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07 Cmos CCD Imagers
07 Cmos CCD Imagers
Technologies
Image Sensors
There are Two Main types of Image
Sensors are available today:
CCD and CMOS
Both were originally developed in the late
1960s and 1970s
Imager Types
CCD = Charge Coupled Device
CMOS = Complementry Metal Oxide
Semi-Conductor, often called Active Pixel
Sensing, or APS
CCD = specialized production plant and
process
CMOS = standard silicon production line
Imager Types
CCD = Longer mass production period
means more mature technology and better
quality
CMOS = technology to produce high
image quality has proven more difficult
and specialized to obtain than expected
APS
Image Sensors
Through the 80s 90s and until today CCDs became
dominant primarily because they gave far superior
images with the fabrication technology available.
Not until the late 1990s could designers begin to make a
case for CMOS to even be considered as a viable
alternative.
Primarily the renewed interest came from expectations of
lower power requirements for CMOS.
CMOS Designers however had to overcome the many
inherent image quality deficiencies of CMOS particularly
high noise, poor low sensitivity and poor dynamic range.
Difference between
Mechanisms of CCD and
CMOS Image Sensors
Light-to-charge
Conversion
Charge-to-voltage
Conversion
/Amplification
Amplifier behind
Horizontal CCD
Charge
Accumulation
Charge-to-voltage
Conversion
/Amplification
Amplifier
within Pixel
Voltage
Transfer
Signal Wire
(Micro Wire)
CCD wells
Buried channel
stops to define
columns
Array of insulated
electrodes to define
pixels
Additional array of
electrodes to shift a
line at a time
Light
Charge
(Electrons)
Output
Amplifier
(x)
Light
Photo Sensor
Charge
(Electrons)
Gate Opens
Gate
Charge
(Electrons)
Vertical CCD
CCD
Charge
CCD
Charge
CCD
Charge
CCD
Charge
Voltage
Generated on
Surface of FD
Horizontal CCD
Output
Output
Gate
Amplifier
Gate
Gate
Gate
Micro
Wire
Charge
CCDs
3 Phase Serial Register
1
2
3
Output
17
Amplifier
(y)
ON
Pixel-select Switch
ON
Charge
ON
(e)
(f)
(i)
ON
Output
Surface
Voltage
Surface
Voltage
High
Voltage
0V
Voltage
0V
Light
Photo Sensor
High
Charg
e
Photo Sensor
Disadvantages:
High read-out noise;
Reduced dynamic range;
Reduced uniformity;
Reduced fill-factor;
High cost;
22
* Photo a close
relative (MT9M011)
0.
25
inc
he
s
A mainstay of
100-in-1
experimenter
kits
Surface
open to
light.
Schematic
symbol
Semiconductor
A photosensitive
resistor.
The semiconductor CdS
is often used, as its
band gap falls in
blue-green,
and thus blocks
infrared w/o a filter.
Metal shield
oxide
oxide
n+
Readout
circuits
go here
h
p- region
Metal shield
p-
Depletion
region
depl
etion
regio
n+ region
e
l
e
c
t
r
o
n
e
n
e
r
g
y
+
V
I = Io (eV/Vo - 1) -
Dark current
When no photons
are present.
Iph
Vo : 25-60 mV
Io : 1-20 fA
42% of photons
that fall on the
photodiode are
converted to electrons
(quantum efficiency)
Source: A 640 512 CMOS Image Sensor with Ultrawide Dynamic Range Floating-Point Pixel-Level ADC,
David X. D. Yang, Abbas El Gamal, Boyd Fowler, and Hui Tian, JSSC, Dec 1999.
Readout Circuits
APS Design
A Simple Photodiode
APS Cell
Described by Noble in
1968
Three transistors per
pixel
High quantum
efficiency (no overlying
polysilicon)
Pixel Circuits
Vdd
Vdd
Vdd
Qf
Cd
Vdd
Cd
I(Qf)
Edge circuitry samples
current I(Qf)
for later use.
Parasitic
photodiode
capacitance.
Column
Sense
Reset
Row Sel
Gnd
Gnd
Qf - Qd(t)
Qd(t)
Cd
Cd
Limits dynamic
range and signalto-noise.
Column
Sense
Gnd
Vdd
Qf - Qd(t)
Cd
Vdd
I(Qf - Qd(t))
Use I(Qf) from start
of the cycle to reduce
kTC (reset) noise.
Cd
Column
Sense
Color
Color filters
deposited on
pixel array
RGB Bayer
Why?
Source: Eric Fossum, IEEE Micro,
and Micron Data Sheets
Fill factor =
h
h
oxide
Readout
circuits
go here
oxide
n+
p-
Photodiode
area
Pixel
area
Source: http://micro.magnet.fsu.edu/
APS
Analog
ADCs
10/16/08
43
Sensor Architecture
Black pixels
have
photodiodes
covered by
metal.