You are on page 1of 27

| || 

 

m 


   |  |   | 
  
  

 

a   


   

p    
  
     
  
    
       
      
         
       
       
     
DRAWBACKS OF PHOTOLITHOGRAPHY

_ 
       
 
      
      
 
    
! "   
# $  
% & ''
' 

SOLUTION?
" (   
|  
  

| 
  



  | 

  


|   
  |  
     

  
i   | 
      
        
    
      

      
    

        
   
   
 !      
       
   
"      #   
         
 
$ %     !
&   ' &'!  
         
 
`   
 





`


HISTORY
s |   
   
   ( 
) *     
 +
s |      
,,$   - *   

       
  .  $!
 // -
s %    $ 0 

s       ,,1

8
PARAMETERS

|"          ( 


1. SUBSTRATE

2. PATTERNING MATERIALS
3. IMPRINT PARAMETERS

 +i(&%'

ü   
 ''$     ) 
$'
*   

+

ü*  
* 
(     
 
 ,    -.
    , +
 -.

 /001|"| */01"/
ü 2    ,2**/-      
, '-
ü  ' 3''1 ,31-
ü #4445 
 
   
 0 |".2 |".
6
ü 74445    ( 

WHAT IS PMMA?
m
  m)  
  

  
 
  
 
 

 

 


 
  *21"|0 2/1/*01
ü  

s &     8


(    
ü
s O  '        '
  

s 9   

  


ü÷ 
sO  '     ' 


    
 
ü&   
s0 
    ' 
  

s"      (($0. $ $ 
''   
FORGETTING ONE OF THE MOST IMPORTANT THINGS?

` 

MOLD MADE OF NANOTECHNOLOGY


 `` 
 a 

 


     
STAMPS (MOLD)
†0     '$    
†    
'
  
_ 
(    
    
   

—  (    

´* 
(    :  .  
&  .2 .;
 .| .& 
´  (       

 
  -  
   23-

´ ( ,6-


´    ,O-
´  
´/  '   ,/*-
´<  

  %4#
 

´/    '
  
. 
   .  $ (
( 
´0    8   
'  (

 '$ 
  :
ü& '
 

'
ü'  (,/*-

' (  
ü&  

'
ü"
  
     
  
›  
    
   |   
  4|
 m


  
  m
 m 

1. THERMOPLASTIC NANOIMPRINT L ITHOGRAPHY

´'    |!           


´%   ÷ '

s 
     !    s%  


 &!  
!!   
  
 
 
 % 
s
     "!#      
     

 
$
   
 
 
  s
 
  
  
s
 
 
 
   
 ' 
›  
    
2.PHOTO NANOIMPRINT LITHOGRAPHY
 2      
 %   * '

s 0      


      
 
s %       
  
    
0
s       +5 


     

s       &' 
          
 
s     
 
 0   $/
 6 
s (   
       
 

&8
›  
    
3.DIRECT PATTERNING
 |      2 |"0 |"
s 2 $ 
     
s  / &  "  ,/&"-
      

(  $     $ 
 ;
  
     
     
s         . 
'   
s     '  '  .  '   ' 
    

&"
WHAT MAKES NIL 'Ú Ú  'THAN OPTICAL LITHOGRAPHY?

& '
 
 
   
  

  
 

 
       

   
 


 

    


   
   
 
 


   

 
     
    
  
  
   
(    
    
        

 
   

    
  
 
   
      
%   

          
      
  
  
 
 
    
    
) 
    

 


    

   
     

 
  

   
  


      
  
   


  
  
8   
  

"  `  

&! 
 
   

E-BEAM LITHOGRAPHY OR UV
LITHOGRAPHY IS STILL NEEDED!!


   
 
    
'*   
  )
&    

 

   

    
 
 
  
  
   

(   
       
 
  

 

     


   
   

   
  
%    
 
     +
    
  
 
 
 
) 
 
 
 
SOME IMPORTANT FACTS FROM VARIOUS PAPERS AND JOURNALS

´a 4     22%   /$ 7*


´(  
   0    "/7  8/ 7
´ 

     1//  ,// 
´&'        0 "//   ,/   
*÷3+9   
´*   
        /   9  
   
´*      #               
    #    
LIMITATIONS

3 ( % 


     
'
         
    (   
"2    ) #


ü    
 +     
 %,&!%#   
  
   
 ( 8,&! 
ü   
  

 
  


 

  

 

`

 
 ! 
CHALLENGE OF FUTURE RESEARCHERS
†  
   
 
+
    
 
 
 
†   
   
      
†  +      

† 

    
 
% 
  
     
† 
      



    
  

    
&!   
        

     
 
 
         
`     
s |"     
    "=
s 2    
     
' 
s |"(
   
  
s &  01 
,&01-  +

s |"(
   
 

 
s 1  '&(> 

 **  
s    '*   
s   '  .

.
 .
&|/     

%
CONCLUSION
|   
             *9
: //1   '          

 
|   
 

!               


      

     
  
 
    

 
             

  

FUTURE OF NANOIMPRINTIG LITHOGRAPHY IS OBVIOUSLY PROMISING


WE WOULD BE HAPPY TO
ANSWER ANY OF YOUR QUERRIES.

›