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Purpose: To evaluate the effect of selective phosphoric acid etching on enamel using “no-wait” self-etching adhesives.
Materials and Methods: Clearfil Universal Bond Quick (UBQ, Kuraray Noritake) or G-Premio BOND (GPB, GC) was
applied to ground human enamel surfaces. The adhesives were used in 3 modes: no-waiting self-etching mode
(UBQ-0 or GPB-0), 10-s self-etching mode (UBQ-10 or GPB-10), and the selective-etch mode with phosphoric acid
etching (UBQ-PA or GPB-PA). After an acid-base challenge, the morphological attributes of the interface were exam-
ined using scanning electron microscopy (SEM) to characterize the acid-base resistant zone (ABRZ). Microshear
bond strength (μSBS) testing to enamel and ultimate tensile strength (UTS) of the adhesive resin were carried out.
Results: ABRZ formation was confirmed in all groups. UBQ-PA and GPB-PA created thicker ABRZ with no funnel-
shaped erosion beneath the adhesive-enamel interface. μSBS of UBQ-PA was significantly higher than UBQ-0 and
UBQ-10 (p < 0.05). However, there were no statistically signficant differences in μSBS among GPB-0, GPB-10, and
GPB-PA. For the UTS, UBQ was significantly higher than GPB.
Conclusion: Selective phosphoric acid etching created a stable adhesive-enamel interface. The no-waiting self-etch-
ing concept adhesive led to a thinner ABRZ. The results of μSBS suggest that phosphoric acid etching effects on
enamel are material dependent.
Keywords: enamel, multimode, no-waiting self-etching concept, phosphoric acid, acid-base resistant zone, micro-
shear bond strength test.
J Adhes Dent 2018; 20: 407–415. Submitted for publication: 05.04.18; accepted for publication: 17.08.18
doi: 10.3290/j.jad.a41359
G-Premio Bond 1.5 GC 10-MDP, 4-MET, methacrylate acid ester, distilled water, 1603091
10-methacryoyloxydecyl dihydrogen thiophosphate, acetone, photoinitiators,
silica
Bis-GMA: bisphenol A diglycidylmethacrylate; HEMA: hydroxyethyl methacrylate; 10-MDP: 10-methacryloyloxydecyl dihydrogen phosphate; 4-MET: (4-[2-(methac-
ryloyloxy)ethoxycarbonyl]phthalic acid).
1-SEAs are regarded as ultra-mild self-etching adhe- Board of Tokyo Medical and Dental University (D2013-022).
sives;19 however, the bonding mechanism to enamel relies The teeth were stored at 4°C in 0.01% thymol solution, and
on micromechanical interlocking provided by the resin tags used within 1 month following extraction.
in acid-etched enamel. Furthermore, some studies con- Two kinds of 1-SEAs were used in this study (Table 1),
cluded that phosphoric acid etching prior to the application Clearfil Universal Bond Quick (UBQ, Kuraray Noritake; Tokyo,
of self-etching adhesives (selective phosphoric acid etching) Japan) and G-Premio BOND (GPB, GC; Tokyo, Japan). Both
improves enamel bond strength.3,8,32 The mild etching abil- adhesives can be applied according to the no-waiting self-
ity has raised some concerns with regard to the ability of etching concept. UBQ contains 10-MDP, while GPB contains
these 1-SEAs to form a stable bond and marginal sealing of 10-MDP and (4-[2-(methacryloyloxy)ethoxycarbonyl]phthalic
the restoration without selective phosphoric acid etching.35 acid) (4-MET) as functional monomers. For GPB, no-waiting
Tsuchiya et al34 first observed ultramorphological self-etching mode is recommended in the Japanese version
changes at the interface between adhesive and dentin after of the manufacturer’s instruction, and 10-s self-etching
an acid-base challenge by using scanning electron micros- mode is recommended in the international version.
copy (SEM). They found a new zone resistant to acid-base Specimens were randomly divided into six groups. For
attack, the so-called acid-base resistant zone (ABRZ) adja- the no-waiting self-etching mode, the adhesive was applied
cent to the dentin hybrid layer in self-etching adhesives. The for less than 1 s and immediately air dried with no time
ABRZ was thought to play an important role in the preven- lapse between steps (UBQ-0 or GPB-0). For the 10-s self-
tion of recurrent caries, sealing of restoration margins, and etching mode, the adhesive was applied on the enamel sur-
promotion of restoration durability.21,22 Li et al15 found that face for 10 s (UBQ-10 or GPB-10). For the selective-etch
a similar zone, “enamel ABRZ”, formed at the adhesive- mode, 37% phosphoric acid (K-etchant Gel, Kuraray Nori-
enamel interface with 2-SEAs containing 10-methacryloyl- take; Tokyo, Japan) was applied for 10 s, then rinsed and
oxydecyl dihydrogen phosphate (10-MDP). It has been re- dried. Each adhesive was applied and air dried without wait-
ported that 2-SEAs containing 10-MDP created a stable ing (UBQ-PA or GPB-PA). An LED light-curing unit (Valo LED
enamel ABRZ, whereas the 1-SEAs containing 10-MDP cre- Curing Light, Ultradent; South Jordan, UT, USA) was used in
ated thinner ABRZs with funnel-shaped erosion, indicating a high power mode (1400 mW/cm2) to light cure the adhe-
weak area vulnerable to acid-base attack beneath the adhe- sive for 10 s.
sive-enamel interface. However, this erosion did not occur
in 1-SEAs with selective phosphoric acid etching.28 Microshear Bond Strength (μSBS) Test
The purpose of this study was to evaluate the effect of Sample preparation was carried out as shown in Fig 1. A
selective phosphoric acid etching on enamel using no-wait- 2-mm-thick cuspal enamel slice was sectioned using a low-
ing self-etching adhesives. The null hypotheses of this study speed diamond saw (Isomet, Buehler; Lake Bluff, IL, USA).
were that 1) the extension of application time improves the In order to standardize the smear layer, the enamel sur-
adhesive-enamel interface, 2) selective phosphoric acid faces were wet polished with 600-grit SiC paper for 1 min.
etching has no effect on the adhesive-enamel interface The slices were randomly divided into six groups. Prior to
when the no-waiting self-etching adhesive is used, and 3) all polymerization of the adhesive resin, a tygon tube (R-3603,
no-waiting self-etching adhesives show the same trend. Professional Plastics; Fullerton, CA, USA) with an internal
diameter of 0.79 mm and a height of 0.5 mm was placed
on each bonded area. After the adhesive was light cured, a
MATERIALS AND METHODS hybrid resin composite, Clearfil AP-X (shade A2, Kuraray
Noritake), was inserted into the tube and polymerized for
Materials 40 s. After light curing, the tygon tube was removed, and
Non-carious human third molars and premolars were col- the composite rods checked for defects. All bonded speci-
lected after obtaining the individuals’ informed consent ac- mens were stored in 37°C distilled water for 24 h before
cording to a protocol approved by the Institutional Review testing. The specimens were attached to the testing device
24 h storage
with silica gel
Fig 1 Sample preparation for microshear bond strength testing and ultimate tensile strength testing.
(EZ-SX, Shimadzu; Kyoto, Japan) and subjected to micro- ing machine at a crosshead speed of 1.0 mm/min until fail-
shear bond testing at a crosshead speed of 1 mm/min, as ure. The UTS of the adhesives was calculated as:
previously described.23,29 UTS = F/A, where F is maximum stress (N) and A is the
The mean bond strengths were calculated, then statisti- cross-sectional area of the specimen (mm2). As for μSBS,
cally analyzed in PASW Statistics version 18 (IBM; Armonk, the UTS was expressed in MPa. Statistical analysis was
NY, USA) using two-way ANOVA and t-tests with Bonferroni carried out using the t-test (α = 0.05).
correction at a significance level of α = 0.05 (n = 15).
The failure mode was determined using SEM (JSM- SEM Observation of ABRZ
IT100, JEOL; Tokyo, Japan). Failure modes were divided into Sample preparation is illustrated in Fig 2. Roots were re-
four categories: bond-enamel interface (B/E); resin-compos- moved and crowns were sectioned mesiodistally using an
ite-bond interface (R/B); cohesive failure in bond (B); cohe- Isomet low-speed saw (Buehler). In order to prepare the
sive failure in enamel (E). The area of each failure type (%) mid-coronal buccal or lingual enamel surfaces for bonding,
was calculated and statistically analyzed using Dunn’s test the specimens were embedded in epoxy resin (EpoxiCure,
with Bonferroni correction at a significance level of Buehler) with buccal or lingual surfaces facing out, and then
α = 0.05. ground with wet 600-grit SiC paper until flat enamel sur-
faces were exposed. The specimens were randomly divided
Ultimate Tensile Strength (UTS) Test into six groups. An LED light-curing unit was used to poly-
GPB and UBQ were poured into beam-shaped silicone merize the bonding agent after application. Clearfil Majesty
molds (Fusion II, putty type, GC) with dimensions of 10 mm LV (shade A2, Kuraray Noritake) was applied on top of the
length × 1 mm width × 1 mm height (Fig 1). The solvents of cured adhesive (approximately 2 mm thick) and cured for
each adhesive were evaporated with a 3-way dental air sy- 20 s. After storage in 37°C distilled water for 24 h, each
ringe for 30 s held at a distance of 15 cm with an air pres- specimen was sectioned perpendicular to the bonding inter-
sure of 3.8 kgf/cm2. After covering the top of the surface face into two halves and embedded in the epoxy resin. The
with thin transparent strips (Hawe Striproll, Transparent specimens were then polished with SiC papers from 600- to
Striproll No.687, Kerr; Orange, CA, USA) and a glass slab, 1200-grit, then subjected to an acid-base challenge to ex-
the light guide was placed directly on the surface and light amine the acid-base resistance of the interfacial structure.
cured for 1.5 min from each side.11,17 Twelve specimens For the acid challenge, each specimen was stored in buff-
were manufactured for each material. After polymerization, ered demineralizing solution (pH 4.5, 2.2 mmol/l CaCl2,
all specimens were kept in a desiccator with silica gel for 2.2 mmol/l NaH2PO4, and 50 mmol/l acetic acid) for 4.5 h.
24 h, then subjected to the UTS test using a universal test- For the base challenge, the specimens were immersed in
24 h storage
in water 37°C
#600 SiC paper #1200 SiC paper
SEM; JSM-IT100
Diamond paste Ar-ion etching
(1/4 μm) (EIS-220Et, Elionix)
Demineralization solution (pH 4.5), 4.5 h
6% NaOCl, 20 min with ultrasonication
Same superscript letters indicate significant differences (two-way ANOVA and t-tests with Bonferroni correction, α = 0.05).
Table 3 Failure mode (area %) Table 4 Mean values of ultimate tensile strength (MPa)
R/B 4.7 6.7 2.6 0.0 1.3 2.0 Same superscript letters indicate significant differences (t-test, α = 0.05).
Fig 3 Ultrastructure of adhesive-enamel interface after acid-base challenge (3500X magnification). a: UBQ-0; b: UBQ-10; c: UBQ-PA; d: GPB-
0; e: GPB-10; f: GPB-PA. OL and ABRZ (between white triangles) were observed in all groups. ABRZ in c and f were thicker than a, b, c, and d.
The funnel-shaped erosion (white arrows) was detected in a, b, c, and d. The top area of erosion was wider than bottom area in d and e.
B: bonding, CR: composite resin, D: dentin, OL: outer lesion.
and GPB-PA (Figs 3c and 3f) were thicker than in the other beneath bonding interface in UBQ-PA and GPB-PA (Figs 3c
groups. In UBQ-0, UBQ-10, GPB-0 and GPB-10, funnel- and 3f).
shaped erosion or defects along the interface were de-
tected beyond the OL, where enamel was dissolved and SEM Observation of the Enamel Surface after
detached from the bonding layer. In contrast to UBQ-0 and Application of Adhesive
UBQ-10 (Figs 3a and 3b), the top area of erosion was Figures 4 and 5 show the enamel surface after treatment.
wider than the bottom area in GPB-0 and GPB-10 (Figs 3d Where phosphoric acid etching was not used, a smear layer
and 3e). On the other hand, no gap or defect was formed covered the entire surface, and scratches from SiC paper
a b c
d e f
Fig 4 SEM observation of the enamel surface after application of adhesive (5000X magnification). a: UBQ-0; b: UBQ-10; c: UBQ-PA; d: GPB-
0; e: GPB-10; f: GPB-PA. The entire surface was covered by a smear layer, and polishing scratches are clearly visible in UBQ-0 and UBQ-10.
GPB-0 shows a shallow, non-uniform etching pattern. The honeycomb pattern is evident on surfaces of UBQ-PA and GPB-PA.
a b c
d e f
Fig 5 SEM observation of the enamel surface after application of adhesive (10,000X magnification). a: UBQ-0; b: UBQ-10; c: UBQ-PA; d:
GPB-0; e: GPB-10; f: GPB-PA. Enamel crystallites were identified on the surface. The entire surface was covered by a smear layer in UBQ-0,
UBQ-10 and GPB-0. For GPB-10, exposed crystallites within enamel prisms were observed, but a honeycomb pattern was not apparent. In
UBQ-PA and GPB-PA, spatial repetition of regular patterns created a multitude of deep pits, forming a honeycomb structure.
were observed regardless of application time (Figs 4a, 4b, solution of enamel prisms (Figs 4c and 4f). For GPB-10
4d, and 4e). Surfaces etched with phosphoric acid clearly (Fig 5e), exposed crystallites within enamel prisms were
exhibited the honeycomb pattern caused by preferential dis- observed, but a honeycomb pattern was not apparent.
was wider than bottom observed in GPB-0 and GPB-10 cant difference between GPB-0, GPB-10, and GPB-PA. There-
(Figs 3d and 3e). The difference of composition or pH of fore, the null hypothesis that the extension of application
the adhesives might be the reason for these morphologi- time improves the adhesive-enamel interface was partially
cal differences. Furthermore, the morphological features rejected. The other two null hypotheses (selective phos-
were also influenced by the method of enamel etching. phoric acid etching has no effect on the adhesive-enamel
Phosphoric acid etching prior to UBQ and GPB application interface when the no-waiting self-etching concept adhesive
showed thicker ABRZ (approximately 3 μm) and no funnel- is used, and all no-waiting self-etching concept adhesives
shaped erosion was created at the adhesive-enamel inter- show the same trend) were rejected.
face (Figs 3c and 3f), consistent with the results of other
studies.14,28 Since phosphoric acid etching is more ag-
gressive than self-etching, resin monomers penetrate CONCLUSION
deeper into the etched layer.
UBQ and GPB contain 10-MDP as a functional monomer. The μSBS results suggest that phosphoric acid etching of
The ability of 10-MDP to readily establish an ionic bond with enamel is material dependent. The enamel ABRZ was con-
HAp has been demonstrated.38 Previous studies have re- firmed in all groups. However, selective phosphoric acid
ported that self-etching adhesives demineralize enamel etching created a stable adhesive-enamel interface, while
mildly, resulting in shallower intercrystallite resin infiltration the no-waiting self-etching concept adhesive created thinner
and less interprismatic resin tag formation, compared with ABRZ and exhibited erosion.
phosphoric acid-etching adhesives.6,9 From these reports,
GPB might demineralize enamel more deeply than UBQ. The
manufacturer indicates that UBQ includes a new hydrophilic ACKNOWLEDGMENTS
amide monomer which is more hydrophilic than HEMA. Con- This work was supported by the Japan Society for the Promotion of
trary to this, GPB does not contain HEMA. It is likely that Science 17K17119 and 15K11105.
the presence of hydrophilic monomers favors monomer pen-
etration into moist tooth substrates. This amide monomer
is a polyfunctional monomer in contrast to the monofunc-
tional monomer HEMA. The polyfunctional monomer might
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