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Dilution
Deposit
316 L SS
WT-50
Colmonoy-5
-5 -4 -3 -2 -1 0 1 2 3
10
12
13
N o rm a l L o ad
: 1 20 N
S li d i n g V e l o c i ty : 0 . 2 5 m / s
N e a r I n te r fa c e (0 . 1 5 - 0 .2 m m )
S i n g le la y e r
D o u ble la y er
0.016
0.012
0.008
0.004
0
0
450
900
1350
S lid in g d is tan ce (m )
Fig. 2:
170
11
Hardness, VHN10kg
n OUTLINE
1800
TECHNOLOGY-1
n ADDITIONAL INFORMATION ABOUT THE PROCESS
Using information generated on systematic study of dilution during GTAW deposit, a procedure for fabrication bushes
made from the Ni base hardfacing alloy was developed which involved weld build up and precision machining. The bushes
made by this procedure met all the requirement and this procedure is now being adopted for fabrication of the bushes
made of this material to meet the requirement of PFBR. Figure 3 shows various stages involved in the design.
a)
b)
c)
Fig. 4 : Bottom plate of grid plate assembly after hardfacing during technology
development
n ACHIEVEMENT
1.
2.
3.
Choosing the optimum deposit thickness considering dilution from base metal, deposition process, distortion of the
components and machining allowance available
Development of procedure for hardfacing of various PFBR components
Technology development for fabrication of bushes made of hardfacing alloys using weld deposition technique
C.R. Das, S.K. Albert, A.K. Bhaduri and G. Kempulraj, J. Mater. Process. Tech., 141 (2003) 60.
C.R. Das, S.K. Albert, A.K. Bhaduri, C. Sudha, and A.L.E. Terrance, Surface Engineering, 21 (2005) 290.
C.R. Das, S.K. Albert, A.K. Bhaduri and Nithya Ravindran, Materials Science and Technology (In Press).
Further inquiries:
Dr. A.K. Bhaduri, Materials Technology Division
Metallurgy and Materials Group, IGCAR, e-mail: bhaduri@igcar.gov.in
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