ELECTROCHEMICAL ALTERNATING GRADIENT FORCE MAGNETOMETER

J.E.Schmidt, A. Morrone Laboratório de Magnetismo Instituto de Física - UFRGS 91501-970 Porto Alegre, RS (Brazil) P. Allongue Laboratoire de Physique des Liquides et Electrochimie CNRS UPR - 15, Université P. & M. Curie, 4 Place Jussieu, Tour 22 E5, 75005 Paris (France)
-0,50

Fig.1 . The EC-AGFM setup

1,2 Potential Magnetization 1,0 0,9

Potential of Deposition (V)

-0,75

Cu

Magnetization (a.u.)

0,7 0,6 -1,00 0,4 0,3 -1,25 0,1

Co
-1,50 0 20 40 60 80 100 120 140 160

0,0 -0,1 180

deposition time (s)

In times when efforts are being made to develop new magnetic materials based on nanostructures, the techniques for producing them are being developed or refined, and the ones for characterizing them are also under central attention. Under this focus, the electrochemical (EC) deposition techniques to obtain high quality nano-materials are being explored and this, in return, calls for techniques to characterize them properly, preferentially in situ, during its formation. It is known that there are very few in situ techniques envisaged to study the magnetic properties of materials in EC environment[1], but we succeeded in constructing an Alternating Gradient Force Magnetometer[2] for use in this situation (ECAGFM)[3] Fig. 1. We will show the possibilities of the experimental setup, its capability for measuring the magnetization as a function of most any of the EC variable parameters including time and mass evolution (Examples in Fig. 2 and Fig. 3) Acknowledgments : We would like to acknowledge the contributions of L. Cagnon, A. Gündel, C.I.Gomes, E. Chassaing, and F. Maroun in testing and using the EC-AGFM in their research work. References : [1] Schindler W. et al., Phys. Rev B, 55 (1987) R1989; J.Appl. Phys, 81(1997)3915
[2] Zilstra H. , Rev. Sci. Instrum. 41(1970) 1241; Reeves, R. , J. of Phys. E: Sci. Instrum.5( 1972) 547; Flanders P.J., J. Appl. Phys. , 63 (1988) 3940 [3] L. Cagnon, T. Devolver, R. Cortes, A. Morrone, J.E. Schmidt, C. Chappert, and P. Allongue, Appl. Surface Sci., 164(1-4):22-28, Aug 2000.; A. Gündel, L. Cagnon, C. Gomes, A. Morrone, J. E. Schmidt, and P. Allongue, Phys. Chem . Chem. Phys 16 (2001) 3330.

Fig 2 – Deposition x time for a Co/Cu multilayer

140,0µ 120,0µ Magnetisation (V) 100,0µ 80,0µ 60,0µ

G16 1mM Fe H⊥= 100 Oe

-1.50 V/MSE -1.55 V/MSE -1.60 V/MSE -1.65 V/MSE -1.70 V/MSE

1 - 2 ML Fe

40,0µ 10 20 30 40 Time (s) 50 60 70

Fig 3 – Deposition x time for a Fe ultra thin film

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