閉じ込められたナノ秒パルスレーザーアブレーションプラズマ特性

Characterization of confined nanosecond laser ablation plasmas

D2 ヘルナンデスジェイムスエドワード二世アキノ

１．はじめに
Laser ablation is the interaction of a high powered laser
on a target above its vaporization threshold. Laser ab-
lation has been widely explored for applications such as
mass spectrometry and pulsed laser deposition. These
applications also vary depending on the pulse width,
which can range from ’short’ nanosecond to ’ultra-
short’, or femtosecond order pulses. Some of the pri-
mary processes involving laser ablation via short pulses
are plasma formation, material evaporation, and clus-
ter formation. The conditions of the resulting plasma,
its constituents, and the evaporated material highly
depend on the laser, target, and ambient parameters.
(b)
Characterization of positive and negative ions within
Figure 1 (a) Schematic of the reflectron (b)
the laser plasma can be performed by time-of-flight
Calculated resolution vs length and Electric field
(TOF) spectroscopy, where ions and their mass dis-
tribution are detected after they are allowed to drift. From the above graphs, it is concluded that the reflec-
Since laser ablation involves the target material re- tron design would be a single stage reflectron. In order
moval, repeated laser incidence focused on the same re- to further optimize the device, the mirror equation is
gion of the target would form a cavity. Characteristics employed, with the image distance corresponds to the
of the generated ions are influenced with the formation FC, in order to identify the point at which the ion beam
of a deep hole within the target. After the laser inci- focuses. Energy focusing calculation is also performed,
dence within the hole, the cavity acts as a wall result- and is shown in Figure 2.
ing to a confined transient plasma, which is followed by
material expulsion. The theme of the current research
is to investigate the influence of cavity in the formed
plasma and its constituents, as well as the evaporated
from the particles via direct laser vaporization.
２．進捗
The current goal is to establish an ion spectra of neg-
ative ions with sufficient resolution and intensity. Re-
cent progress involve the design and optimization of
the reflectron mass analyzer. The reflectron makes
use of a 15◦ angle with the incident ion beam. The
ions propagating from the extraction region will pass
through the plates. The characterization whether the
reflectron would be a single stage or double staged is
performed. Energy focusing calculation is performed.
The resolution defined as
m E
R= = (1)
2∆m 2∆E
and is employed as the main design parameter. Figure Figure 2 Resolution versus energy ratio for a
shows the model schematic. reflectron after ion mirror calculation
It is observed in Figure that the most variation the ion
energy to achieve < 1µs difference in TOF is around
0.018. Thus for a 2500 keV ion beam, 45 keV energy
deviation results to a resolution of 6000.
３．予定

• ISPlasma
(a) • 負イオン研究会　(Dec 2020 締切)