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3/29/2015

SILVACOProductsATHENAProcessSimulationFramework
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MCImplantAdvancedMonteCarloImplantationSimulator
Genericionimplantationsimulatorwhichmodelsionstopping,
defectgeneration,andionimplantationdistributioninamorphous
andcrystalinematerials

Athena
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ProcessSimulationFramework

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Athenaframeworkintegratesseveralprocesssimulationmoduleswithina
userfriendlyenvironmentprovidedbySilvacoTCADinteractivetools.Athena
hasevolvedfromaworldrenownedStanfordUniversitysimulatorSUPREMIV,
withmanynewcapabilitiesdevelopedincollaborationwithdozensofacademic
andindustrialpartners.Athenaprovidesaconvenientplatformforsimulating
processesusedinsemiconductorindustry:ionimplantation,diffusion,
oxidation,physicaletchinganddeposition,lithography,stressformationand
silicidation.

Overview
TCAD
Overview
ProcessSimulation
3D
2D
Athena
SSuprem4
MCImplant
Elite
MCEtch&
Deposit
Optolith
DeviceSimulation
StressSimulation
InteractiveTools
VirtualWaferFab
TCADVideos
Analog,
MixedSignal,RF
CustomICCAD
Interconnect
Modeling
DigitalCAD
ProductExamples
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Licensing
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TechnicalLibrary
Services
Corporate

Brochure3.4MB
ReleaseNotes
Manual
Competitors
TrainingMaterials

KeyFeatures:
Fastandaccuratesimulationofallcriticalfabricationstepsusedin
CMOS,bipolar,SiGe/SiGeC,SiC,SOI,IIIV,optoelectronic,MEMS,and
powerdevicetechnologies
Accuratelypredictsmultilayertopology,dopantdistributions,and
stressesinvariousdevicestructures
Advancedsimulationenvironmentallows:
easycreationandmodificationofprocessflowinputdecks
includingautomaticcontroloflayoutmasksequences
automaticanduserdefinedmeshgenerationandcontrol
interactiveplottingof2Dstructuresanddistributionsaswellas1D
crosssections
runtimeextractionofimportantprocessanddeviceparameters
optimizationofprocessflowandcalibrationofmodelparameters

PresentationsMaterials
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Examples
SupportedPlatforms

Connect
ConnectwithotherSilvaco
TCADusersonLinkedIn:
SilvacoTCADTools
Group

FocusedTCADsupportteamofPh.D.physicistscontinuouslydeveloping
modelsfornewsemiconductortechnologyadvances
Replacescostlywaferexperimentswithsimulationstoenableshortertechnologydevelopmentcyclesand
higheryields
Silvaco'sstrongencryptionisavailabletoprotectvaluablecustomerandthirdpartyintellectualproperty.
SSuprem42DCoreProcess
Simulator

MCImplantAdvancedMonte
CarloImplantationSimulator

SSuprem4isa2D
processsimulatorthat
iswidelyusedinthe
semiconductorindustry
fordesign,analysisand
optimizationofvarious
fabrication
technologies.SSuprem4accurately
simulatesallmajorprocessstepsin
moderntechnologybyusingawiderange
ofphysicalmodelsfordiffusion,ion
implantation,oxidation,etching,
deposition,silicidation,epitaxyandstress
formation.

MCImplantisa
genericion
implantationsimulator,
whichmodelsion
stopping,defect
generation,andion
implantation
distributionsinamorphousandcrystalline
materials.Extensivecomparisonswith
measuredprofileshaveshownthatMC
Implantishighlyaccurateandpredictive.
Thesimulatorcanbeusedformajorityof
ion/materialcombinations,arbitrary
geometries,differentsubstrate
orientations,implantdoses,energiesand
angles.

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EliteAdvancedPhysicalEtching
andDepositionSimulator
Eliteisanadvanced
2Dtopography
simulatorformodeling
physicaletching,
deposition,reflowand
CMPplanarization
processesformodern
semiconductortechnologies.Withinthe
Athenaframework,Eliteprovides
seamlessbidirectionalintegrationwith
SSuprem4andOptolithprocesssimulators
andcontainsanadditionalMCDeposit/Etch
module,whichprovidesseveralMonte
Carlobasedatomisticetchingand
depositionmodels.

MCEtch&Depo2DMonteCarlo
DepositionandEtchSimulator
MCEtch&Depoisan
advancedtopology
simulationmodule
seamlesslyinterfaced
withElite,throughthe
Athenaframework.The
moduleincludes
severalMonteCarlobasedmodelsforthe
simulationofetchanddepositprocesses
whichusefluxesofatomicparticles.
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3/29/2015

SILVACOProductsATHENAProcessSimulationFramework
OptolithAdvance2DOptical
LithographySimulator
Optolithisapowerful
nonplanar2D
lithographysimulator
thatmodelsallaspects
ofmoderndeepsub
micronlithography:
imaging,exposure,
photoresistbake,developmentandreflow.
Optolithprovidesafastandaccurate
alternativetoexperimentalevaluationof
maskprintabilityandprocesscontrol.
Optolithsimulatesbothprojectionimaging
andproximityprintingwithalargemask
toresistgap.
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Typical90nmCMOSProcessFlow

AthenaFrameworkArchitecture

AthenaInputs/Outputs

Rev.042313_22

http://www.silvaco.com/products/tcad/process_simulation/athena/athena.html

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SILVACOProductsATHENAProcessSimulationFramework

Co p y rig h t 1 9 8 4 2 0 1 5 S ilva c o , I n c . Tr a de m a r k s P r i v a c y P ol i c y

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