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Present Day Challenges And Goals Of

Nanotechnologyand Single-Electron Transistor.


Author : M . Brahmanandam Bhatlu,
¾ B.tech,
Department of Chemical Engineering,
Andhra Universitry College of Engineering (A),
Visakhapatnam.
e-mail : brahmi_chem@yahoo.com

Abstract:-

Scaling trends of Si metal-oxide-semiconductor field-effect


transistor (MOSFET) along with a description of to-days 0.13-
micrometer generation transistors are presented. Subthreshold
leakage, increased gate oxide leakage, increased transistor parameter
variability and inter connect density and performance are some of the
limits to future
scaling which must be kept in mind while evaluating nanotechnology
options such as
single-electron transistors(SETs) as possible future replacements for Si
MOSFETs. SETs
based on Si islands are presented. The island size dependence of the
capacitance components of SETs was extracted from electrical
characteristics. The capacitance
between the side wall gate and the Si island extracted from the
coulomb oscillation phase
shift of the SETs with side wall depletion gates on a silicon-on insulator
(SOI) nanowire
was independent of the Si island size, which is consistent with the
devise structure. As a
possible application, binary decision diagram operation was
demonstrated.

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