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Outline
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Laser
Structure:
( optical waveguide )
p-contact layer
p-cladding
p-waveguide
active area
n-waveguide
n-cladding
n-substrate
Wavelength
Fast Axis Divergence
Semiconductors - From Wafer to the Chip.ppt 2008-04-18
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Single Emitter 6 W 30 W
120m
Far Field
FA
90 - 800m
600 - 1200m
0
10 0
0
0
0
4
Cladding
Waveguide
Active area
Waveguide
Cladding
SA
Semiconductors - From Wafer to the Chip.ppt 2008-04-18
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Several BA-Laser Diodes for getting higher power levels (40 120 W)
0,1 mm
0,1mm
0,15 - 0,5 mm
Filling Factor
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vertical
(95%)
Fundamental mode
q(95%) from 33 to 64
11
lateral
(95%)
divergence (95%),
10
L = 2 mm
L = 3 mm
Multimode
Changing with:
- power
- cavity length L
q(95%) from 7 to 9
8
7
6
2,0
2,5
3,0
3,5
4,0
4,5
5,0
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803,7
804,0
intensity, a.u.
0,8
0,6
804,3
FWHM
0,4
804,1
0,2
0,0
795
804,1
95%
800
805
810
wavelength, nm
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Laser structure:
- Pulse Wavelength
- Fast Axis Far Field
- Spectral Bandwidth
- Operating Voltage
- Conversion Efficiency (maximum)
- Polarization (TE,TM)
- Slow Axis Far Field
120m
90 - 800m
600 - 1200m
0
100
m
000
-4
- Serial Resistance
- maximum Power Level (COMD-Limit)
- Threshold Current
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Technology :
1. Epitaxierter Wafer
4. Facettenbeschichtung
Quality Control:
2. Prozessierter Wafer
Process steps
Measurement of uncoated laser bars, final measurement
(short pulse measurement, unmounted bars)
Individual bar numbers on each wafer
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Definitions
Laser diode
Laser diode bar
Diode laser
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Definitions
Laser diode
Laser diode bar
Diode laser
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Packaging Aspects
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N-contact-lid
Solder/adhesive
AuSn - Solder
CuW - Substrate
Sn - solder
Cu - heat sink
Cu - Heat sink
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40
60
35
55
P in W
P in W
45
30
50
25
45
20
40
2000
4000
6000
8000
10000
4000
6000
8000
10000
BI time in h
BI Time in h
Semiconductors - From Wafer to the Chip.ppt 2008-04-18
2000
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Thermal Resistance
Pel = 80 W
TL = 55 C
Popt
= 40 W
T = 30 K
Pth = 40 W
Rth =
T
Pth
30 K
TK = 25 C
=
0,75 K/W
40 W
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0,9
0,8
0,7
0.57 K/W
0,6
0,5
0,4
0,3
0,2
0,1
0
1E-05 0,0001
0,001
0,01
0,1
10
100
10
12
14
16
18
20
time / s
time / s
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CH_01138 F0768-8
CH_01129 F0768-8
CH_01160 F0768-8
CH_01127 F0768-8
CH_01135 F0768-8
CH_01161 F0768-8
CH_01179 F0768-8
CH_01131 F0768-8
CH_01132 F0768-8
CH_01180 F0768-8
CH_01177 F0768-8
80
P in W
75
70
65
60
0
2000
4000
6000
8000
10000
12000
BI time in h
Semiconductors - From Wafer to the Chip.ppt 2008-04-18
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Time of
failures [h]
267.177
283.135
0,44
95% survivors
119.387 h
13,06
MTTF
521.041 h
302.571
315.141
359.066
413.527
censored
censored
censored
censored
censored
censored
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CH_05362 F1147-7
CH_05304 F1147-7
CH_05718 F1147-7
CH_05007 F1147-7
CH_05339 F1147-7
CH_05609 F1147-7
CH_05031 F1147-7
CH_05899 F1147-7
CH_05628 F1147-7
CH_05889 F1147-7
CH_05719 F1147-7
CH_05743 F1147-7
170
160
P in W
150
140
130
120
110
100
0
500
1000
1500
2000
2500
3000
3500
BI time in h
Semiconductors - From Wafer to the Chip.ppt 2008-04-18
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Products
based on high power passively cooled diode lasers
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