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1110 IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 11, NO.

6, NOVEMBER 2012

Field Emission of ZnO Nanowires in Low


Vacuum Following Various Enhancements
Made by Exposure to UV
Cheng-Liang Hsu and Yao-Ching Tsai

AbstractHigh-density vertical ZnO nanowires (NWs) were a high aspect ratio, low work function, and excellent thermal
synthesized by vapor phase transport deposition without a metal stability. Many articles have reported enhancements of FE from
catalyst or template. The work function of ZnO NWs was re-
ZnO NWs, as in increased negative electron affinity [18], in-
duced to 3.7 eV by exposure to UV. At a low vacuum of 10 3 Torr,
the UV light improved the field emission performance and creased conductivity of emission [19], the reduced screening ef-
reduced the turn-on voltage such that they were better than those fect of ZnO nanostructures [20], or reduced work function [21].
of nor-mal field emission in a high vacuum. The depletion layer Most relevant investigations focus on controlling morphology
of NWs disappeared because surface O2 oxygen molecules were and doping technology [21]. The morphology of ZnO NWs is
removed by exposure to UV light. The enhancement by UV
composed of ultralong wires or sharp tips, which increase the en-
remained even after the UV light had been turned off for 20 min.
hancement factor [18][20]. ZnO nanostructures were doped
Index TermsEnhance, field emission (FE), low vacuum, using elements Al, Ga, and In [21], [22]. ZnO is well known as a
ultra-violet (UV), ZnO nanowires (NWs).
natural n-type material. The work function ( = Eva c EF ) of
pure ZnO NWs is 5.3 eV. Doping ZnO strengthens its n-type
I. INTRODUCTION characteristic and shifts EF toward the conduction band EC . The
increase in the EF value upon doping reduces the work function
ANOSTRUCTURE materials have very favorable physi-
. The field emission displays (FEDs) are operated in a high

N cal and chemical properties because of their large surface-


to-volume ratio. In the past decade, nanostructure materials have
6
vacuum (10 Torr), which is vacuum-sealed in a frame
package. The vacuum of FED package decays slowly because the
materials are porous and the glue-pasting degrades. A few studies
been extensively adopted for fabricating nano-sized photoelec- have discussed the FE property in low vacuum [23]. In this
tric and electronic devices, such as UV nanolasers [1], field-effect
transistors [2], solar cells [3], gas sensors [4], UV pho-todetectors investigation, vertical ZnO NWs were synthesized on
[5], light-emitting diodes [6], nanogenerators, and field emission ZnO:Ga/glass substrate without a catalyst. The FE of ZnO NWs
3
(FE) devices [7], [8]. The most well-known (1-D) emitter was measured at low vacuum (10 Torr). At the low vacuum,
cathodes of FE are carbon nanotubes [9], but emitters of metallic the FE is measured in dark region and under various wavelengths
and semiconductor nanostructure materials have been of UV light. The results concerning FE in a low vacuum are dis-
investigated in recent years [8][10], owing to their lower elec-
tron affinity and ease of synthesis. Among available nanostruc- cussed. The optical and electrical mechanisms of the fabricated
ture materials, ZnO is an n-type material with a large exciton FE device are also elucidated.
binding energy of 60 meV and a wide direct bandgap energy of
3.37 eV at room temperature. ZnO nanowires (NWs) can be
synthesized by various methods, including chemical vapor de- II. EXPERIMENTAL DETAILS
position [8][11], template-assisted growth [12], catalyst-driven
molecular beam epitaxy [13], metalorganic chemical vapor de- Before ZnO NWs were synthesized, Ga-doped ZnO films with
position [14], vaporliquidsolid [2], [15], sol-gel synthesis, and a thickness of approximately 50 nm were deposited by reac-tive
hydrothermal methods [16], [17]. ZnO NWs have been consid-
ered to be promising cold cathodes for FE because they have magnetron sputtering on glass substrates (Corning1737). X-ray
diffraction (XRD) measurements demonstrated that the sput-tered
ZnO:Ga film was preferentially oriented in the (002) direc-tion. A
Manuscript received April 21, 2012; accepted August 7, 2012. Date of pub- four-point probe resistivity measurement indicated that the sheet
lication August 10, 2012; date of current version November 16, 2012. This resistance of the ZnO:Ga film was around 186 /sq. ZnO NWs
work was supported by the National Science Council (NSC) of Taiwan under
Contract NSC 101-2221-E-024-016. The review of this paper was arranged
were synthesized by vapor phase transport deposi-tion without a
by Associate Editor G. Ramanath. metal catalyst or template. The source of zinc vapor was Zn metal
C.-L. Hsu is with the Department of Electrical Engineering, National powder with a purity of 99.9%, which was purchased from Strem
Univer-sity of Tainan, Tainan 700, Taiwan (e-mail: clhsu@mail.nutn.edu.tw).
Y.-C. Tsai was with the Department of Electrical Engineering, National Uni-
Chemicals. The ZnO:Ga/glass substrate and zinc metal powder
versity of Tainan, Tainan 700, Taiwan. He is now with Advanced Semiconductor were placed on an alumina boat. The distance between the zinc
Engineering, Inc., Kaohsiung 811, Taiwan (e-mail: luckygd77@hotmail.com). powder and the substrate was main-tained at 20 mm, with the
Color versions of one or more of the figures in this paper are available
online at http://ieeexplore.ieee.org. zinc powder placed upstream of the boat. The boat was inserted
Digital Object Identifier 10.1109/TNANO.2012.2212913 into a horizontal tube furnace to grow the ZnO NWs. Notably, the
positions of the patterned ZnO:Ga/glass substrate, zinc vapor
source, and alumina boat

1536-125X/$31.00 2012 IEEE


HSU AND TSAI: FIELD EMISSION OF ZnO NANOWIRES IN LOW VACUUM FOLLOWING VARIOUS ENHANCEMENTS 1111

Fig. 1. Configuration for making FE measurements.

were carefully controlled so that they were located at the same


horizontal level and were heated at the same temperature. Argon
and oxygen gases were introduced into a thermal furnace system
as the NWs grew therein. The Ar flow rate was maintained at
54.4 sccm, while the O2 flow rate was maintained at 0.8 sccm. A
mechanical pump was then utilized to evacuate the system and a Fig. 2. FESEM image of cross-sectional sample of ZnO NWs grown on
programmable temperature controller was used to control the ZnO/glass. (Left) XRD profiles of ZnO NWs. (Right) PL emission spectra
obtained by excitation at e x c = 254 nm.
furnace temperature with an accuracy of 1 C. Meanwhile, the
reaction temperature, total growth time, and pressure inside the

tube furnace were 580 C, 60 min, and 10 Torr, respectively. ing their FE property. The left inset in Fig. 2 displays the XRD
The morphologies and size distribution of the as-grown ZnO spectrum of a sample. Only one strong ZnO (002) XRD peak
NW were characterized using a field-emission scanning elec-tron with a small linewidth was observed. This result demonstrates
microscope (FESEM) (JSM-7000F), which was operated at 10 that these ZnO NWs were well oriented with a pure wurtzite
keV. The crystallographic and structural properties of the as- structure. The right inset in Fig. 2 shows room-temperature
grown ZnO NWs were then determined using a MAC MXP18 X- photoluminescence (PL) spectra of the ZnO NWs that were
ray diffractometer. The FE characteristics of ZnO NWs in the grown on a ZnO:Ga/glass substrate. Clearly, all of the PL
dark region were compared with those of ZnO NWs that were spectra exhibit a strong peak located at about 380 nm with a
illuminated by UV. Fig. 1 schematically depicts the configura- long tail in the long wavelength region. The strong PL peak is
tion for making the FE measurements, which suggested that the attributable to the recombination of free excitons through the
emission current was generated by the tunneling of electrons excitonexciton collision process [24]. Deep emissions
from the tip of the ZnO NW. The FE properties of these ZnO (greenyellow bands) are also observed as long tails. Deep
NWs at room temperature in a vacuum chamber at a pressure of level emissions have been suggested to be related to the singly
6 3
10 Torr or 10 Torr were also investigated. During FE mea- ionized oxygen vacancies in ZnO [25].
surements, the anode was a tungsten probe with a diameter of 1.8 Fig. 3(a) plots the emission currentvoltage characteristics of
mm, while the interelectrode distance d between the anode and ZnO NWs, which were measured in the dark and in UV light of
the ZnO NWs was precisely maintained at 100 m. The 2
various wavelengths. The inset presents FN plots of ln(J /V )
wavelengths of the light from the UV-A and UV-B are defini-tion against (1/V ). The energy of the photons of UV-A (around 365
in 320400 nm and 280320 nm, respectively. The lamp was nm) and UV-B (around 310 nm) fluorescent tubes exceeds the
placed above the glass substrate as an excitation source for the energy of the ZnO bandgap, which is 3.37 eV. The conductivity
ZnO NWs. The distance between the UV lamp and the substrate of ZnO increased upon exposure to UV light ow-ing to the
was maintained at 1 cm. The currentvoltage (I V ) formation of an electronhole pair. UV light evidently reduced
characteristics were determined using a Keithley 237 source and the FE turn-on voltage. The intensities of UV-A and UV-B light
measuring unit, which measured in femtometers and provided a 2
were approximately 4.2 and 2.1 mW/cm , respec-tively. Owing
maximum voltage of 1100 V. The FE properties were extracted
to the UV-A FE property, the lowest turn-on volt-age was 240 V,
from the obtained I V curves using the FowlerNordheim (FN) equivalent to an electric field of 2.4 V/m since the distance
model. between was 100 m. In the UV-B light and dark regions, the
threshold fields were higher, 4.2 and 6.4 V/m, respectively
III. RESULTS AND DISCUSSION suggesting that the light intensity dominated FE performance.
The power consumed by the UV-A and UV-B flu-orescent lamps
Fig. 2 presents the cross-sectional FESEM image of the ZnO matched their specifications, but the intensity of the UV-B

NWs that were grown at 580 C. Clearly, high-density verti-cal photons was lower than that of the UV-A photons because their
ZnO NWs with uniform diameter and uniform length were grown electrical transfer efficiency was lower. The three FE curves are
on ZnO:Ga/glass substrates. As shown in Fig. 2, the av-erage described by the FN equation
length and diameter of the ZnO NWs were approximately 3.5 m J= 2 3/2
aV bd
and 120 nm, respectively. The tips of the ZnO NWs were around
exp
20 nm in diameter and had a sharp morphology, enhanc- 2 2
d V
1112 IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 11, NO. 6, NOVEMBER 2012

denotes the work function of ZnO NWs (eV). To investigate fur-


2
ther the FE behavior of these two different ZnO NWs, ln(I /V )
was replotted as a function of 1/V, in the FN plot in the inset of
Fig. 3(a). It exhibits three negative linear regions within the
measured range. The change in the slope of the FN plot reveals
that the local electric field at the top of these NWs may not in-
crease linearly with the applied voltage. Knowing that the work
function of the pure ZnO NWs was 5.3 eV indicates that the
field enhancement factor in the dark, in UV-A and in UV-B,
should be approximately 1198, 5420, and 3233, respectively. The
sample of ZnO NWs is the same; its surface morphology should
be the same. The field enhancement factor of ZnO NWs was
also assumed to be equal to that in the dark region, 1198. Based
on this assumption, the work functions for UV-A and UV-B
should be reduced to 3.7 and 4.2 eV, respectively.
To examine the characteristics of the emission current at vari-
ous pressures, two values of pressure were utilized in the exper-
iments. To maintain a high vacuum, a turbo pump was used to
6
maintain a pressure in the chamber of about 10 Torr. When the
3
turbo pump was turned off, the pressure increased to 10 Torr.
The FE of UV-A light was measured at various pressures, and
plotted in Fig. 3(b). The inset presents FN plots. In the dark
6
region, the high vacuum (10 Torr) yielded a better turn-on
3
voltage, 570 V, than did the low vacuum (10 Torr), 650 V.
Under the same sample exposed to UV-A light, the high vac-uum
yielded the lowest turn-on voltage, 240 V, and the low vac-uum
yielded a turn-on voltage of 330 V. These results show that the
UV-A light improved the FE performance and dominated it. Fig.
3(c) plots the FE properties of ZnO NWs in the dark and un-der
UV-B light at high and low vacuums. The inset displays FN plots.
The relationships among FE, duration of exposure to UV-B light,
and the vacuum pressure are similar to that in Fig. 3(b). The
lowest turn-on voltage, 420 V (equivalent to an electric field of
4.2 V/m) in Fig. 3(c) was measured under UV-B light at a high
vacuum. Therefore, UV-A and UV-B light yielded better FE
properties in a high vacuum than in a low vacuum.
To investigate the FE properties after the UV light was turned
off, Fig. 4(a) presents the emissions that were measured in the
dark and under UV-A light at a low vacuum (10 3 Torr), and after
the UV-A light had been turned off. After the UV-A light had
been turned off for 5, 10, 15, 20, 25, and 30 min, the measured
turn-on voltage of the FE was 420, 450, 460, 560, 615, and 660
V, respectively. The FE performance became worse as the time
after the UV-A light was turned off increased, but the FE turn-on
voltages when the UV-A light had been off for 520 min were
still lower than those measured in the dark. The conditions under
which the measurements in Fig. 4(b) were made were the same as
those under which the measurements in Fig. 4(a) were made,
Fig. 3. (a) FE properties of ZnO NWs measured in the dark and under UV except that a high vacuum (105 Torr) was maintained in the
2
light of various wavelengths. (Inset) FN plots of ln(J /V ) as a function of chamber. The measured turn-on voltages of FE after the UV-A
(1/V ). (b) FE properties of ZnO NWs measured in the dark and under UV-A light had been turned off for 5, 10, 15, 20, and 25 min were 330,
light in high and low vacuums. (Inset) FN plots. (c) Emission current in UV-B 350, 460, 590, and 650 V, respectively. When the UV-A light had
light and dark at various pressures. (Inset) FN plots.
been turned off for 515 min, the FE performance was still
better than in the dark (in which it was 550 V). When the UV-
2 A light had been turned off for more than 25 min, the FE
where J denotes the current density (A/m ); V denotes the ap- properties were worse than in the dark, regardless of
plied voltage (V); denotes the field enhancement factor; a = whether the vacuum was high or low.
1 0 2 9 3/ 2
1.56 10 (A eV/V ); b = 6.83 10 (V/m eV ), and
HSU AND TSAI: FIELD EMISSION OF ZnO NANOWIRES IN LOW VACUUM FOLLOWING VARIOUS ENHANCEMENTS 1113

Fig. 5. (a) FE measured in low vacuum after UV-B light is turned off. (b) FE
Fig. 4. (a) FE measured in low vacuum after UV-A light is turned off. (b) FE
measured in high vacuum after UV-B light is turned off.
measured in high vacuum after UV-A light is turned off.

and sharper) contributed more to the current FE, so the emission


Fig. 5(a) and (b) shows under UV-B light in a low vacuum current was constricted within a small local area in the sample.
3 5 The high current density produced a very high temperature on a
(10 Torr) and a high vacuum (10 Torr), respectively. The
measurement procedures and conditions were similar to those in small local area of the sample, where the ZnO NWs therefore
Fig. 4(a) and (b). In a low vacuum, the measured turn-on voltage locally melted and its morphology changed. The consequent
of FE after the UV-B light had been turned off for 5, 10, 15, and change in sample morphology from NWs to planar with time
20 min was 450, 530, 570, and 680 V, respectively. In the high reduced the enhancement factor and caused FE to decay.
vacuum, the measured turn-on voltage of FE after the UV-B light The UV irradiation produces the photonics and simultane-
had been turned off for 5, 10, 15, 20, 25, 30, and 35 min was 210, ously heating the sample. Maybe a part of FE enhancement is
300, 320, 340, 370, 430, and 510 V, respectively. The FE contributed from the high temperature. Fig. 8 reveals that
properties are still improved when the UV-B illumination is temperatures of sample increased upon exposure to UV light.
turned off. According to the aforementioned experiments, the Even if these substrates were exposed to UV an hour, the maxi-

UV-A and UV-B improved the FE performance, and the UV- mum temperature is still smaller than 50 C. The UV exposure
enhancing affect continues even after the UV light has been temperature is low and difficult to enhance FE characteristics.
turned off for 20 min. As is well known, ZnO NWs are used in gas sensing because
Fig. 6(a)(d) presents the FN plots that correspond to Figs. they have a large surface-to-volume ratio. The sensing mech-
4(a) and (b), and 5(a) and (b), respectively. Because the FE anism of gas-sensing semiconductors operates only at the sur-
performance worsens with time after the UV light is turned off, face. Oxygen ionosorption removes conduction electrons and
an FESEM instrument was utilized to study the local mor- reduces the conductance of ZnO. According to Barsan et al.,
interaction with atmospheric oxygen causes the ionosorption of
phology of ZnO NWs after the measurements of FE were made. 2
Fig. 7(a)(d) displays scanning electron microscope (SEM) molecular (O 2 ) and atomic (O , O ) species at tempera-tures of

images of ZnO NWs 10, 20, 30, and 40 min, respectively, after 25500 C [26]. Temperature programmed desorption, Fourier
the FE was measured. NWs with a higher aspect ratio (longer transform infrared (FTIR), and electron spin resonance
1114 IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 11, NO. 6, NOVEMBER 2012

Fig. 9. ZnO NW in (a) low vacuum, (b) high vacuum, and (c) UV light.


indicate that at 150 C, the molecular species O 2 dominates,
while above this temperature, the atomic species dominates.

At low temperatures, molecular O 2 is commonly
chemisorbed. The FE was measured at room temperature.
Fig. 6. (a)(d) FN plots that corresponds to Figs. 4(a) and (b), and 5(a) and Most of the adsorbed atmospheric oxygen was molecular
(b), respectively.
O 2 . The reaction kinetics are as follows:
O2 (gas) O2 (ads.)

O2 (ads.) + e O2 .

Photoconduction in a ZnO NW is governed by the desorp-tion


and adsorption of oxygen [27][29]. In the dark, oxygen
molecules at the surface of an NW carry negative charges by
capturing free electrons from the n-type ZnO. Accordingly, a
depletion layer with low conductivity is formed near the sur-face.

Fig. 9(a) and (b) displays that adsorption of O 2 molecules at the
surface of a ZnO NW in a low vacuum and a high vacuum,
respectively. The thickness of the depletion layer at the surface of
a NW increases with oxygen concentration. The low vacuum [see
Fig. 9(a)] yields a thicker depletion layer than the high vacuum
[see Fig. 9(b)]. The depletion layer reduces the surface
conductivity, degrading FE performance.

Many O 2 oxygen molecules are adsorbed on the surface of
5
NWs, even though the chamber is at a high vacuum of 10
Fig. 7. SEM images of ZnO NWs and measured FE after UV-A had been Torr. The absorption of UV light generates electron hole

turned off for (a) 10 min, (b) 20 min, (c) 30 min, and (d) 40 min. pairs. The photogenerated holes oxidize the adsorbed O 2
oxygen molecules on the surface, while the remaining
electrons in the conduction band increase the conductivity
+
O 2 + h O2 (gas).

Since most of the surface O 2 oxygen molecules become O 2
gas upon exposure to UV light, the O 2 gas is rapidly removed
from the chamber by the exhaust pump. Fig. 9(c) indicates that

UV light reduces the amount of surface O 2 oxygen molecules.
The depletion layer almost completely disappears. In the vac-uum
chamber, the very small amount of remaining O2 gas may be

adsorbed on the surface, forming O 2 oxygen molecules, but
recovering the state of the NWs before exposure to UV-light in a
short time is difficult. The enhancement by UV continues even
for at least 20 min after the UV light has been turned off.
Fig. 10 shows that FE was measured under pulsed UV-A
exposure in low vacuum. The pulsed UV-A light is turned on 2
s/min. The emission current was kept at an applied voltage of 350
Fig. 8. Substrate temperatures increasing upon exposure to UV.
V and measured continuously for 1400 s. In the first 200 s, the
emission current is around 4.5 106 A, and the current has
HSU AND TSAI: FIELD EMISSION OF ZnO NANOWIRES IN LOW VACUUM FOLLOWING VARIOUS ENHANCEMENTS 1115

IV. CONCLUSION
High-density vertical ZnO NWs were synthesized by vapor
phase transport deposition without a metal catalyst or template.
The mean length and diameter of the ZnO NWs were around 3.5
m and 120 nm, respectively. XRD and PL spectra demon-strate
that these ZnO NWs were well oriented and highly crys-talline
with a wurtzite structure. The work functions of sam-ples that
had been exposed to UV-A and UV-B were reduced to 3.7 and 4.2
3
eV, respectively. At a low vacuum of 10 Torr, the FE turn-on
voltage upon exposure to UV light was lower than that in a high
6
vacuum of 10 Torr in the dark. The enhancement by UV
continues even when the UV light has been turned off for 20 min.
The depletion layer of NWs disappeared when UV light removed

Fig. 10. FE measured under pulsed UV exposure in low vacuum. O 2 oxygen molecules from the surface.
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1116 IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 11, NO. 6, NOVEMBER 2012

[18] A. Umar, M. M. Rahman, A. Al-Hajry, and Y. B. Hahn, Highly- Cheng-Liang Hsu was born in Taipei, Taiwan, in 1973. He received the B.S.
sensitive cholesterol biosensor based on well-crystallized flower-shaped degree in electronic engineering from Chung Yuan Christian University,
ZnO nanostructures, Talanta, vol. 78, pp. 284289, 2009. Chung-Li, Taiwan, in 1996, the M.S. degree in electronic engineering from
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Enhanced field emission from ZnO nanorods via thermal annealing in and the Ph.D. de-gree in electrical engineering from the National Cheng Kung
oxygen, Appl. Phys. Lett., vol. 88, pp. 033102-1033102-3, 2006. University, Tainan, Taiwan, in 2005.
[20] S. H. Jo, J. Y. Lao, Z. F. Ren, R. A. Farrer, T. Baldacchini, and J. T. From 2000 to 2003, he was an Engineer at the Taiwan Semiconductor
Fourkas, Field-emission studies on thin films of zinc oxide nanowires, Manufacturing Company, specializing in CMOS low-voltage, low-K devices
Appl. Phys. Lett., vol. 83, pp. 48214823, 2003. and 0.13-m copper processes. From 2003 to 2005, he was with the Mate-rial
[21] C. L. Hsu, S. J. Chang, H. C. Hung, Y. R. Lin, C. J. Huang, Y. K. Tseng, and Research Laboratories, Industrial Technology Research Institute, where he
I. C. Chen, Well-aligned, vertically Al-doped ZnO nanowires syn-thesized contributed to develop the synthesis of nanoscale materials. In 2005, he joined
on ZnO:Ga/glass templates, J. Electrochem. Soc., vol. 152, the Department of Electrical and Electronic Engineering, Ming-Chi
pp. G378G381, 2005. University of Technology, Taipei, as an Assistant Professor. He is currently an
[22] S. Y. Bae, C. W. Na, J. H. Kang, and J. Park, Comparative structure and Associate Professor in the Department of Electrical Engineering, National
optical properties of Ga-, In-, and Sn-doped ZnO nanowires synthesized University of Tainan, Tainan. He has published more than 60 contributions in
via thermal evaporation, J. Phys. Chem. B, vol. 109, pp. 25262531, journals. His research interests include nanoscale 1-D semiconductor.
2005.
[23] S. J. Chang, T. J. Hsueh, C. L. Hsu, Y. R. Lin, I C. Chen, and B. R. Huang,
A ZnO nanowire vacuum pressure sensor, Nanotechnology, vol. 19,
pp. 095505-1095505-4, 2008.
[24] S. C. Lyu, Y. Zhang, H. Ruh, H. J. Lee, H. W. Shim, E. K. Suh, and C. J.
Lee, Low temperature growth and photoluminescence of well-aligned
zinc oxide nanowires, Chem. Phys. Lett., vol. 363, pp. 134138, 2002.
[25] B. J. Jin, S. H. Bae, S. Y. Lee, and S. Im, Effects of native defects on
opti-cal and electrical properties of ZnO prepared by pulsed laser
deposition, Mater. Sci. Eng. B, vol. 71, pp. 301305, 2000.
[26] N. Barsan, M. Schweizer-Berberich, and W. Gopel, Fundamental and
practical aspects in the design of nanoscaled SnO2 gas sensors: A status
report, Fresenius J. Anal. Chem., vol. 365, pp. 287304, 1999.
[27] Q. H. Li, T. Gao, Y. G. Wang, and T. H. Wang, Adsorption and desorption of
oxygen probed from ZnO nanowire films by photocurrent measure-ments,
Appl. Phys. Lett., vol. 86, pp. 123117-1123117-3, 2005.
[28] O. Harnack, C. Pacholski, H. Weller, A. Yasuda, and J. M. Wessels, Rec-
tifying behavior of electrically aligned ZnO nanorods, Nano Lett., vol. 3, Yao-Ching Tsai received the B.S. degree in electrical engineering from the
pp. 10971101, 2003. National Chung Cheng University, Chiayi, Taiwan, in 2008, and the M.S.
[29] Y. W. Heo, B. S. Kang, L. C. Tien, D. P. Norton, F. Ren, J. R. La Roche, degree in electrical engineering from the National University of Tainan,
and S. J. Pearton, UV photoresponse of single ZnO nanowires, Appl. Tainan, Taiwan, in 2010.
Phys. A, vol. 80, pp. 497499, 2005. He is currently a Semiconductor Assembly Process Engineer with
Advanced Semiconductor Engineering, Inc., Kaohsiung, Taiwan.

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