Lecture 3

Case Study:
Polysilicon Deposition Process (2)
Experimental Data and SN Ratios
Surface Defects d (
= 10 log y d2 + Sd2 )
　 yd (unit: defectt/cm2) 　 　 　
　 Wafer 1 Wafer 2 Wafer 3 　 　 　
Exp. Top Center Bottom Top Center Bottom Top Center Bottom yd Sd d

1 1 0 1 2 0 0 1 1 0 1 1 0.51
2 1 2 8 180 5 0 126 3 1 36 64 -37.30
3 3 35 106 360 38 135 315 50 180 136 120 -45.17
4 6 15 6 17 20 16 15 40 18 17 9 -25.76
5 1720 1980 2000 487 810 400 2020 360 13 1088 781 -62.54
6 135 360 1620 2430 207 2 2500 270 35 840 983 -62.23
7 360 810 1215 1620 117 30 1800 720 315 776 609 -59.88
8 270 2730 5000 360 1 2 9999 225 1 2065 3237 -71.69
9 5000 1000 1000 3000 1000 1000 3000 2800 2000 2200 1303 -68.15
10 3 0 0 3 0 0 1 0 1 1 1 -3.47
11 1 0 1 5 0 0 1 0 1 1 1 -5.08
12 3 1620 90 216 5 4 270 8 3 247 495 -54.85
13 1 25 270 810 16 1 225 3 0 150 253 -49.38
14 3 21 162 90 6 1 63 15 39 44 50 -36.54
15 450 1200 1800 2530 2080 2080 1890 180 25 1359 876 -64.18
16 5 6 40 54 0 8 14 1 1 14 18 -27.31
17 1200 3500 3500 1000 3 1 9999 600 8 2201 3049 -71.51
18 8000 2500 3500 5000 1000 1000 5000 2000 2000 3333 2173 -72.00

Lecture 3. Case Study: Polysilicon Deposition Process (2) 2

Experimental Data and SN Ratios
St2 1
Thickness and Deposition Rate t
= 10 log
y t2 r
= 10 log
y r2
　 yt (unit: Å) 　 　 　 沉積 沉積 　
　 Wafer 1 Wafer 2 Wafer 3 　 　 　 時間 速率 　

Exp. Top Center Bottom Top Center Bottom Top Center Bottom yt St (min) yr
t r

1 2029 1975 1961 1975 1934 1907 1952 1941 1949 1958 34 35.22 135 14.5 23.23
2 5375 5191 5242 5201 5254 5309 5323 5307 5091 5255 86 35.75 144 36.6 31.27
3 5989 5894 5874 6152 5910 5886 6077 5943 5962 5965 94 36.02 144 41.4 32.34
4 2118 2109 2099 2140 2125 2108 2149 2130 2111 2121 16 42.24 59 36.1 31.15
5 4102 4152 4174 4556 4504 4560 5031 5040 5032 4572 388 21.43 63 73.0 37.27
6 3022 2932 2913 2833 2837 2828 2934 2875 2841 2891 65 32.91 58 49.5 33.89
7 3030 3042 3028 3486 3333 3389 3709 3671 3687 3375 287 21.39 44 76.6 37.68
8 4707 4472 4336 4407 4156 4094 5073 4898 4599 4527 326 22.84 43 105.4 40.46
9 3859 3822 3850 3871 3922 3904 4110 4067 4110 3946 116 30.60 34 115.0 41.21
10 3227 3205 3242 3468 3450 3420 3599 3591 3535 3415 155 26.85 138 24.8 27.89
11 2521 2499 2499 2576 2537 2512 2551 2552 2570 2535 29 38.80 127 20.0 26.02
12 5921 5766 5844 5780 5695 5814 5691 5777 5743 5781 72 38.06 148 39.0 31.82
13 2792 2752 2716 2684 2635 2606 2765 2786 2773 2723 68 32.07 51 53.1 34.50
14 2863 2835 2859 2829 2864 2839 2891 2844 2841 2852 19 43.35 62 45.7 33.20
15 3218 3149 3124 3261 3205 3223 3241 3189 3197 3201 43 37.44 58 54.8 34.78
16 3020 3008 3016 3072 3151 3139 3235 3162 3140 3105 79 31.86 40 76.8 37.71
17 4277 4150 3992 3888 3681 3572 4593 4298 4219 4074 323 22.01 39 105.3 40.45
18 3125 3119 3127 3567 3563 3520 4120 4088 4138 3596 431 18.42 39 91.4 39.22

Lecture 3. Case Study: Polysilicon Deposition Process (2) 3

Measure of Quality: SN Ratios
Quality Loss Function

When a quality characteristics is on target, the quality loss is at its minimum.

When the quality characteristics deviates from the target, the quality loss
increases quadratically.

L(y) = k(y m)2

Quality loss L(y)

m
Quality characteristics y

Lecture 3. Case Study: Polysilicon Deposition Process (2) 4

Measure of Quality: SN Ratios
Average Quality Loss

n
k(y i m)2
Q= i =1
= k MSD
n
1
MSD = (y i m)2
n n i =1
n
1
where = (y i2 2my i + m2 )
n i =1
n n n
n 1 1 1
2 = y i2 2my i + m2
(y i m) n i =1 n i =1 n i =1
n
1
MSD = i =1
= (y m)2 + S 2 =
n
y i2 2my + m2
n i =1
n
1
= y i2 2y 2 + y 2 + y 2 2my + m2
n i =1

( )
n n n
1 1 1
= y i2 2y i y + y2 + y2 2my + m2
n i =1 n i =1 n i =1

( )
n
n 1
= y i2 2y i y + y 2 + y 2 2my + m2
2 n
(y i y) i =1
n
1
S= i =1
(y ) ( )
2 2
= i
y + y m
n
n i =1

( )
2
= S2 + y m

Lecture 3. Case Study: Polysilicon Deposition Process (2) 5

Measure of Quality: SN Ratios
Definition of SN Ratios

Although Q = k MSD can be used as a measure of quality, we prefer using

a modified version,

SN = 10 log MSD

The quality loss coefficient k is dropped, since it is a constant for a specific

product.
Logarithm transformation is to achieve better additivity (to be discussed).

Multiplication of -10 is to be consistent with the traditional definition of SN

ratios.

Lecture 3. Case Study: Polysilicon Deposition Process (2) 6

Measure of Quality: SN Ratios
Mean Squared Deviation (MSD)
For the nominal-the-best cases,
n
(y i m)2
MSD = i =1
= (y m)2 + S 2
n
For the smaller-the-better cases, let m = 0,
n
y i2
MSDSB = i =1
= y 2 + S2
n
For the larger-the-better cases, we may inverse the quality characteristics
and then treat them as smaller-the-better cases,
n
(1 y i )2
MSDLB = i =1

n
Lecture 3. Case Study: Polysilicon Deposition Process (2) 7
Measure of Quality: SN Ratios
For the nominal-the-best cases,
n
(y i m)2
SN = 10 log MSD = 10 log i =1
= 10 log (y m)2 + S 2
n

For the smaller-the-better cases,

n
y i2
SNSB = 10 log MSDSB = 10 log i =1
= 10 log y 2 + S 2
n

For the larger-the-better cases,

n
(1 y i )2
SNLB = 10 MSDLB = 10 i =1

Lecture 3. Case Study: Polysilicon Deposition Process (2) 8

Measure of Quality: SN Ratios
Nominal-the-best cases:
n
(y i m)2
SN = 10 log i =1
= 10 log (y m)2 + S 2
n

Usually, there exist "adjustment" factors so that the "bias" can be completely
eliminated (i.e., y = m ). In such cases,
n
(y i y )2
SNNB2 = 10 log i =1
= 10 log S 2
n

The deviation S usually enlarges as the average y increases. In order the

comparison be "fair", we divide the deviation by the average,

S2
SNNB3 = 10 log 2
y
Lecture 3. Case Study: Polysilicon Deposition Process (2) 9
Case Study: Polysilicon Deposition Process
Response Analysis
　 A B C D E F 　 　 　
Exp. 2 3 4 5 6 8 d t r
( ) = (0.51 37.30 45.17 3.47
d A1
1 1 1 1 1 1 1 0.51 35.22 23.23 5.08 54.85) / 6 = 24.23
2 1 2 2 2 2 2 -37.30 35.75 31.27
3 1 3 3 3 3 3 -45.17 36.02 32.34 ( ) = ( 25.76 62.54 62.23 49.38
d A2
4 2 1 1 2 2 3 -25.76 42.24 31.15
36.54 64.18) / 6 = 50.10
5 2 2 2 3 3 1 -62.54 21.43 37.27
6 2 3 3 1 1 2 -62.23 32.91 33.89 ( ) = ( 59.88 71.69 68.15 27.31
d A3
7 3 1 2 1 3 3 -59.88 21.39 37.68
71.51 72.00) / 6 = 61.75
8 3 2 3 2 1 1 -71.69 22.84 40.46
9 3 3 1 3 2 2 -68.15 30.60 41.21 ( ) = (0.51 25.76 59.88 3.47
d B1
10 1 1 3 3 2 1 -3.47 26.85 27.89
49.38 27.31) / 6 = 27.55
11 1 2 1 1 3 2 -5.08 38.80 26.02
12 1 3 2 2 1 3 -54.85 38.06 31.82
( )
d B2
= ( 37.30 62.54 71.69 5.08
13 2 1 2 3 1 2 -49.38 32.07 34.50
36.54 71.51) / 6 = 47.44
14 2 2 3 1 2 3 -36.54 43.35 33.20
15 2 3 1 2 3 1 -64.18 37.44 34.78
( ) = ( 45.17 62.23 68.15 54.85
16 3 1 3 2 3 2 -27.31 31.86 37.71 d B3

64.18 72.00) / 6 = 61.10

17 3 2 1 3 1 3 -71.51 22.01 40.45
18 3 3 2 1 2 1 -72.00 18.42 39.22
Average = -45.36 31.52 34.12
Lecture 3. Case Study: Polysilicon Deposition Process (2) 10
Case Study: Polysilicon Deposition Process
Response Analysis (Factor A)
　 A B C D E F 　 　 　
Exp. 2 3 4 5 6 8 d t r
1 1 1 1 1 1 1 0.51 35.22 23.23 ( ) = (0.51 37.30 45.17 3.47
d A1

2 1 2 2 2 2 2 -37.30 35.75 31.27 5.08 54.85) / 6 = 24.23

3 1 3 3 3 3 3 -45.17 36.02 32.34
10 1 1 3 3 2 1 -3.47 26.85 27.89 ( )
d A2
= ( 25.76 62.54 62.23 49.38
11 1 2 1 1 3 2 -5.08 38.80 26.02 36.54 64.18) / 6 = 50.10
12 1 3 2 2 1 3 -54.85 38.06 31.82
4 2 1 1 2 2 3 -25.76 42.24 31.15 ( )
d A3
= ( 59.88 71.69 68.15 27.31
5 2 2 2 3 3 1 -62.54 21.43 37.27 71.51 72.00) / 6 = 61.75
6 2 3 3 1 1 2 -62.23 32.91 33.89
13 2 1 2 3 1 2 -49.38 32.07 34.50
14 2 2 3 1 2 3 -36.54 43.35 33.20
15 2 3 1 2 3 1 -64.18 37.44 34.78
7 3 1 2 1 3 3 -59.88 21.39 37.68
8 3 2 3 2 1 1 -71.69 22.84 40.46
9 3 3 1 3 2 2 -68.15 30.60 41.21
16 3 1 3 2 3 2 -27.31 31.86 37.71
17 3 2 1 3 1 3 -71.51 22.01 40.45
18 3 3 2 1 2 1 -72.00 18.42 39.22
Average = -45.36 31.52 34.12
Lecture 3. Case Study: Polysilicon Deposition Process (2) 11
Case Study: Polysilicon Deposition Process
Response Analysis (Factor B)
　 A B C D E F 　 　 　
Exp. 2 3 4 5 6 8 d t r
1 1 1 1 1 1 1 0.51 35.22 23.23 ( ) = (0.51 25.76 59.88 3.47
d B1

4 2 1 1 2 2 3 -25.76 42.24 31.15 49.38 27.31) / 6 = 27.55

7 3 1 2 1 3 3 -59.88 21.39 37.68
10 1 1 3 3 2 1 -3.47 26.85 27.89 ( )
d B2
= ( 37.30 62.54 71.69 5.08
13 2 1 2 3 1 2 -49.38 32.07 34.50 36.54 71.51) / 6 = 47.44
16 3 1 3 2 3 2 -27.31 31.86 37.71
2 1 2 2 2 2 2 -37.30 35.75 31.27 ( )
d B3
= ( 45.17 62.23 68.15 54.85
5 2 2 2 3 3 1 -62.54 21.43 37.27 64.18 72.00) / 6 = 61.10
8 3 2 3 2 1 1 -71.69 22.84 40.46
11 1 2 1 1 3 2 -5.08 38.80 26.02
14 2 2 3 1 2 3 -36.54 43.35 33.20
17 3 2 1 3 1 3 -71.51 22.01 40.45
3 1 3 3 3 3 3 -45.17 36.02 32.34
6 2 3 3 1 1 2 -62.23 32.91 33.89
9 3 3 1 3 2 2 -68.15 30.60 41.21
12 1 3 2 2 1 3 -54.85 38.06 31.82
15 2 3 1 2 3 1 -64.18 37.44 34.78
18 3 3 2 1 2 1 -72.00 18.42 39.22
Average = -45.36 31.52 34.12

Lecture 3. Case Study: Polysilicon Deposition Process (2) 12

Case Study: Polysilicon Deposition Process
Response Analysis (Surface Defects d
)

　 Level
Factor 1 2 3
A. Temperature -24.23 -50.10 -61.75
B. Pressure -27.55 -47.44 -61.10
C. Nitrogen -39.03 -55.99 -41.07
D. Silane -39.20 -46.85 -50.04
E. Settling time -51.52 -40.54 -44.03
F. Cleaning method -45.56 -41.58 -48.95

-20

-30

-40

-50

-60

-70
A1 A2 A3 B1 B2 B3 C1 C2 C3 D1 D2 D3 E1 E2 E3 F1 F2 F3

Lecture 3. Case Study: Polysilicon Deposition Process (2) 13

Case Study: Polysilicon Deposition Process
Response Analysis (Thickness Uniformity t
)

　 Level
Factor 1 2 3
A. Temperature 35.12 34.91 24.52
B. Pressure 31.61 30.70 32.24
C. Nitrogen 34.39 27.86 32.31
D. Silane 31.69 34.70 28.16
E. Settling time 30.52 32.87 31.16
F. Cleaning method 27.04 33.67 33.85

40

35

30

25

20
A1 A2 A3 B1 B2 B3 C1 C2 C3 D1 D2 D3 E1 E2 E3 F1 F2 F3

Lecture 3. Case Study: Polysilicon Deposition Process (2) 14

Case Study: Polysilicon Deposition Process
Response Analysis (Deposition Rate r
)

　 Level
Factor 1 2 3
A. Temperature 28.76 34.13 39.46
B. Pressure 32.03 34.78 35.54
C. Nitrogen 32.81 35.29 34.25
D. Silane 32.21 34.53 35.61
E. Settling time 34.06 33.99 34.30
F. Cleaning method 33.81 34.10 34.44

45

40

35

30

25
A1 A2 A3 B1 B2 B3 C1 C2 C3 D1 D2 D3 E1 E2 E3 F1 F2 F3

Lecture 3. Case Study: Polysilicon Deposition Process (2) 15