Chapter 4

Results and Discussions

Chapter 4

Results and Discussions

This chapter describes the experimental conditions and the characterization results of

the deposited Cu2O thin films. Optical and Electrical characterization have been studied
and discussed for samples prepared for different time duration at constant oxygen
inflow rates. Detailed results have been presented and discussed in the subsequent
sections.

4.1 Experimental Parameters

Six different samples of Cu2O and two samples of TiO2 were prepared as the

experimental conditions mentioned in Table 4.1. These samples were studied for,

Spectroscopic Ellipsometry. Apart from this Cu2O and TiO2 were deposited on nSilicon and current-voltage characteristics were measured using SourceMeter 2400.
Table 1 Experimental conditions for Cu2O deposition
Slide Number

1
2
3
4
5
6

Oxygen
inflow

(sccm)

50
50
50
50
50
50

Power (%)

Pressure

Deposition

1%

37.110-1 Pa

1 min

Formatted: Line spacing: 1.5 lines

1%

38.1810-1 Pa

3min

Formatted: Line spacing: 1.5 lines

1%
1%
1%
1%

Duration

37.110-1 Pa

38.1810-1 Pa
37.1710 Pa
-1

37.1710 Pa
-1

Table 2 Experimental conditions for TiO2 deposition

Slide Number
1
2

35 | P a g e

1min
3min
5min
5min

Oxygen inflow Power (%)

Pressure

Deposition

1.4710-3 Pa

3 min

(sccm)

1%
1%

1.4710-3 Pa

Duration

3 min

Formatted: Line spacing: 1.5 lines

Formatted: Line spacing: 1.5 lines

Formatted: Line spacing: 1.5 lines
Formatted: Line spacing: 1.5 lines
Formatted: Line spacing: 1.5 lines

Formatted: Line spacing: 1.5 lines

Formatted: Line spacing: 1.5 lines