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© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia)


on-line Total Ammonia [ ammonia (NH3) + monochloramine (NH2Cl) +
dichloramine (NHCl2)] in Ultra-Purified brine
 Early Warning
 Prevent formation of nitrogen trichloride (NCl3)
 Avoid nitrogen trichloride (NCl3) explosion

on-line FAST hydrogen (H2) in WET chlorine (Cl2)


using Multi Wavelength InfraRed ( IR ) Technology
 Early Warning
 Avoid hydrogen (H2) explosion

by: Chris Du Bois

Safety is not Expensive


It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Chris Du Bois
EVP System Integration Div.

Date of birth: October 18, 1964

AppliTek employee: since January, 1990

Founder of the AppliTek Engineering Dept.


Responsible for concept- and detail
engineering of 400+ on-line analyzer projects
© 2008 AppliTek NV/SA,

WHY  Quality CONTROL


Gas Chromatography
"SAFETY IS NOT EXPENSIVE - IT IS PRICELESS“
Safety
on-line Analyzer Workshop:
Systems Process
for Safety and Safety
ControlManagement (PSM)
of Chlorine Production Plants
EZ-Brine®sulfate EZ-Brine®sulfite www.applitek.com
12 17 18
© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
WHY  SAFETY CRITICAL WHY  SAFETY CRITICAL WHY  SAFETY CRITICAL WHY  prevent CORROSION
The content of this page/document is entirely a non-binding external opinion. Neitherrange:
AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content
range:  PROTECT against Explosion  PROTECT Plant against hydrogen Explosion
1.000 mg/l range: 10 / 20 / 200 ppm (H2O)
range: 0 – 1%vol H2 | 0 – 5%vol 0.5 – 20 g/kg meta bisulfite oxygen (O2) in range: 10 / 100 / 1,000 / 5,000 < 30 seconds
O2 | 0 – 2%vol CO2 | 0 – 2%vol Na2SO4 (Na2S2O5) DRY Chlorine (Cl2) ppm (NCl3) 10 range: 0 – 5%vol H2 response time
N2 | 90 – 2%vol Cl2 (by
by Paramagnetic analyzer
calculation sum all components 11
subtracts from 100 for % Cl2). range: 0 – 5 %vol
10
10 10 12

13 14 13
WHY  WHY  FAST hydrogen (H2) in DRY chlorine (Cl2) moisture (H2O) in DRY chlorine (Cl2)
PROCESS CONTROL SAFETY by multi wavelength INFRARED by Amperometric (P2O5) cell
chlorine (Cl2) in EZ-NCl3®
15 13 DRY Chlorine (Cl2) nitrogen trichloride (NCl3)
16
by multi wavelength UV in DRY chlorine (Cl2)
16 15 WHY  SAFETY CRITICAL
 PROTECT against hydrogen Explosion
EZ-Bleach® range: 0 – 200 ppmvol (H2)
sodium hypochlorite (NaOCl) 14
sodium carbonate (Na2CO3) 12
sodium hydroxide (NaOH) 11 10 9
sodium chloride (NaCl)
in sodium hypochlorite (NaOCl)
oxygen (O2) in hydrogen (H2)
by Electrochemical cell

WHY  brine QUALITY 18


 Up-stream Control Brine Purification
LIMIT dosage of 17 9
WHY  caustic QUALITY
hydroxides (NaOH) & carbonates (Na2CO3) 2
1 range: 10 – 100 ppm (Cl-)

1 8
UPA® titrimetric 7
2 points acid / base pH titration
range: 1 g/l NaOH | 1.5 g/l Na2CO3 4 5

EZ-Chloride®
water
Chlorides (Cl-) in causitc soda (NaOH)
6
3
7

WHY  brine QUALITY WHY  brine QUALITY WHY  brine QUALITY WHY  SAFETY CRITICAL WHY  SAFETY CRITICAL
 Control Brine Filter Cleaning Flush-back  Up-stream Control  AVOID membrane damage  AVOID formation of  EARLY WARNING hydrogen detection
nitrogen trichloride (NCl3)  PROTECT your Chlorine Plant against hydrogen Explosion
range: 0 – 50 FTU / NTU range: 20 ppm Ca2+ & Mg2+ range: 0 – 50 – 100 ppb
range: 0 – 10 ppm FAST hydrogen (H2) in WET chlorine (Cl2)
range: 10 ppm Ca2+
Mg2+ by calculation by multi wavelength INFRARED
4
range: 1000 µg/l
6 < 30 seconds
2 2 3 5 8 response time

EZ-Brine®high EZ-Brine® TONI® special (Total Ammonia)


EZ-Brine® Total Ammonia
calcium (Ca2+) calcium (Ca2+) &
calcium (Ca2+) [ ammonia (NH3) +
ULTRASONIC & magnesium (Mg2+) magnesium (Mg2+) FAST oxygen (O2) in WET chlorine (Cl2)
in HCl (36%) & magnesium (Mg2+) monochloramine (NH2Cl) +
TURBIDITY in Pre-purified Brine in Pre-Purified Brine dichloramine (NHCl2)] by Alternating Pressure Paramagnetic analyzer
in Ultra-Purified Brine
© 2013 – AppliTek NV / SA
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Leading supplier of on-line brine analyzer systems

Associated Member Technical Correspondent

“Works good, Looks Good”


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Leading supplier of Safety Critical (Life Saving)


on-line hydrogen analyzer systems

Associated Member Technical Correspondent

“Works good, Looks Good”


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia)


on-line Total Ammonia [ ammonia (NH3) + monochloramine (NH2Cl) +
dichloramine (NHCl2)] in Ultra-Purified brine
 Early Warning
 Prevent formation of nitrogen trichloride (NCl3)
 Avoid nitrogen trichloride (NCl3) explosion
WHY  SAFETY CRITICAL
 AVOID formation of nitrogen trichloride NCl3)

range: 0 – 10 ppm

TONI® special (Total Ammonia)


Total Ammonia [ ammonia (NH3) +
monochloramine (NH2Cl) +
dichloramine (NHCl2)]
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Vacuum
TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) +

DE- CHLORINATOR
monochloramine (NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine
BRINE
caustic soda Further Chlorine
(NaOH) Processing

Return Brine or Depleted Brine DEPLETED HYDROGEN


BRINE PURIFICATIO
TANK N
Water sodium carbonate (Na2CO3) Filtration Aid
hydroxides (NaOH)

WET chlorine hydrogen


Chemicals (Cl2) (H2)

ION EXCHANGER A

ION EXCHANGER B

ION EXCHANGER C
Salt Raw Saturated Brine Pre-Purified Brine FILTRATION
SETTLING

Re-Generation
Re-Generation
Chemicals
Cl2 H2
WHY  SAFETY CRITICAL Sludge Solids
Precipitated Depleted
 AVOID formation of nitrogen CaCO3 (↓) Brine _
+
trichloride (NCl3) Mg(OH)2 (↓)
range: 0 – 10 ppm 33%

MEMBRANE
BRINE NaOH
STORAGE
320 g/l NaCl caustic
Water soda
(NaOH)

cathode
anode
6 hydrogen
6
Saturate
30%
NaOH
chloride ACIDIFICATION Ultra-Purified Brine
d Brine
(HCl)
ELECTROLYZER
TONI® special (Total Ammonia)
Total Ammonia [ ammonia (NH3)
+ monochloramine (NH2Cl)
+ dichloramine (NHCl2)] WHERE ?
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) + monochloramine
(NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine

WHY ?  EARLY WARNING:


Prevent formation of Nitrogen trichloride (NCl3) | avoid explosion
 Most Chlorine (Cl2) is produced by electrolysis of brine generated by dissolving Sodium
Chloride (NaCl) or Potassium Chloride (KCl) in water (H2O). Side reactions with the Nitrogen
impurities in the salt can lead to the formation of Nitrogen trichloride (NCl3) during the
Chlorine process.

 Nitrogen compounds present in the BRINE are the main source for the formation of
Nitrogen trichloride (NCl3).

 In certain parts of the Chlorine production, the Chlorine is either liquefied or evaporated.
Due to its lower volatility, the NCl3 accumulates in liquid Chlorine.

 Traces of Ammonia (NH3) and other Nitrogen compounds in BRINE can produce NCl3 in
Chlorine.
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) + monochloramine
(NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine

WHY ?  EARLY WARNING:


Prevent formation of Nitrogen trichloride (NCl3) | avoid explosion
Prevention of Nitrogen trichloride (NCl3) formation:
 Approximately 25% of Nitrogen trichloride (NCl3) formed in cells enters the chlorine process (1)
 Ammonia in cell feed brine is the major source (1)

Learning from incidents:


Nitrogen trichlorinde incident @ Orica, Yarraville – 30 July 1998 (1)
One of the conclusions after investigation was: “Inaccurate method and inadequate frequency of analysis
for ammonia in brine”

(1)“ManagingRisks Nitrogen Trichloride” by Shane Fast - Vice President The Chlorine


Institute @ the WORLD chlorine council meeting.

N-compounds + Cl2  NCl3


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) + monochloramine
(NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine

HOW ?
Measuring Principle TONI® special (Total Ammonia)
by Colorimetric analysis (Adapted Berthelot
method conform ASTM 4500-NH3 F)
To determine the total amount of NH3, NH2Cl and
NHCl2, NH2Cl and NHCl2
they have to be converted to NH3. This is done by
adding thiosulphate.

Reactions:
4 NH2Cl + Na2S2O3 + 5 H2O → 2 NaHSO4 + 4 NH3 + 4 HCl
2 NHCl2 + Na2S2O3 + 5 H2O → 2 NaHSO4 + 2 NH3 + 4 HCl
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) + monochloramine
(NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine

HOW ?
Measuring Principle TONI® special (Total Ammonia)

 injection of BRINE sample in analyzer


 addition of buffer  Alkaline
 Initial absorbance value is measured at (λ) 630 nm (ABS 1)
 addition of color solution
 Final Absorbance value is measured at (λ) 630 nm (ABS 2)
 calculation of result: Lambert Beer’s Law ABS = Є . b. C
Є = molar absorptivity (l . cm-1. mol-1)
b = path length (cm)
C = concentration (mol/liter)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) + monochloramine
(NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine

HOW ?

methodology: colorimetric measurement using


adapted Berthelot method
conforms to: ASTM 4500-NH3 F
λ LED: 630 nm
range: 0 - 2 mg/l NH3
(0 - 10 mg/l NH3 by Sample dilution) ~ 0 – 50 mg/l N-NH3
higher range by Sample dilution*
detection limit: ≤ 100 µg/l (for 0-1 mg/l NH3)
precision: < 2% full scale range for standard test solutions
cycle time: 1 cycle/25 minutes
stream selection: 1 stream (up to 3 streams optional)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) + monochloramine
(NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine Field Example
AnaShell® protective shelter
Including single stream
TONI® Special (Total Ammonia)
in Ultra-purified brine
USA
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

TONI® special (Total Ammonia) on-line Total Ammonia [ ammonia (NH3) + monochloramine
(NH2Cl) + dichloramine (NHCl2)] in Ultra-Purified brine Field Example
AnaShell® protective shelter
Including single stream
TONI® Special (Total Ammonia)
in Ultra-purified brine
USA
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Early Warning !

Plant SAFETY
Critical Equipment

 Eliminating the risk of hydrogen explosions in chlor-alkali plants


on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength INFRARED
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Vacuum
on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by

DE- CHLORINATOR
Multi-Wavelength InfraRed
BRINE
8
caustic soda Further Chlorine
(NaOH) Processing

Return Brine or Depleted Brine DEPLETED HYDROGEN


BRINE PURIFICATION
TANK
Water sodium carbonate (Na2CO3) Filtration Aid
hydroxides (NaOH)

WET chlorine hydrogen


Chemicals (Cl2) (H2)

ION EXCHANGER A

ION EXCHANGER B

ION EXCHANGER C
Salt Raw Saturated Brine Pre-Purified Brine FILTRATION
SETTLING

Re-Generation
8

Re-Generation
Chemicals
Cl2 H2
Sludge Solids
Precipitated Depleted
CaCO3 (↓) Brine + _
Mg(OH)2 (↓)

33%

MEMBRANE
BRINE NaOH
 EARLY WARNING hydrogen detection
 PROTECT your Chlorine Plant against hydrogen STORAGE
320 g/l NaCl caustic
Explosion Water soda
8 (NaOH)

cathode
FAST hydrogen (H2) in WET chlorine (Cl2)

anode
by multi wavelength INFRARED 30%
hydrogen NaOH
< 30 seconds ACIDIFICATION Ultra-Purified Brine Saturated
chloride
response time Brine
(HCl)
ELECTROLYZER

FAST oxygen (O2) in WET chlorine (Cl2)


by Alternating Pressure Paramagnetic analyzer
Safety is not Expensive
It is Priceless !
WHERE ?
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

High H2 present High Energy present

Defined as: General Purpose Zone (NON explosion Proof)


WHY ?
Low voltage High Current = High Energy
High Electrical Current  NO electrical Ex Proof Technology possible
Chlorine Electrolysis Process
FAST on-line analysis of Hydrogen (H2) on-line Hydrogen Analyzer system
in WET Chlorine gas to keep the gas
matrix within the flammability limits.

 Field Proven Technology


 FAST Response (T90 = 15 seconds)
 GOOD results during start-up CELL ROOM
 HAZOP approved
Safety is not Expensive
It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Misconceptions ! Plant SAFETY


Critical Equipment

Hindenburg disaster

 hydrogen is a light gas NO RISK


 hydrogen is not an hydrocarbon NO RISK
one of your ONLY protections is to have an

May 6, 1937 Lakehurst, New Jersey

Safety is not Expensive on-line hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed 8
It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)

hydrogen is not waiting to ignite until you


are ready with analysis !!!
Every second counts !!!
Response time of < 35 seconds T90
Do not install an analyzer systems that needs minutes to show results
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

presented by Jean-Pol Debelle (Technical Director Eurochlor)


@ WCC Global Safety Team meeting in Dubai, UAE
October 24th 2013

Safety is not Expensive


It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

presented by Jean-Pol Debelle (Technical Director Eurochlor)


@ WCC Global Safety Team meeting in Dubai, UAE
October 24th 2013

Safety is not Expensive


It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Plant SAFETY
Membrane type Chlorine Production Critical Equipment

on-line H2 in WET Cl2

Cathode
Anode

Safety is not Expensive “Courtesy of the Euro Chlor federation, www.eurochlor.org "
It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Protect Your plant against HYDROGEN Explosions

Hydrogen – Chlorine mixture can be flammable if Hydrogen > 4% (v/v)


WHY ? temperature: 110°C / 230°F
Gas Chlorine by volume
initial pressure: 1 bar / 15psi
Cell gas
Chlorine 31%vol
Hydrogen 0.2%vol
Water vapor 68.2%vol
Inerts 0.6%vol

typical gas - matrix @ wet chlorine header electrolysis cells: Hydrogen – Chlorine
mixture can be
flammable if
Hydrogen
concentration

> 3 - 4%vol

Safety is not Expensive


It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Protect Your plant against HYDROGEN Explosions


Hydrogen – Chlorine mixture can be flammable if Hydrogen > 4% (v/v)
typical chlorine gas travel time = 2,5min.

WHY ? Gas chlorine cell gas outlet compressor 50% liquefaction 90% liquefaction
Chlorine 31%vol 97,5%vol 48.7%vol 9.7%vol
Hydrogen 0.2%vol 0.6%vol 1.2%vol 5%vol
water vapor 68.2%vol - - -
Inerts 0.6%vol 1.9%vol 50.1%vol 85.3%vol
T90 = 15s

 REMARK: Liquefaction is a Dynamic

T90 = 15s

T90 = 15s

T90 = 15s
process. Dry Air, Nitrogen or even in
some cases CO2 are injected to keep the DRYER 1st LIQUEFACTION 2nd LIQUEFACTION
mixture H2 – Cl2 outside the flammable removal of water vapor Cl2 gas condensed Cl2 gas condensed
limits to Liquid Chlorine to Liquid Chlorine
Double system for Safety Double system for Safety

on-line H2 in WET Cl2 on-line H2 in DRY Cl2 on-line H2 in DRY Cl2

Safety is not Expensive


It is Priceless !
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in DRY chlorine (Cl2) by Multi-Wavelength InfraRed
WHY  SAFETY CRITICAL
caustic soda
 PROTECT Plant against hydrogen Explosion
(NaOH) 20%
WASTE CHLORINE GAS

< 30 seconds response time


10 range: 0 – 5%vol H2
SCRUBBER

11

sodium 12
hypochlorite
or
13
bleach
(NaOCl) Tail Gas 13
FAST hydrogen (H2) in DRY chlorine (Cl2)
by multi wavelength InfraRed
LIQUEFIER
CHLORINE

LIQUID CHLORINE CHLORINE Dilution sulfuric acid


STORAGE CONDENSOR Air (H2SO4)
12

CHLORINE DRYER
Cooling High chlorine Low chlorine Chilled
Water CW Pressure Pressure Cooling
Cooling
Water

SECONDARY
Water

COOLER
CW

PRIMARY
COOLER
10 CCW

WET CHLORINE
INTERSTAGE
CHLORINE
DRY CHLORINE

COOLER

DEMISTER
11 COMPRESSOR
DEMISTER

Cooling
Water CW

WET chlorine
chlorine travel time = ± 5 to 6 minutes
(Cl2)
hydrogen – chlorine mixture can be flammable if Hydrogen > 4% (v/v)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)
by Gas-Chromatograph by by
(GC) 1 Thermal Conductivity (TC) 2 Multi-Wavelength INFRARED (MW-IR) 3

Thermal Conductivity Multi-Wavelength INFRARED



+ +
UV light UV light

H2 + Cl2 2 HCl H2 + Cl2 2 HCl


differential measurement H2 and Cl2 is oxidized by UV to HCl
∆ Delta TC before - and after HCl is measured by MW-IR
 Discontinuous measurement oxidation by UV UV reactor % HCl stoechiometrically equal to H2 UV reactor

 Long analysis time (several min.!)


 Selective measurement for H2
 Can only be used for Quality Control  Not Selective measurement for H2  Calibration Matrix - independable
 Cannot be used for Process Control  Calibration Matrix - dependable  Fast Response (T90 < 20 seconds)
 Cannot be used for SAFETY  Does not react first 6 – 12 min. after  Shows Good results @ Plant
 Complex Technology Plant Start-up
Start-up
 High Maintenance  Cannot be used for SAFETY during  Best Available Technology
 Low Up-time Plant Start-up
 Field Proven – High Up-time
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

8 on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)
by Multi-Wavelength
INFRARED (MW-IR)
3
 HOW ?
Best Available Technology
Multi-Wavelength INFRARED measurements eliminates the
influence of the environment and distinguish between H2O
Multi-Wavelength INFRARED
and HCl. This allows measurement of HCl in WET chlorine.
+
UV light

H2 + Cl2 2 HCl
H2 and Cl2 is oxidized by UV to HCl
HCl is measured by MW-IR
% HCl stoechiometrically equal to H2 UV reactor
INFRARED absorption
 Selective measurement for H2 IR spectra 100% Hydrogen Chloride
 Calibration Matrix - independable
 Fast Response (T90 < 20 seconds)
 Shows Good results @ Plant
Start-up
 Best Available Technology
 Field Proven – High Up-time Hydrogen Chloride (HCl) Water (H2O)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

single stream on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed

 typical ± 10 m (32 ft)

Thermostatically controlled electrically traced thick wall PFA insulated sample bundle

Vortex
Cooler Multi-wavelength InfraRed analyzer

Process Valve
Heat Shrink Sample Bundle Entry by Customer DIP-tube
STOP
Main
Chlorine
Salt Washing Header
Water Removal
Salt Filtration
UV reaction (H2 + Cl2  2HCl)
Height = 2 m (6 ft 56)

Pressure Control
double compartment Flow Control
corrosion resistant Sample Aspiration
insulated protected Flame Arrestor Protection
cabinet
IP56 / NEMA 4X

Logic Control
Electrical Compartment 1 Analytical Compartment 2
height = 2 m (6 ft 56) height = 2 m (6 ft 56)
Width = 1 m (3 ft 28) Width = 2 m (6 ft 56)
Depth = 0 m 5 (1 ft 64) Depth = 0 m 5 (1 ft 64)

 Selective measurement for H2


 Calibration Matrix - independable
 Fast Response (T90 < 30 seconds)
 Shows Good results @ Plant Start-up
Width = 3 m (9 ft 84)  Best Available Technology
 Field Proven – High Up-time

UV - Reactor
H2 + Cl2  2HCl Water
Lifting / Mounting Condensate Drain Condensation
Support Pump
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

8 on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)
by Multi-Wavelength
INFRARED (MW-IR)
3
 HOW ?
Best Available Technology
© 2008 AppliTek NV/SA,

Plant SAFETY
Safety Workshop: Process Safety Management (PSM)
Critical Equipment
© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

8 on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)
by Multi-Wavelength
INFRARED (MW-IR)
3
 Pyro Electric Lithium Tantalite
solid-state INFRARED Detector
(FET transistor) with Medium Broadband (Pt)
HOW ?

Sensitivity but High stability. INFRARED source

N2 purged Sapphire N2 purged


NO damage by Cl2 possible Windows NO damage by Cl2 possible

Detector Source
Enclosure Enclosure

Best Available Heated Hastelloy-C Sample Cell Rotating Optical


Technology up to 34 bar (510psi) Filter
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

8 on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)
Start-up Membrane type Chlorine Plant by Gas-Chromatograph (GC)

0.4% H2 in Cl2
5 min. 30 s 1

by
Multi-Wavelength INFRARED (MW-IR) Air Dilution

3
± 6 min. Load (kA)
Multi-Wavelength INFRARED (MW-IR)
Start-up Start-up
Hydrogen HydrogenPeak
peak

0 % H2 in Cl2

by Thermal Conductivity (TC)

2
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

8 on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)
Start-up Membrane type Chlorine Plant by Gas-Chromatograph (GC)

5 min. 30 s 1
0.4% H2 in Cl2

by
Multi-Wavelength INFRARED (MW-IR)
Air Dilution

3
± 5 min.
Multi-Wavelength INFRARED (MW-IR)
Hydrogen Start-up Peak

Load (kA)

by Thermal Conductivity (TC)

0% H2 in Cl2
2
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

8 on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)

Hydrogen (H2) peak during Start-up Membrane type Chlorine Plant


Migration of hydrogen from the cathode compartment to the anode compartment is caused by
small holes in the membrane. This hydrogen flow is mainly depending on the pressure difference
of the two compartments, the pressure in the cathode compartment is higher than in the anode
compartment. This pressure difference is kept constant. Consequently, the flow of hydrogen to the
anode compartment is more or less independent of the cell load.

During start up of the cell, there is hardly any chlorine flow, and consequently, you achieve a
rather high hydrogen concentration. With increasing chlorine production, this hydrogen is diluted,
and the hydrogen concentration decreases.
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

8 on-line analyzer system for the FAST determination of hydrogen (H2) in WET chlorine (Cl2)

Hydrogen (H2) peak during Start-up Membrane type Chlorine Plant

Hydrogen in Wet Chlorine


The issue of excessive hydrogen concentrations on the
chlorine side of a membrane cell during start-up has been
raised. The peak concentrations can be dangerously high
depending on the speed at which the facility goes trough the
start up procedure. The Issue team discussed the issue and
agreed that the phenomenon was generally understood by
all producers
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Start-up Membrane type Chlorine Plant

± 20 min.
∆ P H2 / Cl2 (mbar)
2%vol H2 in Cl2

by
Multi-Wavelength INFRARED (MW-IR)

3
0,85%vol H2 in Cl2 Load (kA)
2%vol
2 2 (MW-IR)
Multi-Wavelength INFRARED
H in Cl
START

Hydrogen Start-up Peak

0%vol H2 in Cl2
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line hydrogen (H2) in WET chlorine (Cl2) PRECONDITIONING

FIELD proven preconditioning @ Sample Take Off Point (STOP)


 Sample Probe with DIP-tube
 Sample Cooler / Coalescer
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line hydrogen (H2) in WET chlorine (Cl2) PRECONDITIONING

measures the sample after oxidation


(H2 + Cl2  2HCl)
H2 and Cl2 is Oxidized by UV to HCl and is
measured by the INFRARED analyzer
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line hydrogen (H2) in WET chlorine (Cl2) PRECONDITIONING

FIELD proven preconditioning


 Salt Filtration
 Water removal
 UV reactor (H2 + Cl2  2HCl)
 Flow & Pressure Control
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Protect Your plant against HYDROGEN Explosions


Due to high electrical currents a Chlorine Production Plant is defined
as General Purpose zone  Need for Flame Arrestors
Chlorine
resistant Flame
Arrestor

Protection

ANALYZER system CHLORINE Plant

Chlorine
resistant Flame
Arrestor

Your Analyzer system can be a source of explosion for your plant !


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength INFRARED
FIELD Example

example AnaShell® multi-compartment protective cabinet


Plant SAFETY 1 x on-line Analyzer system for Hydrogen in WET Chlorine
Critical Equipment (Multi Wavelength INFRARED)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Joutseno Finland
example AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for hydrogen in WET chlorine

Plant SAFETY
Critical Equipment
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Plant SAFETY
Critical Equipment

Joutseno Finland
example AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for Hydrogen in WET Chlorine
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Plant SAFETY
Critical Equipment

Joutseno Finland
example AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for Hydrogen in WET Chlorine
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of Hydrogen (H2) in WET Chlorine (Cl2) by Multi-Wavelength INFRARED

The bitterness of poor quality remains long after the sweetness of low
price is forgotten, especially for life saving, safety critical equipment

You can only apply Best Available Technology

Safety is not expensive, it is priceless

Plant SAFETY
Critical Equipment
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Plant SAFETY
Critical Equipment
Yokkaichi,Japan
example AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for Hydrogen in WET Chlorine
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example Repeat Order

Yokkaichi,Japan
Plant SAFETY example AnaShell® multi-compartment protective cabinet
Critical Equipment 1 x on-line Analyzer system for Hydrogen in WET Chlorine
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example Repeat Order

Canada
Plant SAFETY example AnaShell® multi-compartment protective cabinet
Critical Equipment 1 x on-line Analyzer system for Hydrogen in WET Chlorine
(Multi Wavelength INFRARED)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Banten, Indonesia Plant SAFETY


ASC PHASE –V Expansion Project Critical Equipment
AnaShell® multi compartment protective cabinet
1 x on-line Analyzer system for Hydrogen in WET Chlorine
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Russian Federation
Plant SAFETY IKRA Project
AnaShell® multi compartment protective cabinet
Critical Equipment 2 x on-line Analyzer system for Hydrogen in WET Chlorine
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example Repeat Order

Plant SAFETY
Critical Equipment

Geismar, LA, USA


AnaShell® multi compartment protective cabinet
3 x on-line Analyzer system for Hydrogen in WET Chlorine
(Multi Wavelength INFRARED)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example Repeat Order

Plant SAFETY
Critical Equipment

Geismar, LA, USA


AnaShell® multi compartment protective cabinet
3 x on-line Analyzer system for Hydrogen in WET Chlorine
(Multi Wavelength INFRARED)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example Repeat Order
Plant SAFETY
Critical Equipment

Geismar, LA, USA


AnaShell® multi compartment protective cabinet
3 x on-line Analyzer system for Hydrogen in WET Chlorine
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Manual Stream Selection
typical ± 10 m (32 ft)

Vortex
Cooler
Thermostatically controlled electrically traced thick wall PFA insulated sample bundle

Multi-wavelength InfraRed analyzer

Process Valve
Heat Shrink Sample Bundle Entry by Customer DIP-tube
DIP-tube
DIP-tube
STOP
DIP-tube Main
Chlorine
Salt Washing DIP-tube
Header
Water Removal
Salt Filtration DIP-tube
UV reaction (H2 + Cl2  2HCl)
Height = 2 m (6 ft 56)

DIP-tube
Pressure Control
double compartment Flow Control DIP-tube
corrosion resistant Sample Aspiration
insulated protected Flame Arrestor Protection
cabinet
IP56 / NEMA 4X

Logic Control
Electrical Compartment 1 Analytical Compartment 2
height = 2 m (6 ft 56) height = 2 m (6 ft 56)
Width = 1 m (3 ft 28) Width = 2 m (6 ft 56)
Depth = 0 m 5 (1 ft 64) Depth = 0 m 5 (1 ft 64)

 Selective measurement for H2


 Calibration Matrix - independable
 Fast Response (T90 < 30 seconds)
 Shows Good results @ Plant Start-up
Width = 3 m (9 ft 84)  Best Available Technology
 Field Proven – High Up-time

UV - Reactor
H2 + Cl2  2HCl Water
Lifting / Mounting Condensate Drain Condensation
Support Pump
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Dual stage
Salt MANUAL
Crystal Flow & Pressure Oxidation
°t Cl2 + H2 = 2HCl
Gas Cooler Filter Control
Flame
Arrestor

H2O H2O

Vent

Flame
Arrestor

STOP 1 STOP 2 STOP 3 STOP X Multi-Wavelength


INFRARED ANALYZER
Sample Take Off Probes with dip-tube
OUT
Alarm

4 – 20mA
% HCl
stoechiometrically
equal to H2
ModuPlex® MANUAL Multiple Stream Control IN
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Rayong, Thailand
AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for H2 in WET Chlorine
Plant SAFETY (Multi Wavelength INFRARED)
Critical Equipment
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Plant SAFETY
Critical Equipment

Rayong, Thailand
AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for H2 in WET Chlorine
(Multi Wavelength INFRARED)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
typical ± 10 m (32 ft)
ModuPlex® Automatic Stream Selection Thermostatically controlled electrically traced thick wall PFA insulated sample bundle


Vortex
Cooler

Multi-wavelength InfraRed analyzer

Process Valve
DIP-tube
Heat Shrink Sample Bundle Entry by Customer
DIP-tube
STOP
DIP-tube Main
Chlorine
DIP-tube
Header
Salt Washing DIP-tube
Water Removal
Height = 2 m (6 ft 56)

Salt Filtration DIP-tube

Logic Control double compartment UV reaction (H2 + Cl2  2HCl)


corrosion resistant Pressure Control
insulated protected Flow Control
cabinet Sample Aspiration
IP56 / NEMA 4X Flame Arrestor Protection

Electrical Compartment 1 Analytical Compartment 2


height = 2 m (6 ft 56) height = 2 m (6 ft 56)
Width = 1 m (3 ft 28) Width = 3 m (9 ft 84)
Depth = 0 m 5 (1 ft 64) Depth = 0 m 5 (1 ft 64)

 Selective measurement for H2


 Calibration Matrix - independable
 Fast Response (T90 < 30 seconds)
 Shows Good results @ Plant Start-up
Width = 4 m (13 ft 12)  Best Available Technology
Lifting / Mounting
 Field Proven – High Up-time
Support ModuPlex®
Automatic Stream Selector
UV - Reactor
H2 + Cl2  2HCl Water
Condensate Drain
Pump Condensation
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength INFRARED
Dual stage
ModuPLEX® Salt Crystal Flow & Pressure Oxidation
Stream °t Cl2 + H2 = 2HCl
Selection
Gas Cooler Filter Control
Flame
Arrestor

H2O H2O

Coalescer Coolers
Vent
Cooling

Sample take-off PROBE’s with DIP-Tubes Flame


Arrestor
STOP 1 STOP 2 STOP 3 STOP 9
Multi-Wavelength
WET Chlorine Headers
INFRARED ANALYZER
OUT
Alarm

4 – 20mA
ModuPlex® AUTOMATIC Multiple Stream Control % HCl
stoechiometrically
equal to H2
IN
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

example AnaShell® multi-compartment protective cabinet


4 x on-line Analyzer system for Hydrogen in WET Chlorine Plant SAFETY
(multiple Wavelength INFRARED) Critical Equipment
Including NEW ModuPLEX® Multiple Stream Control
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example
Plant SAFETY
Critical Equipment

2 pc AnaShell® multi-compartment protective cabinets


1 x on-line Analyzer system for Hydrogen in WET Chlorine
by multi-Wavelength INFRARED)
1 x on-line Analyzer system for Oxygen in WET Chlorine
(alternating pressure PARAMAGNETIC analyzer)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Plant SAFETY
Critical Equipment

Jubail, Saudi Arabia


AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for H2 in WET Chlorine using NEW ModuPlex® stream selector
(multiple (19) streams !)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example

Plant SAFETY
Critical Equipment

Jubail, Saudi Arabia


AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for H2 in WET Chlorine using NEW ModuPlex® stream selector
(multiple (19) streams !)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

on-line FAST determination of hydrogen (H2) in WET chlorine (Cl2) by Multi-Wavelength InfraRed
Field Example
Plant SAFETY
Critical Equipment

Brasil
AnaShell® multi-compartment protective cabinet
1 x on-line Analyzer system for H2 in WET Chlorine
(Multi Wavelength INFRARED)
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

“You can also belong to the right club of believers


in AppliTek!”
David Laurier, CEO AppliTek
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

For Info on AppliTek


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

• Headquarters & manufacturing: Belgium (Flanders region)


• Established manufacturer of on-line (automatic) analyzers
• System Integrator for several industries
• Wholly-privately owned company, non stock listed
• Represented in 100+ countries

• 2015: 30 years of experience in on-line analysis


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

a complete solution for a measuring problem


Plug – Play – Educate - Service
Application • Colorimetry
& Feasibility • Ionometry
• Titration
Commissioning • Voltammetry
Analyzer • Spectrometry (UV, IR, NIR, XRF, Raman)
& Training
• Chromatography
Analytical • Respirometry
Expertise • Bio monitoring
System Sample
Integration preconditioning

Engineering
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Application Laboratory

 Advice of best analysis method


 In-house feasibility studies
 Application development.
 Danger Assessment Studies Application
 In-house customer & product training & Feasibility
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Production of wide-range wet chemical on-line Analyzers

Analyzer
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Process Dedicated-series Water Analyzers


Analyzers: TONI®, TOPHO®, AppliTOC®, AppliCOD®,
• titration Ra-BOD®, Ra-TOX®
• ionometry
• colorimetry
Toxicity /
Single Heavy Metal Microbiology
Parameter Analyzers analyzers
series VPA® AppliTox® | EZ-ATP®
Analyzers
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Engineering

Sample
Preconditioning
 In-house CAD ExPert team
 In-house Ex Proof (ATEX/NEC) ExPert team
 In-house Software/PLC expert team
 Cost planning
 Basic & Detail engineering
Engineering
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

System Integration

 in-house quality & safety control


 Flexible changes of scope of supply
 Project & Site Management System
 FAT prior to shipment Integration
 Fully equipped workshop
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

®
AnaShell concept NEC 505 / ATEX
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

20 years Field Proven on All Continents

®
AnaShell concept NEC 505 / ATEX
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Enclosure Protection by
®
AnaShell concept vacuum to scrubber
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

Successful both in Desert & Artic Locations

®
AnaShell shelter concept
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

System Integration through Analytical Expertise

State of the Art


Analytical Solutions

Expertise in stainless steel /


monel / hastelloy c
(Swagelok | Parker | Gyrolok)

“Works good, Looks Good”


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

System Integration trough Analytical Expertise

State of the Art


Analytical Solutions

PVDF / KynarTM / PFA / TeflonTM

“Works good, Looks Good”


© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

 Site Acceptance Test (SAT)


 Start up / Test runs
 Operator / Product training
 Maintenance (contracts)
Commissioning
 Periodic preventive checks & Training
Commissioning / After Sales Service
© 2008 AppliTek NV/SA,

Safety Workshop: Process Safety Management (PSM)

© CDB 2014 AppliTek Nov. 14th 2014 Hilton – São Paulo Brazil www.applitek.com
The content of this page/document is entirely a non-binding external opinion. Neither AppliTek NV nor any of its employees can be held liable for damages to people, third parties, goods and assets, that may result from implementing the content

AppliTek REFERENCES ?