DST2T features iy ‘ y A . Ze UR COE UE OncLu a TR eH qi - i ee RCD nea MT t ] \ i = TEM OUCH RCC bv va A \ O Able to plot sputtering parameters graphs. TNO aan eee oe DEL UC TL ce O Thickness monitor system for thickness measuring during coating process with precision of | nm. Nano Structured Coatings Co.Desk Sputter-Thermal deposition system - DST2T Dae CL UR Ce eo eS CU 2” angled magnetron cathode and turbo molecular pump can deposit different kinds of metals, dielectrics and alloys with 1 nm thickness precision. It can deposit several layers from two different cathodes separately or simultaneously. In addition, a thermal source is De RUS CUR CU eC ORm OMaie eed Ph Ue A OU aC RR Cc PUT Teil TacSE as De une Ts Sn aoe PAE ae te POR TR OC ETTCU SCLL DOC LUC Ara Ra BRD Re ne es UAT ee teers RU aL anor Ca om ENON ee ee a Dee ue LO CU MU CRC} ST RU ee Ultimate Vacuum: Less than 2*10-5 millitorr. Box dimensions; 50 Cm H x 60 Cm W x 47 Cm D. De Pa eR La coe eee a PICU Cc UC UA uC Le CO Control the rate of sputtering for any cathode OCU ACCU Lo ee ce uu CE ee Rue CL$ DC Cu ace PTE Ree RU Cu CeO ert cd ee ctu Se OSI us eT RO eG Reus e SUSU Co Cua EOE CeO) Seu OCC AO ou oe CO CE OL CoS et ie ku cee as O Transfer the curves and sputtering process data by PST es ol CO Shipping Weight: ~ 100 Ke with rack and pump. tn eae yay fale esses ooo uk Cu eo Srey ke