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University of Virginia, Dept.

of Materials Science and Engineering


1
Vacuum Science
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o Vacuum is obtained in a portion of space where matter and
radiation are absent

o Vacuum as obtained in laboratory chambers is a space with
reduced pressure w/respect to the ambient

o Pressure is the force per unit area acting on a surface in a
direction perpendicular to that surface.

o Mathematically:
P = F/A
where:
P is the pressure
F is the normal force
A is the area.
What is Vacuum?
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Vacuum Science
1) Why are we studying vacuum science?
A:
Reduce contamination by reducing the numerical density of
species

Kinetic energy of the species is maintained unaltered by
reducing the probability of collisions

2) What is a vacuum system?
A combination of pumps, valves, and pipes, which create a
region of low pressure. It can be anything from a simple
mechanical pump to complex ultra high vacuum systems.
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Pressure Units
o 1bar = 750.06 Torr
o 1 mTorr = 0.133 Pa
o In vacuum technology both mbar and Torr are used
Unit Symbol Pascals
Pa Pa 10
5
Pa
Millibar mbar 100 Pa
Torr Torr 133.32 Pa
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Three levels of vacuum normally recognized

Low vacuum 760 to 25 Torr = 100 to 3.3 kPa
Medium vacuum 25 to 110
-4
Torr = 3.3 kPa to 13 mPa
High vacuum 110
-4
to 110
-8
Torr = 13 mPa to 1.3 Pa
Ultrahigh vacuum 110
-9
Torr and less = 130 nPa and less

Each level is suitable for specific applications and obtained by special
pumping systems

Each pumping system rely on a different physical principle to produce
the vacuum and is working in a specific pressure range.
Working Conditions Another False Statement
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Collision Free Conditions P < 10
-4
Torr
Maintenance of a Clean Surface P < 10
-9
Torr
vacuum Pressure
(Torr)
Gas Density
(molecules m
-3
)
Mean Free
Path (m)
Time / ML
(s)
Atmospheric 760 2 x 10
25
7 x 10
-8
10
-9

Low 1 3 x 10
22
5 x 10
-5
10
-6

Medium 10
-3
3 x 10
19
5 x 10
-2
10
-3

High 10
-6
3 x 10
16
50 1
Ultra High 10
-10
3 x 10
12
5 x 10
5
10
4

Summary I
University of Virginia, Dept. of Materials Science and Engineering
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Kinetic Picture of an Ideal Gas
Assumptions for this treatment of Gases:
A volume of gas contains molecules

Adjacent molecules are separated by distances that are large
relative to the individual diameters

Molecules are in a constant state of motion

Collisions are elastic
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Gas Properties
Atmospheric Pressure at Room Temperature
Ultra High Vacuum at Room Temperature (10
-9
Torr)
~2.5x10
25
molecules/m
3
(large number!)
~2.5x10
13
molecules/m
3
, 2.5x10
7
molecules/cm
3
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Maxwell-Boltzmann Distribution
1) Average particle velocity

2) Peak Velocity (dn/dV= 0)


3) Root Mean Square Velocity (RMS)
0
0.0002
0.0004
0.0006
0.0008
0.001
0.0012
0 200 400 600 800 1000 1200
Velocity (m/s)
d
n
/
d
V
dN/dV
peak
average
RMS
2
1
8
|
|
.
|

\
|
=
m
KT
avg
t
v
2
1
2
|
.
|

\
|
=
m
kT
v
p
2
1
3
|
.
|

\
|
=
m
kT
v
rms
particle of mass m
e Temperatur T
Constant s Boltzman' K
velocity
:
=
=
=
= v
where
Maxwell-Boltzmann Statistics
v
avg
= 1.128 v
p
and v
rms
= 1.225vp
Used for particle flow
2
1
8
|
|
.
|

\
|
=
M
RT
avg
t
v
2
1
2
|
.
|

\
|
=
M
RT
v
p
2
1
3
|
.
|

\
|
=
M
RT
v
rms
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| Pressure (| particle density), + mean free path
Requirement for experiment in vacuum: Path length between surface and
detector might be 1 m, the pressure must be less than about 10
-7
atm
(7.67x10
-5
Torr).
The Mean Free Path
Mean free path (), what does it mean?
density particle gas n
diameter molecular
:
2
1
2
2
1
=
=
=
d
where
n d t

) (
10 5
) (
3
Torr P
x
cm
mfp

=
(for air at room temperature)
-average distance a particle travels before it collides with another particle:
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The measure of the frequency with which molecules impinge or collide
with a surface. The # of molecules that strike an element surface,
perpendicular to the coordinate direction, per unit time and area is:
Collisions with Surfaces Particle Flux
Area A
n
Hertz-Knudsen eqn.
M
RT
n dn
x x
t
v
2
0
= = u
}

A A
N
nRT
N
nM
P = =
3
2
v
remember:
s cm moles
MRT
P
N
A
=
u
2
/
2t
s cm molecules
MT
P
x / / 10 513 . 3
2 22
= u
A useful variation is:
P in Torr
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Monolayer Formation Times
Assuming a typical interatomic distance for a solid surface of 3.1:

2
10
10 1 . 3
1
#
|
.
|

\
|
=

m x
atoms surface
Requirement for experiment in vacuum: A clean surface quickly
becomes contaminated through molecular collisions,
p must be less than about 10
-12
atm (10
-9
Torr).
10
-10
to 10
-11
Torr (UHV-ultra high vacuum) is the lowest pressure
routinely available in a vacuum chamber.
At 300K and 1 atm, if every N molecule that strikes the surface
remains absorbed, a complete monolayer is formed in about t = 3 ns.
If p = 10
-3
Torr (1.3 x 10
-6
atm), t = 3x10
-3
sec
If p = 10
-6
Torr (1.3 x 10
-9
atm), t = 3 sec

If p = 10
-9
Torr (1.3 x 10
-12
atm), t = 3000 sec or 50 min

= 1 x 10
19
m
-2
= 1 x 10
15
cm
-2
P
MT
x
atoms
S
t
stick
c
22
10 513 . 3
# 1
(sec)=
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Summary II
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Low Pressure Properties of Air
Summary III
OHanlon
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Pumping Speed
where:
C = Conductance, Units = m
3
/s: the ability of an object to transport gas
between two pressures regimes.

Q = throughput, Units = l/s, Pa-m
3
/s: quantity of gas (the volume of gas at a
known pressure) that passes a plane in a known time.
) (
1 2
P P
Q
C

=
Q = P(dV/dt) where: P = pressure and dV/dt = volumetric flow rate
Mass Flow - Units = kg/s: The quantity of a substance (kg) that passes a plane
in a known time.

Molecular Flow - Units = N/s: The quantity of a substance (number of
molecules N for example) that passes a plane in a known time.
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Series
2 1
1 1 1
C C C
T
+ =
C
1
C
2
C
T
= C
1
+ C
2

Parallel
C
2 C
1
Pump Down and Conductance
University of Virginia, Dept. of Materials Science and Engineering
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Reduction of
pumping
speed
depends on
tube diameter
and length.
( )
b
P P
Q
S

=
C
S
S
S
P
P
b
+
=
1
In General:
where S
P
is the intrinsic speed at
the pump inlet (S
P
=Q/P
P
) and S is
the effective pumping speed at the
base of the chamber. What does
this tell us?
Pumping Speed - S
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Pump Down Procedure
1.Start-up
Turn on pumps
Open foreline
valve
2.Close foreline valve
3.Open roughing
valve
4. Rough chamber
~100mTorr
5.Close roughing
valve
6.Open foreline valve
7.Open high-vac
valve
Foreline Valve
high-vacuum
pump
chamber
mechanical
pump
high-vacuum
Valve
roughing valve
N
2

vent valve
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Venting Procedure
1.Close high-vac
valve
2.Open vent valve
Why N
2
or Ar for
venting chamber??
Foreline Valve
high-vacuum
pump
chamber
mechanical
pump
high-vacuum
Valve
roughing valve
N
2

vent valve
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Leaks:
Real: a defect that allows room
gas into the vacuum system
Virtual, Screws, improper welds,
sample jigging, etc

System Leaks:
< 10
-6
TorrL/s: Very Leak Tight
~ 10
-5
TorrL/s: Adequate
> 10
-4
TorrL/s: Needs work

Issues in Pump Down
Pump
Permeation
Real
leak
Virtual
leak
Vaporization
Desorption
Diffusion
Back streaming
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Real Systems
Pressure limits in vacuum
systems


1st term -- time dependence of
pressure that is due to the gas
in the chamber volume (exp(-t))
2nd term -- pressure due to
outgassing (~ t
-1
)
3rd term -- pressure due to
diffusion (~ t
1/2
and later exp(-
Dt))
4th term -- pressure due to
permeation (constant)
eff
K
eff
D
eff
O
eff
S
Q
S
Q
S
Q
V
t S
P P + + +
|
|
.
|

\
|

= exp
0
10
1

10
3
10
5
10
7
10
9
10
11
10
13
10
15
10
17

10
10
-1

10
-3

10
-5

10
-7

10
-9

10
-11

10
-13

10
3

Time (s)
Pressure
(Torr)
Volume ~ exp(-t)
Outgassing ~ t
-1
Diffusion ~ t
-1/2
Permeation
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Mandatory
Working chamber
Sample holder
Pumping system
Pressure control
Temperature control
Feed thru for the
deposition process

Optional
Residual gas analysis
In situ sample analysis
AFM/STM, XPS, etc.
Vacuum Systems
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Classifications
Pumping Action
Entrainment pumps
Positive displacement
Rotary Vane (m)
Rotary Piston (m)
Roots Blower (m)
Momentum transfer or kinetic
Turbomolecular (m)
Diffusion (nm)
Capture pumps (entrapment)
Cryosorption (nm)
Ion -sputter sublimation (nm)
Titanium sublimation pumps (nm)
Pressure Ranges
1) 760 torr to 1x10
-3
torr
(essentially viscous flow -
roughing pumps

2) 10 torr to 10
-5
torr
(transition flow range) -
high throughput pumps

3) 10
-5
torr to 10
-12
torr
(molecular flow) HV, UHV
pumps
mechanical (m) / non-mechanical (nm)
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Compression ratio 10
6

Up to hundred liter/sec

Ultimate pump ressure10
-2
Torr
with double stage 10
-4

Oil is used as sealant
possible contamination

Main use: backing pump for
turbo and diffusion pumps
Vacuum pumps: Rotary Pumps
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Gas enters through
suction chamber (1)
Compressed by
rotor (3) and vane (5)
Expelled through
discharge valve (8)
500 to 2000 rpm
Single stage pumps
Speed ~ 10 to 200
m
3
/hour
Ultimate pressures ~
1.4 Pa (~10 mTorr)
Single Stage Rotary Vane
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Two Stage Rotary Vane
500 to 2000 rpm
Single stage
pumps
Speed ~ 10 to
200 m
3
/hour
Ultimate
pressures ~
1.5x10 to 2 Pa
(~100 mTorr)
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2 lobed rotors mounted on parallel shafts and rotate in
opposite directions
Not lubricated with oils: dry pump, (3000 to 3500 rpm)
Pumping Speed 500 m
3
/hour
Ultimate pressure ~10 to 5 Torr (must be backed by a rotary
pump because it can not pump at high pressures)
Roots Pump (or lobe blower)
Semiconductor
manufacturers
use dry pumps
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Pumping speed of single versus double stage
rotary vane (speed ~ 30 m
3
/hour)
Gas ballast introduces gas out exit port to keep gases from
condensing (i.e. water, acetone)
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Due to close tolerances (<0.1 mm) the
pump surfaces are lubricated with oils
Oil Properties
Vapor pressure - sets ultimate pressure
of the pump
Viscosity and wet-ability - lubrication
Breakdown of oils and subsequent
backstreaming can be a significant source
of contamination

Rotary vane and Rotary Piston Pump Issues
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Contamination reduced by
cold traps

Diffusion Pump
10
-4
to 10
-10
Torr

Pumping speeds, from
30 L/s to 1000 L/s.

Working range 10
-10

down to 10
-2
Torr.

Needs backing pump.
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Diffusion Pump - Operation
Diffusion pump pumping mechanism
Low vapor pressure oil is heated
to its boiling point
Vapors flow up a chimney and
are ejected through a series of
nozzles (supersonic velocities)
The nozzles direct the vapor
stream downward
The gas stream is directed
toward the water-cooled wall
where it is condensed and
returned to the boiler
Gas particles that diffuse into
this region are on average given
a downward momentum and
eventually ejected through the
outlet
Need low vapor pressure oils
Ultimate pressure ~ 10
-11
Torr
University of Virginia, Dept. of Materials Science and Engineering
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Turbine rotating at 20,000 to 30,000 rpm
High compression ratio for hydrocarbons
(10
10
) and N
2
(10
9
), bad for H
2
(10
3
)
Oil back streaming negligible: its a clean
pump.
Pumping speed 10
3
l/s
Ultimate pressure below 10
-10
Torr
Turbomolecular Pump
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Pumping action by momentum
transfer
Can damage blades at high
pressures (large viscous
forces)
Must back turbo with a
mechanical pump
Pumping speed ~1000 l/s
Ultimate pressure ~ 10
-10
Torr
Turbomolecular Pump - Operation
blade
gas molecule
momentum
xfer
turbomolecular pump blades atomic baseball bats
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Cryosorption Pump
Gas entrapment pump: gas
molecules condense on surfaces
cooled below 120K
Bare metals
Micro-porous surfaces
Chemically treated surfaces
Very clean vacuum between
10
-3
to 10
-10
Torr
Ultimate pressure reached when the
impingement rate on the cooled
surfaces equals the impingement on
the chamber walls at 300K




T
T P P
S ult
300
) ( =
where Ps(T) is the saturation pressure of the pumped gas (10
-11
for N
2
at 20K)
University of Virginia, Dept. of Materials Science and Engineering
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Pumping action is by
adsorbing gas molecules
onto cold surfaces
Gas particles impinge on
cooled surface and do not
desorb
Typically two stages
Liquid N
2
(~80K)
Liquid helium (~20K)
Need to rough chamber to
molecular flow or premature
pump saturation can occur
must periodically regenerate
(ie heat up and desorb gas)
Pumping Speed ~ 1000 l/s
Ultimate Pressure ~10
-13
Torr
Cryosorption Pump - Operation
University of Virginia, Dept. of Materials Science and Engineering
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Sputter - Ion Pump
Provides clean, bakeable and vibration free
operation at pressure ranges of 10
-6
to 10
-11
Torr

The pump of choice for the surface analysis
chamber
University of Virginia, Dept. of Materials Science and Engineering
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Pumping action
Adsorption followed by
dissociation
Gettering from freshly
sputtered cathode
surface
Surface burial under
sputtered cathode
material
Implantation of ionized
gas
High energy neutral
implantation of
reflected ions
Pumping Speed ~ 500 l/s
Ultimate Pressure ~ 10
-10

Torr

Sputter - Ion Pump - Operation
University of Virginia, Dept. of Materials Science and Engineering
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Pumping action -- adsorbed gases react with
titanium surface
Periodically evaporate a titanium filament which
deposits a fresh film of Ti on nearby walls
(typically cooled to inhibit desorption)
Ultimate pressure ~ 10
-11
Torr
Titanium Sublimation Pump - TSP
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Summary of Vacuum Pumps
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Pressure Measurement Vacuum Monitoring
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Pressure Measurement
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Pressure Measurement
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43
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44
These are some of the considerations we face in
designing a vacuum system.

Vacuum Chamber: Connections:
Provide sufficient room for The smaller the diameter
the operation of the of the tube, the lower the
analytical techniques conductance

Large diameters increases the
Vacuum System Dimensions
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45
O-Ring Seals
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Metal Gaskets
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Where:
o O-rings seals
o metal gaskets
o electrical feed-throughs
o shut-off valves with through
leaks,
o internal welds/brazes on
utility pipes
o chamber welds
o porous flanges or deep-
drawn sheet
Leaks
Solution
- Acetone
- Helium
Pressure gauge or mass
spectrometer will react if the
fluid enters the chamber.
University of Virginia, Dept. of Materials Science and Engineering
48
For depositions processed in vacuum, compatibility of materials with low
pressure is a delicate point.

The part of the equipment in direct contact with the vacuum must not
evaporate at the pressure and temperature used for processing

If some gas is used for processing, materials should not react with it, or the
reaction product must fulfill the previous point

Degassing: some materials release their gas content
Materials Compatibility I
University of Virginia, Dept. of Materials Science and Engineering
49
Material Property Requirements

Mechanical Properties





Thermal Properties






Gas Loading
Materials Compatibility II
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50
Outgassing
Approximate Rates
(All rates are for 1 hr of pumping)
Vacuum Material Rate
(Torr liter/sec/cm
2
)
Stainless Steel 6 x 10
-9
Aluminum 7 x 10
-9

Mild Steel 5 x 10
-6

Brass 4 x 10
-6

High-Density Ceramic 3 x 10
-9

Pyrex 8 x 10
-9

Other Rate
Torr liter/sec/linear cm
Viton (unbaked) 8 x 10
-7

Viton (baked) 4 x 10
-8

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51
THE END
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52
If they move towards a wall of area A, and the number density is n
(=N/V), the number of molecules that strike the wall in time At is:

Gas Pressure and Molecular Velocity
For molecules traveling with
velocity {v
x
}, the distance they can
travel in time interval At is: {v
x
} At
nA{v
x
}At
(1/2)nA{v
x
}At
But half of the molecules move towards the surface, half
away from the surface:
FYI - V
RMS
derivation
University of Virginia, Dept. of Materials Science and Engineering
53
Since force is the rate of change of momentum:
Pressure is the force per unit area:
Generalizing:
{v
2
}= {v
x
2
} + {v
y
2
} + {v
z
2
} = 3 {v
x
2
}, P = (1/3)nm{v
2
}
1 atm = 1013 mbar = 760 mmHg
1 atm = 760 Torr = 101,325.00 Pa = 101,325 Nm
-2
2 / 1
3
(

=
m
kT
v
rms
When a molecule collides with a surface, the particles
momentum changes from mv to - m v
x
(total 2mv
x
)
(m=M/N
A
), hence the total momentum change is:
= [(# of collisions)] (mom. change per collision)
= [(1/2)nA{v
x
}At] (2m{v
x
})
= nmA{v
x
2
}At
F = nmA{v
x
2
}
P = nm{v
x
2
}
where v
RMS
is typically
used in the calculation
University of Virginia, Dept. of Materials Science and Engineering
54
Langmuir Units
At 10
-10
Torr a surface will stay clean for about 7.3 hr.

Surface exposure to gas is measured in Langmuir (L) units of
pressure - time, e.g. Torr-s.

1 Langmuir (L) = 10
-6
Torr-s, which means that gas exposure
could occur at 10
-6
Torr for 1 s, at 10
-7
Torr for 10 s, etc..

Since a monolayer typical forms after 7.3 hr (26,280 s) at 10
-10

Torr ( or 2.63 L), 1 L corresponds to about 0.38 monolayer.
University of Virginia, Dept. of Materials Science and Engineering
55
Boyles Law (1622)
P1/V (T and N constant)
P
V
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56
Amontons Law (1703)
PT (N and V constant)
T
P
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57
Charles Law (1787)
VT (P and N constant)

T
V
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58
Daltons Law (1801)
Daltons Law of Partial Pressures
P
t
= n
1
kT + n
2
kT + n
3
kT + ... n
i
kT
where P
t
is the total pressure and n
i
is the number
of molecules of gas i

P
t
= P
1
+ P
2
+ P
3
P
i

where P
t
is the total pressure and P
i
is the partial
pressure of gas i
University of Virginia, Dept. of Materials Science and Engineering
59
Avogadros Law (1811)
PN (T and V constant)
N
P
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60
Diffusion
Example: diffusion in stainless steel
H
2
is a common diffuser gas in stainless steel






Typically we perform a Bake while under
vacuum for stainless steel chambers
D=D
o
exp(-Ed/kT) increase T, increase D, remove H
2

from stainless steels and decrease q (diffusion)

C
0

t
0

H
H
H
2
University of Virginia, Dept. of Materials Science and Engineering
61
Vaporization
Particle flux ():
re temperatu T
weight molecular M
pressure vapor P
:
=
=
=
where
Vaporization
Similarly for vaporization of a solid source (or
evaporation):
M
RT
n
t 2
= u
s cm molecules
MT
P
x = u
2 22
/ 10 513 . 3
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62
Vapor Pressure Curves
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63
Vapor Pressure Curves
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64
Gas Sources in a Vacuum
Permeation
Real
leak
Virtual
leak
Vaporization
Desorption
Diffusion
Vaporization
Thermal Desorption
Diffusion
Permeation
Backstreaming
Leaks
Pump
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65
Thermal Desorption
Heat stimulated release of gases or vapors
previously adsorbed on the surface of the
chamber walls
Function of:
Molecular binding energy
Temperature of the surface
Number of monolayers formed on the surface
Desorption
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66
Gas Sources in a Vacuum
Permeation
Real
leak
Virtual
leak
Vaporization
Desorption
Diffusion
Vaporization
Thermal Desorption
Diffusion
Permeation
Backstreaming
Leaks
Pump
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67
Diffusion
Diffusion of gas particles
- 2 step process
Diffusion of gas to the interior of chamber surface
Desorption of diffused species
Diffusion << slower than desorption, therefore diffusion is the
rate limiting step
External
Surface
P >> C
o
Internal
Surface
P < C
o
Diffusion
wall the of thickness d
t coefficien diffusion D
wall solid in gas of ion concentrat initial
0
=
=
= C
University of Virginia, Dept. of Materials Science and Engineering
68
Diffusion
Outgassing rate (q) [Pressure-volume/sec)/surface
area] i.e. [(Torr-liters/s)/m
2
]
wall the of thickness d
t coefficien diffusion D
wall solid in gas of ion concentrat initial
:
exp ) 1 ( 2 1
0
2
2 / 1
0
=
=
=
(
(

|
|
.
|

\
|

+
|
.
|

\
|
=

=
=
C
where
Dt
nd
t
D
C q
n
n
o n
University of Virginia, Dept. of Materials Science and Engineering
69
Diffusion
2
1
2 / 1
0
~

|
.
|

\
|
=
t q
t
D
C q
) exp( ~
2
exp
2
2
2
0
aDt q
d
Dt
d
DC
q

|
|
.
|

\
|

=
t
Short times
Long times
(infinite series solution)
Log (q)
Log (time)
t
1/2

exp(-t)
Crossover point
t=d
2
/6D
University of Virginia, Dept. of Materials Science and Engineering
70
Gas Sources in a Vacuum
Permeation
Real
leak
Virtual
leak
Vaporization
Desorption
Diffusion
Vaporization
Thermal Desorption
Diffusion
Permeation
Backstreaming
Leaks
Pump
University of Virginia, Dept. of Materials Science and Engineering
71
Permeation
Three step process
1) Gas adsorbs onto outer wall of vacuum chamber
2) Gas diffuses through chamber wall
3) Gas desorbs from interior of chamber wall
Permeability of a wall (K
P
)
K
P
= DS where:
D = diffusion coefficient
S is the solid solubility of the gas in the chamber
material
Non-Dissociative vs. Dissociative
Permeation

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