3.

1 Mask Design & Fabrication

The design of multi-resevoir microfluidic devices with various size of microchannels on PDMS
and glass substrate that need to be develop is shown in Figure 1. The design consists of the
reservoir with dimensions of 660x1940 micrometer, microchannels size of 1000x1720
micrometer, and nanochannels which vary in sizes of 20, 30, 40 and 60 micrometer.

Figure 1: The pattern to be developed

The fabrication method of microfluidics device is started with design of the mask pattern in
Adobe Illustrator, the design of the mask pattern is shown in Figure 2.The design of the mask
must be on positive or negative photoresist employed as the imaging layer.The mask is designed
on the OHP mask to be 5 times larger than actual size and printed onto transparent plastic using
high resolution and very dark printing system.The printed plastic film is check under the
microscope to verify the quality of printing.This step is important to check on the
smear,insufficient ink and line edge roughness of the printing result. In the step of mask creation,
the dark environment must be ensured.The emulsion mask is created by exposing the emulsion
mask to the light source for 6.5 seconds in the optical mask maker box. The exposed emulsion is
then rinse with ionized water, fixer solution, distilled water and tap water.

Figure 2: The design of mask pattern

3.2 Wafer Substrate Cleaning
Then the silicon wafer that been coated is cut with dimensions 20x20mm. The silicon wafer
is cleaned by immersing the wafer into ultrasonic bath with the solution of acetone,
methanol, and isopropanol. The wafer is immersed in each of these three solution for about
5minutes each.