT portion of the device has a larger beta and thus the BJT section carries the largest fraction of the IGBT current. Thus IBJT(long) > IBJT(short).
This is base width modulation and it results in a lower output resistance ro (steeper slope in the active region of the iDvDS characteristics).253. The effective base width is thus lowered and the beta increases as vDS increases. Depletion layer . Collector junction of pnp BJT section of IGBT Body region of MOSFET section of IGBT Base of pnp BJT Emitter of pnp BJT P NV V DS1 >V P + Drain of IGBT DS2 DS1 Effective base width Significant encroachment intoa the base of the PNP BJT section by the depletion layer of the blocking junction.
The PNP base width becomes constant and so the effective resistance ro remains large.layer but the advance is halted at moderate vDS values by the N+ buffer layer. .Collector junction of pnp BJT section of IGBT Body region of MOSFET section of IGBT Base of pnp BJT Emitter of pnp BJT P NV DS N + P + Drain of IGBT Depletion layer Effective base width independent of V DS Depletion encroaches into the N.
One dimensional model of nchannel IGBT 25 m m Source N + P 17 10 N 14 10 N+ 19 10 P + Drain 19 10 19 10 Reverse blocking junction is the P+ . BVRB ≈ 1.N+ junction because of bodysource short.3x1017 < 1 volt.junction.limited by P .N.254. No reverse blocking capability. . 1019 Forward breakdown .
3x1017 BVFB = ≈ 1300 volts .7)(8.6x1019)(1014)(2.9x1014) .5x103)2 = 453 volts BVFB = (2x105)(2. But Wdepl(1300 V) = (105)(1300) = 130 microns 14 10 130 microns > 25 micron drift region length.5x103) (2)(11. Hence forward blocking limited by punchthrough.1. (1.
MOS . Exact value not critical to an approximate estimate of Ion.IGBT ≈ 3 .8 Ron.3x1017 = 1. Von(MOS) = Ion.5x103)(1.5x103 Ron.6x103 MOSFET current . Ron.IGBT ≈ q (m + m ) n A n p b 7.IGBT Ron. Von(IGBT) = Vj + Ion.IGBT Wd .09 = 33 amps . Ron.6x10 W 2.7x1014 cm3 750 7.2 Ion.5x103 3 5)(750) = 75 mm .6x1019)(900)(1016)(2) = 2.0.6x1019)(1. Wd = 75 mm Nd = 1.IGBT Assume Vj ≈ 0.IGBT. IGBT current . Ion.255.IGBT = (1.8 V .MOS = 0.MOS Ion.7x1014)(2) 3 Ion.IGBT .IGBT ≈ ≈ 850 amps 2.MOS = = 0.Ion.Ion.MOS Ron.MOS = Wd q mn Nd A . R W d = (10 on.09 ohms (1.MOS = Von(MOS) Ron.MOS .
PT since Vj.PT ≈ .NPT Ron.NPT ≈ Vj.NPT Ron.PT + Ion.PT Ion.NPT Ron.256.NPT + Ion.PT = Vj. Von(PT) = Vj.NPT Ion.PT Ron.
PT Hence I on.NPT = W ≈ 2 assuming doping level in PT drift region is much less than Ron.NPT ≈ 2 . Ion.Ron.NPT W d.PT d.PT the doping level in the NPT drift region.
P = power dissipated in IGBT during overcurrent transient. . P = Iov2 Ron .6x1019)(900)(1016)(0. Iov = V Cv dT dt Ron .Duration of transient = dt. dQ = V dt .257. V = volume in IGBT where power is dissipated. V ≈ A Wdrift q (mn + m p) nb A2 Cv dT dt W drift Ron = q (m + m ) n A . Iov = n p b Iov = (1.75)(100) ≈ 2.5)2(1. However IGBTs nominally rated at 100 A have repeatedly been tested at 1000 A for 10 microseconds or less and survived.5x103 amps 5) (10 Estimate is overly optimistic because it ignores any other ohmic losses in the device such as channel resistance or resistance of the heavily doped source and drain diffusions. P Cv dT = dQ .
The IGBT has the smaller values of Cgd and Cgs because its effective crosssectional area is smaller than that of the MOSFET.258. The IGBT has a smaller area even though its current rating is identical to the MOSFET's rating because the IGBT utilizes conductivity modulation of the drift region to significantly reduce the specific onstate resistance. .
dvDS Vd dvDS = t .259.75 microseconds Check dt at turnoff . trv < 0. 3x107 dvDS Device is overstressed by an overly large dt . . dt rv Vd dvDS > t dt off = 700 = 2330 V/ms > 800 V/ms limit.
max . Module is overstressed by too much power dissipation.25 Allowable power loss = = = 250 watts Rqja 0.tri + trv + tfi + tfv Check switching losses Psw = Vd Io fs 2 (3x107 + 7.5x104) = 875 W Psw = (700)(100) 2 Tj.5 Switching losses exceed allowable losses. .Ta 150 .5x107) (2.
i + v GS D Linearized IV characteristics 0 C GD C GS + v DS V GS1 V GS2 0 V DS1 V DS2 . Equivalent circuit for JFET in active region.261. + v GS C GS C GD +  ro mv GS + v DS  Equivelent circuit for JFET in the blocking state.
MOSFET on R1 R 2 + V drive  RL VDS = VKG = .VGK = RDD R 2 1+ 2 Negative enough to insure that the FCT is off.VGK = 0 and FCT is on. Drive circuit configuration V DD MOSFET off V R VDS = VKG = . .262.
MOSFET characteirstics: . Low BVDss .Low Ron .High current sinking capability .
Î ˚ .125 . BVBD = . EBD(GaAs) = 400 kV/cm 2 È3˘ 2 = 9 Í4˙ = 0. Wd2 EBD Wd Vdrift = (m + m ) t .263.GaAs = Vdrift. GaAs has the shorter lifetime. Vdrift. (m n + mp)GaAs = 9000 cm2/Vsec EBD(Si) = 300 kV/cm tGaA tSi .Si 2 n p Wd2(Si) (mn + mp)Si tSi = Wd2(GaAs) (mn + mp)GaAs tGaAs (mn + mp)Si È EBD(Si) ˘ 2 tGaA Í ˙ tSi = (mn + mp)GaAs ÎE (GaAs)˚ BD (mn + mp)Si = 2000 cm2/Vsec .
EBD = 107 V/cm . BVBD = EBD tox 103 = 104 cm = 1 micron tox = 107 .264.
265.max = (105)(1. IA.5x102) = 1500 amperes .
266. PMCT fabricated in silicon can turnoff three times more current than an identical NMCT due to the difference between the mobilities in the nchannel OFFFET in the PMCT and pchannel OFFFET in the NMCT.5x102) = 4500 amperes . Hence IA.max = (3)(105)(1.
Assume an ntype drift region since m n > mp.267. .
sp = Rdrift A = q m N n d e EBD2 2 BVBD EBD Using Eq. Rdrift. (203) Wd = Substituting into the expression for Rdrift. (201) Nd = 2 q BV BD . Using Eq.sp yields 2 BVBD 1 2 q BVBD Rdrift.sp = E BD q e e EBD2 4 (BVBD)2 = e mn (EBD)3 .Wd Rdrift = q m N A n d Wd .
sp = (4)(500)2 Diamond: Rdrift.024 ohmscm (11.sp = 14)(3x105)3 = 0.9x10 (4)(500)2 = 2.sp = = 9.sp = (4)(500)2 2 14)(4x105)3 = 0. (4)(500)2 2 Silicon : Rdrift.9x1014)(107)3 .5)(2200)(8.8)(8500)(8.9x1014)(2x106)3 6HSiC: Rdrift.9x10 GaAs: Rdrift.0016 ohmscm (12.7)(1500)(8.3x107 ohmscm2 (5.268.3x104 ohmscm2 (10)(600)(8.
269. It has the largest bandgap (by almost a factor of two) and thus the smallest intrinsic carrier density at any given temperature. . This statement presumes that the phase change listed for diamond in the table of material properties exceeds the sublimation temperature of SiC (1800 °C). Diamond is the most suitable material for high temperature operation.
9x1014)(2x106)2 1.9x1014)(4x105)2 = BV For GaAs: Nd = BD (2)(1.2610.1x1019 For 6HSiC: Nd = = BV (2)(1. (201): Nd = 2 q BV BD 5. Eq.7x1017 (12.8)(8.6x1019)(BVBD) BD e EBD2 .6x1019)(BVBD) (10)(8.
6x1019)(BVBD) BD Eq.5x1020 = BV (2)(1.For diamond: Nd = (5. (203): Wd = 2 BVBD EBD 2 BVBD = 5x106 BVBD [cm] 4x105 [cm] For GaAs: Wd = 2 BVBD = 106 BVBD For 6HSiC: Wd = 2x106 2 BVBD = 2x107 BVBD For diamond: Wd = 7 10 [cm] .9x1014)(107)2 1.5)(8.
Use equations from problem 2610.5x1016 cm3 7. Material GaAs 6HSiC Diamond Nd 2.5x1017 cm3 Wd 102 cm 2x103 cm 4x105 cm .9x1015 cm3 5.2611.
75 cm1 200 0.5 °C/W : R qjc(SiC) = 5 = 0.75 0.15)(200) + 50 = 80 °C .15°C/W 0.038°C/W Tj(GaAs) = (1.2612.5) = 0. Tj = Rqjc Pdiode + Tcase : Rqjc = C.• (k) 1 k = thermal conductivity and C = constant Using silicon diode data: C = (Tj .75 Rqjc(diamond) = 20 = 0.75 Rqjc(GaAs) = 0.50)( 1.5 = 1.5)(200) + 50 = 350 °C : Tj(SiC) = (0.Tcase) k Pdiode = (150 .
4 °C .Tj(diamond) = (0.038)(200) + 50 = 57.
Occurs at a gatesource voltage of Vp.fc Î o˚ 2 e fc q Nd .8 .8 = 3.8 V fc = 0. Pinchoff of the channel occurs when the depletion region of the gatechannel (P+N) junction is equal to W/2 where W is the width of the channel. Wo = Solving for Vp yields Vp = È(1019)(2x1014)˘ ˙ = 0. .3 microns È 10 ˘ 2 Vp = (0.2613.0. W 2 = Wo Vp 1+ f c ÈNa Nd˘ kT Í ˙ fc = q ln Í 2 ˙ Î ni ˚ È W ˘ 2 fc Í2 W ˙ . 261 and 263.8 = 3 V Î ˚ .7)(8.3)˙ .8) (1.0. See Figs. The other half of the channel is depleted by the depletion region from the gatechannel junction on the other side of the channel.8) Í(2)(2.026 ln Í Î ˚ 1010 (2)(11.6x1019)(2x1014) Wo = = 2.9x1014)(0.
See Fig. The diagram on the left indicates the various contributions to the onstate resistance and the figure on the right shows the various geometrical factors that determine the resistance. Each cell is d centimeters deep in the direction perpendicular to the plane (page) of the diagram. . 261 for a fuller picture of the multicell nature of the JFET. The gatesource voltage is set at zero. Single cell of the multicell JFET shown below.2614.
2.2.3x104) (lgd . Treat the region of thickness Wo + Wg/2 as though it has an average width (W .W o .6x104) Rc Rt estimate.Wo.6x1019)(1500)(2x1014)(0.2W ) n d o 103 = 552 ohms = (1. Rt now approximately given by 2 Rt Rt Wo + Wg/2 = q m N d (W + W /2 .07)(103 +103) Total resistance of a single cell is Rcell = Rs + Rc + Rt + Rd .source Rs P + Rc R t P + W g W l gs P + W .2W o Wo + W /2 g P + lc l gd .2 Wo) + (W + Wg) given by = W + Wg/2 .07)(103 .5x104) (35x10 = 412 ohms Rd = (1.6x1019)(1500)(2x1014)(0.Wo Wg/2) Rd = q m N d (W + W ) = n d g 4 .W g /2 R W + Wg d Rs drain lgs 103 =qm N dW = = 298 ohms n d (1.6x1019)(1500)(2x1014)(0.4.6x1019)(1500)(2x1014)(0.3x104 .07)(103) lc = q m N d (W .07)(103 + 5x104 .W ) n d g o (103 + 5x104) = 351 ohms = (1.
Rcell = 298 + 552 + 351 + 412 = 1613 ohms There are N = 28 cells in parallel so the the net onstate resistance is Ron = Rcell 1613 = 28 = 58 ohms N .
Use Eq.5x102) = 65 microns > 35 microns 2x1014 Hence this is a punchthrough structure. Check for this possibility first. As the drainsource voltage increases. The short length of the drift region suggests that punchthrough will limit the breakdown voltage.189 .6x1019)(2x1014)(3.2615.5x103) (2)(11. Wd > (105)(6. Nonpunchthrough estimate: BV = 1. the reversebias on the gatedrain pn junction increases.9x1014) BV = 511 V = 700 . (2121) and EBD = 2x105 V/cm (1.5x103)2 BV = (2x105)(3. The depletion region of the two adjacent P+ regions merge and then grow towards the drain.3x1017 = 650 V .7)(8. The drift region of length lgd and doping Nd must contain this depletion region and will determine the breakdown voltage.
Solving for Cs yields dt 500 5x107 = 10 microfarads Cs > È dvAK˘ 1 Í ˙ Io Î dt ˚ = Rs chosen on basis of limiting discharge current from Cs to safe level when GTO turns on.3)(105)(1.2 Io. dvC dvC dvAK Io t t Cs dt = Io t .25 kW b. ICs.Irr . a. Io communtates linearly to Cs. During turnoff of the GTO. fsw Cs Vd2 Power dissipated in snubber PRs ≈ 2 PRs = (0. Assume irr = 0.5)(103)(105)(500)2 = 1.max = 1000 .max = IAM . .Io .500 100 = 400 A 500 Rs = 400 ≈ 1.271.3 Rs Cs = (2.3 ohms Snubber recovery time = 2. dt = = C t < 5x107 V/s dt fi s fi Maximum dvAK occurs at tfi. Then ICs.3) = 30 microseconds.
Ls ≈ ≈ 1.7 microhenries.2 Vd Rs = (0.2)(500) = 0. (500) .2 ohms. diA 500 L s dt max = Vd .272. 3x108 Voltage across GTO at turnoff = Vd + Io Rs : Assume Io Rs = 0.
vCs(t) = Vd .Kcos(wot) sin(f) .max = Vd + K .f) = K sin(wot) cos(f) . K sin(wot .273.Vd cos(wot) + Vd Cbase Cs sin(wot) = Vd + K sin(wot .f) vCs.
K sin(wot) cos(f) . C 2 + K sin(f) 2 = K2 = V 2 base + V 2 [ K cos(f)] [ ] d Cs d Cbase 1+ C s vCs.K cos(wot) sin(f) = Vd Cbase Cs Cbase Cs sin(wot) .max = Vd + K = Vd + Vd .Vd cos(wot) K cos(f) = Vd and K sin(f) = Vd .
Irr = (2x10 )(3x10 ) = 6 A Cbase 1+ C s b. During reverse recovery L dt = 200 V diR Irr 200 7 7 7 dt = trr = 105 = 2x10 A/sec .274. L = 10 mH + 200 V Rs Cs i L diR iL(0+) = Irr . Equivalent circuit after diode reverse recovery.25 ≈ 7 nF .max = 500 V = 200 + 200 Cbase Cbase 1+ C = 1. C = 1.25 s s È 2 ˘ 5) Í 6 ˙ = 9 nF Cbase = (10 Î (200)2˚ 9 nF Cs = 1.5 . a.5 ≈ 1. vCs.
3 Rbase = (1.3) Í 6 ˙ = 43 ohms Î ˚ vCs. È 62 ˘ ˙ Cs = Cbase = (105) Í Î(200)2˚ = 9 nF È200˘ Rs = 1. Use the circuit shown in problem 274.275.max = (1.5)(200) = 300 V .
2 watts .5)(9x109)(200)2 = 3.6x104 Joules P = WR fsw = (3.5)(105)(6)2 + (0.276.6x104 )(2x104) = 7. ÈL I 2 + C V 2˘ Í s rr s in ˙ ˚ f P = WR fsw = Î 2 sw WR = (0.
277. a. BJT waveforms (trv assumed to be zero for Cs = 0) i Cs Io 0 v CE Cs = 0 Cs > 0 0 V d t tfi t Power dissipation for Cs = 0 is Pc = Vd Io tfi fsw 2 .
2714a.di /dt + C È Irr ˘2 2 Vd Cs1 Í ˙ Î diC/dt˚ + diC/dt Note that DT = 0 if Cs1 = 0 which is consistent with the assumption that the external circuit and not the BJT that dominates the turnon transient.Pc = (200)(25)(4x107) (2x104) = 20 W 2 Power dissipation for Cs = Cs1 tfi Û Io t2 Vd Io tfi t Ù Pc = Wc fsw . Wc = ıIo(1 .Irr . 2714a) required for vCE to reach zero yields Irr DT = . but also because the time to complete turnon is extended as shown in Fig.t ) 2 C t d t = 12 s1 fi fi 0 (200)(25)(4x107)(2x104) = 3. the collectoremitter voltage is given by (assuming that the external circuit dominates the transient) diC diC t2 dvCE Cs1 dt = . This extended duration of traversal of the active region also increases the turnon losses. vCE(t) = Vd .3 watts Pc = 12 Factor of six reduction in the turnoff losses.dt 2 C s1 t .dt t . BJT losses increase at turnon only becaue of energy stored in Cs being dissipated in the BJT. Extra energy disspated in the BJT at turnon due to Cs1 is thus ÈVd diC [Io + Irr] Irr˘ DT 2 ˙ ÛvCE(t) iC(t) dt = Vd Irr DT + Í 2 dt ı 2 Cs1 ˚ DT Î 0 4 (Io + 3 Irr) diC Èdi ˘ 2 3 . During the turnon interval. Seting the expression for vCE(t) equal to zero and solving for the time DT = t2 .Í C˙ DT Î dt ˚ 8 C 2 Cs1 dt DT s1 .Irr C s1 b.(tri + trr) (see Fig.
ÈDT ˘ The increase in the BJT loss is Í ÛvCE(t) iC(t) dt˙ fs where fs is the switching Íı ˙ Î0 ˚ frequency. Evaluation of the loss gives 1.5 watts .29 ms (I rr = 10 A and Cs1 = 25 nF). Numerical evaluation of DT gives DT = 0.3x103 fs = 26.
Ds shorts out the snubber resistance during the BJT turnoff.Í C + Rs dt ˙ t . diC Irr + Rs Cs dt DT= + diC dt È ÍIrr + Rs Cs diC Í Î dt diC˘ 2 dt ˙ ˙ ˚ 2 Cs + di [Vd .278.Irr Rs] C dt in Vd D T goes to zero when Rs = I . b. hence there is no increase in power dissipation rr the BJT due to the presence of Cs. Rs + v CE I r r+ di C dt t Cs + v C v (0+ ) = V C d dvC diC dvC vCE = CsRs dt + vC . vCE = 0 and turnon is completed.. Hence Cs1 is directly across the BJT as in problem 277a.Irr .Irr Rs . . a.dt 2 C Î s ˚ s At t = D T.dt t Combining equations and solving for vCE(t) yields diC t2 È Irr diC˘ vCE(t) = Vd . Cs dt = . Equivalent circuit during BJT turnoff after freewheeling diode reverse recovery is shown below. Thus the loss reduction is the same as in problem 277a.
Continuous flow of load current formces SCRs 1 & 2 to remain on past the time of natural commutation (when vs(t) goes through zero and becomes negative). 0. Ls 2 Vs Rs 1 4 Io Cs 3 2 Equivalent circuit swith SCRs 3 & 4 on and 1&2 going off or viceversa. L s dt = 2 Vs and b. 3 or 4 Ls Irr 2 Vs Rs 1 or 2 Cs With 3 & 4 on.279. Proposed snubber circuit configuration shown below. 1 & 2 are off. w Ls = . Thus the RsCs snubber functions as a turnoff snubber. and effectively in parallel with the R sCs snubber. same is true when 1 & 2 are on and 3 & 4 are off.05 Vs . a. During reverse recovery of SCR1. worst case situation (maximum reverse voltage across SCR Ia1 which is turning off) occurs when SCR which is turning on is triggered with a di delay angle of 90°.
Putting in numerical values Cs = 0.05 Vs Smallest overvoltage occurs when Cs = Cbase.3 Rbase.05 Î Irr ˘ 2 ˙ = 2 Vs˙ ˚ w Ia1 trr2 0. Solving for Irr yields dt rr È 2 w trr Ia1 Í Irr = .33 mF .05 Vs 2 Vs = wt I Irr rr a1 4000 Ia1 (0.Irr di = t . For Ia1 = 100 A 4000 Rs.9933 Ia1 mF 0. Cs = (0.5)(322) = 483 V which occurs when Cs = Cbase and Rs = 1.0033)(100) = 0.3 Rbase = c. Cbase = Ls Í 0.opt = 1.3 Rbase = 100 = 40 ohms . Peak line voltage = 2 (230) = 322 V Smallest overvoltage = (1.opt = 1.05) (230) 3050 = I 5) I (377) (10 a1 a1 ohms Rbase = = ohms Rs.
The resistor in the BJT/MOSFET snubber must be shorted out during the device turnoff so that the snubber capacitance is in parallel with the device. thus providing the shorting of the snubber resistor as required.3 Rbase and Cs = Cbase. Hence a diode in parallel with the resistor is not desirable. . Lowest overvoltages are obtained when Rs = 1.2710. The uncharged capacitor delays the buildup of the large Vd voltage across the BJT/MOSFET until most of the current has been diverted from the switch. The snubber diode is forward biased during turnoff. Overvoltages are 70% larger if Rs is zero. The turnoff of the thyristor limits overvoltages arising from the interruption of current through the stray inductance in series with the thyristor.
dvDS Vd dvDS . dt 7.5x107 Not enough information available to check on power dissipation or overcurrents. dt = t rv dvDS 700 > = 930 V/ms > 800 V/ms limit so snubber is needed. .75 microseconds Check dt at turnoff.2711. trv < 0. a.
3)(14)(2. dvDS Io 100 = C = 400 V/ms . . Rs = 150 .b.3 Rs Cs = (2.25 mF dt s 4x108 Choose Rs to limit total current ID to less than 150 A 700 700 150 A = 100 + R .5x107) = 8 ms Off time of the IGBT is 10 microseconds which is greater than the snubber recovery time. Hence choice of Rs is fine.100 = 14 ohms s Check snubber recovery time = 2. Cs = = 0.
281. t fv During MOSFET turnoff.VGSth =Î RG Cgd dvDS Vd = t dt rv Io ˘ gm˙ ˚ < 500 V/ms Io ˘ gm˙ Vd From problem 232. 100 V GG+ 100 A R G + V V DS V GG vDS(t) waveform same as in problem 222. dvDS Vd During MOSFET turnon dt = t < 500 V/ms fv Vd From problem 222. VGG+.GSth + =Î RG Cgd ˚ Io 60 gm = V .4 .4 = 20 A/V GS Estimate of RG for MOSFET turnon: 100 VGG+ . t rv ÈV + V Í GG.min = VGSth + g = 4 + 20 = 9 V m .VGSth = 7 . ÈV Í GG+ . Schematic of drive circuit shown below.20 5x108 V/sec > (RG)(4x1010) Io 100 .
Choose VGG+ = 15 V to insure that MOSFET driven well into ohmic range to minimize onstate losses. RG > 15 . . RG > 15 + 9 = 115 ohms (4x1010)(5x108) Satisfy both turnon and turnjoff requirements by choosing VGG+ = VGG= 15 V and RG > 115 ohms.= 15 V to insure that MOSFET is held in offstate and to minimize turnoff times.+ 4 + 20 5x108 V/sec > (RG)(4x1010) Choose VGG.9 10)(5x108) = 30 ohms (4x10 Estimate of RG at MOSFET turnoff: 100 VGG.
+ R G1 Df Tsw I o = 200 A V = 1000 V d  R G2 Qs RG2 1000 When FCT is off we need VKG = (1.25 V = (1000) R G1 + RG2 Now R G1 + RG2 = 106 ohms so 31. a.25) 40 = 31.25 kW and RG1 = 969 kW . Circuit diagram shown below.282.25 = (1000) (106) RG2 RG2 = 31.
MOSFET characteristics .b.low BVDSS (BVDSS of 50100 V should work) .large onstate current capability .low Ron .
058 0.4 [dvert]1.rad 0.046 0.046 0.sa = net surfacetoambient thermal resistance = R q.0021 4.24 1/4 for DT = 100 °C.042 0.75 dv2 Rq.027 0.2 5 2x104 0. (2920) Rq.1 6 3x104 0. (2918) Rq.0032 3.04 Rq.sa (measured) 1 7.sa = [dvert]1.conv + Rq.6x105 0.12 .3 3 1.057 0.sa [°C/W] Rq.004 0. Eq.9 2. A [dvert] A cube having a side of length dvert has a surface area A = 6 [dvert]2 Rq.3 3.0088 0.rad ≈ A Èd ˘ 1 Í vert˙ 1/4 Rq.0018 5.0066 0.7 Heat Sink # 7 8 9 10 11 12 .291.5 2.rad Rq.conv Rq. Assume Ts = 120 °C and T a = 20 °C.3 1.1 2.34)(A) Î DT ˚ .013 0.0069 0. Rq.0045 2. 0.75 0.011 0. Eq.2 2 104 0.conv ≈ 0.75 + 2 [dvert]2 Heat Sink # Volume [m]3 dv = (vol.conv ≈ 0.)1/3 [m] A = 6 [dv]2 [m]2 dv1.0034 2.02 . A in m2 .conv ≈ (1.8x104 0.019 0.rad ≈ [dvert]2 Rq.002 0.067 0.
8104 0.Volume [m]3 dv = (vol.4 1.034 0.75 dv2 Rq.021 0.8 1.0058 1.011 0. Heat sink #9 is small and flat with much more surface area compared to its volume. Large surfacetovolume ratios give smaller values of Rq.sa.013 0.sa (measured) 4.3 6.014 0.sa [°C/W] Rq.046 0.086 0.3 0.085 0.3 6.072 0.25 6.088 0.8 1.)1/3 [m] A = 6 [dv]2 [m]2 dv1.4 1.043 0.1x104 0.5 1.3x104 0.014 0.65 Heat sink #9 is relatively large and cubical in shape with only a few cooling fins.0073 1.088 0.014 0.012 0.2 7x104 0.0078 1.4x104 0.9 0.11 0.044 0. .0078 1.4x103 0.047 0.076 0.0071 1.
292.conv ≈ 0. From problem 291 A [dvert] Rq.24 1/4 for DT = 100 °C . Rq.conv ≈ 24 0 [d vert]1/4 for DT = 100 °C and A = 10 cm2 = 103 m2 dvert 1 cm 5 cm 12 cm 20 cm Rq.conv 76 °C/W 113 °C/W 141 °C/W 160 °C/W .
160 140 120 R q .conv °C/W 100 80 60 40 20 0 0 2 4 6 B B B B 8 10 12 14 16 18 20 dvert [cm] .
conv 127 °C/W 118 °C/W 112 °C/W 107 °C/W Rq.34)(A) Èd ˘ Í vert˙ 1/4 . 1 Rq.conv ≈ (1.conv ≈ 353 [DT]. (2920) Î DT ˚ A = 10 cm2 and dvert = 5 cm DT 60 °C 80 °C 100 °C 120 °C Rq.293. Eq.25 .
140 120 100 Rq .conv °C/W 80 60 40 20 0 60 70 80 90 100 110 120 DT [°C] B B B B .
(2917) Rq. A = 10 cm2 and Ts = 120 °C Rq.294.Ta(° C) . Eq.Ë100¯ ¯ 120 .Î 100 ˚ ˚ Ta 0 °C 10 °C 20 °C 40 °C .rad = DT Ê Ê Ts ˆ4 Ê Ta ˆ4 ˆ ÁÁ ˜ Á ˜ ˜ 5.rad = 196 È ÈTa(° K)˘4 ˘ Í Í ˙ ˙ Î239 .rad 128 °C/W 123 °C/W 119 °C/W 110 °C/W . Rq.1 A Ë Ë100¯ .
140 120 R 100 q .rad 80 [ °C / W ] 60 40 20 0 0 5 10 15 20 25 30 35 40 Ta [°C ] B B B B .
Ë100¯ ¯ .1 A Ë Ë100¯ .rad 114 °C/W 120 °C/W 110 °C/W 101 °C/W .40 Rq. Eq.96˚ Ts 80 °C 100 °C 120 °C 140 °C .rad = DT Ê Ê Ts ˆ4 Ê Ta ˆ4 ˆ ÁÁ ˜ Á ˜ ˜ 5.rad = 196 ÈÈT (° K)˘4 ˘ ÍÍ s ˙ ˙ ÎÎ 100 ˚ .295. (2917) Ts(° C) . Rq. A = 10 cm2 and Ta= 40 °C Rq.
120 100 R q.rad [ °C / W ] 80 60 40 20 0 B B B B 80 90 100 110 120 130 140 T s [ °C ] .
100 W = 50 + 103 fs Solving for fs yields fs = 50 kHz .296.50 ° C 1 ° C/W = 100 W .max = 150 ° C . PMOSFET.
297.00 = 0.1.53 °C/W .53 .35 ° C 75 W = 1.53 °C/W Rq. PMOSFET = 50 + 103 • 2.ca = 150 ° C .ja = Rq.jc + Rq.5x104 = 75 W Rq.ca = 1.
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