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TRI GATE TRANSISTORS

Tri-Gate transistors, the first to be truly three-dimensional, mark a major revolution in the Semiconductor industry. The semiconductor industry continues to push technological innovation to keep pace with Moores Law, shrinking transistors. However the ability to shrink transistors becomes more and more problematic, in part due to worsening short channel effects and an increase in parasitic leakages with scaling of the gate-length dimension. In this regard Tri-gate transistor architecture makes it possible to continue Moore's law at 22nm and below without a major transistor redesign.

INTRODUCTION
Tri-gate or 3-D Transistor fabrication is used by Intel Corporation for the nonplanar transistor architecture used. In Ivy Bridge processors these transistors employ a single gate stacked on top of two vertical gates allowing for essentially three times the surface area for electrons to travel. Intel reports that their tri-gate transistors reduce leakage and consume far less power than current transistors. This allows up to 37% higher speed, or power consumption at fewer than 50% of the previous type of transistors used by Intel. Tri-Gate transistorreferred to as a 3-D chip due its 3-D ridge (or fin, thus the alternative name, FinFET) in which electrons runs through. Intel explains, "The additional control enables as much transistor current flowing as possible when the transistor is in the 'on' state (for performance), and as close to zero as possible when it is in the 'off' state (to minimize power), and enables the transistor to switch very quickly between the two states (again, for performance)."

Fig. Tri-Gate Transistor

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