Crystalline Silicon on Glass

The next generation solar technology

Crystalline Silicon on Glass
Silicon Preparation Process
Borosilicate Glass 3mm

Texture Coat Both Surfaces

(Dipping)
 SiN

Borosilicate Glass 3mm

Deposit Anti-Reflection Coating

(PECVD)
 Si 1.5 m p+
SiN p
n+
Borosilicate Glass 3mm

Deposit Silicon Film

(PECVD)
 Si 1.5 m 0
SiN
Borosilicate Glass 3mm

Crystallise Si
 Si 1.6 m 0
SiN
Borosilicate Glass 3mm

Anneal Defects
 +
+
+ +
+
+ + + +
+ + +
+
Si 1.5 m 0+ +

SiN
Borosilicate Glass 3mm

Hydrogen Passivation
 Si 1.5 m 0
SiN
Borosilicate Glass 3mm

Hydrogen Passivation
Crystalline Silicon on Glass
Device Fabrication Process
Cell Separation Grooves
(Laser)
Cell Separation Grooves
(Laser)
 P150W Resin coating
(Spray then dry at 90° C)
Crater Openings in P150W
(Ink Jet)
Crater Openings in P150W
(Ink Jet)
 Crater Etch
(~5min Purple Etch)
 Crater Etch
(~5min Purple Etch)
Crater Reflow
Crater Reflow
Dimple Openings in P150W
(Ink Jet)
Dimple Openings in P150W
(Ink Jet)
 Dimple Etch
(~10sec Purple Etch)
Aluminium Deposition
(100nm Sputter)
Aluminium Deposition
(100nm Sputter)
Metal Scribing
(Laser)
Metal Scribing
(Laser)
Metal Scribing
(Laser)
Metal Scribing
(Laser)
 Crater

Top View
Dimple

Al
0.339 mm
Resin
Groove
Silicon

Textured Glass

Light in

Completed CSG Structure