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Electrochimica Acta 127 (2014) 7–19

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Electrochimica Acta
journal homepage: www.elsevier.com/locate/electacta

Electrochemical dissolution of fresh and passivated chalcopyrite


electrodes. Effect of pyrite on the reduction of Fe3+ ions and transport
processes within the passive film
O.G. Olvera ∗ , L. Quiroz, D.G. Dixon, E. Asselin
Department of Materials Engineering, The University of British Columbia 309-6350 Stores Road, Vancouver, BC, V6 T 1Z4, Canada

a r t i c l e i n f o a b s t r a c t

Article history: The effect of pyrite (FeS2 ) on the electrochemical dissolution of fresh and passivated chalcopyrite (CuFeS2 )
Received 28 October 2013 electrodes has been studied. Current density values for the dissolution of CuFeS2 were calculated from EIS
Received in revised form 27 January 2014 measurements. FeS2 increased the dissolution rate of fresh and passivated CuFeS2 electrodes indicating
Accepted 31 January 2014
that the galvanic effect continued even after the electrode was chemically passivated. The dissolution
Available online 15 February 2014
rate of CuFeS2 decreased by a factor of 3 after the passivation treatment. Due to the low diffusion rates of
ions within the CuFeS2 passive film and due to an increase in the resistance to the transfer of electrons at
Keywords:
the electrode/film interface, the activity of FeS2 for the reduction of Fe3+ ions was also reduced by a factor
Chalcopyrite
Pyrite
of 2.3 even though FeS2 was not exposed to any chemical treatment. The results in this work indicate that
Galvanic effect the dissolution rate of the fresh CuFeS2 electrode was controlled by the reduction of Fe3+ ions whereas
EIS for the passivated CuFeS2 electrode the dissolution rate was controlled by diffusion within the passive
Passivating film. film.
© 2014 Elsevier Ltd. All rights reserved.

1. Introduction are represented by Eqs. 1–4; Eq. 1 represents the anodic dissolution
of CuFeS2 to yield cupric and ferrous ions, as well as an elemental
Chalcopyrite (CuFeS2 ) is the most abundant copper sulphide sulfur product layer that forms on the surface of the CuFeS2 parti-
mineral accounting for nearly 70% of the known reserves in the cle. The second reaction (Eq. 2) comprises the reduction of Fe3+ ions
world [1]. Hydrometallurgical processes continue to attract interest that are further regenerated by oxidizing Fe2+ ions with dissolved
since they possess the ability to treat low tonnages of complex ores O2 (Eq. 3). The overall reaction for the process is represented by Eq.
containing high impurities. However, due to the slow dissolution 4.
rates of CuFeS2 , hydrometallurgical processes have not yet found
widespread application. In spite of this, there have been a number CuFeS2 → Cu2+ + Fe2+ + 2S0 + 4e− (1)
of processes developed for the leaching of CuFeS2 and other copper-
bearing minerals; several of these processes have been reviewed by 4Fe3+ + 4e− → 4Fe2+ (2)
Baba et al. [2] and Dreisinger [3].
4Fe2+ + O2 + 4H+ → 4Fe3+ + 2H2 O (3)
One of the latest developments in the chemical leaching of
chalcopyrite in sulphate media under atmospheric pressure is the CuFeS2 + 4Fe3+ → Cu2+ + 5Fe2+ + 2S0 (4)
GalvanoxTM process. This process consists in the addition of pyrite
(FeS2 ) to the leach slurry in the presence of Fe3+ ions. FeS2 and The quality of FeS2 as a catalyst depends on its source and its cat-
CuFeS2 are thought to form a galvanic couple where FeS2 acts as alytic properties seem to be related to its silver content [6]. Nazari
an extended surface for the reduction of Fe3+ ions, increasing in et al. [7] showed that the catalytic properties of different sources of
this way the rate of the anodic dissolution of CuFeS2 [4,5]. Fig. 1 FeS2 could be enhanced by pretreating them with small amounts
shows a simple schematic representation of the reactions that are of silver. This effect was later suggested to be a consequence of a
thought to take place in the GalvanoxTM process. These reactions decrease in the electrical resistivity of the sulfur product layer cov-
ering the CuFeS2 particles, thus facilitating the electrical contact
between CuFeS2 and FeS2 . A concomitant increase in the catalytic
∗ Corresponding author. Tel.: +1 604 827 5070. properties of FeS2 for the reduction of Fe3+ ions was also postulated
E-mail addresses: oscar.olvera@ubc.ca, og.olvera@yahoo.com.mx (O.G. Olvera). [8].

http://dx.doi.org/10.1016/j.electacta.2014.01.165
0013-4686/© 2014 Elsevier Ltd. All rights reserved.
8 O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19

reviews [9,12,24–26]. The following passivating films have been


suggested: elemental sulfur in both porous and compact layers;
metal-deficient sulphides; polysulphides and, iron precipitates
such as jarosite, KFe3 (SO4 )2 (OH)6 , and ferrihydrite, Fe5 O3 (OH)9 .
Interestingly, regardless of the nature of this passive film, in a recent
work Rivera [27] observed that adding FeS2 to a CuFeS2 concentrate
that was showing signs of passivation increased the leaching rate
and overcame the passivation effects observed prior to its addition.
Similar results were observed when activated carbon was added to
an enargite (Cu3 AsS4 ) concentrate after having observed its passiv-
ation [28].
In the present work we have studied the effect of FeS2 on the
Fig. 1. Schematic representation of the reactions taking place in the GalvanoxTM electrochemical dissolution of fresh and passivated CuFeS2 elec-
process.
trodes. The dissolution current density values were determined
using electrochemical impedance spectroscopy (EIS). The effect of
The improvement of hydrometallurgical processes is strongly the passive film on the dissolution rate of CuFeS2 was also quan-
related to understanding the kinetics and mechanisms underlying tified. An experimental rate expression for the electrochemical
the dissolution of minerals. It has been recognized that the main dissolution of fresh CuFeS2 electrodes was obtained and compared
factors affecting the dissolution rate of CuFeS2 are the concentra- against a theoretical model based on mixed potential theory. A sim-
tion of the oxidizing species, the redox potential of the solution and ple kinetic analysis was conducted to determine the rate controlling
the presence of a passivating layer [9–11]. step on the dissolution of fresh and passivated CuFeS2 electrodes.
Fe3+ ions are the most commonly applied oxidizing agent used
in CuFeS2 leaching [11 and references within]. It has been reported
2. Experimental
that the leaching rate of CuFeS2 depends on Fe3+ ions when con-
centration is below 0.1 mol L−1 whereas at higher concentrations
2.1. Mineral characterization
no further increase in the dissolution rate is observed [12–14].
An explanation for this effect was given by Hirato et al. [15] who
The CuFeS2 sample used in this study was from the La Ranita
calculated that the concentration of Fe3+ and FeHSO4 2+ increased
mine in Chihuahua, Mexico. The mineral sample was analyzed by X-
when total Fe concentration increased up to 0.1 mol L−1 whereas
ray powder-diffraction (XRD) for quantitative phase analysis using
for higher concentrations the predominant species was FeSO4 + .
the Rietveld method and the International Centre for Diffraction
This explanation flows from the fact that, according to Ashurst
Database PDF-4 and Search-Match software by Bruker. The sample
and Hancock [16], the Fe3+ and FeHSO4 2+ species are outer-sphere
was reduced to the optimum grain-size range for quantitative X-ray
complexes while FeSO4 + is an inner-sphere complex where charge
analysis (<10 ␮m) by grinding under ethanol in a vibratory McCrone
transfer is retarded since it involves the breaking of the Fe3+ and
Micronising Mill for 7 minutes. Step-scan XRD data were collected
SO4 2− bond to form the FeSO4 outer-sphere complex. Thus only
over a range 3-80◦ 2␪ with CoK␣ radiation on a Bruker D8 Focus
FeHSO4 2+ and Fe3+ would act as the electroactive species [17].
Bragg-Brentano diffractometer equipped with an Fe monochroma-
With regards to the rate determining step in the dissolution
tor foil, 0.6 mm (0.3◦ ) divergence slit, incident- and diffracted-beam
of CuFeS2 , Linge [18] demonstrated that pore diffusion through
Soller slits and a LynxEye detector. The long fine-focus Co X-ray tube
the sulphur film did not limit the dissolution rate; instead it was
was operated at 35 kV and 40 mA, using a take-off angle of 6◦ .
proposed that a solid diffusion process was the rate controlling
step. Similarly, Dutrizac [19] studied the dissolution of CuFeS2 in
ferric sulphate and ferric chloride media and found that leaching 2.2. Electrochemical techniques
rates were independent of acid concentration (for acid concentra-
tions lower than 1 mol L−1 ) and degree of agitation. More recently The dissolution of a CuFeS2 electrode was studied in a conven-
Ghahremaninezhad et al. [20] showed that any contribution of tional three electrode cell. A CuFeS2 electrode was used as working
the Fe3+ reduction limiting current density could be neglected and electrode, a graphite rod as counter electrode and a saturated
that the major contribution to the dissolution current of a CuFeS2 calomel electrode (SCE, +0.24 V/SHE) as reference electrode. Most
electrode came from charge transfer reactions; these authors also experiments were performed at 25 ◦ C except for those performed
suggested that the passive film was a better electronic conductor during the passivation of the electrode at 50 ◦ C. The working elec-
than an ionic conductor and that the diffusion of atoms within the trode consisted of cubic-shaped CuFeS2 with an exposed surface of
passive film was the reason for the slow reduction of Fe3+ on the sur- 1.9 cm2 . The CuFeS2 electrode was fixed to a copper wire using
face of the electrode. There have also been several works reporting silver-containing epoxy resin. The whole assembly was further
that the kinetics of CuFeS2 leaching with Fe3+ occur under linear or embedded in a high temperature non-conductive epoxy resin. Prior
parabolic kinetic chemical control regimes, with activation ener- to each electrochemical experiment the electrode was polished
gies ranging from 40 to 130 kJ mol−1 between 35 to 100 ◦ C both in with 1200 grit carbide paper. Electrodes were rinsed with deion-
sulphate and chloride media [10,12,15,21–23]. ized water and acetone and left to dry. The polishing and acetone
As mentioned before, the presence of a passivating layer is rinsing steps were omitted for the experiments with the passivated
one of the main factors affecting the leaching rate of chalcopy- CuFeS2 electrode to avoid changes in the formed product layer.
rite. This passivating layer causes the mineral to leach at very The electrolyte used in the experiments was a 0.5 mol L−1
low rates, which is one of the main drawbacks of hydrometallur- H2 SO4 (Fisher Scientific, 95 to 98%) aqueous solution prepared
gical processes. In addition to this, the presence of a passivating with deionized water; FeSO4 ·7H2 O (Fisher Scientific, 100%) and
layer complicates the analysis of the kinetics and mechanisms Fe2 (SO4 )3 ·5H2 O (Sigma Aldrich, 97%) were added in the desired
involved in the leaching of CuFeS2 . To date there are differ- concentrations. Nitrogen gas was sparged 30 minutes before and
ent theories regarding the nature of the passive layer formed during the electrochemical experiments to remove dissolved
during the leaching of the mineral and the nature and mecha- oxygen from the electrolyte. The measured pH of the solutions
nisms of formation have been the subject of several articles and used in this study was always in the range of 0.77–0.80.
O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19 9

Electrochemical experiments were performed with a PARSTAT 400


2273 potentiostat from Princeton Applied Research. Open circuit
potential (OCP) measurements were performed until the electrode 390
EM = 39.5log[Fe3+] + 435.7
potential stabilized with a change of no more than 1 mV in 10 min.
EIS measurements were conducted at the measured OCP, with 380
an a.c. amplitude of 5 mV in the frequency range of 10 kHz to 10
370

OCP vs SCE/mV
mHz; impedance was measured three times at each frequency to
decrease the contribution of experimental error when fitting the 360
experimental data; ZSimpWin v3.30 software was used to fit the
impedance data. 350
To evaluate the effect of FeS2 on the electrochemical behaviour
of CuFeS2 three different FeS2 particles denominated P1, P2 and 340
P3 were used, their corresponding weights were 124, 266 and
754 mg. The surface area for these particles could not be directly 330
measured by physisorption due to their very small size; however,
320
based on their respective masses an equivalent surface area was
calculated assuming particles were spherical (no correction factor 310 0 1 2
was introduced to account for roughness and irregularities). The 10 10 10
calculated areas for P1, P2 and P3 were 0.41, 0.68 and 1.37 cm2 ,
[Fe ]/mmol L-1
3+
respectively.
To conduct the electrochemical experiments the CuFeS2 elec- Fig. 2. Effect of Fe3+ concentration on the OCP of a fresh CuFeS2 electrode. T = 25 ◦ C;
trode was placed in the electrolyte with the mineral surface facing 0.5 mol L−1 H2 SO4 + 0.1 mol L−1 FeSO4 .
upwards, thereafter the FeS2 particle to be evaluated was fixed to
the tip of a plastic pipette and placed on top of the electrode. This
ensured that the electrical contact between the electrode and the
3.2. OCP measurements
corresponding FeS2 particle was constant during the experiments.

Before analyzing the effect of FeS2 on the electrochemical behav-


2.3. Passivation of the CuFeS2 electrode ior of CuFeS2 , a set of experiments to evaluate the effect of Fe3+
and Fe2+ ions on the measured potential and EIS spectra of the
The CuFeS2 electrode was passivated by immersing it in an aque- fresh CuFeS2 electrode was first conducted. The objective of these
ous solution of 0.5 mol L−1 H2 SO4 , 0.05 mol L−1 Fe2 (SO4 )3 ·5H2 O experiments was to ensure that the correct physical meaning was
and 0.1 mol L−1 FeSO4 ·7H2 O at 50 ◦ C for 96 h; N2 was bubbled dur- assigned to the charge transfer resistances present in the equivalent
ing this treatment. Before and after the passivating treatment, the electrical circuit used to model the experimental EIS data presented
CuFeS2 electrode was analyzed by scanning electron microscopy in further sections.
(SEM) and energy-dispersive X-ray spectroscopy (EDX) to see if Fig. 2 shows an increase of the measured potential with increas-
differences in morphology and chemical composition could be ing Fe3+ concentration. The semi-logarithmic plot led to a linear
observed. No appreciable differences could be observed, which sug- relationship between these two variables with a slope of 39.5 mV
gests that the thickness of the passive film was below 200 nm; since in the range of concentrations analyzed (1–100 mmol L−1 ). This
differences were not observed results have not been presented. value differed from the 79 mV slope value reported by Hirato et al.
[15] at 70 ◦ C when increasing the Fe3+ concentration from 0.01 to
2.4. Leaching of CuFeS2 1.0 mol L−1 ; the equivalent slope at 25 ◦ C for this value is 68.6 mV
which is 29.1 mV higher than the value obtained in this work. To
A leaching test was conducted to provide a point of comparison explain this difference we used mixed potential theory to derive an
for the CuFeS2 dissolution rates estimated using EIS. For this pur- analytical expression for the mixed potential (EM ). First, Eq. 5 states
pose, 1.0 g of the same CuFeS2 sample used for the electrodes was that the sum of the cathodic and anodic currents on the surface of
added to 150 mL of a solution of the same composition as in section the electrode must be zero:.
2.3. Before the test the sample was ground and sieved so that only
particles in the range 53 < dp < 106 ␮m were present in the leach ⎡  ⎤
EM − E 0 3+
slurry; an analytical expression was used to estimate the total area /Fe2+
AC kFe3+ [Fe3+ ] exp ⎣− ⎦
Fe
of the CuFeS2 exposed to the solution (∼190 cm2 g−1 ). The temper- ˇFe3+
ature was 25 ◦ C and N2 was bubbled during the entire experiment
to remove dissolved O2 from the solution. A magnetic stirrer was 
EM − E 0 3+
set at 400 rpm to mix the solution. The duration of the experiment Fe /Fe2+
= AA kFe2+ [Fe2+ ] exp
was 70 h and samples were taken at 4, 27, 48 and 70 h. The sam- ˇFe2+
ples were analyzed by X-ray fluorescence (XRF) using an acquisition 
time of 5 minutes per measurement to obtain an accurate value for 0
EM − ECuFeS
the concentration of Cu. +AA kCuFeS2 exp 2
(5)
ˇCuFeS2

3. Results and discussion


For the time being, and for the purposes of this analysis, the
3.1. Mineral characterization values for the cathodic and anodic reaction surface areas will be
considered to be equal so that AC = AA = A. Eq. 5 can be further sim-
The results of quantitative phase analysis of Rietveld refine- plified by grouping the reaction constants, ki , with the standard
ments revealed that the only crystalline phases in the mineral redox potentials, E0 i , in the argument of the exponential terms so
electrodes were CuFeS2 (99.6 wt. %) and quartz (0.4 wt. %). that Eq. 6 is obtained. The latter expression was further rearranged
10 O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19

470 430
460

450
420
OCP vs SCE/mV

440 P2 P3

OCP vs SCE/mV
430
410
420
P1
410
400
400 EM = -30.0log[Fe2+] + 370.3

390 0 1 2
10 10 10 390 No FeS2
[Fe ]/mmol L-1
2+
Fresh electrode
2+ ◦
Fig. 3. Effect of Fe concentration on the OCP of a fresh CuFeS2 electrode. T = 25 C; Passivated electrode
0.5 mol L−1 H2 SO4 + 0.05 mol L−1 Fe2 (SO4 )3 .
380
0 0.5 1 1.5
to yield Eq. 7:


FeS2 surface area/cm2
 3+ EM  2+ EM
k Fe3+ [Fe ] exp − = k Fe2+ [Fe ] exp
ˇFe3+ ˇFe2+ Fig. 4. Effect of FeS2 equivalent area on the OCP of fresh and passivated CuFeS2

electrodes. T = 25 ◦ C; 0.5 mol L−1 H2 SO4 , 0.05 mol L−1 Fe2 (SO4 )3 , 0.1 mol L−1 FeSO4 .
EM
+k CuFeS2 exp (6)
ˇCuFeS2 if the oxidation of Fe2+ ions was the only anodic reaction occur-
ring on the surface of the electrode. Therefore it can be suggested

that the less negative slope obtained in this study was caused by
 3+  2+ 1 1
k Fe3+ [Fe ] = k Fe2+ [Fe ] exp EM + a low contribution of the oxidation of Fe2+ ions to the total anodic
ˇFe2+ ˇFe3+
current.

Fig. 4 shows the effect of contacting different FeS2 particles with
1 1
+k CuFeS2 exp EM + (7) fresh and passivated CuFeS2 electrodes on their OCP. In the absence
ˇCuFeS2 ˇFe3+
of pyrite, the OCP measured with the fresh CuFeS2 electrode was
394 mV and it increased up to 424 mV when the largest particle
To derive an analytical expression for EM some assumptions are
used in this study (P3, 1.37 cm2 ) was contacted with the fresh
required. Although we recognize that it is not yet justifiable, for the
CuFeS2 electrode. After the electrode was passivated a decrease in
sake of the analysis, it will be assumed that the contribution of the
the OCP was observed from 394 to 385 mV in the absence of FeS2
oxidation of Fe2+ ions to the total anodic current is much lower than
and from 424 to 420 mV when P3 was in contact with the elec-
the contribution of the anodic dissolution of CuFeS2 ; under these
trode; this indicates that the effect of FeS2 on the electrochemical
circumstances Eq. 7 simplifies to:
properties of CuFeS2 persisted after the passivating treatment of
2.3RT k Fe3+ [Fe3+ ] the electrode. Mehta and Murr [29] also reported an increase of
EM =   log (8) 40 mV in the potential by connecting FeS2 and CuFeS2 electrodes
F ˛CuFeS2 + ˛Fe3+ k CuFeS2
immersed in a 1 mol L−1 H2 SO4 solution. More recently, Majuste
When the charge transfer coefficients in Eq. 8 are the same et al. [30] observed similar increases when they evaluated the
and equal to 0.5 then the semi-logarithmic plot of EM against effects of FeS2 inclusions on the electrochemical behavior of CuFeS2
the concentration of Fe3+ ions yields a straight line with a slope electrodes; these authors observed an increase of 100 mV for an
of 59 mV at 25 ◦ C, regardless of the values of the rate constants, electrode containing 42% FeS2 compared to a pure CuFeS2 electrode
ki . The value obtained in Fig. 2 was 39.5 mV which implies that in a 0.1 mol L−1 H2 SO4 , 0.05 mol L−1 Fe3+ solution.
the sum of the charge transfer coefficients is 1.5. Taking the
value obtained by Ghahremaninezhad et al. [20] for the cathodic 3.3. Electrochemical Impedance Spectroscopy
charge transfer coefficient, ˛Fe3+ = 0.5, then a value for the anodic
charge transfer coefficient ˛CuFeS2 = 1 would explain the lower slope Fig. 5 shows the impedance (a) and phase angle (b) Bode plots
observed in Fig. 2, compared with the value reported by Hirato et al. measured with the fresh CuFeS2 electrode in solutions containing
(1987). different concentrations of Fe3+ . By visual inspection two different
The effect of Fe2+ concentration on the measured potential electrochemical processes can be observed; the first, at frequencies
(Fig. 3) was less clear because a linear relation was not observed between 32 and 98 Hz, showed a shifting of the phase peak (Fig. 5b)
as in Fig. 2. This complication was partly because the number of towards higher frequencies as Fe3+ concentration was increased.
solutions analyzed was insufficient to conduct an adequate kinetic The second electrochemical process was observed at frequencies
study, which was considered to be beyond the limits of this work. below 1 Hz. The electrochemical nature of these processes will be
However a decrease in potential was observed with increasing discussed in further paragraphs.
Fe2+ concentration; despite the limited experimental data shown in The effect of Fe2+ on the impedance spectra of the fresh CuFeS2
Fig. 3 a linear fit with a slope of −30 mV was calculated; again, this electrode is presented in Fig. 6; as Fe2+ concentration was decreased
value was different than the −59 mV slope that would be expected a shift from 120 to 50 and 32 Hz was observed in the phase peak
O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19 11

60
a) b)
3+
100 mM Fe 100 mM Fe3+
10 mM Fe3+ 50 10 mM Fe3+
3+
3 1 mM Fe 1 mM Fe3+
10
40

Phase angle/°
|Z|/Ω cm2

30

2
10
20

10

1
10 0
-2 0 2 4 -2 0 2 4
10 10 10 10 10 10 10 10
Frequency/Hz Frequency/Hz

Fig. 5. Effect of Fe3+ concentration on the impedance spectra of a fresh CuFeS2 electrode. T = 25 ◦ C; 0.1 mol L−1 FeSO4 , 0.5 mol L−1 H2 SO4 . a) Impedance modulus and b) Phase
angle.

for the first time constant when concentrations were 100, 10 and for frequencies below 100 Hz where a decrease can be appreci-
1 mmol L−1 (Fig. 6b), respectively. The effect of decreasing Fe2+ con- ated as the area of the CuFeS2 particle used in the experiment
centration on the impedance modulus (Fig. 6a) was similar as that increased.
observed for Fe3+ in Fig. 5a, where an increase of the impedance According to previous reports [5,8,30,31] the main effect of FeS2
was observed at frequencies below 1 Hz. consists in providing an extended surface area for the reduction
Fig. 7 presents the Bode plots for the fresh CuFeS2 electrode of the oxidant to take place, thereby increasing the dissolution
in contact with the different FeS2 particles. As in Figs. 5 and 6, of CuFeS2 . From Figs. 5 to 7 it can be proposed that the changes
two different time constants were observed in all experiments, observed in the EIS spectra are mostly related to changes in the
the first time constant was observed at about 120 Hz and the sec- rate of reduction of Fe3+ ions. According to the literature there is
ond at 25 mHz. These time constants shifted to higher frequencies also evidence that the mass transfer of Fe3+ to the electrode surface
when FeS2 was contacted with the CuFeS2 electrode. In regards to has no influence on the dissolution of CuFeS2 [18,19]. To confirm
the first time constant, the phase angle decreased from 56◦ in the this, a magnetic stirrer was placed in the electrochemical cell and
absence of FeS2 , to 51◦ when P1 and P2 were in contact with the rotated at 800 rpm. Fig. 8 shows that the results of the experiments
CuFeS2 electrode, and to 49◦ in the case of P3. The effect of FeS2 where the solution was stagnant and when it was agitated were
was more evident in the second time constant where the decrease the same and it is safe to conclude that, under the conditions of
in the phase angle was more evident and went from 19◦ for the our experiments, there is no effect of mass transfer processes of
electrode alone to 7◦ when P3 was in contact. In the case of the any soluble species present in the electrolyte on the dissolution of
moduli of the impedance, the effect of FeS2 could only be observed CuFeS2 .

70
a) b)
2+
100 mM Fe 100 mM Fe2+
60
10 mM Fe2+ 10 mM Fe2+
2+
3 1 mM Fe 1 mM Fe2+
10
50
Phase angle/°
|Z|/Ω cm2

40

30
2
10

20

10

1
10 0
-2 0 2 4 -2 0 2 4
10 10 10 10 10 10 10 10
Frequency/Hz Frequency/Hz

Fig. 6. Effect of Fe2+ concentration on the impedance spectra of a fresh CuFeS2 electrode. T = 25 ◦ C; 0.05 mol L−1 Fe2 (SO4 )3 , 0.5 mol L−1 H2 SO4 . a) Impedance modulus and b)
Phase angle.
12 O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19

a) 60
b)
No Pyrite
3
10 Pyrite 1
50 Pyrite 2
Pyrite 3
40

Phase angle/°
|Z|/Ω cm2

30
2
10
No Pyrite 20
Pyrite 1
Pyrite 2
Pyrite 3 10

1
10 -2 0 2 4
0 -2 0 2 4
10 10 10 10 10 10 10 10
Frequency/Hz Frequency/Hz

Fig. 7. Effect of FeS2 on the impedance spectra of a fresh CuFeS2 electrode. T = 25 ◦ C; 0.1 mol L−1 FeSO4 , 0.05 mol L−1 Fe2 (SO4 )3 , 0.5 mol L−1 H2 SO4 CuFeS2 electrode. a)
Impedance modulus and b) Phase angle.

1000 50 Table 1
Estimated parameters from the experimental results shown Figs. 5 and 6 by fitting
to equivalent circuit shown in Fig. 9.

40 Fe2+ , mmol L−1 100 100 100 10 1


Fe3+ , mmol L−1 1 10 100 100 100
100 0 RPM R ,  cm2 19 18 17 18 22
Phase angle/°

800 RPM 30 Q, ␮F sn-1 cm−2 74.6 78.4 27.7 49.3 64.5


|Z|/Ω cm2

n 0.87 0.85 0.86 0.90 0.88


RC , k cm2 18.3 7.5 2.1 3.4 4.1
RA ,  cm2 153 326 393 687 1065
20 Y0 , mF s0.5 cm−2 5.6 5.3 5.5 2.8 1.6
10 ␻0 , s−1 162.2 60.8 133.0 33.0 5.5
K 1.8 3.0 5.8 1.9 1.8
10 nD 0.41 0.48 0.56 0.38 0.48
␹2 × 105 6.3 6.5 7.7 16.2 79.5
Error in |Z|, % 0.8 0.8 0.9 1.3 2.8

0 0
-2 0 2 4
10 10 10 10 iii) Diffusion of ions in the solid side of the electrode-electrolyte
Frequency/Hz interface occurs in series with the anodic dissolution of CuFeS2
Fig. 8. Effect of stirring rate on the impedance spectra of a fresh CuFeS2 electrode.
T = 25 ◦ C; 0.05 mol L−1 Fe2 (SO4 )3 , 0.1 mol L−1 FeSO4 , 0.5 mol L−-1 H2 SO4 . The proposed circuit consists of a constant phase element (CPE)
to account for the presence of non-idealities in the capacitance of
the double layer in parallel with two faradaic resistances; the first
To fit the experimental data in Figs. 5–7 the equivalent electrical resistance, RC , corresponds to the cathodic reduction of Fe3+ ions
circuit shown in Fig. 9 was used. This equivalent circuit was derived whereas the second one, RA , corresponds to the anodic dissolution
based on the following assumptions: of the electrode and is in series with a diffusion impedance element,
ZD , to account for solid state diffusion processes. To model the dif-
i) The only cathodic reaction occurring is the reduction of Fe3+ fusion processes in the system a CPE-restricted diffusion element
ions was selected. This element was proposed by Bisquert et al. [32,33]
ii) Mass transfer of Fe3+ or any other soluble species does not to model diffusion layers where hindrance to mass transport can
affect the dissolution rate of CuFeS2 under the experimental be present at the boundaries. The expression for ZD is given by Eq.
conditions used in this study 9 and the physical meaning of Y0 , ␻0 and K is discussed in further
paragraphs.
⎡   ⎤
n ω0 ωn ω0
(jω) + 0
coth
1 ⎢ jω K jω ⎥
ZD = ⎣ ωn   ⎦ (9)
Y0 ω00.5 jω n ω0
K
0
ω0 + (jω) coth jω

The fitted parameters obtained from the experimental data


shown in Figs. 5 and 6 are summarized in Table 1; fitted param-
eters from Fig. 7 are reported in Table 2. The comparison between
the discrete points and the continuous lines in Figs. 5–7 as well as
Fig. 9. Equivalent circuit used to fit experimental impedance spectra obtained with the low values of ␹2 indicate agreement between the model and
fresh and passivated CuFeS2 electrodes. the experiments.
O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19 13

Table 2
Estimated parameters from the experimental results for the fresh and passivated CuFeS2 electrodes shown in Figs. 7 and 12 by fitting to equivalent circuit shown in Fig. 9.

Fresh CuFeS2 electrodes Passivated CuFeS2 electrodes

No FeS2 P1 P2 P3 No FeS2 P1 P2 P3

R ,  cm2 17 18 17 17 41 38 38 39
Q, ␮F sn-1 cm−2 27.7 29.2 29.8 30.4 76.1 35.9 37.7 84.3
nCPE 0.86 0.85 0.85 0.85 0.75 0.83 0.83 0.73
RC ,  cm2 2148 943 642 432 6405 3885 3109 1065
RA ,  cm2 393 399 433 411 126 187 200 61
Y0 , mF s0.5 cm−2 5.4 6.8 6.8 6.1 1.4 2.22 2.2 1.3
␻0 , s−1 133 81 119 107 101 96 101 85
K 5.8 5.7 5.2 7.0 179 237 277 238
nD 0.56 0.60 0.54 0.58 0.64 0.73 0.73 0.65
␹2 × 105 7.7 9.6 13.5 4.8 25.6 4.0 5.1 3.3
Error in |Z|, % 0.9 1.0 1.2 0.7 1.6 0.6 0.7 0.6

meaning is as follows. Y0 can be regarded as the inverse of a War-


3+
burg constant, ␴; ␻0 is a characteristic frequency that depends on
R , effect of Fe
C
RA , effect of Fe
3+ the chemical diffusion coefficient, D, and the thickness of the diffu-
10
4
R , effect of Fe2+ sion layer, L (Eq. 10). K is a dimensionless parameter associated with
C 2+
R , effect of Fe
A the CPE that is used to model the impedance at the film/electrolyte
interface. Values of K « 1 are indicative of a totally blocking bound-
ary while values of K » 1 correspond to a boundary where the excess
RC, RA/Ω cm2

concentration is immediately absorbed [33]. Finally, nD is the CPE


exponent used in ZD to model the boundary dividing the diffusion
layer and the electrolyte.
3
10
ω0 = D/L2 (10)

Previous studies by Biegler and Horne [40] and Ghahrema-


ninezhad et al. [26] have reported the presence of a thin film on
freshly prepared CuFeS2 electrodes. Therefore, the use of the diffu-
sion impedance model proposed by Bisquert et al. [32,33] seems to
2 be a more appropriate choice as opposed to the use of a Warburg
10 0
10 10
1
10
2 impedance.
The value of Y0 only increased 4% when Fe3+ concentration
[Fe2+], [Fe3+]/mmol L-1
decreased from 100 to 1 mmol L−1 and it can be considered to have
Fig. 10. Effect of Fe3+ and Fe2+ concentration on RC and RA . Circle and square markers remained constant. In regards to ␻0 no clear relation with the con-
correspond to the effect of Fe3+ while keeping Fe2+ concentration at 100 mmol L−1 . centration of Fe3+ species could be observed while the value of K
Diamond and inverted triangle markers correspond to the effect of Fe2+ while keep- decreased with decreasing Fe3+ concentration. This decrease sug-
ing Fe3+ concentration at 100 mmol L−1 . gests that the film/electrolyte interface becomes more blocking or
resistive to the transfer of cations from the film to the solution; this
The estimated values for the CPE exponent value, n, ranged from behavior could have been caused by the decrease of the concentra-
0.85 to 0.90 in all cases, indicating that this element corresponds to tion of electron acceptor species (Fe3+ ions) in the electrolyte and
a capacitor exhibiting frequency dispersion. Such dispersive behav- a consequent decrease on the cathodic current density. Since both
ior has been attributed to the distribution of physical properties the anodic and cathodic processes have to occur at the same rate
[34], surface disorder, roughness and inhomogeneities [35–38]. (Eq. 6) a decrease of the cathodic current should be accompanied
Table 1 shows a decrease in the value of the pre-exponential factor, by a decrease of the anodic dissolution of the electrode and, con-
Q, of the CPE as the concentration of Fe3+ and Fe2+ increased; this sequently, of the diffusion of cations within the film layer, hence
change was caused by a decrease in the dielectric constant of the explaining the decrease of K as Fe3+ concentration was decreased.
electrolyte in the double layer [20,39]. When Fe2+ concentration was decreased from 100 to
As Fe3+ concentration increased from 1 to 100 mmol L−1 RC 1 mmol L−1 , the values of Y0 decreased from 5.4 to 1.6 mF s0.5 cm−2 ,
decreased from 18.3 to 2.1 k cm2 . Increasing Fe2+ concentration indicating an increase in the resistance to the diffusion of cations
from 1 to 100 mmol L−1 only led to a decrease of RC from 4.1 to 2.1 within the thin layer on the surface of the electrode. In addition to
k cm2 . Fig. 10 shows an exponential decrease of RC with increas- this, both the values of ␻0 and K also decreased with decreasing Fe2+
ing Fe3+ and a lower dependence on Fe2+ concentration. The effect concentration. Since Fe3+ concentration was kept constant for these
of Fe3+ concentration on RA was different than on RC and an increase experiments the explanation for this behavior should be different
from 153 to 393  cm2 was observed when Fe3+ concentration from the explanation given in the previous paragraph. The values of
was increased from 1 to 100 mmol L−1 ; however, as with RC , RA K indicate that the dissolution of ions within the film becomes more
also increased with decreasing Fe2+ concentration. The fact that resistive as Fe2+ concentration decreased; however, the decrease
RC decreased and RA increased with increasing Fe3+ concentration in the characteristic frequency suggests that the thickness of the
indicates that RC and RA corresponded to the reduction of Fe3+ ions diffusion film increased with decreasing Fe2+ concentration which
(Eq.2) and to the anodic dissolution of CuFeS2 (Eq. 1), respectively. results in a more positive solution potential. These three indicators
Although the primary objective of these experiments was to (decrease on Y0 , ␻0 and K) suggest that the thickness of the film
help with the assignment of physically-correct RC and RA it also increased with increasing the mixed potential of the electrode.
seems relevant to discuss the significance of the effect of Fe3+ and In order to calculate the numerical values of the thickness of the
Fe2+ concentrations on the parameters of the diffusion impedance film layer the value of the self-diffusion coefficients of Cu2+ and Fe2+
element used in the equivalent circuit shown in Fig. 9. The physical in CuFeS2 would be required to estimate the diffusion coefficient
14 O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19

0.45 RC , indicating that the main effect of FeS2 on the fresh CuFeS2
electrode was to decrease the charge transfer resistance for the
0.40 reduction of Fe3+ ions. On the other hand, RA changed only within
a small range with an average value of 409  cm2 and a relative
0.35
standard deviation of 4.3% suggesting that there was no effect of
0.30 FeS2 on the charge transfer resistance for the anodic dissolution of
the electrode. Q only increased 10% when the largest FeS2 particle
(P3, 1.37 cm2 ) was contacted with the fresh CuFeS2 electrode while
ω -0.5/s 0.5

0.25
the value of n remained constant, indicating that the properties of
0

0.20 the double layer where almost unaffected by the presence of FeS2 .
As for the parameters related to the diffusion of cations in the
0.15
electrode, Y0 increased with the presence of FeS2 but did not seem
0.10 to keep a direct relation with the size of the particles evaluated;
the same can be said of K as it decreased with the particles P1 and
0.05 P2 but then increased when P3 was used in the experiment. The
characteristic frequency, ␻0 , also decreased when contacting the
0 FeS2 particles with the fresh CuFeS2 electrode; however, despite
300 350 400 450
OCP vs SCE/mV the changes in the value of ␻0 and regardless of the value of the
diffusion coefficient used in Eq. 9 the calculated values for the
Fig. 11. Effect of OCP on the characteristic frequency, ␻0 , for the fresh CuFeS2 elec- diffusion layer thickness, L, would only change within a small
trode.
range (relative standard deviation of 11%). This result is expected
as there does not seem to be a reason for which contacting the FeS2
to be used in Eq. 10. Different authors have reported the diffusion particles with the electrode would affect the values of ␻0 and L.
coefficient for chalcopyrite using different techniques [41,42], but Fig. 12 shows the effect of FeS2 on the passivated CuFeS2 elec-
differences in orders of magnitude were found when they were trode. The passivated electrodes showed a shift in the phase peaks
compared. However, from Eq. 10 it is recognized that the thickness towards lower frequencies compared to the fresh electrodes; in the
of the film layer, L, is proportional to ␻0 −0.5 , regardless of the value case of the first time constant the shift in the phase peak happened
of D. Fig. 11 shows a plot of ␻0 −0.5 against the measured OCP for from 120 Hz to about 10 Hz whereas for the lower frequency time
the different concentrations of Fe3+ and Fe2+ reported in Table 1. constant the shift in the peak phase was observed from 25 mHz
Results suggest that the thickness of the film is almost constant for to frequencies below 3 mHz. Otherwise, FeS2 had a similar effect
potentials lower than 394 mV vs SCE. Increasing the ratio Fe3+ :Fe2+ to that observed for the fresh CuFeS2 electrode in Fig. 7a where a
led to an increase in the mixed potential of the electrode and appar- decrease in the impedance modulus was observed, particularly at
ently also to an increase in the thickness of the film. It is important frequencies lower than 1 Hz. In addition to this, it is worth noticing
to consider that the model proposed by Bisquert et al. [32] is limited that the modulus of the impedance at 10 kHz increased from 17 to
in that it considers that the transport of species occurs only by 37  cm2 .
diffusion. Therefore, if there is a contribution of migration to the The equivalent circuit shown in Fig. 9 already considers the dif-
transport of cations within the film, the calculation of the thickness fusion of species within a film layer and therefore was also used to
of the diffusion layer would be affected. Thus these calculations model the experimental data shown in Fig. 12. The fitted parame-
should be accompanied by surface characterization techniques to ters have also been summarized in Table 2.
confirm their validity. Before discussing the effect of FeS2 on the passivated CuFeS2
The fitted parameters for the curves shown in Fig. 7 have been electrode it is worth commenting on the differences observed with
summarized in Table 2. The parameter that was most affected the fresh electrode. The first difference was observed in the value
when FeS2 particles contacted the fresh CuFeS2 electrode was of the ohmic resistance, R , which increased by a factor of 2.4 after

a) b) 60
No Pyrite
3
10 Pyrite 1
50 Pyrite 2
Pyrite 3
40
Phase angle/°
|Z|/Ω cm2

30
2
10
No Pyrite
Pyrite 1 20
Pyrite 2
Pyrite 3 10

1
10 -2 0 2 4
0 -2 0 2 4
10 10 10 10 10 10 10 10
Frequency/Hz Frequency/Hz

Fig. 12. Effect of FeS2 on the impedance spectra of a passivated CuFeS2 electrode. T = 25 ◦ C; 0.05 mol L−1 Fe2 (SO4 )3 , 0.1 mol L−1 FeSO4 , 0.5 mol L−1 H2 SO4 . a) Impedance
modulus and b) Phase angle.
O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19 15

18

16

14

12

Dissolved Cu/mg
10

0
0 20 40 60 80
Fig. 13. Variation of ohmic resistance during the passivating procedure. Time/h

Fig. 14. Extracted copper with time during the leaching of CuFeS2 . T = 25 ◦ C;
the passivating treatment. This apparent increase can be attributed 0.05 mol L−1 Fe2 (SO4 )3 , 0.1 mol L−1 FeSO4 , 0.5 mol L−1 H2 SO4 , 400 rpm.
to an increase of the transfer of electrons at the electrode/film
interface as a consequence of the chemical treatment to which
the electrode was exposed. Armstrong and Edmondson [43] pro- the film/solution interface is not as hindered as in the case of the
posed that the impedance of the electrode-film interface could be fresh electrode, which was an unexpected result and suggests that
described by a capacitor (Cf ) in parallel with two charge transfer the transport of cations is limited within the film but not at the
resistances, each associated with the transfer of electrons (Re ) and film/solution interface.
to the transfer of cations (RC2 ) from the electrode to the film. It is When FeS2 was placed in contact with the passivated electrode
usually assumed that the resistance to the transfer of electrons is the value of RC decreased by a factor of 6 indicating that FeS2 contin-
much lower than the resistance to the movement of cations (Re « ued to have a positive effect on the dissolution rate of the passivated
RC2 ) and that the capacitance associated with the film-electrode CuFeS2 electrode after it was passivated. The effect of FeS2 on RA
interface, Cf , is due to the space charge layer within the passive in the passivated electrode was different depending on the FeS2
film. Under these circumstances, the time constant associated with particle and no direct relationship between the area of the FeS2
the Re Cf circuit is larger than the frequencies analyzed in this work particles and the variation of RA could be observed. Given the val-
and could not be resolved (1/Re Cf » ␻) [44]. Therefore an appar- ues estimated for the fresh electrode in contact with the different
ent increase in the ohmic resistance (R ) would be expected in the FeS2 particles, it is very likely that FeS2 had no actual effect on the
presence of the passive film. To calculate the value of the charge value of RA in the case of the passivated electrode. Similarly, the
transfer resistance of electrons at the electrode/passive film inter- values of Y0 , ␻0 and nD did not seem to have been modified by the
face, an average value for R was taken from values reported in presence of FeS2 despite the variations observed. As for the val-
Table 2 (17  cm2 ) before the passivating treatment. This gave a ues of K, these increased with FeS2 particles being contacted with
value of 24  cm2 for Re which was nearly constant in the presence the passivated electrode although, once again, no relation could be
of different FeS2 particles. observed between this parameter and the size of the FeS2 particles
The effect of the passive film can also be observed in Fig. 13 evaluated.
where the values of R have been plotted against the time dur-
ing which the electrode was immersed in solution at 50 ◦ C for the
passivating treatment. During the first 7 h of the experiment, R 3.4. Leaching of CuFeS2
reached a minimum value and thereafter kept increasing almost
linearly with time up to 94 h when the experiment was stopped. A Fig. 14 shows the Cu extraction curve for the dissolution of
possible explanation for this is that the film originally present on CuFeS2 . Since the leaching rate seemed to have decreased with time
the surface of the electrode dissolves or changes in nature with a the dissolution rate was calculated based on the first four hours of
consequent decrease on the resistance to the transfer of electrons the experiment. This time interval is most in agreement with the
from the electrode to the film; thereafter a different film is formed rates calculated by the EIS experiments as they lasted less than
on the surface of the electrode with a consequent increase on the one hour each. The calculated value for the dissolution rate was
resistance to the transfer of electrons and on the apparent ohmic 928 ␮gCu h−1 g−1 which, based on the stoichiometry given in Eq. 1,
resistance, R . corresponds to a current density of 8.2 ␮A cm−2 .
Results in Table 2 also show that in the absence of FeS2 , RC
increased by a factor of 3 after the passivating treatment whereas
the anodic charge transfer resistance, RA , actually decreased by 4. Discussion
a factor of 3.1. The parameters Y0 , K and ␻0 were also affected;
Y0 and ␻0 decreased while K increased by a factor of 31, being According to the equivalent circuits shown in Fig. 9, the anodic
the most affected parameter after the passivating treatment. The dissolution of CuFeS2 occurs in series with a diffusion process asso-
change observed in Y0 indicates an increase in the resistance to the ciated with the migration of Cu2+ and Fe2+ cations [45] from the
diffusion of cations within the film. The substantial increase of K solid to the solution in the case of fresh electrodes or through a
indicates that despite the increase in Y0 , the transfer of species at metal deficient film in the case of the passivated electrodes [20,45].
16 O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19

Table 3
Calculated dissolution current densities at different experimental conditions. Fresh electrode
60
3+
[Fe ], mmol L −1 2+
[Fe ] mmol L −1
Electrode FeS2 jdissol , ␮A cm−2 Pass ivated electrode
condition
50
1 100 Fresh No 1.4
jdissol = 34.8APy + 13.3
10 100 Fresh No 3.4
100 100 Fresh No 12.0

jdissol/μA cm-2
40
100 1 Fresh No 6.2
100 10 Fresh No 7.6
100 100 Fresh P1 27.2 30
100 100 Fresh P2 40.0
100 100 Fresh P3 59.5
100 100 Passivated No 4.0 20
100 100 Passivated P1 6.6
100 100 Passivated P2 8.3
100 100 Passivated P3 24.1
10
jdissol = 15.0APy + 1.52

The dissolution current density of CuFeS2 at mixed potential con- 0


ditions is given by Eq. 11 (see also Eqs.5–7): 0 0.5 1 1.5
FeS2 surface area/cm2
jdissol (EM ) = jA = −jFe3+ (11)
Fig. 15. Effect of FeS2 surface on the dissolution current density of the fresh
where jdissol is the dissolution current density of the CuFeS2 elec- and passivated CuFeS2 electrodes. T = 25 ◦ C; 0.5 mol L−1 H2 SO4 , 0.1 mol L−1 FeSO4 ,
trode, jA the anodic dissolution of the electrode and jFe3+ , the Fe3+ 0.05 mol L−1 Fe2 (SO4 )3 .
ion reduction current density. Hence, by knowing jFe3+ or jA the
dissolution rate of the electrode can be determined. The anodic
dissolution rate of the passivated electrode decreased by a factor of
dissolution of CuFeS2 , jA , occurs in series with a diffusion process
3 in the absence of FeS2 , the effect of FeS2 on the dissolution rate of
(Fig. 9), which depends on the frequency of analysis in the EIS
the passivated electrode continued after the chemical treatment.
experiment. On the other hand, as shown in Fig. 8, the transport of
Fig. 15 shows the dissolution current densities plotted against the
Fe3+ ions from the solution to the surface of the electrode does not
surface area of the FeS2 particles for both fresh and passivated elec-
affect the electrochemical dissolution of CuFeS2 , thereby allowing
trodes. In both systems a linear increase of the dissolution rate
the direct determination of the dissolution current density (jdissol )
was observed with increasing pyrite particle size. From the results
from the cathodic charge transfer resistance (RC ) via Eq. 12 [46].
shown in Table 3 and Fig. 15 the following observations are note-
The calculated dissolution current density values are summarized
worthy:
in Table 3.
RT i) The galvanic effect between FeS2 and CuFeS2 persisted after
jdissol (EM ) = −jFe3+ = (12)
nFRC the passivating treatment. This result suggests that the passive
Table 3 shows an increase in the rate of dissolution of CuFeS2 film has semiconducting properties as shown by Ghahrema-
with increasing Fe3+ concentration and increasing FeS2 surface ninezhad et al. [26] and does not prevent electron transfer
area. Values ranging from 1.4 to 12.0 ␮A cm−2 were observed in between both minerals.
the absence of FeS2 in the range of Fe3+ and Fe2+ concentrations ii) FeS2 was 2.6 and 9.9 times more active than fresh and passi-
analyzed in this work. The value calculated from the leaching exper- vated CuFeS2 electrodes, respectively, for the reduction of Fe3+
iment was 8.2 ␮A cm−2 and is in very close agreement with the ions.
value obtained from EIS experiments (12.0 ␮A cm−2 ); therefore, iii) There was a change in the slope of the fitted curves in Fig. 15.
the results shown in Table 3 can be considered as representative A decrease in the dissolution rate of CuFeS2 was expected in
of the dissolution rate of the electrode under different experimen- the absence of FeS2 , however FeS2 particles were not subjected
tal conditions. Nevertheless we consider that a more systematic to any chemical treatment and the same rate would have been
study wherein a determination of the conditions under which the expected (34.8 ␮A cm−2 Py ) even after the CuFeS2 electrode was
use of electrochemical techniques is valid for the measurement of passivated, given that the galvanic effect between the two min-
dissolution rates should be conducted. erals remained. This apparent decrease in the activity of FeS2
In the presence of FeS2 a dissolution current density of for the reduction of Fe3+ suggests a change in the rate deter-
59.5 ␮A cm−2 was obtained for the particle P3, with an area of 1.37 mining step in the dissolution of CuFeS2 once the passive film
cm2 . This value represents an increase by a factor of 5 in compar- is formed.
ison to the value obtained in the absence of FeS2 . Majuste et al.
[30] obtained a value of 8.0 ␮A cm−2 with a CuFeS2 electrode when Fig. 16 shows the effect of Fe3+ and Fe2+ concentrations on the
Fe3+ concentration was 0.01 mol L−1 in a 0.1 mol L−1 H2 SO4 aque- dissolution current density of CuFeS2 . This logarithmic plot shows
ous solution; this value matches well with the value obtained in a linear increase of the dissolution current density with increas-
this work under similar conditions (0.5 mol L−1 H2 SO4 , 0.01 mol L−1 ing Fe3+ concentration; the linear fit gave an exponent of 0.46 for
Fe3+ and 0.1 mol L−1 Fe2+ ); these authors also reported an increase the dependence of the dissolution current density on the concen-
by a factor of 2.2 for a CuFeS2 electrode containing 42% FeS2 present tration of Fe3+ . The slope of the experimental points where Fe2+
as inclusions in the surface of the electrode. You et al. [31] reported concentration was varied gave an exponent of 0.14, indicating a
a value of 5 ␮A cm−2 for a CuFeS2 electrode in contact with FeS2 in weaker dependence of the dissolution rate on the concentration of
a 0.01 mol L−1 Fe3+ and pH = 3.8 solution whereas Abraitis et al. [47] Fe2+ . As it was previously mentioned, in order to get a more accu-
reported values of 0.5 and 9.0 ␮A cm−2 in the absence and presence rate kinetic expression more experimental points are required; the
of FeS2 , respectively, in a pH = 2.5 HCl solution. equations presented in Fig. 16 are limited, yet they provide valuable
The effect of the chemical passivation treatment on the dissolu- information. The dissolution kinetics of different metal sulfides can
tion current density can also be observed in Table 3. Although the be represented by Butler-Volmer type rate equations [30,48,49]. To
O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19 17

Effect of Fe3+
Effect of Fe2+
1
10 jdissol = 15.9[Fe2+]0.14
jdissol/μA cm-2

jdissol = 32.3[Fe3+]0.46

0
10 0 1 2
Fig. 17. Resistance to the diffusion of cations within the passive film in fresh and
passivated CuFeS2 electrodes in contact with different FeS2 particles.
10 10 10
[Fe ],[Fe2+]/mmol L-1
3+

Fig. 16. Effect of Fe3+ and Fe2+ concentration on the dissolution current density of
work would be required to obtain a more detailed rate expression
the fresh CuFeS2 electrode. Black circle markers correspond to the effect of Fe3+ to account for other factors such as pH and temperature.
while keeping Fe2+ concentration at 100 mmol L−1 . Blue square markers correspond Figs. 15 and 16 show that the dissolution of CuFeS2 was strongly
to the effect of Fe2+ while keeping Fe3+ concentration at 100 mmol L−1 . affected by the concentration of Fe3+ and by the presence of FeS2 .
This suggests that in the case of fresh electrodes the rate controlling
reaction is the reduction of Fe3+ ions and not the anodic dissolution
derive a simple kinetic expression of the dissolution current density
of chalcopyrite. If the limiting step in the dissolution of the fresh
using mixed potential theory Eq. 7 can be taken as starting point.
electrode was the transport of ions within the passive film a weaker
For simplicity, and to be able to derive an explicit expression, it will
or no dependence of the dissolution rate of CuFeS2 with respect to
be assumed that the charge transfer coefficient for the reduction of
Fe3+ concentration would have been observed. Following the same
Fe3+ ions and for both anodic reactions is the same and equal to 0.5.
reasoning it can also be said that even in the presence of FeS2 the
By solving for EM and substituting in the kinetic expression for the
dissolution of CuFeS2 is controlled by the reduction of Fe3+ ions.
reduction of Fe3+ ions, jFe3+ , Eq. 13 is obtained:
Therefore, before the passive film forms on the CuFeS2 surface, the
    12 diffusion rate of ions from the solid to the solution has to be large
kFe3+ Fe3+ compared to the reduction of Fe3+ ions.
jdissol = kCuFeS2   (13)
kCuFeS2 + kFe2+ Fe2+ These findings agree with previous studies by Nazari et al. [8],
who suggested that the slow charge transfer process in the reduc-
A comparison of the equations presented in Fig. 16 and Eq. tion of Fe3+ ions was the rate determining step in the dissolution
13 indicates agreement between the theoretical electrochemical of un-passivated CuFeS2 , while in the presence of FeS2 this rate
model and the experimentally fitted equations; the electrochemi- increased due to the availability of an additional reaction surface.
cal model predicts a reaction order of 0.5 while the fitted value was If the transport of electrons or ions from the solid to the solution
0.46. On the other hand, Eq. 13 predicts a reaction order of −0.5 was the slowest step in the dissolution of CuFeS2 no change in the
with respect to the concentration of Fe2+ but the fitted value was dissolution rate of CuFeS2 would be observed by increasing Fe3+
0.14; if the product kFe2+ [Fe2+ ] in Eq. 13 is smaller than kCuFeS2 then concentration or by contacting the electrode with the different FeS2
the expected exponent should be close to zero. This indicates that particles.
under the present experimental conditions the anodic dissolution A different scenario was observed for the experiments con-
of CuFeS2 occurs at higher rates than the oxidation of Fe2+ , and that ducted with the passivated electrode. For this system a decrease
the current densities reported in this work indeed correspond to in the dissolution current density (vs. the fresh electrodes) was
the dissolution of the electrode, which was further confirmed by observed both in the presence and absence of FeS2 ; an apparent
the leaching experiment. With these considerations a rate expres- increase in the ohmic resistance was also observed, which cor-
sion can be used to approximate the dissolution current density of responded to the resistance to the transport at the electrode/film
the CuFeS2 electrode: interface. To analyze the effect of the passivating treatment on the
 A   0.5
diffusion within the passive film a diffusion resistance was defined
jdissol ≈ 32.3 Fe3+ (14) in Eq. 15 [32,33]:
cm2  −1
RD = Y0 ω00.5 (15)
Expressions similar to Eq. 14 have been reported in the liter-
ature. In a recent review, Li et al. [11] reported reaction orders The calculated values for RD are presented in Fig. 17. Although no
for the dissolution of CuFeS2 with respect to Fe3+ ranging from clear effect of FeS2 could be observed for this parameter, it is clear
0.12–1.0 depending on the leaching media and temperature used that the passivating treatment increased the resistance to the dif-
by different authors. Although Eq. 14 describes the dissolution of fusion of cations within the passive film; in the experiments where
CuFeS2 appropriately for the conditions used in this work and in the FeS2 was absent the value of RD increased by a factor of 4.3. These
absence of FeS2 , it does possess limitations. For example, further results, and the apparent increase in the ohmic resistance, indicate
18 O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19

that after the passivating treatment the increase in the diffusion of On the contrary, the lower effect of FeS2 on the dissolution cur-
ions within the passive film and the increase in the resistance to rent density of the passivated CuFeS2 electrode suggested that the
electron transfer at the electrode/film interface are the causes for reduction of Fe3+ ions is not the rate controlling step on passi-
the decrease in the dissolution rate of the CuFeS2 electrode after the vated CuFeS2 . The increase in the resistances to the diffusion of
passivating treatment. On the other hand, according to the increase cations within the passive film and to the transfer of electrons at
in the values of K after the passivating treatment, it would seem that the electrode/film interface seems to be responsible for the low
the transfer of cations at the film/solution interface does not play a dissolution current densities observed after the passivating treat-
key role on the dissolution rate of the electrode. ment. Nonetheless, FeS2 still increased the dissolution rate of the
Ghahremaninezhad et al. [20] recently suggested that the reduc- passivated electrode by increasing the reduction of Fe3+ ions.
tion of Fe3+ ions on the surface of an electrochemically passivated
CuFeS2 electrode was fast and that the slow kinetics of this reaction Acknowledgements
was due to the slow diffusion of Fe atoms through the passive film.
The results shown in this work agree with their conclusions. The authors wish to acknowledge generous financial support
Finally, Nazari et al. [8] observed that in the presence of silver- from Xstrata Process Support, SNC Lavalin, and the Natural Sciences
modified FeS2 a small fraction of the silver dissolved and formed and Engineering Research Council of Canada (NSERC). We are also
silver sulfide in the passive film of CuFeS2 ; this increased the con- appreciative of the Electron Microbeam and X-Ray Diffraction Facil-
ductivity of the passive film and allowed the transfer of electrons ity in the Department of Earth, Ocean and Atmospheric Sciences at
from CuFeS2 to FeS2 thus avoiding passivation over several hours UBC for the technical support provided for the QXRD analysis. The
of leaching. In view of the recent findings it is possible that the authors also wish to acknowledge the reviewers for their valuable
presence of silver ions may also have enhanced the flux of cation comments and suggestions.
vacancies within the passive film. According to the point defect
model for passive films [50], an increase in the rate of diffusion References
of cations within the passive film could cause an accumulation of
cation vacancies at the electrode/film interface; depending on the [1] S. Wang, Copper leaching from chalcopyrite concentrates, JOM 57 (2005) 48.
relative rates of cation transfer at the electrode/film interface and [2] A.A. Baba, I.A. Kuranga, F.A. Adekola, M.K. Ghosh, O.S. Ayanda, R.B. Bale,
A.R. Sheik, S.R. Pradhan, A review on novel techniques for chalcopyrite ore
the rate of vacancy transport within the film, the excess vacancies processing, Int. J. Min. Eng. Miner. Process. 1 (2012) 1.
will condense and cause local detachment of the film. Once the [3] D. Dreisinger, Copper leaching from primary sulfides: Options for biological
vacancy condensate has grown to a critical size, the stress in the and chemical extraction of copper, Hydrometallurgy 83 (2006) 10.
[4] D.G. Dixon, A.F. Tshilombo, Leaching process for copper concentrates, US Patent
film will induce structural instability with the possible rupture of application publication US2005/0269208 A1 (2005).
the film and formation of a pit where rapid localized attack of the [5] D.G. Dixon, D.D. Mayne, K.G. Baxter, GalvanoxTM –A novel galvanically-assisted
mineral can occur. atmospheric leaching technology for copper concentrates, Can. Metall. Q. 47
(2008) 327.
Therefore, in addition to offering an additional surface for the [6] M. Eghbalnia, Electrochemical and Raman investigation of pyrite and chal-
reduction of Fe3+ ions it seems that FeS2 may also enhance the copyrite oxidation, The University of British Columbia, Vancouver, Canada,
dissolution of CuFeS2 by increasing the rate of diffusion of cations 2012.(Ph.D. Dissertation).
[7] G. Nazari, D.G. Dixon, D.B. Dreisinger, Enhancing the kinetics of chalcopyrite in
within the passive film and, under certain conditions, contribute to
the GalvanoxTM process, Hydrometallurgy 105 (2011) 251.
the detachment of this film from the CuFeS2 particles. This would be [8] G. Nazari, D.G. Dixon, D.B. Dreisinger, The mechanism of chalcopyrite leaching
consistent with the observations made by Nazari et al. [8] where no in the presence of silver-enhanced pyrite in the GalvanoxTM process, Hydro-
metallurgy 113-114 (2012) 122.
passive behavior was observed during the leaching of CuFeS2 in the
[9] C.A. Klauber, A critical review of the surface chemistry of acidic ferric sulphate
presence of silver-enhanced FeS2 , and would also help to explain dissolution of chalcopyrite with regards to hindered dissolution, Int. J. Miner.
the results reported by Rivera [27] who observed that the addi- Process. 86 (2008) 1.
tion of FeS2 to a copper concentrate after 24 h of leaching, that was [10] J. Li, N. Kawashima, K. Kaplun, V.J. Absolon, A.R. Gerson, Chalcopyrite leaching:
The rate controlling factors, Geochim. Cosmochim. Acta 74 (2010) 2881.
showing signs of passivation, resulted in an increase in the leaching [11] Y. Li, N. Kawashima, J. Li, A.P. Chandra, A.R. Gerson, A review of the structure,
rate with complete copper extraction after 19 h in the presence of and fundamental mechanisms and kinetics of the leaching of chalcopyrite, Adv,
FeS2 . Colloid Interface Sci. 197-198 (2013) 1.
[12] E.M. Córdoba, J.A. Muñoz, M.L. Blázquez, F. González, A. Ballester, Leaching of
chalcopyrite with ferric ion: General aspects, Hydrometallurgy 93 (2008) 81.
[13] H. Kametani, A. Aoki, Effect of suspension potential on the oxidation rate of
5. Conclusions copper concentrate in a sulfuric acid solution, Metall. Trans. B 16B (1985) 695.
[14] J.E. Dutrizac, R.J.C. MacDonald, T.R. Ingraham, T.R., The kinetics of dissolution of
synthetic chalcopyrite in aqueous acidic ferric sulfate solutions, Trans. Metall.
In this work the electrochemical dissolution of fresh and passi- Soc. AIME 245 (1969) 955.
vated CuFeS2 electrodes has been studied. The rate of dissolution [15] T. Hirato, H. Majima, Y. Awakura, The leaching of chalcopyrite with ferric sul-
fate, Metall. Trans. B 18B (1987) 489.
of the fresh electrode increased with Fe3+ concentration and with
[16] K.G. Ashurst, R.D. Hancock, National Institute for Metallurgy, Report 1820 and
FeS2 but decreased by a factor of 3 after the passivating treatment. 1914, Randburg (1977).
On the other hand, dissolution rates of fresh and passivated elec- [17] F.K. Crundwell, Kinetics and mechanism of the oxidative dissolution of a zinc
sulphide concentrate in ferric sulphate solutions, Hydrometallurgy 19 (1987)
trodes increased by factors of up to 5 and 6, respectively, when a
227.
FeS2 particle (1.37 cm2 ) was contacted with the CuFeS2 electrode. [18] H.G. Linge, A study of chalcopyrite dissolution in acidic ferric nitrate by poten-
The catalytic effect of FeS2 continued after the passivating treat- tiometric titration, Hydrometallurgy 2 (1976) 51.
ment of the electrode indicating that the passive film allows the [19] J. Dutrizac, The dissolution of chalcopyrite in ferric sulfate and ferric chloride
media, Metall. Mater. Trans. B 12 (1981) 371.
transport of electrons between the passivated electrode and the [20] A. Ghahremaninezhad, D.G. Dixon, E. Asselin, Kinetics of the ferric-ferrous
FeS2 particles. couple on anodically passivated chalcopyrite (CuFeS2 ) electrodes, Hydro-
The anodic dissolution parameters RA and those associated to ZD metallurgy 125-126 (2012) 42.
[21] T.S. Qiu, G.H. Nie, J.F. Wang, L.F. Cui, Kinetic process of oxidative leaching of chal-
were almost unaffected neither by Fe3+ concentration nor with con- copyrite under low oxygen pressure and low temperature, Trans. Nonferrous
tact with FeS2 , while RC changed considerably with those variables Met. Soc. China 17 (2007) 418.
as well as with the passivation treatment. These results indicated [22] E.M. Córdoba, J.A. Muñoz, M.L. Blázquez, F. González, A. Ballester, Comparative
kinetic study of the silver-catalyzed chalcopyrite leaching at 35 and 68 ◦ C, Int.
that the rate determining step in the electrochemical dissolution of J. Miner. Process. 92 (2009) 137.
a fresh CuFeS2 electrode is the reduction of Fe3+ ions, even in the [23] M.C. Ruiz, K.S. Montes, R. Padilla, Chalcopyrite leaching in sulfate-chloride
presence of FeS2 . media at ambient pressure, Hydrometallurgy 109 (2011) 37.
O.G. Olvera et al. / Electrochimica Acta 127 (2014) 7–19 19

[24] R.P. Hackl, D.P. Dreisinger, E. Peters, J.A. King, Passivation of chalcopyrite during [37] C.H. Kim, S.I. Pyun, J.H. Kim, An investigation of the capacitance dispersion on
oxidative leaching in sulfate media, Hydrometallurgy 39 (1995) 25. the fractal carbon electrode with edge and basal orientations, Electrochim. Acta
[25] Y.L. Mikhlin, Y.V. Tomashevich, I.P. Asanov, A.V. Okotrub, V.A. Varnek, D.V. Vya- 48 (2003) 3455.
likh, Spectroscopic and electrochemical characterization of the surface layers [38] P. Cordoba-Torres, T.J. Mesquita, O. Devos, B. Tribollet, V. Roche, R.P. Nogueira,
of chalcopyrite (CuFeS2 ) reacted in acidic solutions, Appl. Surf. Sci. 225 (2004) On the intrinsic coupling between constant-phase element parameters ˛ and Q
395. in electrochemical impedance spectroscopy, Electrochim. Acta 72 (2012) 172.
[26] A. Ghahremaninezhad, D.G. Dixon, E. Asselin, Electrochemical evaluation of the [39] A. Levy, D. Andelman, H. Orland, Dielectric constant of ionic solutions: a field-
surface of chalcopyrite during dissolution in sulfuric acid solution, Electrochim. theory approach, Phys. Rev. Lett. 108 (2012) 227801.
Acta 55 (2010) 5041. [40] T. Biegler, M.D. Horne, The electrochemistry of surface oxidation of chalcopy-
[27] B.F. Rivera Vasquez, Electrochemical and leaching studies of enargite and chal- rite, J. Electrochem. Soc. 132 (1985) 1363.
copyrite, The University of British Columbia, Vancouver, Canada, 2010,.(PhD [41] R. Berger, R.V. Bucur, Potentiometric measurements of copper diffusion in poly-
dissertation). crystalline chalcocite, chalcopyrite and bornite, Solid State Ionics 89 (1996)
[28] I.G. Ghanad, Atmospheric leaching of enargite in iron sulfate solutions catalyzed 269.
by activated carbon, The University of British Columbia, Vancouver, Canada, [42] D. Pugaev, M. Nicol, G. Senanayake, The mechanisms of the passivation of sul-
2011 (M. Sc. Dissertation). fide minerals in oxidative leaching processes, The Southern African Institute of
[29] A.P. Mehta, L.E. Murr, Fundamental studies of the contribution of galvanic inter- Mining and Metallurgy, 6th Southern African Base Metals Conference, 2011, p.
action to acid-bacterial leaching of mixed metal sulfides, Hydrometallurgy 9 38-48.
(1983) 235. [43] R.D. Armstrong, K. Edmonson, The impedance of metals in the passive and
[30] D. Majuste, V.S.T. Ciminelli, K. Osseo-Asare, M.S.S. Dantas, Quantitative assess- transpassive regions, Electrochim. Acta 18 (1973) 937.
ment of the effect of pyrite inclusions on chalcopyrite electrochemistry under [44] D.D. McDonald, M.C.H. McKubre, Impedance spectroscopy theory, experiment
oxidizing conditions, Hydrometallurgy 113–114 (2012) 167. and applications, Edited by Barsoukov, E. and MacDonald, J. Ross. 2nd ed. John
[31] Q.Y. You, L. Heping, Z. Li, Study of the galvanic interactions between pyrite and Wiley and Sons, 2005.
chalcopyrite in a flowing system: implications for the environment, Environ. [45] A.J. Parker, R.L. Paul, G.P. Power, Electrochemistry of the oxidative leaching of
Geol. 52 (2007) 11. copper from chalcopyrite, J. Electroanal. Chem. 118 (1981) 305.
[32] J. Bisquert, G. Garcia-Belmonte, P. Bueno, E. Longo, L.O.S. Bulhoes, Impedance [46] A.J. Bard, L.R. Faulkner, Electrochemical methods: fundamentals and applica-
of constant phase element (CPE)-blocked diffusion in film electrodes, J. Elec- tions, 2nd ed., John Wiley and Sons, New York, 2001.
troanal. Chem. 452 (1998) 229. [47] P.K. Abraitis, R.A.D. Patrick, G.H. Kelsall, D.J. Vaughan, Acid leaching and dissolu-
[33] J. Bisquert, G. Garcia-Belmonte, F. Fabregat-Santiago, P.R. Bueno, Theoretical tion of major sulphide ore minerals: processes and galvanic effects in complex
models for ac impedance of finite diffusion layers exhibiting low frequency systems, Mineral. Mag. 68 (2004) 343.
dispersion, J. Electroanal. Chem. 475 (1999) 152. [48] P.R. Holmes, F.K. Crundwell, The kinetics of the oxidation of pyrite by ferric ions
[34] B. Hirschorn, M.E. Orazem, B. Tribollet, V. Vivier, I. Frateur, M. Musiani, and dissolved oxygen: An electrochemical study, Geochim. Cosmochim. Acta
Constant-phase-element behavior caused by resistivity distributions in films I. 64 (2000) 263.
Theory, J. Electrochem. Soc. 157 (2010) C452. [49] O.G. Olvera, D.G. Dixon, E. Asselin, Electrochemical study of the dissolution
[35] B. Sapoval, Linear and non-linear behavior of fractal and irregular electrodes, of enargite (Cu3 AsS4 ) in contact with activated carbon, Electrochim. Acta 107
Solid State Ionics 75 (1995) 269. (2013) 525.
[36] Z. Kerner, T. Pajkossy, Impedance of rough capacitive electrodes: the role of [50] D.D. Macdonald, The history of the Point Defect Model for the passive state: A
surface disorder, J. Electroanal. Chem. 448 (1998) 139. brief review of film growth aspects, Electrochim. Acta 56 (2011) 1761.

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