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Effects of Selective Phosphoric Acid Etching on Enamel

Using “No-wait” Self-etching Adhesives


Takaaki Satoa / Tomohiro Takagakib / Masaomi Ikedac / Toru Nikaidod / Michael F. Burrowe /
Junji Tagamif

Purpose: To evaluate the effect of selective phosphoric acid etching on enamel using “no-wait” self-etching adhesives.
Materials and Methods: Clearfil Universal Bond Quick (UBQ, Kuraray Noritake) or G-Premio BOND (GPB, GC) was
applied to ground human enamel surfaces. The adhesives were used in 3 modes: no-waiting self-etching mode
(UBQ-0 or GPB-0), 10-s self-etching mode (UBQ-10 or GPB-10), and the selective-etch mode with phosphoric acid
etching (UBQ-PA or GPB-PA). After an acid-base challenge, the morphological attributes of the interface were exam-
ined using scanning electron microscopy (SEM) to characterize the acid-base resistant zone (ABRZ). Microshear
bond strength (μSBS) testing to enamel and ultimate tensile strength (UTS) of the adhesive resin were carried out.
Results: ABRZ formation was confirmed in all groups. UBQ-PA and GPB-PA created thicker ABRZ with no funnel-
shaped erosion beneath the adhesive-enamel interface. μSBS of UBQ-PA was significantly higher than UBQ-0 and
UBQ-10 (p < 0.05). However, there were no statistically signficant differences in μSBS among GPB-0, GPB-10, and
GPB-PA. For the UTS, UBQ was significantly higher than GPB.
Conclusion: Selective phosphoric acid etching created a stable adhesive-enamel interface. The no-waiting self-etch-
ing concept adhesive led to a thinner ABRZ. The results of μSBS suggest that phosphoric acid etching effects on
enamel are material dependent.
Keywords: enamel, multimode, no-waiting self-etching concept, phosphoric acid, acid-base resistant zone, micro-
shear bond strength test.

J Adhes Dent 2018; 20: 407–415. Submitted for publication: 05.04.18; accepted for publication: 17.08.18
doi: 10.3290/j.jad.a41359

a Medical Staff Dentist, Cariology and Operative Dentistry, Graduate School of


Medical and Dental Sciences, Tokyo Medical and Dental University, Tokyo,
S elf-etching adhesives (SEAs) are widely accepted, and
have been classified into two types: 2-step self-etching
adhesives (2-SEAs) and one-bottle self-etching adhesives
Japan. Participated in experimental design, performed the experiments, wrote
the manuscript. (1-SEAs). Recently, the multimode concept has been intro-
b Assistant Professor, Cariology and Operative Dentistry, Graduate School of duced, where some 1-SEAs can be used either in self-etch-
Medical and Dental Sciences, Tokyo Medical and Dental University, Tokyo, ing mode, selective-etch mode, or etch-and-rinse
Japan. Idea, hypothesis, experimental design, proofread the manuscript.
mode.3,18,24 This multimode capability enables the clinician
c Junior Assistant Professor, Oral Prosthetic Engineering, Graduate School, Fac-
ulty of Dentistry, Tokyo Medical and Dental University, Tokyo, Japan. Per-
to apply the adhesive using the selective enamel etching
formed statistical analysis, contributed substantially to discussion. technique, which includes the advantages of the etch-and-
d Lecturer, Cariology and Operative Dentistry Department, Graduate School of rinse technique on enamel.16
Medical and Dental Sciences, Tokyo Medical and Dental University, Tokyo, Recently, some 1-SEAs have been employed with the op-
Japan. Idea, hypothesis, experimental design, proofread the manuscript.
tion of using the self-etching technique for bonding without
e Clinical Professor in Prosthodontics, Faculty of Dentistry, The University of
Hong Kong, Hong Kong SAR, China. Contributed substantially to discussion,
waiting, or after leaving the adhesive undisturbed for
proofread the manuscript. 10 s.27 Huang et al12 evaluated no-waiting self-etching ad-
f Professor, Cariology and Operative Dentistry Department, Graduate School hesives to dentin using the two alternative self-etching
of Medical and Dental Sciences, Tokyo Medical and Dental University, modes (no-waiting or 10-s self-etch). They reported that suf-
Tokyo, Japan. Supported the experiments, contributed substantially to dis-
cussion. ficient bond strength to dentin may be achieved in the no-
waiting self-etching mode. However, the no-waiting self-etch-
Correspondence: Tomohiro Takagaki, Cardiology and Operative Dentistry, ing mode may not represent the best use of the
Graduate School of Medical and Dental Sciences, Tokyo Medical and
Dental University, 1-5-45, Yushima, Bunkyo-ku, Tokyo 113-8510, Japan. adhesive.12 On the other hand, few studies have focused
Tel: +81-3-5803-5483. e-mail: takagaki.ope@tmd.ac.jp on enamel with no-waiting self-etching adhesives.

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Table 1 Composition of the adhesives used in the study

Material pH Manufacturer Composition Lot No.


CLEARFIL Universal 2.3 Kuraray, 10-MDP, bis-GMA, HEMA, hydrophilic amide monomer, colloidal silica, T160128
Bond Quick Noritake Dental ethanol, dl-camphorquinone, initiators, accelerators, water, sodium fluoride

G-Premio Bond 1.5 GC 10-MDP, 4-MET, methacrylate acid ester, distilled water, 1603091
10-methacryoyloxydecyl dihydrogen thiophosphate, acetone, photoinitiators,
silica

Bis-GMA: bisphenol A diglycidylmethacrylate; HEMA: hydroxyethyl methacrylate; 10-MDP: 10-methacryloyloxydecyl dihydrogen phosphate; 4-MET: (4-[2-(methac-
ryloyloxy)ethoxycarbonyl]phthalic acid).

1-SEAs are regarded as ultra-mild self-etching adhe- Board of Tokyo Medical and Dental University (D2013-022).
sives;19 however, the bonding mechanism to enamel relies The teeth were stored at 4°C in 0.01% thymol solution, and
on micromechanical interlocking provided by the resin tags used within 1 month following extraction.
in acid-etched enamel. Furthermore, some studies con- Two kinds of 1-SEAs were used in this study (Table 1),
cluded that phosphoric acid etching prior to the application Clearfil Universal Bond Quick (UBQ, Kuraray Noritake; Tokyo,
of self-etching adhesives (selective phosphoric acid etching) Japan) and G-Premio BOND (GPB, GC; Tokyo, Japan). Both
improves enamel bond strength.3,8,32 The mild etching abil- adhesives can be applied according to the no-waiting self-
ity has raised some concerns with regard to the ability of etching concept. UBQ contains 10-MDP, while GPB contains
these 1-SEAs to form a stable bond and marginal sealing of 10-MDP and (4-[2-(methacryloyloxy)ethoxycarbonyl]phthalic
the restoration without selective phosphoric acid etching.35 acid) (4-MET) as functional monomers. For GPB, no-waiting
Tsuchiya et al34 first observed ultramorphological self-etching mode is recommended in the Japanese version
changes at the interface between adhesive and dentin after of the manufacturer’s instruction, and 10-s self-etching
an acid-base challenge by using scanning electron micros- mode is recommended in the international version.
copy (SEM). They found a new zone resistant to acid-base Specimens were randomly divided into six groups. For
attack, the so-called acid-base resistant zone (ABRZ) adja- the no-waiting self-etching mode, the adhesive was applied
cent to the dentin hybrid layer in self-etching adhesives. The for less than 1 s and immediately air dried with no time
ABRZ was thought to play an important role in the preven- lapse between steps (UBQ-0 or GPB-0). For the 10-s self-
tion of recurrent caries, sealing of restoration margins, and etching mode, the adhesive was applied on the enamel sur-
promotion of restoration durability.21,22 Li et al15 found that face for 10 s (UBQ-10 or GPB-10). For the selective-etch
a similar zone, “enamel ABRZ”, formed at the adhesive- mode, 37% phosphoric acid (K-etchant Gel, Kuraray Nori-
enamel interface with 2-SEAs containing 10-methacryloyl- take; Tokyo, Japan) was applied for 10 s, then rinsed and
oxydecyl dihydrogen phosphate (10-MDP). It has been re- dried. Each adhesive was applied and air dried without wait-
ported that 2-SEAs containing 10-MDP created a stable ing (UBQ-PA or GPB-PA). An LED light-curing unit (Valo LED
enamel ABRZ, whereas the 1-SEAs containing 10-MDP cre- Curing Light, Ultradent; South Jordan, UT, USA) was used in
ated thinner ABRZs with funnel-shaped erosion, indicating a high power mode (1400 mW/cm2) to light cure the adhe-
weak area vulnerable to acid-base attack beneath the adhe- sive for 10 s.
sive-enamel interface. However, this erosion did not occur
in 1-SEAs with selective phosphoric acid etching.28 Microshear Bond Strength (μSBS) Test
The purpose of this study was to evaluate the effect of Sample preparation was carried out as shown in Fig 1. A
selective phosphoric acid etching on enamel using no-wait- 2-mm-thick cuspal enamel slice was sectioned using a low-
ing self-etching adhesives. The null hypotheses of this study speed diamond saw (Isomet, Buehler; Lake Bluff, IL, USA).
were that 1) the extension of application time improves the In order to standardize the smear layer, the enamel sur-
adhesive-enamel interface, 2) selective phosphoric acid faces were wet polished with 600-grit SiC paper for 1 min.
etching has no effect on the adhesive-enamel interface The slices were randomly divided into six groups. Prior to
when the no-waiting self-etching adhesive is used, and 3) all polymerization of the adhesive resin, a tygon tube (R-3603,
no-waiting self-etching adhesives show the same trend. Professional Plastics; Fullerton, CA, USA) with an internal
diameter of 0.79 mm and a height of 0.5 mm was placed
on each bonded area. After the adhesive was light cured, a
MATERIALS AND METHODS hybrid resin composite, Clearfil AP-X (shade A2, Kuraray
Noritake), was inserted into the tube and polymerized for
Materials 40 s. After light curing, the tygon tube was removed, and
Non-carious human third molars and premolars were col- the composite rods checked for defects. All bonded speci-
lected after obtaining the individuals’ informed consent ac- mens were stored in 37°C distilled water for 24 h before
cording to a protocol approved by the Institutional Review testing. The specimens were attached to the testing device

408 The Journal of Adhesive Dentistry


Sato et al

Microshear bond strength test


24 h storage in
Cut
water 37°C
SEM

#600 SiC paper Bonding,


composite buildup, Failure mode
light curing observation

Ultimate tensile strength test

Air blowing, Universal testing machine; EZ-SX


light curing Crosshead speed of 1.0 mm/min

24 h storage
with silica gel

Silicone mold Beam specimen


Width: 1 mm
Height: 1 mm
Length: 10 mm

Fig 1 Sample preparation for microshear bond strength testing and ultimate tensile strength testing.

(EZ-SX, Shimadzu; Kyoto, Japan) and subjected to micro- ing machine at a crosshead speed of 1.0 mm/min until fail-
shear bond testing at a crosshead speed of 1 mm/min, as ure. The UTS of the adhesives was calculated as:
previously described.23,29 UTS = F/A, where F is maximum stress (N) and A is the
The mean bond strengths were calculated, then statisti- cross-sectional area of the specimen (mm2). As for μSBS,
cally analyzed in PASW Statistics version 18 (IBM; Armonk, the UTS was expressed in MPa. Statistical analysis was
NY, USA) using two-way ANOVA and t-tests with Bonferroni carried out using the t-test (α = 0.05).
correction at a significance level of α = 0.05 (n = 15).
The failure mode was determined using SEM (JSM- SEM Observation of ABRZ
IT100, JEOL; Tokyo, Japan). Failure modes were divided into Sample preparation is illustrated in Fig 2. Roots were re-
four categories: bond-enamel interface (B/E); resin-compos- moved and crowns were sectioned mesiodistally using an
ite-bond interface (R/B); cohesive failure in bond (B); cohe- Isomet low-speed saw (Buehler). In order to prepare the
sive failure in enamel (E). The area of each failure type (%) mid-coronal buccal or lingual enamel surfaces for bonding,
was calculated and statistically analyzed using Dunn’s test the specimens were embedded in epoxy resin (EpoxiCure,
with Bonferroni correction at a significance level of Buehler) with buccal or lingual surfaces facing out, and then
α = 0.05. ground with wet 600-grit SiC paper until flat enamel sur-
faces were exposed. The specimens were randomly divided
Ultimate Tensile Strength (UTS) Test into six groups. An LED light-curing unit was used to poly-
GPB and UBQ were poured into beam-shaped silicone merize the bonding agent after application. Clearfil Majesty
molds (Fusion II, putty type, GC) with dimensions of 10 mm LV (shade A2, Kuraray Noritake) was applied on top of the
length × 1 mm width × 1 mm height (Fig 1). The solvents of cured adhesive (approximately 2 mm thick) and cured for
each adhesive were evaporated with a 3-way dental air sy- 20 s. After storage in 37°C distilled water for 24 h, each
ringe for 30 s held at a distance of 15 cm with an air pres- specimen was sectioned perpendicular to the bonding inter-
sure of 3.8 kgf/cm2. After covering the top of the surface face into two halves and embedded in the epoxy resin. The
with thin transparent strips (Hawe Striproll, Transparent specimens were then polished with SiC papers from 600- to
Striproll No.687, Kerr; Orange, CA, USA) and a glass slab, 1200-grit, then subjected to an acid-base challenge to ex-
the light guide was placed directly on the surface and light amine the acid-base resistance of the interfacial structure.
cured for 1.5 min from each side.11,17 Twelve specimens For the acid challenge, each specimen was stored in buff-
were manufactured for each material. After polymerization, ered demineralizing solution (pH 4.5, 2.2 mmol/l CaCl2,
all specimens were kept in a desiccator with silica gel for 2.2 mmol/l NaH2PO4, and 50 mmol/l acetic acid) for 4.5 h.
24 h, then subjected to the UTS test using a universal test- For the base challenge, the specimens were immersed in

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SEM observation of ABRZ

Cut Embed Bonding, composite buildup,


light curing Cut and embed

24 h storage
in water 37°C
#600 SiC paper #1200 SiC paper

Acid-base challenge Polishing

SEM; JSM-IT100
Diamond paste Ar-ion etching
(1/4 μm) (EIS-220Et, Elionix)
Demineralization solution (pH 4.5), 4.5 h
6% NaOCl, 20 min with ultrasonication

Fig 2 Sample preparation for SEM observation of ABRZ on enamel.

6% NaOCl for 20 min with ultrasonic agitation to remove RESULTS


any debris on the demineralized structures or enamel pro-
teins, and finally rinsed with running water for 30 s. Follow- μSBS Test
ing this, a 4-META/MMA-TBB resin (Super Bond C&B, Sun The μSBS and failure modes are shown in Tables 2 and 3.
Medical; Moriyama, Japan) was applied without acid etching UBQ-PA provided significantly higher μSBS than did UBQ-0
the surface, in order to prevent wear or fracture of the re- (p < 0.001) and UBQ-10 (p = 0.008). However, there were
maining structure during polishing. The specimens were no statistically significant differences between GPB-0, GPB-
then cut perpendicular to the adhesive-enamel interface, 10, and GPB-PA (p > 0.05). There was a significant differ-
and polished with diamond pastes (Struers; Ballerup, Den- ence between UBQ-PA and GPB-PA (p = 0.004).
mark) down to 0.25-μm particle size. Argon-ion etching (EIS- The fracture at the bond-enamel interface (B/E) was the
200ER, Elionix; Tokyo, Japan) was used for the polished most frequent failure mode in all groups, with more than
surfaces to bring the adhesive-enamel interface into sharp 70% of total bonding area. Then, GPB bonded under selec-
relief, with an accelerating voltage of 1 kV and an ion cur- tive-etch mode showed cohesive failure in the bond (B) of
rent density of 1.5 mA/cm2 for 30 s. The specimens were approximately 1/4 of the total bonding area, whereas <14%
finally gold sputter-coated, and the morphological structure of such fractures was detected in others (p = 0.080). In
of the interface after the acid-base challenge was observed contrast, 12.7% of the total bonding area in UBQ-PA failed
using SEM with an accelerating voltage of 20 kV. cohesively in enamel, which was statistically significantly
different from GPB-PA (p = 0.010).
SEM Observation of the Enamel Surface after
Application of Adhesive UTS Test
The enamel surfaces of six premolars were wet polished The UTS values are shown in Table 4. The t-test showed
with 600-grit SiC paper until flat enamel surfaces were ex- that UBQ had significantly higher UTS than did GPB
posed, then treated with each bonding regimen as de- (p < 0.001).
scribed above. Without light curing, the surface was ultra-
sonically rinsed with absolute acetone for 1 min in order to SEM Observation of ABRZ
dissolve the adhesive and dehydrate the specimens for The interfacial morphologies of each group after acid-base
SEM observation. After air drying for 10 s, samples were challenge are shown in Fig 3. ABRZ and an outer lesion
sputter-coated with gold and examined using SEM to ob- (OL), created by mineral loss due to the acid-base chal-
serve the surface structure and etching pattern. lenge, were observed in all groups. The depth of the OL
ranged from 15 to 20 μm in all groups. ABRZ in UBQ-PA

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Table 2 Means and standard deviations of microshear bond strength (MPa)

UBQ-0 UBQ-10 UBQ-PA GPB-0 GPB-10 GPB-PA


21.4 ± 7.2a 23.9 ± 8.1b 32.0 ± 8.2a,b,c 24.7 ± 7.5 27.7 ± 7.7 24.4 ± 7.5c

Same superscript letters indicate significant differences (two-way ANOVA and t-tests with Bonferroni correction, α = 0.05).

Table 3 Failure mode (area %) Table 4 Mean values of ultimate tensile strength (MPa)

UBQ-0 UBQ-10 UBQ-PA GPB-0 GPB-10 GPB-PA UBQ GPB


B/E 84.7 79.3 72.7 86.0 84.7 70.7 22.8 ± 4.3a 8.8 ± 2.7a

R/B 4.7 6.7 2.6 0.0 1.3 2.0 Same superscript letters indicate significant differences (t-test, α = 0.05).

B 9.3 14.0 12.0 13.3 14.0 27.3

E 1.3 0.0a 12.7a,b,c 0.7 0.0b 0.0c

B/E: bond-enamel interface; R/B: resin-composite/bond interface; B: co-


hesive failure in bond; E: cohesive failure in enamel. Same superscript
letters indicate significant differences (Dunn’s test with Bonferroni correc-
tion, α = 0.05)

Fig 3 Ultrastructure of adhesive-enamel interface after acid-base challenge (3500X magnification). a: UBQ-0; b: UBQ-10; c: UBQ-PA; d: GPB-
0; e: GPB-10; f: GPB-PA. OL and ABRZ (between white triangles) were observed in all groups. ABRZ in c and f were thicker than a, b, c, and d.
The funnel-shaped erosion (white arrows) was detected in a, b, c, and d. The top area of erosion was wider than bottom area in d and e.
B: bonding, CR: composite resin, D: dentin, OL: outer lesion.

and GPB-PA (Figs 3c and 3f) were thicker than in the other beneath bonding interface in UBQ-PA and GPB-PA (Figs 3c
groups. In UBQ-0, UBQ-10, GPB-0 and GPB-10, funnel- and 3f).
shaped erosion or defects along the interface were de-
tected beyond the OL, where enamel was dissolved and SEM Observation of the Enamel Surface after
detached from the bonding layer. In contrast to UBQ-0 and Application of Adhesive
UBQ-10 (Figs 3a and 3b), the top area of erosion was Figures 4 and 5 show the enamel surface after treatment.
wider than the bottom area in GPB-0 and GPB-10 (Figs 3d Where phosphoric acid etching was not used, a smear layer
and 3e). On the other hand, no gap or defect was formed covered the entire surface, and scratches from SiC paper

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a b c

d e f

Fig 4 SEM observation of the enamel surface after application of adhesive (5000X magnification). a: UBQ-0; b: UBQ-10; c: UBQ-PA; d: GPB-
0; e: GPB-10; f: GPB-PA. The entire surface was covered by a smear layer, and polishing scratches are clearly visible in UBQ-0 and UBQ-10.
GPB-0 shows a shallow, non-uniform etching pattern. The honeycomb pattern is evident on surfaces of UBQ-PA and GPB-PA.

a b c

d e f

Fig 5 SEM observation of the enamel surface after application of adhesive (10,000X magnification). a: UBQ-0; b: UBQ-10; c: UBQ-PA; d:
GPB-0; e: GPB-10; f: GPB-PA. Enamel crystallites were identified on the surface. The entire surface was covered by a smear layer in UBQ-0,
UBQ-10 and GPB-0. For GPB-10, exposed crystallites within enamel prisms were observed, but a honeycomb pattern was not apparent. In
UBQ-PA and GPB-PA, spatial repetition of regular patterns created a multitude of deep pits, forming a honeycomb structure.

were observed regardless of application time (Figs 4a, 4b, solution of enamel prisms (Figs 4c and 4f). For GPB-10
4d, and 4e). Surfaces etched with phosphoric acid clearly (Fig 5e), exposed crystallites within enamel prisms were
exhibited the honeycomb pattern caused by preferential dis- observed, but a honeycomb pattern was not apparent.

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Sato et al

DISCUSSION UBQ-PA showed significantly higher μSBS than did UBQ-0


or UBQ-10. A previous study reported that selective phos-
Enamel is the hardest tissue in the human body, being phoric acid etching improved the bond strength of universal
composed of 92–96% inorganic matter or mineral phase, adhesives.26 SEM observations of the enamel surface re-
and 4% of organic material and plasma by weight. The min- vealed that phosphoric acid etching treatment created the
eral phase consists primarily of calcium phosphate in the honeycomb pattern on enamel surface. These phenomena
form of hydroxyapatite crystals, which are carbonated or demonstrate that phosphoric acid etching promoted enamel
fluoridated.10 The enamel microstructure consists of crys- demineralization into deeper areas than was possible with
tals arranged in prisms or rods which run approximately per- self-etching adhesives, thus increasing the micromechani-
pendicular to the dentin-enamel junction.4 The interfacial cal interlocking of adhesives into the etched surface
area between prisms is protein rich, and termed interpris- through selective demineralization of the enamel
matic enamel.7 In the prismless enamel layer, the hydroxy- prisms.2,20,26 In this study, the failure mode of UBQ-PA
apatite crystals are parallel to each other and perpendicular showed a high tendency to cause enamel fracture (E).
to the enamel surface.4 Self-etching adhesives are less These features may explain why UBQ-PA showed signifi-
acidic than etch-and-rinse adhesives that use phosphoric cantly higher μSBS than the other groups (p < 0.001). On
acid etching. To improve the bonding performance to the other hand, there were no significant differences in
enamel, selective enamel etching has been regarded as a μSBS between GPB-0, GPB-10, and GPB-PA. Cohesive fail-
strategy for optimizing enamel bond strength of mild univer- ure in the bond (B) occurred most frequently in GPB-PA
sal adhesives. On the other hand, when phosphoric acid (27.3%), whereas the rate in UBQ-PA was 12.0%. Moreover,
etching was applied to the parallel prismatic enamel, the the UTS test indicated that bond strength in GPB was sig-
enamel surface appeared to be over-etched, resulting in nificantly lower than in UBQ. The UTS test method is consid-
reduced bond strengths.30 The depth of enamel demineral- ered a further valuable method for evaluating the mechani-
ization might be influenced by the orientation of enamel cal properties of bonding resins, resin composites, and
prisms.5 In order to avoid confusion, crosscut enamel sur- tooth structure.37 It was reported that the UTS of the bond-
faces were used in this study. ing resins was material- and storage-time dependent.31
The no-waiting self-etching adhesive provides the clin- From these results, low mechanical strength of GPB could
ician with the alternatives of using the self-etching tech- have affected the μSBS test in GPB-PA, resulting in cohe-
nique for bonding to dentin without waiting for the adhe- sive failure in the bonding resin.
sive to interact with the bonding substrate, or after leaving Li et al15 found an ABRZ on enamel after application of
the adhesive undisturbed for 10 s.27 Since self-etching a 2-SEA that contained the functional monomer 10-MDP.
adhesives contain acidic functional monomers and the pH From their study, it was suggested that the formation of
of these solutions is low, the thickness of the demineral- the enamel ABRZ might be influenced by the presence of
ized layer might be affected by the application time. An the functional monomer. In self-etching adhesives, the
increase in adhesive application time significantly influ- functional monomer behaves as an etchant, allowing the
ences the enamel bond strength of 1-SEA.33 SEM observa- resin monomer to penetrate into the demineralized
tion of the enamel surface revealed that scratches still enamel and chemically interact with HAp crystals. This pro-
remain on the enamel surface without phosphoric acid tects the crystals from acid attack and forms an ABRZ.15
treatment. The surface of UBQ-0 showed little difference We reported that funnel-shaped erosions were observed in
to UBQ-10 (Figs 5a and 5b). In contrast, exposed crystal- the adhesive-enamel interface of 1-SEA, despite the fact
lites within enamel prisms were observed in GPB-10 that it contained 10-MDP. However, with selective phos-
(Fig 5e). The results of the μSBS test showed that there phoric acid etching, the funnel-shaped erosion was not
were no significant differences between UBQ-0 and UBQ- observed.28 The ABRZ is thought to play an important role
10, or GPB-0 and GPB-10. However, in both UBQ and GPB, in the prevention of recurrent caries, sealing of restoration
μSBS of specimens treated with 10-s application tended margins, and improving restoration durability.22 However,
to be higher than that of the no-waiting self-etching tech- funnel-shaped erosion was also detected in 1-SEAs, mean-
nique. A recent study reported that although reducing ap- ing that there was an area susceptible to the acid-base
plication time increases user friendliness, using the con- attack beneath the ABRZ. However, little has been re-
ventional 10-s application time improved bonding ported about the enamel ABRZ with the use of no-waiting
performance when compared with the no-waiting self-etch- self-etching concept adhesives. In this study, the forma-
ing technique.12 The pH of GPB is 1.5. This low pH may tion of the enamel ABRZ was confirmed in all adhesive
contribute to exposing crystallites in GPB-10, which might groups with or without selective phosphoric acid etching
improve the bonding performance due to mechanical inter- (Fig 3). UBQ and GPB include 10-MDP, and this may con-
locking. Meanwhile, little difference was observed be- tribute to formation of the ABRZ. In UBQ-0, UBQ-10, GPB-
tween UBQ-0 and UBQ-10. UBQ contains a new hydrophilic 0, and GPB-10, the widths of the ABRZ were approximately
amide monomer, which may penetrate easily into moist 0.2 μm, and the funnel-shaped erosion or defect along the
tooth substrates. Therefore, monomer penetration may be interface was detected. There were some morphological
enhanced by 10-s application, yielding a chemical reaction differences between UBQ and GPB. In contrast, in UBQ-0
with the tooth substrate. and UBQ-10 (Figs 3a and 3b), the top area of the erosion

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was wider than bottom observed in GPB-0 and GPB-10 cant difference between GPB-0, GPB-10, and GPB-PA. There-
(Figs 3d and 3e). The difference of composition or pH of fore, the null hypothesis that the extension of application
the adhesives might be the reason for these morphologi- time improves the adhesive-enamel interface was partially
cal differences. Furthermore, the morphological features rejected. The other two null hypotheses (selective phos-
were also influenced by the method of enamel etching. phoric acid etching has no effect on the adhesive-enamel
Phosphoric acid etching prior to UBQ and GPB application interface when the no-waiting self-etching concept adhesive
showed thicker ABRZ (approximately 3 μm) and no funnel- is used, and all no-waiting self-etching concept adhesives
shaped erosion was created at the adhesive-enamel inter- show the same trend) were rejected.
face (Figs 3c and 3f), consistent with the results of other
studies.14,28 Since phosphoric acid etching is more ag-
gressive than self-etching, resin monomers penetrate CONCLUSION
deeper into the etched layer.
UBQ and GPB contain 10-MDP as a functional monomer. The μSBS results suggest that phosphoric acid etching of
The ability of 10-MDP to readily establish an ionic bond with enamel is material dependent. The enamel ABRZ was con-
HAp has been demonstrated.38 Previous studies have re- firmed in all groups. However, selective phosphoric acid
ported that self-etching adhesives demineralize enamel etching created a stable adhesive-enamel interface, while
mildly, resulting in shallower intercrystallite resin infiltration the no-waiting self-etching concept adhesive created thinner
and less interprismatic resin tag formation, compared with ABRZ and exhibited erosion.
phosphoric acid-etching adhesives.6,9 From these reports,
GPB might demineralize enamel more deeply than UBQ. The
manufacturer indicates that UBQ includes a new hydrophilic ACKNOWLEDGMENTS
amide monomer which is more hydrophilic than HEMA. Con- This work was supported by the Japan Society for the Promotion of
trary to this, GPB does not contain HEMA. It is likely that Science 17K17119 and 15K11105.
the presence of hydrophilic monomers favors monomer pen-
etration into moist tooth substrates. This amide monomer
is a polyfunctional monomer in contrast to the monofunc-
tional monomer HEMA. The polyfunctional monomer might
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J Adhes Dent 2016;18:223–229.

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