The document discusses the present challenges facing nanotechnology and single-electron transistors. It presents scaling trends of silicon MOSFET transistors and limitations to future scaling like subthreshold leakage, gate oxide leakage, and interconnect density issues. It also discusses single-electron transistors as possible future replacements for silicon MOSFETs and presents silicon island based SETs. Electrical characteristics were used to extract the capacitance components of SETs and their dependence on silicon island size. Binary decision diagram operation was demonstrated as a potential application.
The document discusses the present challenges facing nanotechnology and single-electron transistors. It presents scaling trends of silicon MOSFET transistors and limitations to future scaling like subthreshold leakage, gate oxide leakage, and interconnect density issues. It also discusses single-electron transistors as possible future replacements for silicon MOSFETs and presents silicon island based SETs. Electrical characteristics were used to extract the capacitance components of SETs and their dependence on silicon island size. Binary decision diagram operation was demonstrated as a potential application.
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The document discusses the present challenges facing nanotechnology and single-electron transistors. It presents scaling trends of silicon MOSFET transistors and limitations to future scaling like subthreshold leakage, gate oxide leakage, and interconnect density issues. It also discusses single-electron transistors as possible future replacements for silicon MOSFETs and presents silicon island based SETs. Electrical characteristics were used to extract the capacitance components of SETs and their dependence on silicon island size. Binary decision diagram operation was demonstrated as a potential application.
Copyright:
Attribution Non-Commercial (BY-NC)
Available Formats
Download as DOC, PDF, TXT or read online from Scribd
Author : M . Brahmanandam Bhatlu, ¾ B.tech, Department of Chemical Engineering, Andhra Universitry College of Engineering (A), Visakhapatnam. e-mail : brahmi_chem@yahoo.com
Abstract:-
Scaling trends of Si metal-oxide-semiconductor field-effect
transistor (MOSFET) along with a description of to-days 0.13- micrometer generation transistors are presented. Subthreshold leakage, increased gate oxide leakage, increased transistor parameter variability and inter connect density and performance are some of the limits to future scaling which must be kept in mind while evaluating nanotechnology options such as single-electron transistors(SETs) as possible future replacements for Si MOSFETs. SETs based on Si islands are presented. The island size dependence of the capacitance components of SETs was extracted from electrical characteristics. The capacitance between the side wall gate and the Si island extracted from the coulomb oscillation phase shift of the SETs with side wall depletion gates on a silicon-on insulator (SOI) nanowire was independent of the Si island size, which is consistent with the devise structure. As a possible application, binary decision diagram operation was demonstrated.
Study of The Metal Filling Impact On Standard Cells and Their Associated Interconnects Using Ring Oscillators: Definition of The Metal Fill Corner Concept