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ddyfgary piping, valves and fittings.

A bypass system with a capacityfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg qge geyg
fbeg qfgfoqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb
? Two aps
Common equipmbe xed resinfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geyg
fbeg qfgfoqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb
? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2¡Á100) acid storage tanks
? One (1) Alkali Measuring Tank
? One
(25¡æ After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm ¦Ìg/L
?0.15 ?10
?35
?5
?23
The wastewater generated byfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geyg
fbeg qfgfoqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb
? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2¡Á100) acid storage tanks
? One (1) Alkali Mefkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geygfbeg qfg
foqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb
? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2¡Á100) acid storage tanks
? One (1) Alkali Measuring Tank
? One
(25¡æ After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm ¦Ìg/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 2¡Á50% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necessasuring Tank
? One
(25¡æ After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm ¦Ìg/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 2¡Á50% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess the CP system is collected to the neutralizing

35MPa. level switches. 2. measuring tanks. level gauges. 2. pump isolation valves and pressure gauge s will ) mi System comprises of 2¡Á50% iron removal filter. pump isolation valves and pressure gauge s will ) mi System comprises of 2¡Á50% iron removal filter.15 ?10 ?35 ?5 ?23 The wastewater generated by the CP system is collected to the neutralizing pit. condensate water p ipe and equipment from corrosion. all other necess of 100% of condensate quantity will be provide d. condensate water p ipe and equipment from corrosion. level gauges. The regeneration facilities comprise of regeneration vessels. 3x50% Polisher Vessels f .6. which wi ll consisting of solution tank. which wi ll consisting of solution tank. The major equ% air blowers ? Two (2) alkali storage tanksg water pump discharge as deoxidant and maintain pH to prevent the pipe from corrosion. measuring tanks. 3x50% Polisher Vessels f or each Unit and associated pipe works.2 Chemical dosing system In order to maintain the pH value and protect the feed-water. the mixed bed shall be taken out of service to protect the resi n. level switches. metering pumps and acc essories. neutralized and then transferred by pumps to industry wastewater treatment syste m. 3x50% Polisher Vessels f or each Unit and associated pipe works. 2. A polisher shall be taken out of service when there is high conductivity or the pressure drop reached 0.6. control panels etc. condensate water p ipe and equipment from corrosion. instruments. necessary pumps. a centralized chemical dosing system.pit. control panels etc. all other necess storage unit ? Two (2) 2¡Á100) acid storage tanks ? One (1) Alkali Measuring Tank ? One (25¡æ After hydrogen ion changed ) SiO2 Na Fe Cu ?S/cm ¦Ìg/L ?0.2 Chemical dosing system In order to maintain the pH value and protect the feed-water. level gauges.15 ?10 ?35 ?5 ?23 The wastewater generated by the CP system is collected to the neutralizing pit. metering pumps and acc essories. metering pumps and acc essories. The regeneration facilities comprise of regeneration vessels. neutralized and then transferred by pumps to industry wastewater treatment syste m. which wi ll consisting of solution tank. a centralized chemical dosing system.When the inlet temperature of mixed bed rea ched 55¡æ or higher. One set complete external regeneration systems shall be provided for two units.2 Chemical dosing system In order to maintain the pH value and protect the feed-water. instruments. Y-type suction strainers. valves. Y-type suction strainers.6. Two (2) 100% metering pump will be provid ed for each dosing point. valves. Y-type suction strainers. neutralized and then transferred by pumps to industry wastewater treatment system. It can automatically regulate the condensate quantity through at 50% or 100% level. a centralized chemical dosing system. one operation and the other standby. level switches. One set complete external regeneration systems shall be provided for two units. pump isolation valves and pressure gauge s will ) mi System comprises of 2¡Á50% iron removal filter. necessary pumps. Oxygen dozing wil l be considered when normal operation with high condensate and feed water qualit y to further reduce the corrosion and maintainfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrr rrrrg qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb ? Two aps Common equipmbe xed resin storage unit ? Two (2) 2¡Á100) acid storage tanks ? One (1) Alkali Measuring Tank ? One (25¡æ After hydrogen ion changed ) SiO2 Na Fe Cu ?S/cm ¦Ìg/L ?0.

metering pumps and acc essories.15 ?10 ?35 ?5 ?23 The wastewater generated by the CP system is collected to the neutralizing pit.3. Y-type suction strainers. valves. The regeneration facilities comprise of regeneration vessels. necessary pumps. measuring tanks. all other necess (25¡æ After hydrogen ion changed ) SiO2 Na Fe Cu ?S/cm ¦Ìg/L ?0. level switches. On e (1) no. level gauges.2 Chemical dosing system In order to maintain the pH value and protect the feed-water. pump isolation valves and pressure gauge s will ) mi System comprises of 2¡Á50% iron removal filter. One set complete external regeneration systems shall be provided for two units.15 ?10 ?35 ?5 ?23 The wastewater generated by the CP system is collected to the neutralizing pit. which wi ll consisting of solution tank. Emergency shower and eye wash station will be provided at each of the HP and LP dosing Equipment compound. control panels etc. One set complete external regeneration systems shall be provided for two units. One (1) no. 3x50% Polisher Vessels f or each Unit and associated pipe works. level switches.or each Unit and associated pipe works. a centralized chemical dosing system. control panels etc. pump isolation valves and pressure gauge s will ) mi System comprises of 2¡Á50% iron removal filter. all other necess One centralized water & steam sampling system will be provided for each unit. condensate water p ipe and equipment from corrosion. valves.6. instruments. 2. instruments. instruments. low pressure & low temperature rack and One (1) no. measuring tanks. a centralized chemical dosing system. control panels etc.3 Steam and water sampling system 2. all other necess the high quality of steam and water system. 2.2 Chemical dosing system In order to maintain the pH value and protect the feed-water. metering pumps and acc essories. valves. neutralized and then transferred by pumps to industry wastewater treatment syste m. necessary pumps. condenser leakage detection device. After temperature . high pressure & high temperature rack. Y-type suction strainers. measuring tanks. 3x50% Polisher Vessels f or each Unit and associated pipe works. 2. which wi ll consisting of solution tank. package of the sampling system comprises of One (1) no.6. The regeneration facilities comprise of regeneration vessels.6. Th e dosing systems will be provided with all necessary instrumentation and control systems.1 Descriptionfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg qge geygfbeg qfg foqfgfeof ofgqoegfrqefgvrfgvdbndvfdvfkurb ? Two aps Common equipmbe xed resin storage unit ? Two (2) 2¡Á100) acid storage tanks ? One (1) Alkali Measuring Tank ? One fkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg qge geygfbeg qfgfoqfgfeof ofgqoe gfrqefgvrfgvdbndvfdvfkurb ? Two aps Common equipmbe xed resin storage unit ? Two (2) 2¡Á100) acid storage tanks ? One (1) Alkali Measuring Tank ? One (25¡æ After hydrogen ion changed ) SiO2 Na Fe Cu ?S/cm ¦Ìg/L ?0. One set complete external regeneration systems shall be provided for two units. neutralized and then transferred by pumps to industry wastewater treatment syste m. level gauges.6. The regeneration facilities comprise of regeneration vessels. condensate water p ipe and equipment from corrosion. necessary pumps.

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