Photo Elasticity

1
Structures and Controls Lab - AE 461 Chasiotis I.

Measurement of Stress by
Photoelasticity
References: M.M. Frocht, Photoelasticity, John Wiley and Sons, Boston, (1941)
A.J. Durrelli, Introduction to Photomechanics, Prentice-Hall, (1965)
Photoelastic Experiment
Based on: When tractions are prescribed in a boundary value problem, the stress
distribution is independent of material (properties), i.e. E and v
Photoelasticity helps us visualize stresses inside an object
Objectives:
1. Introduce the use of photoelastic principles in stress analysis
2. Use the stress distribution in a polymer beam to find the material fringe constant
3. Measure the stress concentration in a notched polymer beam
Photoelastic Effect: Optical property of transparent materials in which the speed of
light through the material is affected by the state of stress
How we use it: Pass light through a model of an engineering structure and measure
the changes in the wave speed for a given applied load.
2
Use Photoelasticity to Find the Stress in the Object
Use Photoelasticity to Find the Stress in the Object
3
Definition of Light and Dark Fringes
Light and dark field isochromatics in a circular disk under diametric compression
Dark fringes fall between light fringes
High fringe density denotes high stress gradient (and perhaps stress concentration)
We Need Polarized Light
PLANE POLARIZED LIGHT
Light going through a polarizer is transmitted in one plane only
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The Method Applies to Birefringent Materials
Gary Cloud, Experimental Techniques, 2008
Birefringent materials are those in which
the index of refraction varies with the
direction of polarization of the light passing
through them.
The surface of the
birefringent slab acts as a
beam splitter, dividing the
entering wave into two waves
that are polarized in
orthogonal directions called
the principal axes of the
refractive index.
The Plane Polariscope
Polarizer and Analyzer are crossed Dark field
The incident light that enters the model is split into two components that are
orthogonally polarized and vibrate in the planes of o
1
and o
2
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Isocromatics in the Object
Isocromatics Shadowed by Isoclinics
Gary Cloud, Experimental Techniques,
2008
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Circularly Polarized Light
The tip of the light vector traces a circular path with time forming a helix
as it propagates along the z-axis
How do we create circularly polarized light?
Use a plane polarizer and a quarter wave plate
The Quarter Wave Plate
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Crossing Quarter Wave Plates
Two parallel quarter plates shift the light plane by 90
Two crossing quarter plates shift the light plane by 0
The Circular Polariscope Dark Field
If analyzer is crossed Dark field
If analyzer is parallel Light field
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Dark field Dark field Light field
Configurations of the Circular Polariscope
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The Circular Polariscope ? Field
WHAT HAPPENS IF I PLACE AN OBJECT IN THE MIDDLE?
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The Circular Polariscope
The Circular Polariscope Light Field Arrangement
When light passes through the analyzer we have Light Field Arrangement
( )
2 cos cos
2
A k t
o
e
| |
=
|
\ .
Amplitude
Frequency
Phase shift
( )
2 2 2 2
Intensity: 4 cos cos
2
I A k t
o
e
| |
= =
|
\ .
Dark fields are generated when:
1. cos
2
(et) 0 ; cannot be observed since e is very high (~10
12
Hz)
2. cos
2
(o/2) 0
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The Circular Polariscope Light Field Arrangement
Condition for isochromatic fringes (light field)
( )
2
cos 0 1 2 0,1, 2, 3,...
2 2 2
o o t | |
= + =
|
\ .
n n
Question:
How does the applied STRESS affect o?
1 2
Nf
t
o
o o =
: retardation of polarized light
2
: material fringe constant (psi-in)
: thickness of model
N
f
c
t
o
o
t

The Circular Polariscope Light vs. Dark Field
( )
1 2 1 2
1 2 1
2 2
f n t
n
t f
o
o
o o o o
+ | |
= = +
|
\ .
If we combine these relations:
For the material used in your experiment, obtain f
o
as follows:
1 2
o o
n
f
slope
t
o
| |
=
|
\ .
Similarly, we find that for dark field:
( )
1 2 1 2
= =
f t
m m
t f
o
o
o o o o
In dark field, dark fringes correspond to integer fringe order
In light field, dark fringes correspond to half fringe order
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Experimental Set-up for Bending Dark Field
fixed fixed
M M
Pure Bending
o
1
-o
2
=0
( )
1 2
=
f
m
t
o
o o
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Four Point Bending
( )
1 2
=
f
m
t
o
o o
Stress Concentration at a Circular Hole
Plate thickness = t
: 0 0
r r
r a r a
BCs
u
o t
= =
= =
14
o
1
-o
2
=0
Stress Concentration
Stress Concentration
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Pre-Lab Assignment
For the isotropic photoelastic beam shown below (in a light-field polariscope), what is the
highest fringe number? Locate the n = 0 fringe(s) and the highest fringe(s).
The fringes are denoted by the black lines. (Note: In a light-field polariscope, these are
actually half-fringes, thus the need for (n+1/2) rather than n)
Pre-Lab Assignment
h = 1.5 in
h = 1.5 in
w = 0.25 in
Beam cross-section
0.125 in from highest fringe order to the edge of beam
Determine the fringe constant f
s
for the following beam with an applied
moment of 12.00 in-lb at the ends. Note that the fringe pattern is symmetric
about the neutral axis.
( )
1 2
1
2
o
o o = +
t
n
f
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Pre-Lab Assignment
Which would give a greater stress resolution in a photoelastic beam, a high
f
s
or a low f
s
? Which is more applicable for sensitive experimental stress
analysis? Explain.
( )
1 2
1
2
o
o o = +
t
n
f
( )
1 2
o
o o =
t
m
f
or
What purpose do the quarter wave plates serve in the experimental
polariscope setup?
Pre-Lab Assignment
Around a circular hole the maximum stress is the nominal stress magnified by
a factor of 3.0. If n
far
= 2 (number of fringes seen in the far field):
a) Derive the relationship between the stress concentration ratio to the
number of near and far field fringes.
b) How many fringe orders will be seen in the near field under this applied
stress?
n
near
n
far
o
nom o
max
P P
( )
1
1 2
1
2
t
n
f
o
o o

| |
| |
= +
| |
\ .
\ .
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Other Examples
Other Examples
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Other Examples
Other Examples
http://www.flickr.com/photos/core-materials/3841043722/sizes/o/in/photostream/
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Other Examples
http://www.flickr.com/photos/core-materials/3840250573/sizes/o/in/photostream/
Other Examples
http://medlibrary.org/medwiki/Contact_mechanics

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Structures and Controls Lab - AE 461 Chasiotis I.

Structures and Controls Lab - AE 461 Chasiotis I.

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