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K.L. Choy / Progress in Materials Science 48 (2003) 57170

12.9.2.
12.9.3.
12.9.4.
12.9.5.
12.9.6.
12.10.
12.10.1.
12.10.2.
12.10.3.

Kinetics and growth ............................................................................... 146

Comparison of CVD and EVD processes ..............................................147
Advantages............................................................................................. 148
Technological status............................................................................... 148
Other variants ........................................................................................ 149
Chemical vapour inltration ..................................................................149
Applications ........................................................................................... 150
Methodology .......................................................................................... 151
Various CVI processes ........................................................................... 153

13. Comparison of various CVD methods............................................................................ 156

14. Comparison of CVD with other coating techniques .......................................................157
15. Conclusions and outlook ................................................................................................ 159
Acknowledgements...............................................................................................................160
References ............................................................................................................................160

1. Denition
Chemical Vapour Deposition (CVD) involves the dissociation and/or chemical
reactions of gaseous reactants in a activated (heat, light, plasma) environment, followed by the formation of a stable solid product. The deposition involves homogeneous gas phase reactions, which occur in the gas phase, and/or heterogeneous
chemical reactions which occur on/near the vicinity of a heated surface leading to
the formation of powders or lms, respectively.
Though CVD has been used to produce ultrane powders, this review article is
mainly concerned with the CVD of lms and coatings. Fig. 1 shows a schematic
diagram of CVD of coatings.

2. Background
CVD is a relatively mature technique. The formation of soot due to incomplete
oxidation of rewood since prehistoric times is probably the oldest example of
deposition using CVD. The industrial exploitation of CVD could be traced back to a
patent literature by de Lodyguine in 1893 [1] who had deposited W onto carbon
lamp laments through the reduction of WCl6 by H2. Around this period, the CVD
process was developed as an economically viable industrial process in the eld of
extraction and pyrometallurgy for the production of high purity refractory metals
such as Ti, Ni, Zr and Ta. For example: