Tungsten disilicide, or just tungsten silicide (WSi

2
) is an inorganic compound. It is an electrically
conductive ceramic material with special physical properties; especially for high temperature
applications and in the semiconductor industry. The compound is regularly found in the components of
circuit boards used widely in technology. In this paper the thermogravimetric results of a study into the
dry fluorination of WSi
2
using both hydrogen fluoride and dilute fluorine gas as fluorinating agents are
reported. This paper was constructed as there is a very limited source of information on this particular
reaction type, fluorine is an extremely interesting element and the results of this reaction had the
potential for an interesting exploration into chemical reactivity and a possible substitute for the semi-
conductor industry. We used a TGA machine in order to track changes and record our data. Our final
product of the reaction between WSi
2
and HF

was found to be tungsten metal according to XRF analysis.