© The Hong Kong Polytechnic University

THE HONG KONG POLYTECHNIC UNIVERSITY

DEPARTMENT OF APPLIED PHYSICS

Programme : PhD (11601/41601/88011/88111) / MPhil. (11601/41601/88012/88112)

Subject Title : Advanced Electron Subject Code : AP 621

Microscopy: Theory and
Practice

Session : Semester 1, 2018/19

Date : 21 Dec 2018 Time : 3 hours

Allowed
Time : 08:45 – 11:45
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This question paper has a total of 4 pages (attachments included).

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Instructions to candidates:

This exam paper consists of FOUR questions.

All the answers should be written/illustrated on the answer sheets.

Please read the questions carefully.

Follow the instructions and choose approiporite projects to do in Q.4.

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DO NOT TURN OVER THE PAGE UNTIL YOU ARE TOLD TO DO SO

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Q.1

(a) Please find the techniques which use the inelastic scattering among the follows: high
resolution TEM imaging (HRTEM), electron energy loss spectroscopy (EELS), secondary
electron imaging, X-ray energy dispersive spectroscopy (EDS), cathodoluminescence
(CL), Kikuchi lines (pattern), high resolution annular dark field imaging (ADF). (5 marks)

(b) Sort (in ascending order) the order by time for the following milestone events in the
history of electron microscopy development: (5 marks)
(i) The first TEM invented by Ruska
(ii) The first high resolution STEM built in Chicago
(iii) The electron aberraction corrector commercialized by CEOS Ltd
(iv) The first measurement of the energy loss spectrum of transmitted electrons by
Ruthemann
(v) The diffraction contrast TEM technique developed in Cavendish Lab

(c) Sort (in descending order) the spatial resolution limit for the following techniques of
electron microscopy in current time (by 2018). (5 marks)
(i) STEM
(ii) SEM
(iii) EDS (in TEM)
(iii) EELS (in TEM)

Q.2

(a) Sketch the configuration of the TEM, and the ray diagrams for the TEM mode, selected
area diffraction mode and STEM mode (including ADF and BF).
(20 marks)

(b) Sketch the ray diagrams for the dark field TEM and bright field TEM. (8 marks)

Advanced Electron Microscopy: Theory and Practice 2018/2019 Examination

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(c) Sketch the configuration of SEM (including SE, BSE and EDS detectors).
(6 marks)

Q.3 Are the following arguments correct? Expain why.

(a) The annular bright field(ABF) techqnique are usually used to image the heavy atoms such
as Ba, Au, W, etc. (4 marks)

(b) The high resolution TEM imaging require ultrathin samples. (4 marks)

(c) To study the defects in crystals, TEM imaging is more suitable than STEM imaging.
(4 marks)

Q.4 Project planning exercises.

(a) Suggest the complete characterizing process (from sample preparation to the electron
microscopy techniques) for the following materials/structures by using electron
microscopy, explore all the possibilities and push-to-limit use of instruments.
(choose either three of the four projects below). (21 marks)

(i) The nanotwined copper for ultrahigh strength and ductility.

(ii) The thin film of quantum well structrures made of SrTiO3/BaTiO3 grown on silicon
substarte.

(iii) The oxygen doped graphene monolayer prepared by liquid exfoliation.

(iv) The magnetic iron oxide nanoparticles grown inside bacteria.

Advanced Electron Microscopy: Theory and Practice 2018/2019 Examination

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(b) Choose the methodology of the in situ electron microscopy (including in situ technique
and microscopy techniques) and explain your reasons for the following projects, explore
all the possibilities and push-to-limit use of instruments. (choose either two of the four
projects below) (18 marks)

(i) The lithium ion diffusion in Si nanowires.

(ii) The size dependent yielding strength of Ni nanopillars.

(iii) The structure for the CoPt nanoparticle catalyst for oxygen reduction reactions.

(iv) The vapor-liquid-solid (VLS) growth of carbon nanotubes using Fe catalyst.

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Advanced Electron Microscopy: Theory and Practice 2018/2019 Examination