Discussion on New Magnetic Lattice Fabrication (12/04/17)

For the next magnetic lattice fabrication, the primary aim will be to try to understand the
origin of the very short (~ 1 ms) lifetimes for the 0.7-um-period triangular magnetic lattice,
by studying the lifetimes of lattices with periods in between the 0.7 um-period triangular
lattice with trap lifetimes of about 1 ms and the 10 um-period 1D lattice with trap lifetimes of
about 25 s. We suggest 4 of the following 5 lattices, assuming we can use the new 10 times
thicker Co/Pd film:
1. 0.7 um-period triangular lattice: rotated by 90 degrees to improve loading and using
10 times thicker magnetic film to enable to trap at larger distances (d a), to compare
lifetime vs distance with present triangular 0.7 um-period lattice.
2. 1.5 um-period triangular lattice: check lifetime vs distance from chip surface.
3. 3 um-period triangular lattice: check lifetime vs distance from chip surface. May
possibly be able to site resolve, though need to image from bottom for 2D lattice?
4. 5 um-period triangular lattice: check to see if the trap lifetime is similar to 10 um-
period 1D lattice ( 25 s). Should be able to site resolve, though need to image from
bottom for 2D lattice.
5. 0.7 um-period 1D lattice: should be easier for trapping than the triangular lattice, and
interesting to compare lifetime vs distance. Need to have some axial confinement
provided by Z-wire.If successful, could try some simple tunnelling experiments?
Some other points:
(1) Armandas needs to do some trial etchings on the new 98 nm thick films for 0.7 um
triangular lattice
(2) New computer files for the 4 lattice structures need to be generated Prince?
(3) Check to see how many thin film wafers and thick film wafers are there.
(4) Calculate tunnelling times for a = 0.9 nm and 1.2 nm.
(5) When fabricating new current-carrying wire chip, make two chips.