ONH-2000 is designed for the rapid and accurate determination of oxygen, nitrogen and hydrogen in copper, steel, cast iron, alloys, zirconium, titanium, molybdenum, nickel, ceramics and other inorganic materials. Nitrogen and hydrogen are detected with a dual range thermal conductivity cell. The change over from the low to the high ranges is done automatically during the analysis and does not require any pre-setting by the operator.
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Analisador de H, N e Ox Http___webmail.weldinox.com
ONH-2000 is designed for the rapid and accurate determination of oxygen, nitrogen and hydrogen in copper, steel, cast iron, alloys, zirconium, titanium, molybdenum, nickel, ceramics and other inorganic materials. Nitrogen and hydrogen are detected with a dual range thermal conductivity cell. The change over from the low to the high ranges is done automatically during the analysis and does not require any pre-setting by the operator.
ONH-2000 is designed for the rapid and accurate determination of oxygen, nitrogen and hydrogen in copper, steel, cast iron, alloys, zirconium, titanium, molybdenum, nickel, ceramics and other inorganic materials. Nitrogen and hydrogen are detected with a dual range thermal conductivity cell. The change over from the low to the high ranges is done automatically during the analysis and does not require any pre-setting by the operator.
D e t e r m i n a t o r Oxygen, nitrogen and hydrogen anaIysis with one anaIyser TotaI and fractionaI anaIysis for oxides and nitrides separation Hot extraction anaIysis of residuaI hydrogen Easy to repIace economic upper eIectrode insert Hot zone at the crucibIe's bottom due to graphite tip Grain and driIIings anaIysis without tin capsuIes PC controIIed High temperature eIectrode impuIse furnace for metaIs and ceramics anaIysis DN EN SO 9001 Certificate: 01 100 0020005 AnaIysers made in Germany ELTRA innovates ONH anaIysis in inorganic soIids Description The ONH-2000 is designed for the rapid and accurate determination of oxygen, nitrogen and hydrogen in copper, steel, cast iron, alloys, zirconium, titanium, molybdenum, nickel, ceramics and other inorganic materials. The ONH-2000 can be supplied with two independent infrared cells to provide optimum precision for the analysis of high and low levels of oxygen. Nitrogen and hydrogen are detected with a dual range thermal conductivity cell. The change over from the low to the high ranges is done automatically during the analysis and does not require any pre-setting by the operator. The ONH-2000 features a microcontroller and solid state infrared detectors with auto zero and auto range control. The water-cooled high power electrode impulse furnace uses a graphite crucible to heat the sample up to a temperature of 3000 C. On request the ONH-2000 measuring ranges can be optimized in the factory to suit your requirements, without additional charges. The sensitivity of the detectors can be designed to provide maximum accuracy in ranges from low ppm up to high percentage concentrations. AnaIysis procedure The sample is weighed on an electronic balance which is interfaced to the PC. By pressing a key the sample weight is transferred into the PC. f required the sample weight can also be entered manually. The sample is placed into the loading head and the graphite crucible is put on the lower electrode tip. The start key is pressed and the analysis cycle runs automatically. The furnace closes, the crucible is outgased, the sample is dropped into the crucible and the analysis proceeds. At the end of the cycle, the analysis results appear on the screen of the PC. A manual loading of the sample is also possible. The manual loading is necessary for the analysis of powders. The ONH-2000 can alternatively operate as a simultaneous oxygen / nitrogen or as a simultaneous oxygen / hydrogen determinator. The changing from ONto OHmode and reverse, is easily done with a switch having an ONand an OHposition. The carrier gas cylinders are also selected by solenoid valves controlled by the ON/ OHswitch. For OHoperation, Schutzes reagent is used as CO CO converter, while for 2 ONoperation the more economic CuO is used in a catalyst furnace. PCcontroI with Windows software Comprehensive analyser control and easy operation are provided by the PCand software connected to the computer. The multilingual software provides the user with the following features: Optional display layout - adjustable screen appearance of the program windows. User profiles with multi-level access - parameter changes protected by unauthorized acces. Sample D memory - supplemented with running analysis number. Data base (analysis results storage) - all data for each analysis is stored and can be recalled later for review, report creation, statistical calculations or results recalculation with modified parameters. Optional data base configuration - displays only results meeting specified conditions, for example, certain date/time period, specific sample .D. etc. Visualisation of the results consistency. OutIet Reference fIow EIectrode impuIse furnace FIow sensor High CO 2 IR-ceII C a r r i e r
g a s
h e I i u m C a r r i e r
g a s
n i t r o g e n
o r
a r g o n H O
t r a p 2 H O
t r a p 2 C O
t r a p 2 C o
t r a p 2 N / H 2 2 TC-ceII Low CO 2 IR-ceII Pump Attenuator D u s t
t r a p C O
C O 2 C O
C O 2 CO 2 HeIium CO N 2 Mi cr ocont r oI I er ONH-2000 Oxygen / Ni l rogen / Hydrogen Del ermi nol or Ihe ONH- 2000 c ompl i es l o l he s pec i l i c ol i ons ol l he s l ondor ds : A5IM E - 1019 E - 157 E - 1409 E - 159 E - 1447 E - 1937 Ihe ONH- 2000 c ompl i es l o l he s pec i l i c ol i ons ol l he s l ondor ds : A5IM E - 1019 E - 157 E - 1409 E - 159 E - 1447 E - 1937 ONH-2000 Oxygen / Ni l rogen / Hydrogen Del ermi nol or AppIications memory The settings for different applications can be stored in memory and they can be recalled for later analysis of the corresponding material. Due to this feature, the operator does not need to enter new settings every time he has to analyse a sample of a material different to that of the sample before. Also every time new settings are found for a new kind of samples, the operator can memorize them in the PCsoftware. This facility is practically a must, especially for fractional analysis. FractionaI anaIysis Every oxide and nitride has a characteristic decomposition temperature. The furnace power can be raised slowly until a particular oxide or nitride breaks its bond. Continually increasing the temperature will separate the various oxides and nitrides. Upper eIectrode insert The furnace of the ONH-2000 features an upper electrode insert. t can be easily and quickly replaced by the operator. t is therefore a very economic solution when the upper contact surface to the crucible is worn out. Graphite tip The crucible is placed on a graphite tip. Due to the electrical resistance of the graphite, there is a power dissipation in it, so that the graphite tip heats up the bottom of the crucible. This effect moves the hot zone from the middle of the crucible down to the bottom where the sample is. Grain and driIIings anaIysis without tin capsuIe The design of the sample drop mechanism enables the analysis of grains and drillings without the risk of blockages. Therefore the grains can be put into the furnace without the need of a tin or nickel capsule. The elimination of the need for a capsule has the following advantages: No blank values of the capsule material. No blank values due to the air enclosed in the capsule.
No contamination of the furnace and of the gas flow system due
to evaporation of the capsule material when analyzing with high power, especially for nitrogen compounds requiring high temperature. No costs and delays for maintenance due to the capsule evaporation. No costs and delays due to the time required to tare, to handle the capsule and to fill it with grains. No expenses for capsules. For this purpose the software can control the furnace power, either by ramping or in steps up to a maximum of 3000 C. The peaks are individually integrated by the software and the individual values of the different oxides or nitrides are displayed. Hot extraction anaIysis The ONH-2000 can determine the residual hydrogen in the sample, by heating up the sample at a temperature below the melting point. This can be obtained by setting the power at a relatively low level (about 1.2 kW). n order to be able to analyse big samples, a bigger crucible is used in this case. The big sample is put directly into the crucible by the operator, using the manual loading mode of the analyser. Peak separation calculation procedure for fractional analysis. LMS communication and data export (Notepad, Excel etc.). Basic one-point and advanced multi-point calibration. Barometric pressure compensation. Simultaneous calibration of more than one measuring range. Procedure for automatic linearity correction calculation. Applications memory and deficiency checks - adjustable analysis counters to prompt the changing of reagents, cleaning of filters and other maintenance procedures. Hardware diagnostics display and technical report printouts. Ihe ONH- 2000 c ompl i es l o l he s pec i l i c ol i ons ol l he s l ondor ds : A5IM E - 1019 E - 157 E - 1409 E - 159 E - 1447 E - 1937 ONH-2000 Oxygen / Ni l rogen / Hydrogen Del ermi nol or The lengths of both cells can be individually optimized, to obtain maximum precision for the target analysis levels of each customer. Each of the cells can be installed with infrared absorption lengths ranging between 1 mm and 320 mm. ThermaI conductivity ceII Nitrogen and Hydrogen concentrations are determined by a thermal conductivity detector. This detector was especially developed by ELTRA in order to guarantee low drift, high resolution and wide measuring ranges. Saving carrier gas When the ONH-2000 is in analysis mode, but it has not been used for a while, the gas consumption will automatically be reduced to a very lowlevel. This lowflowkeeps the gas flowsystem flooded with carrier gas, preventing the air from penetrating the system. As soon as the operator starts using the analyser again, the normal flow will be automatically restored. The analyser will be again ready for operation in a very short time, due to the purging with the low flow during the break. CooIing system The ONH-2000 has a primary and a secondary cooling system. This is to prevent the tap water from passing through the furnace. Tap water can contain carbonates and, depending on the tap water quality of each location, it may cont ai n cont ami nant s whi ch can at t ack e m t T p e r a u r e a b s t iIiz e d b Io c k The primary cooling system of the ONH-2000 consists of a closed loop of clear water circulating from a tank through the furnace, utilizing a water pump within the ONH-2000. The secondary cooling system is connected to tap water which flows through a coil of metal tube, cooling the water in the tank as a thermal exchanger. There is no mixing of the tap water with the clear water of the primary system. Athermostatic control opens the tap water valve at a certain temperature level of the water in the tank. The valve closes again when the water is cooled down. The water tank is not inside, but outside the analyser. This configuration reduces considerably the risk of water problems with the analyser in case of leakages. The tank is made of very solid stainless steel. t can be placed under the desk underneath the analyser saving space on the desk. The analyser's size is small due to the tank being outside the analyser. The tank itself is big, accommodating a big quantity of water to ensure lowvariations of the water temperature during analysis. The ONH-2000 can be supplied for glove box operation. n this case the furnace part of the instrument is installed inside the glove box and the remainder outside. By s p l i t t i n g t h e i n s t r u m e n t w e minimise the amount of cont ami nat ed material and improve a c c e s f o r maintenance. The ONH-2000 can be supplied with an auxiliary tube furnace for the analysis of residual hydrogen by hot extraction. The f u r n a c e h a s a temperature range of 0 to 1000C.
residual oxygen in inert carrier gases. and damage t he i nt er nal cooling surface of the furnace. The carbonates can additionally form a thermal insulating layer on the inner surface of the f u r n a c e , reduci ng t he cooling effect of the water. Carrier gas fIow Reference fIow Infrared ceIIs The infrared cells of the ONH-2000 do not require any manual zero adjustments. The zero and sensitivity adjustments of the infrared cells are permanently and automatically controlled by the electronics. The detectors utilize solid state sensors combined with infrared filters. The sensors are not gas filled, thus eliminating long term problems due to gas leakage. The ONH-2000 can be equipped with up to two independent infrared cells for oxygen determination. SoIid state detector with infrared fiIter Chopper bIade Infrared source Window Gas inIet Gas outIet PreampIifier ONH 2000 Oxygen Nitrogen Hydrogen Determinator PC controIIed ON OH w w w. e l l r o g m b h . c o m ME/SRlNC R/NCES /CCR/C /CCESSCRlES 5) Balance 0.0001g to 60 g 0.0001 g 5) Computer PC with HDD, DVD-ROM drive, color monitor and keyboard 5) Color printer with automatic cut sheet feed, other options on request 1) Other ranges on request. 2) Possible by reducing the sample weight. 3) 99.999% pure for low Oxygen analysis 4) Balance (serial - RS232) and printer USB are connected to the PC. 5) Visit our web site for further details (http://www.eltragmbh.com/onh2000/information.shtml). OH operolion Oxygen at 1 gram sample Oxygen at 1 gram sample Power requirements 400 V AC 10% 50/60 Hz 3 phase and neutral or 230 V AC 10% 50/60 Hz single phase on request max 8500 Watts, Weight approx. 140 kg Dimensions Width Height Depth 55 cm (21") 80 cm (31.5") 60 cm (23.5") ON operolion Low oxygen 1) 0.0 - 300 ppm Low oxygen 1) 0.0 - 300 ppm High oxygen 1) up to 2% High oxygen 1) up to 2% Sensitivity 0.01 ppm oxygen 2) ndicating range 0 - 100% oxygen Sensitivity 0.01 ppm oxygen 2) ndicating range 0 - 100% oxygen Hydrogen at 1 gram sample Low hydrogen 1) 0.0 - 50 ppm High hydrogen 1) up to 1000 ppm Sensitivity 0.01 ppm hydrogen 2) ndication range 0 - 100% hydrogen Sensitivity 0.01 ppm nitrogen 2) ndication range 0 - 100% nitrogen Nitrogen at 1 gram sample Low nitrogen 1) 0.0 - 300 ppm High nitrogen 1) up to 2% CENER/L SPEClFlC/TlCNS Chemicals CO trap sodium hydroxide / H O trap magnesium perchlorate / Catalyst copper oxide / Schutzes reagent 2 2 Detection method Solid state infrared absorption for oxygen and thermal conductivity for hydrogen and nitrogen Gas required 3) 3) Nitrogen at least 99.995% pure 2 to 4 bar (30 to 60 psi) / helium at least 99.995% pure 2 to 4 bar (30 to 60 psi) Compressed air 2 bar (30 psi) nterfaces 4) serial and USB Normal sample weight 1 gram Normal analysis time 2 minutes Furnace temperature up to 3000C Furnace power 0 to 8 kW Low oxygen 0.1 ppm or 1% of oxygen present Low oxygen 0.1 ppm or 1% of oxygen present High oxygen 2 ppm or 1% of oxygen present High oxygen 2 ppm or 1% of oxygen present Low nitrogen 0.1 ppm or 1% of nitrogen present Low h 0.05 ppm or 1% of h present ydrogen ydrogen High nitrogen 2 ppm or 1% of nitrogen present High hydrogen 0.5 ppm or 1% of h present ydrogen Calibration Standard samples and gas dosing device on request ONH-2000 5pecilicolions o n o l y s e r s @ e l l r o g m b h . c o m 12.03.2006 13:15 Copper /012 1015.2 mg 235.13 ppm O 1/0 0.45 ppm H 4/0 12.03.2006 13:19 Copper /013 1016.3 mg 238.75 ppm O 1/0 0.47 ppm H 4/0 12.03.2006 13:24 Copper /014 1015.4 mg 231.32 ppm O 1/0 0.41 ppm H 4/0 12.03.2006 13:27 Copper /015 1012.7 mg 236.59 ppm O 1/0 0.39 ppm H 4/0 12.03.2006 13:31 Copper /016 1014.1 mg 233.91 ppm O 1/0 0.44 ppm H 4/0 12.03.2006 14:25 979-3 /004 1150.3 mg 201.76 ppm O 1/0 5.26 ppm H 4/0 12.03.2006 14:29 979-3 /005 1028.3 mg 198.21 ppm O 1/0 5.16 ppm H 4/0 12.03.2006 14:33 979-3 /006 961.4 mg 205.93 ppm O 1/0 4.88 ppm H 4/0 12.03.2006 14:40 976-3 /007 806.4 mg 199.44 ppm O 1/0 4.83 ppm H 4/0 12.03.2006 14:44 976-3 /008 942.7 mg 204.12 ppm O 1/0 5.10 ppm H 4/0 14.03.2006 08:21 Copper /095 1016.0 mg 215.5 ppm O 1/0 9.1 ppm N 4/0 14.03.2006 08:25 Copper /096 1014.9 mg 214.9 ppm O 1/0 8.0 ppm N 4/0 14.03.2006 08:30 Copper /097 1014.6 mg 214.8 ppm O 1/0 8.8 ppm N 4/0 14.03.2006 08:43 Steel /083 1007.2 mg 205.3 ppm O 1/0 51.2 ppm N 4/0 14.03.2006 08:48 Steel /084 1002.8 mg 203.3 ppm O 1/0 50.1 ppm N 4/0 14.03.2006 08:55 Steel /085 1006.4 mg 205.6 ppm O 1/0 51.8 ppm N 4/0 14.03.2006 09:15 Cast ron /086 502.2 mg 72.5 ppm O 1/0 1148.0 ppm N 3/0 14.03.2006 09:20 Cast ron /087 502.7 mg 71.2 ppm O 1/0 1151.3 ppm N 3/0 14.03.2006 09:24 Cast ron /088 499.6 mg 71.7 ppm O 1/0 1146.2 ppm N 3/0 14.03.2006 09:47 Steel /080 500.0 mg 219.2 ppm O 1/0 51.2 ppm N 4/0 14.03.2006 09:54 Steel /081 503.0 mg 210.4 ppm O 1/0 49.0 ppm N 4/0 14.03.2006 09:58 Steel /082 502.0 mg 217.8 ppm O 1/0 52.2 ppm N 4/0 12.03.2006 13:55 130-H/052 125.0 mg 132.16 ppm H 4/0 102 12.03.2006 13:59 130-H/053 116.7 mg 131.23 ppm H 4/0 104 12.03.2006 14:03 130-H/054 122.4 mg 133.89 ppm H 4/0 091 12.03.2006 14:07 130-H/055 131.8 mg 131.95 ppm H 4/0 105 12.03.2006 14:12 130-H/056 122.4 mg 129.62 ppm H 4/0 079 average in the range O : 235.14 standard deviation : 2.773 / 1.18% average in the range O : 201.90 standard deviation : 3.203 / 1.59% average in the range O : 215.07 standard deviation : 0.400 / 1.87% average in the range O : 204.733 standard deviation : 1.000 / 0.488% average in the range O : 71.80 standard deviation : 0.538 / 0.75% average in the range O : 215.80 standard deviation : 3.882 / 1.80% average in the range H : 131.77 standard deviation : 1.531 / 1.16% average in the range H : 0.432 standard deviation : 0.032 / 7.4% average in the range H : 5.05 standard deviation : 0.183 / 3.62% average in the range N : 8.63 standard deviation : 0.499 / 5.78% average in the range N : 51.033 standard deviation : 0.757 / 1.48% average in the range N : 1148.50 standard deviation : 4.768 / 0.41% average in the range N : 50.80 standard deviation : 1.343 / 2.64% OH operation ON operation Copper Titanium SteeI Copper pins SteeI pins Cast Iron driIIings SteeI driIIings ELTRA GmbH Mainstr. 85 BIock 20 D-41469 Neuss Germany +(49) 2137 12822 Fax: anaIysers@eItragmbh.com www.eItragmbh.com +(49) 2137 12513 The contents of the cataIogue are subject to change without prior notice for further improvement. 14.04.2010 ONH-2000 Iypicol resulls ELTRA GmbH Retsch-Allee 1-5 D-42781 Haan Germany Phone: (+49) 02104 2333-400 Fax: (+49) 02104 2333-499 info@eltra.org www.eltra.org