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Innovalight
Innovalight
Innovalight
silicon inks
DuPont Innovalight Selective Emitter Platform:
Raising the Efficiency of Solar Cells
The DuPont Innovalight selective emitter platform is a
patented silicon ink based solution for quick transition to
>19% efficient mono crystalline solar cells.
DuPont
Innovalight
Solamet
metallization pastes
enable the production of superior selective emitter solar
cells.
Innovalight Selective Emitter Cell
Architecture
The DuPont Innovalight selective emitter cell is based on
the selective emitter architecture where there are two
differentially doped regions on the front surface of the
wafer. The region between the metal contacts has low
dopant concentration to minimize charge recombination.
In contrast, the region underneath the metal grid has
high dopant concentration to minimize the contact resis-
tance between the silicon wafer and the metal pattern.
Technology
A silicon ink screen printing step is added after texturization
in a mono crystalline cell manufacturing line. In addition,
minor modifications to diffusion, passivation, and metalliza-
tion ensure that the manufacturing process is optimized for
high conversion efficiency.
Visible Cell Pattern
In the DuPont Innovalight selective emitter cell, the heav-
ily doped region remains visible during the metal printing
step, resulting in high alignment accuracy and narrow ink
line widths. With this feature, cell efficiency increases and
manufacturing yield is maintained.
Voc (mV) Jsc (mA/cm
2
) FF (%) Efficiency (%)
Maximum 639 37.7 79.5 19.1
Median 635 37.4 78.9 18.8
DuPont Innovalight Selective Emitter Cell Cross-section View
Region I - Lightly Doped Region II - Heavily Doped
Cell Efficiency Distribution
DuPont Innovalight Selective Emitter Cell After SiNx Passivation
Precise Doping
Doping pastes tend to diffuse dopants in undesirable
regions of the substrate (also known as autodoping)
and thus reduce the conversion efficiency. DuPont
Innovalight