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2016 J. Phys. D: Appl. Phys. 49 264001
(http://iopscience.iop.org/0022-3727/49/26/264001)
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doi:10.1088/0022-3727/49/26/264001
Center for Advanced Plasma Surface Technology (CAPST), NU-SKKU Joint Institute for Plasma
Nano-Materials (IPNM), Advanced Materials Science and Engineering, Sungkyunkwan University,
Suwon 440-746, Korea
2
Department of Textile Processing, National Textile University, Faisalabad 37610, Pakistan
3
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon 440-746,
Korea
4
Biological & Nanoscale Materials Lab, Advanced Materials Science and Engineering, Sungkyunkwan
University, Suwon 440-746, Korea
5
Plasma Nanotechnology Research Center, Nagoya University, Furo-cho, Chikusa-ku 464-8603, Japan
E-mail: manishk@skku.edu and hanjg@skku.edu
Received 8 February 2016, revised 8 April 2016
Accepted for publication 14 April 2016
Published 31 May 2016
Abstract
Carbon thin films, having a combination of unique physical and chemical properties, exhibit
an interesting biocompatibility and biological response to living entities. Here, the carbon
films are developed in the morphology form of nano-domains with nanoscale inter-domain
separations, tuned by plasma conditions in the facing target magnetron sputtering process.
The wettability and surface energy are found to have a close relation to the inter-domain
separations. The chemical structure of carbon films exhibited the relative enhancement of sp3
in comparison to sp2 with the increase of domain separations. The cell-viability of these
films shows promising results for L929 mouse fibroblast and Saos-2 bone cells, when
inter-domain separation is increased. Electrical conductivity and surface energy are identified
to play the key role in different time-scales during the cell-proliferation process. The
contribution from electrical conductivity is dominant in the beginning of the cultivation,
whereas with the passage of time (~35 d) the surface energy takes control over conductivity
to enhance the cell proliferation.
Keywords: carbon films, cell viability, surface energy, photoelectron spectroscopy,
conductivity
(Some figuresmay appear in colour only in the online journal)
1.Introduction
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2. Experimental details
Si wafer and round glass cover slips are used as substrates and
these were cleaned via ultrasonication in acetone and ethyl
alcohol (separately for 15min) before the deposition. The
carbon films with 200nm (10nm) thickness were deposited by facing target magnetron sputtering using a graphite
target (99.99%, 4 inch diameter). The plasma chamber was
evacuated to the base pressure of 1105 Torr through high
vacuum pump along with the rotary pump. The discharge was
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respectively. It is observed that the intensity of all these species tends to decline on increasing the pressure. It reveals
that the highly excited plasma species are generated at the
lower pressure. Furthermore, the intensity ratio of Ar II
(at 488.1nm) to Ar I (at 419.83nm) is calculated and shown
in figure1(b). This ratio is associated to the electron temper
ature. On increasing the pressure, the increase in density of Ar
enhances the electronneutral collision frequency due to lowering the mean free path. This will reduce the electron temper
ature and excitation of the present species as well. Hence, the
lower energy species approaching the substrate will generate
the film structure with lower density.
The surface morphology, studied by FESEM, is shown in
figures2(a) and (b), for the representative samples prepared at
2.5 mTorr and 6.5 mTorr, respectively. The top view clearly
depicts the growth of films in the form of nano-domains (NDs)
separated by nanoscale dimensions. Similar morphology has
been reported by Kumar et al in carbon films deposited as
a function of power density and pulsed frequency [29]. The
cross sectional image represents the film growth in columnar
structures. The separations between NDs correspond to
the nano-channels between the columns. The observations
depict that the spacing between the columns is large at higher
3
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Figure 2. FESEM images of carbon film deposited at: (a) 2.5 mTorr, (b) 6.5 mTorr with magnification200000. The nano-domains and
the separations in columnar structure are pointed out by arrows.
Figure 3. XPS spectra of carbon films: (a) survey spectra, (b) high resolution C-1s spectra, (c) high resolution O-1s spectra. (d) Relative
hybridization of sp2, sp3 and ratio of sp3 to sp2 calculated from the area of C-1s components.
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Figure 6. The viability of carbon films for: (a) L 929 cells as a function
of working pressure. (b) Saos-2 at fixed 4.5 mTorr working pressure.
Figure 5. Water contact angle and surface energy of carbon films
deposited as a function of working pressure.
s = sd + sp.
(3)
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4.Conclusion
The deposition of carbon films having nanodomain morph
ology with tunable inter-domain separation is successfully
achieved through a facing target magnetron sputtering plasma
process. The process facilitates control over the energy of species in the plasma by variable working pressure. The chemical
structure as analyzed by XPS shows the formation of higher
sp2 bonds in the films at lower pressure which controls the surface electrical properties of carbon films. The nano-separations
in the nanodomains structure work as nano-capillaries to
accommodate the water molecules. The films exhibit higher
wettability and surface energy at higher working pressure
because of the larger separations between columns. The time
dependent cell growth study for L929 cells reveals the dominance of electrical conductivity in the beginning of the cell
cultivation, followed by surface energy playing a leading role
in cell population enhancement after the passage of time.
Acknowledgments
This study was supported by the National Fusion Research
Institute of Korea (NFRI) through the R&D Program of
Plasma Advanced Technology for Agriculture and Food
(Plasma Farming) and the Global Development Research
Center (GRDC), under the program of the Ministry of Science,
ICT and Future Planning (MSIP, Grant No. 20120006672,
2nd stage 3rd year). Authors also acknowledge the help from
Chikage Yamada during the cell viability experiments.
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