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Understanding Diffusion in Materials

The document discusses diffusion, a mass transport process by atomic motion, and its significance in materials processing, such as heat treatment and doping. It covers mechanisms of diffusion, including vacancy and interstitial diffusion, and introduces Fick's laws for quantifying diffusion rates. Additionally, it explains how diffusion is influenced by temperature and structure, providing examples of practical applications like case hardening and semiconductor doping.

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0% found this document useful (0 votes)
72 views38 pages

Understanding Diffusion in Materials

The document discusses diffusion, a mass transport process by atomic motion, and its significance in materials processing, such as heat treatment and doping. It covers mechanisms of diffusion, including vacancy and interstitial diffusion, and introduces Fick's laws for quantifying diffusion rates. Additionally, it explains how diffusion is influenced by temperature and structure, providing examples of practical applications like case hardening and semiconductor doping.

Uploaded by

Meet Patel
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd

MECH2272 Diffusion

Diffusion

The Figures used in these slides are taken from:

Materials Science and Engineering: An Introduction


by

William D. Callister, Jr.


David G. Rethwisch

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

ISSUES TO ADDRESS...
• How does diffusion occur?

• Why is it an important part of processing?

• How can the rate of diffusion be predicted for


some simple cases?

• How does diffusion depend on structure


and temperature?

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 2
MECH2272 Diffusion

Diffusion
Diffusion - Mass transport by atomic motion
Example: salt in water

• Why is diffusion an important part of processing?


Example: Heat treatment and doping

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 3
MECH2272 Diffusion

Diffusion in solids
 When two metals that are coupled together are heated for an extend period at
elevated temperature (below melting point), diffusion of atoms across the
interface will occur as shown in the figure below
 In an alloy, atoms tend to migrate from regions of high conc. to regions of low
conc.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Interdiffusion: The process whereby the atoms of one metal diffuse


into another is called interdiffusion or impurity diffusion.
Copper-Nickel diffusion couple

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

• Self-diffusion: In an elemental solid, atoms also migrate.

Label some atoms After some time


C
C
A D
A
D
B
B

Question: how can atoms change positions in a crystal?

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 6
MECH2272 Diffusion

Diffusion Mechanisms
 For atoms to change position by diffusion the following conditions
must be met:
a. there must be an empty adjacent site
b. the atom must have sufficient energy to break bonds with
neighboring atoms
Recall: atomic vibrations
 The common mechanisms for explaining diffusion of atoms are
a. vacancy diffusion – atoms moving from one regular lattice
position to another.
b. interstitial diffusion - atoms moving from one interstitial
position to another
Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Vacancy Diffusion:
• atoms exchange with vacancies
• applies to substitutional impurities atoms
• rate depends on:
-- number of vacancies
-- activation energy to exchange.

increasing elapsed time


-Q v 
N  N exp
v  
 RT 
Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 8
MECH2272 Diffusion

Interstitial diffusion

 Migration of atoms from an interstitial position to a neighboring


interstitial position that is empty.
 Found in inter-diffusion of impurities such as hydrogen, carbon,
nitrogen and oxygen, which are so small that they can occupy
interstitial positions

Adapted from Fig. 5.3(b),


Callister & Rethwisch 8e.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Question: which one is faster, vacancy or


interstitial diffusion?

 Interstitial atoms are smaller and more mobile


 There are more empty interstitial position than
vacancies.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Processing Using Diffusion


• Case Hardening:
-- Diffuse carbon atoms Adapted from
chapter-opening
into the host iron atoms photograph,
Chapter 5, Callister
at the surface. & Rethwisch 8e.
(Courtesy of
Surface Division,
Midland-Ross.)
• Result: The presence of C
atoms makes iron (steel) harder.

For Carbon in Iron:


Question 1: What is the impurity type?
A: Substitutional
B: Interstitial
Question 2: What is the diffusion mechanism?
A: Vacancy diffusion
B: Interstitial diffusion
Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 11
MECH2272 Diffusion

Processing Using Diffusion


• Doping silicon with phosphorus for n-type semiconductors:
• Process:
1. Deposit P rich
layers on surface.

For Phosphorus in Silicon:


silicon Question 1: What is the impurity type?
A: Substitutional
2. Heat it. B: Interstitial
Question 2: What is the diffusion mechanism?
3. Result: Doped
A: Vacancy diffusion
semiconductor B: Interstitial diffusion
regions.

silicon

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 12
MECH2272 Diffusion

Quantification of Diffusion

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Diffusion flux
• How do we quantify the amount or rate of diffusion?
moles (or mass) diffusing mol kg
J  Flux   or
 surface area  time  cm
2
s m s
2

 Diffusion is time dependent, i.e. the amount of atoms that diffuse across a
cross-section is a function of time.
 The rate of atoms transfer across a cross-sectional area is termed
diffusion flux
 Diffusion Flux (J) can be defined as the mass or number of atoms
diffusing (M) through a perpendicular cross-sectional unit area of solid
per unit time.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

 Mathematically,

M
J 
At

A = cross section area across which diffusion occurs


t = diffusion time

 In differential form
1 dM
J 
A dt

Units of J = kg/m2-s or atoms/m2-s

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Steady-State Diffusion
 If the diffusion flux does not change with time, diffusion is said to steady-state
diffusion.
 A typical example of steady-state diffusion is the diffusion of gas atoms through a plate
of metal in which the pressures or concentrations on both surfaces of the plate are held
constant.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

 A plot of concentration against distance


gives the concentration profile
 The slope of concentration profile is the
concentration gradient
 Concentration gradient = dC/dx
 Concentration is expressed in mass of
diffusing species per unit volume of solid
(kg/m3 or g/cm3)

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Steady-State Diffusion
1 dM
J 
A dt

• Diffusion flux does not change with time


• Concentration profile is linear
• Concentration gradient is constant

C CB -CA
Concentrat ion gradient  
x xB -x A

Any correlation between J and


concentration gradient?
Hint: electric current and voltage

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Fick’s Laws of Diffusion

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Fick’s First Law


 For one dimensional steady-state diffusion in direction (x) the
diffusion flux (J) is proportional to the concentration gradient:

dC
J  - D
dx

 The negative sign shows that the direction of the flux is down the
concentration gradient.
 D is constant of proportionality called diffusion coefficient
or diffusivity.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Example 1:

A plate of iron is exposed to a carburizing (carbon-rich)


atmosphere on one side and a decarburizing (carbon-
deficient) atmosphere on the other side at 700 C. If a
condition of steady-state is achieved, calculate the
diffusion flux of carbon through the plate if concentrations
of carbon at position of 5 and 10 mm beneath the
carburizing surface are 1.2 and 0.8 kg/m3, respectively.
Assume a diffusion coefficient of 3 x 10-11 m2/s at this
temperature.
dC
J  - D
dx
Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Data: D = 3 x 10-11 m2/s


CA = 0.44 g/cm3
Iron plate
C1 CB = 0.02 g/cm3
2

t 
Carbon-
6D
b xB – xA = 0.04 cm
Carbon-
rich deficient
C2 C  C
J   D
B A

xA xB x B
 x A

( 0 . 8  1 . 2 ) kg / m
3
 11
  ( 3  10
2
m / s)  2 3
(10  5  10 )m

9
 2 . 4  10
2
kg / m s

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Diffusion and Temperature


• Diffusion coefficient increases with increasing T.

 Qd 
D  Do exp 
 RT 

D = diffusion coefficient [m2/s]


Do = pre-exponential [m2/s]
Qd = activation energy [J/mol or eV/atom]
R = gas constant [8.314 J/mol-K]
T = absolute temperature [K]
Question: how activation energy can be determined if diffusivity at
a particular temperature can be determined?

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 23
MECH2272 Diffusion

Diffusion and Temperature


D has exponential dependence on T

1500

1000

600

300
T(C)
10-8

D (m2/s) Dinterstitial >> Dsubstitutional


C in a-Fe (BCC) Al in Al
10-14 C in g-Fe (FCC) Fe in a-Fe
Fe in g-Fe
Question: why C in a-Fe > C in g-Fe ?
10-20
0.5 1.0 1.5 1000 K/T

Adapted from Fig. 5.7, Callister & Rethwisch 8e. (Date for Fig. 5.7
taken from E.A. Brandes and G.B. Brook (Ed.) Smithells Metals
Reference Book, 7th ed., Butterworth-Heinemann, Oxford, 1992.)

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 24
MECH2272 Diffusion

In-class discussion: Determine the activation energy for diffusion if the


diffusivities are D1 at T1 and D2 at T2.

 Qd 
D  Do exp 
 RT 

D transform ln D
data

Temp = T 1/T

Qd  1  Qd  1 
ln D 2  ln D 0    and ln D 1  ln D 0   
   
R  T2  R  T1 
D2 Qd  1 1 
ln D 2  ln D 1  ln     
 
D1 R  T2 T1 
Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 25
MECH2272 Diffusion

Example: At 300ºC the diffusion coefficient and activation energy for Cu in


Si are
 Qd 
D  Do exp
D(300ºC) = 7.8 x 10-11 m2/s 
Qd = 41.5 kJ/mol  RT 
What is the diffusion coefficient at 350ºC?

D transform ln D
data

Temp = T 1/T

Qd  1  Qd  1 
ln D 2  ln D 0    and ln D 1  ln D 0   
   
R  T2  R  T1 
D2 Qd  1 1 
 ln D 2  ln D 1  ln     
 
D1 R  T2 T1 
Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 26
MECH2272 Diffusion

Example (cont.)
 Q  1 1 
D2  D 1 exp  
d
  
 
 R T
 2 T 1 

T1 = 273 + 300 = 573 K

T2 = 273 + 350 = 623 K

 11 2   41 ,500 J/mol  1 1 
D 2  ( 7 . 8 x 10 m /s) exp    
 8 . 314 J/mol - K  623 K 573 K  

D2 = 15.7 x 10-11 m2/s

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 27
MECH2272 Diffusion

Non-steady State Diffusion


In non steady-state diffusion, the diffusion flux changes with time.
This results in non-linear concentration profile with varying
concentration gradient

Cs
Adapted from
Fig. 5.5, Callister
& Rethwisch 8e.

It is the common type encountered in practice

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 28
MECH2272 Diffusion

 Under nonsteady-state condition,

 C(x, t)    C(x, t) 
  D 
t x  x 

 This expression is known as Fick’s Second Law

 If D is independent of composition, the equation simplifies to

C 
2
C
 D
t x
2

There are lots of analytical solutions to this


differential equation depending on the type of
boundary conditions.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Example of Analytical Solution of Ficks Second Law Equation:


 Consider a semi-infinite solid in which surface concentration is held constant at
Cs and assuming that:

a. The diffusing atoms in the solid before diffusion are uniformly distributed with
concentration Co.
b. The value of x at the surface is zero and increases with distance into the solid.
c. Time is taken to be zero at the instant before the start of diffusion process

• Copper diffuses into a bar of aluminum.


Surface conc.,
C s of Cu atoms bar
pre-existing conc., Co of copper atoms

For t = 0, C = Co at 0  x  
For t > 0, C = Cs (the constant surface concentration) at x = 0
C = Co at x = 

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Solution:
C x ,t   C o  x 
 1  erf  
Cs  Co  2 Dt 

C(x,t) = Conc. at point x at CS


time t
erf (z) = error function
2 z
y
2 C(x,t)


 0
e dy

Co
erf(z) values are given in Table
5.1
Adapted from Fig. 5.5,
Callister & Rethwisch 8e.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed. 31
MECH2272 Diffusion

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Error function: erf(X)

http://en.wikipedia.org/wiki/Error_function
Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Example 2

Consider a steel alloy that initially has a uniform carbon


concentration of 0.25 wt % and is to be heated at 950 C. If
the concentration of carbon at the surface is suddenly
brought to and maintained at 1.20 wt %, how long will it
take to achieve a carbon content of 0.80 wt. % at a position
0.5 mm below the surface? The diffusion coefficient for
carbon in iron at this temperature is 1.6 x 10-11 m2/s:
assume that the steel piece is semi-infinite.

C x, t
- C o  x 
 1 - erf  
C s
 C o  2 Dt 

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

C - C  x 
 1 - erf  
x o

C s
 C o  2 Dt 

C  C 0 . 80  0 . 25 5  10
4
m
  1  erf
x 0

C  C 1 . 20  0 . 25 2 (1 . 6  10
 11
m
2
/ s )( t )
s 0

 
1

 62.5 s 2 
0.4210  erf  
 t 
 

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

 
1

 62.5 s 2 
0.4210  erf  
 t 
 

Linear interpolation
z erf(z)
0.35 0.3794 z  0 . 35 0 . 4210  0 . 3794

z 0.4210 0 . 40  0 . 35 0 . 4284  0 . 3794
0.40 0.4284

z  0.392

 
1

 62.5 s 2 
0.392   
 t 
 
t  25,400 s  7.1 hrs

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.
MECH2272 Diffusion

Other Diffusion Paths


 Migration of atoms can occur along: dislocations, grain boundaries
and external surfaces.

 These diffusion paths are called short-circuit diffusion paths


because of accelerated rate of diffusion associated with them.

 As a result of their small cross-sectional areas, compared to the


bulk lattice, the contributions of these paths to total diffusion can
be small, even though the rates of diffusion along them are rapid.

Ref: Materials Science and Engineering: An Introduction by William D. Callister, Jr. and David G. Rethwisch, 8th Ed.

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