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793-799, 1994
~ ) Pergamon
Copyright 1994ElsevierScienceLtd
Printed in Great Britain.All rights reserved
0038-1101/94 $6.00+0.00
SINGLE-ELECTRON T U N N E L I N G A N D COULOMB
CHARGING EFFECTS IN ULTRASMALL
DOUBLE-BARRIER HETEROSTRUCTURES
M. TEWORDTt,V. J. LAW,J. T. NICHOLLS,L. MARTiN-MORENO~,D. A. RITCHIE,M. J. KELLY,
M. PEPPER,J. E. F. FROST,R. NEWBURYand G. A. C. JONES
Cavendish Laboratory, University of Cambridge, Cambridge CB3 0HE, England
Abstract--An extensivestudy of charge transport through submicron-diameterdouble barrier heterostructure diodes is reported. The occupation of the quantum well with single electrons, starting from zero, is
observed in the form of sharp steps in the current-voltage characteristics. The magnitude of the current
steps can be controlled by changing the barrier thicknesses and thus their transparency for tunneling
electrons. The plateau width of the current steps is related to the energies of the electron states in the
quantum well that are affected by the lateral quantum confinement, and by Coulomb charging effects.
Diameter dependent studies of the tunneling current suggest that the lateral quantum confinement can
result from the surface depletion potential, potential fluctuations, or single impurities. High magnetic field
studies confirm this conclusion. The contribution of the Coulomb charging energy is investigated by using
an asymmetric double barrier profile. It is shown that tunneling through submicron-diameter double
barrier heterostructures provides valuable insight into the electronic properties of quantum boxes
containing a few electrons.
1. INTRODUCTION
Advanced technology has now made it possible to
fabricate semiconductor nanostructures in which
electrons are confined in small boxes that are a few
hundred angstroms in size[l]. These tiny artificially
crafted electron systems are often referred to as
"quantum dots" or "Coulomb islands". The interest
in semiconductor quantum dots lies in their characteristic electronic properties. Firstly, when the size of
the quantum dot is smaller than the Fermi wavelength and the electron mean free path, three-dimensional quantum confinement of the electronic states
can be observed in vertical[2] and lateral[3] tunneling
spectroscopy, and in optical spectral4]. Secondly, the
small size of the quantum dots implies that their
electrostatic charging energy is quite significant. In
analogy to classical electrostatics of a capacitor C, the
Coulomb charging energy of a quantum dot is
Ec(N) ~ N 2 e 2 / 2 C , where N is the number of electrons in the dot, and e is the electron charge.
Coulomb charging effects were first observed in
small metal grains[5], but the quantum confinement
energies are too small to affect the classical charging
tPresent address: Max-Planck-lnstitut for Festk6rperforschung, Heisenbergstr. 1. 70569 Stuttgart 80,
Germany.
:l:Present address: lnstituto de Ciencia de Materiales, Consejo Superior de lnvestigacionesCientificas, Universidad
Autonoma de Madrid, 28049 Madrid, Spain.
Present address: Department of Physics, University of
Surrey, Guildford. Surrey GU2 5XH, England.
fAlso at the Toshiba Cambridge Research Centre, 260
Cambridge Science Park, Cambridge CIM4WE, England.
ssr 37:4-6--a
793
794
M. TEWORDT et al.
Table 1. Summary of the double-barrier heterostructures
Structure
(l)
(2)
(3)
(4)
Barrier width
(nm)=
10 (7)
7.1 (7.1)
Well width
(nm)
14
5.5
Spacer
(nm)
7
5
Dopingb
(10~scm 3)
0.02
~ 1.5
5.0 (5.25)
4.3 (4.3)
5.5
6.1
5
5
~ 1.5
~ 1.5
4 |
<
2
o
T = 50mK
dia = lOp.m
-4
-160
-80
80
160
240
Bias (mV)
Fig. I. Current-voltage (I-V) characteristics of a large
diameter asymmetric double-barrier diode from strucutre 1.
The band structure graphs in the inset illustrate the charging
only under forward bias.
795
100-1000nm
box
Eo
-eV
GaAs
AIGaASGaAs
~
O~
="
( C):)
~ bo]
b2 w
electron
accumulation
~
b 1 b0
Fig. 2. (a) Schematic sketch of the submicron-diameter double-barrier diode. (b) Band diagram of
structure 1 and reverse and (c) forward bias.
(2)
(3)
= ( E J h ) e x p { - ( 2 b / h )x/(2m*[V0 - E,])},
(4)
796
M. TEWORDTet al.
AND
DISCUSSION
30T=370mK
20~.~
dia = 1 5 O h m
1Or-
(~
xlO0
-10 -200
I
200
i
400
(a)
i
600
/ /
T=2OmK
~l~
100
dia=3OOnm
O[
, ~L
, I /
t-"
ll~II tit l
0
-100
_,--
/.
A
I
-40
I tt t
111
t
(b)
1
30
t...=
[
40
J
50
1
60
Bias ( m V )
Fig. 3. (a) I - V characteristics of a 150 nm diameter asymmetric double-barrier diode at T -~ 370 inK. (b) Expanded
I - V at T ~ 20 mK of a 300 nm diameter diode fabricated
from structure 1 at low current levels, showing in forward
bias the incremental charging of the quantum d o t electron
by electron, starting from zero. The inset shows that the
current steps are w a s h e d o u t at T = 4.2 K. In reverse bias,
tunneling between two quantum dots in series is observed.
'
'
~ 120
SO
~30
/ //0
d=101~m
c-
'
Onm
F]
,
20
J
I
40
(a)
60
,,~Q.200150 30Ohm/i
~ ~
100
,..,v
80
.....
797
-50
-100
-150
Bias (mV)
Fig. 4. l - V characteristics of four diodes from structure 1
with conducting diameters i0 #m, 300 nm, 300 nm, and
150nm, in (a) forward bias, and (b), reverse bias. The
single-electron charging can be observed in all diodes, but
only in the forward bias direction.
,<r=
.<c:
-4"
Positive BiQs
Fig. 5. I - V characteristics of four diodes fabricated from
structures 1-4, with increasing barrier thickness b (and
various electronic diameters). The current steps A/decrease
with increasing barrier thickness. See Table I for details.
798
M.TEWORDT et al.
(b)
(a)
O000000 O0
120
oooOOOoo0oo
i I ~ l n+contact
30mK
-
Double barrier
20nA
J ~ [ ~ n +contact / /
,j
~100
w
0
--
B=O
0- 8O
1.5T
~ 4 . 5 T
8OT
ooo0
";i!i i i i i i i i i i l
ooooooooooooooooooo
::::::::::::::::::::::::::
g~ 6o
...
oooooooooooO0ooO o
60
40
20
20
40
60
Voltage (mY)
L,I,,,I,,,I,,,I,,,I,,,I,,,
40
0
10 12 14
Magnetic Field
(T)
Fig. 6. (a) I-V characteristics of a symmetric RTD from structure 3 with a conducting diameter of 83 nm,
as a function of magnetic field applied parallel to the current direction. (b) Positions of the current steps
in bias vs magnetic field according to (a).
7.1, 5, and 4.3nm, respectively (compare with
Table 1). The corresponding values calculated using
the W K B approximation using structure parameters
from Table 1 are 15pA, 2 n A , 18 nA, and 50hA.
While there is good agreement between experiment
and theory, we can say that the dependency on
barrier thickness supports the model of singleelectron tunneling [eqn (3)]. Other numerical
calculations[10] show
that
in most
cases,
quantitative agreement is obtained between theory
and model.
(5)
5.CONCLUSIONS
We have observed the incremental charging of
the double-barrier diode with single electrons, start-
REFERENCES
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