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AZ 3300-F Photoresist

Data Package

The information contained herein is, as far as we are aware, true and accurate. However, no representations
or warranties, either express or implied, whether of merchantable quality, fitness for any particular
purpose or of any other nature are hereby made in respect of the information contained in this
presentation or the product or products which are the subject of it. In providing this material, no license or
other rights, whether express or implied, are given with respect to any existing or pending patent, patent
application, trademarks, or other intellectual property right.

AZ 3300-F Photoresist
AZ 3312-F
AZ 3330-F

AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3300-F Photoresist
AZ 3312-F

Very fast resist


High resolution (i-line 0.6m, g-line 0.8m)
Excellent for contact holes, vias, implants, and
non critical gates

AZ 3330-F

Great for pad layer applications


Can be coated from 2.5 to 5m

AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3300-F Photoresist
Spin Curves
6

Film Thickness [m]

AZ 3312-F
AZ 3330-F

0
0

1000

2000

3000

4000

5000

6000

7000

rpm

AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

Features & Benefits

Why AZ 3300 Cross-over Resist?


Global infrastructure to support your
worldwide business with expanding local
support networks
Excellent Performance and Value in
all our products and services
Wide selection of solutions to your
problems

AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

Features & Benefits

Sensitivity to g, h, and i-line wavelengths


Process relatively insensitive to bake conditions,

develop times, and develop temperatures


Compatible with inorganic and organic (w/ & w/o
surfactant) developers
Thermal stability to 125
Good depth of focus, linearity, and photospeed
for crossover applications
Very high stability against particle generation
Excellent value for performance
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Suggested Process Conditions

Spray/Puddle Process:
Softbake 90 -110 C,
60 - 90 sec
Expose: g-line, h-line, i-line
stepper or broadband
exposure source
Where necessary, PEB:
110C, 60 - 90 sec.
Develop: AZ 300 MIF
developer, 60 sec. spraypuddle

Double Puddle Process:


Softbake 90 -110C,
60 - 90 sec
Expose: g-line, h-line, iline stepper or broadband
exposure source
Where necessary, PEB:
110C, 60 - 90 sec.
Develop: AZ 917 MIF
developer, 52 sec. double
puddle
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Optical Parameters

Refractive Index
Bleached
n
k

365nm
1.7006
0.00805

405nm
1.6752
0.00433

435nm
1.6611
0.00331

Unbleached
n
k

1.7046
0.03251

1.6872
0.03369

1.6908
0.02028

AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Optical Parameters

Dill Parameters
i-line:
A = 1.0870 (m-1)
B = 0.0700 (m-1)
C = 0.0260 (cm2/mJ)

g-line:
A= 0.6750 (m-1)
B= 0.0150 (m-1)
C= 0.0188 (cm2/mJ)

Cauchy Coefficients
A
1.6217

B
0.01156 m

C
7.77E-07 m4

Unbleached 1.6200

0.00705 m

1.64E-03 m4

Bleached

AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
g-line Swing Curve

60

Dose (mJ/cm )

55
50
45
40
35
30
0.950

1.000 1.050

1.100

1.150

1.200 1.250

1.300

1.350 1.400

Thickness ( m)

SB: 90C, 60sec


PEB 110C, 60sec
AZ300MIF developer, spray puddle,60sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

1.450

AZ 3312-F Photoresist
i-line Swing Curve
45
43

Dose(mJ/cm )

41
39
37
35
33
31
29
27
25
1.050 1.075 1.100 1.125 1.150 1.175 1.200 1.225 1.250 1.275 1.300 1.325 1.350
Thickness( m)

SB: 90C, 60sec


PEB 110C, 60sec
AZ300MIF developer, spray puddle,60sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
With
AZ 300 MIF Developer
Nikon i-line Stepper

AZ 3312-F Photoresist
Exposure Latitude for 0.6m Dense Lines, FT = 1.184 m
0.80

Nominal: 62mJ/cm
Exposure Latitude: 28%

0.75

Measured Linewidth [m]

0.70

0.65

0.60

0.55

0.50

0.45

0.40
44

48

52

56

60

64

68

72

76

Exposure Dose [mJ/cm]

SB: 90C, 60sec PEB 110C, 60sec


AZ 300MIFDeveloper, spray puddle, 60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

80

AZ 3312-F Photoresist
Exposure Latitude for 0.7m Dense Lines, FT = 1.184 m
0.90

Nominal Energy: 63mJ/cm


Exposure Latitude: 34%

Measured Linewidth [m]

0.85

0.80

0.75

0.70

0.65

0.60

0.55

0.50
45

50

55

60

65

70

75

80

85

Exposure Dose [mJ/cm]

SB: 90C, 60sec PEB 110C, 60sec


AZ 300MIFDeveloper, spray puddle, 60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Exposure Latitude for 0.8m Dense Lines, FT = 1.184 m
1.00

Nominal Energy: 62 mJ/cm


Exposure Latitude: 35%

0.95

Measured Linewidth [m]

0.90

0.85

0.80

0.75

0.70

0.65

0.60
50

55

60

65

70

75

80

85

Exposure Dose [mJ/cm]

SB: 90C, 60sec PEB 110C, 60sec


AZ 300MIFDeveloper, spray puddle, 60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Exposure Latitude for 0.9m Dense Lines, FT = 1.184 m
1.10

Nominal Energy: 62mJ/cm


Exposure Latitude: 39%

Measured Linewidth [m]

1.05

1.00

0.95

0.90

0.85

0.80

0.75

0.70
50

55

60

65

70

75

80

85

Exposure Dose [mJ/cm]

SB: 90C, 60sec PEB 110C, 60sec


AZ 300MIFDeveloper, spray puddle, 60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Exposure Latitude for 1.0m Dense Lines, FT = 1.184 m
1.20

Nominal Energy: 64 mJ/cm


Exposure Latitude: 48%

1.15

Measured Linewidth [m]

1.10

1.05

1.00

0.95

0.90

0.85

0.80
50

55

60

65

70

75

80

85

Exposure Dose [mJ/cm]

SB: 90C, 60sec PEB 110C, 60sec


AZ 300MIFDeveloper, spray puddle, 60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Linearity for Dense Lines, Focus = - 0.20 m, FT = 1.188 m
1.10
1.05

Measured Linewidth [m]

1.00
0.95
0.90
0.85
0.80
0.75
0.70

AZ3312-F, 61mJ/cm

0.65
0.60
0.60

0.65

0.70

0.75

0.80
0.85
0.90
0.95
Nominal Linewidth [m]

1.00

1.05

1.10

SB: 90C, 60sec PEB 110C, 60sec


AZ 300MIFDeveloper, spray puddle, 60sec @23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Bossung Curve; 0.7m Dense Lines; FT = 1.18 m
1.0
0.9

CD

0.8
0.7
0.6
0.5
0.4
0.3
-2

-1.5

-1

-0.5

0.5

1.5

46
49
52
55
58
61
64
67
70
73
76
79
82

Focus
SB: 90C, 60sec
PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
DOF 0.7m Dense Lines, FT = 1.18 m , 61 mJ/cm2
-1.4m

-1.2m

-1.0m

-0.8m

-0.6m

+0.2m

0.0m

-0.2m

-0.4m

SB: 90C, 60sec


PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Bossung Curve; 0.8m Dense Lines, FT = 1.18 m
1.1

46
49
52
55
58
61
64
67
70
73
76
79
82

1.0

CD

0.9
0.8
0.7
0.6
0.5
0.4
-2

-1.5

-1

-0.5

0.5

1.5

Focus
SB: 90C, 60sec
PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
DOF 0.8m Dense Lines, FT = 1.18 m, 61 mJ/cm2
-1.6m

-1.4m

-1.2m

-1.0m

-0.8m

-0.6m

+0.4m

+0.2m

0.0m

-0.2m

-0.4m

SB: 90C, 60sec


PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Bossung Curve; 0.9m Dense Lines, FT = 1.18 m
1.2
1.1

46
49
52
55
58
61
64
67
70
73
76
79
82

CD

1.0
0.9
0.8
0.7
0.6
0.5
-2

-1.5

-1

-0.5

0.5

1.5

Focus
SB: 90C, 60sec
PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
DOF 0.9m Dense Lines, FT = 1.18 m, 61 mJ/cm2
-1.6m

-1.4m

-1.2m

-1.0m

-0.8m

-0.6m

+0.4m

+0.2m

0.0m

-0.2m

-0.4m

SB: 90C, 60sec


PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
Bossung Curve; 1.0m Dense Lines, FT = 1.18 m
1.3

46
49
52
55
58
61
64
67
70
73
76
79
82

1.2

CD

1.1
1.0
0.9
0.8
0.7
-2

-1.5

-1

-0.5

0.5

1.5

Focus
SB: 90C, 60sec
PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312-F Photoresist
DOF 1.0m Dense Lines, FT = 1.18 , 64 mJ/cm2
-1.6m

-1.4m

-1.2m

-1.0m

-0.8m

-0.6m
+0.4m

+0.2m

0.0m

-0.2m

-0.4m

SB: 90C, 60sec


PEB 110C, 60sec
AZ 300MIFDeveloper, spray puddle,60sec @ 23C
Nikon 0.54 NA i-line
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3312- F Photoresist
Thermal Flow

No Bake

115C

120C

125C

130C

10 m

1 m

Processing Conditions:
Film Thickness: 1.188m
Soft bake: 90C/60sec, PEB: 110C/60sec
Nikon i-line stepper, 0.54NA, AZ 300MIF Developer, 60sec spray/puddle @23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3330-F Photoresist
With
AZ 300 MIF Developer
ASML i-line Stepper

AZ 3330-F Photoresist
Exposure Latitude for 1.50m Dense Lines, FT = 2.99m
2.0

249 mJ/cm
21% Exposure Latitude

1.9

Measured CD (m)

1.8
1.7
1.6
1.5
1.4
1.3
1.2
1.1
1.0
200

220

240

260

280

300

Exposure (mJ/cm)
SB : 110C for 60sec contact
Exposure : ASML/250 i-line, Conventional NA=0.60 sigma=0.75
PEB : 110C for 60sec contact
Develop: AZ 300 MIF developer / Single puddle for 60 sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3330-F Photoresist
Exposure Latitude for 1.50 m Dense Lines, FT = 2.99m
200 mJ/cm

210 mJ/cm

220 mJ/cm

230 mJ/cm

240 mJ/cm

250 mJ/cm

300 mJ/cm

290 mJ/cm

280 mJ/cm

270 mJ/cm

260 mJ/cm

SB : 110C for 60sec contact


Exposure : ASML/250 i-line, Conventional NA=0.60 sigma=0.75
PEB : 110C for 60sec contact
Develop: AZ 300 MIF developer / Single puddle for 60 sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3330-F Photoresist
Linearity for Dense Lines @ 250 mJ/cm, FT = 2.99m
2

Measured CD (m)

1.75

1.5

1.25

0.75

0.5
0.5

0.75

1.25

1.5

1.75

Mask CD (m)
SB : 110C for 60sec contact
Exposure : ASML/250 i-line, Conventional NA=0.60 sigma=0.75
PEB : 110C for 60sec contact
Develop: AZ 300 MIF developer / Single puddle for 60 sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3330-F Photoresist
Linearity for Dense Lines, FT = 2.99m
2.00 m

1.80 m

1.70 m

1.60 m

1.50 m

1.40 m

0.80 m

1.00 m

1.10 m

1.20 m

1.30 m

SB : 110C for 60sec contact


Exposure : ASML/250 i-line, Conventional NA=0.60 sigma=0.75, 250mJ/cm
PEB : 110C for 60sec contact
Develop: AZ 300 MIF developer / Single puddle for 60 sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3330-F Photoresist
DOF for 1.50 m Dense Lines, FT = 2.99m
2.0

Measured CD (m)

1.9
1.8
1.7
1.6
1.5
1.4
1.3
1.2
1.1
1.0
-1.5

-1.25

-1

-0.75

-0.5

-0.25

0.25

0.5

0.75

1.25

1.5

Focus (m)
SB : 110C for 60sec contact
Exposure : ASML/250 i-line, Conventional NA=0.60 sigma=0.75
PEB : 110C for 60sec contact
Develop: AZ 300 MIF developer/ Single puddle for 60 sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.

AZ 3330-F Photoresist
DOF for 1.50 m Dense Lines, FT = 2.99m
1.00 m

0.80 m

0.60 m

0.40 m

0.20 m

0.00 m

-1.00 m

-0.80 m

-0.60 m

-0.40 m

-0.20 m

SB : 110C for 60sec contact


Exposure : ASML/250 i-line, Conventional NA=0.60 sigma=0.75, 250mJ/cm
PEB : 110C for 60sec contact
Develop: AZ 300 MIF Developer / Single puddle for 60 sec @ 23C
AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are
registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow,
SWG, and TARP are trademarks of AZ Electronic Materials.