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8/22/2021 CN112582502A - Preparation method of antifouling antireflection layer for solar photovoltaic panel - Google Patents

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Preparation method of antifouling antireflection layer for solar photovoltaic panel

Abstract
CN112582502A
The invention relates to the technical field of solar photovoltaic panels, in particular to a method for
China
preparing an antifouling antireflection layer for a solar photovoltaic panel, which comprises the
following steps: uniformly mixing the silicon dioxide sol and sodium chloride, ultrasonically spraying
the mixture on the surface of the photovoltaic glass to form a coating, carrying out coating curing Download PDF
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and toughening heat treatment, washing, spraying sodium hydroxide on the antireflection layer, then
spraying fluororesin powder coating, and curing to obtain the coating. The invention solves the Other languages: Chinese
problem that the photovoltaic glass antireflection coating in the prior art is easy to adsorb stains to
Inventor: 曾军堂, 陈庆, 张俊, 司文彬
influence light transmission. According to the invention, the anti-reflection layer with micropores is
obtained on the surface of the photovoltaic glass, and then the fluorine-containing resin powder Current Assignee
: Chengdu New Keli Chemical Science Co Ltd
coating is sprayed on the anti-reflection layer, so that the anti-fouling anti-reflection coating is
obtained. The process is simple and suitable for mass production; in addition, when the light
Worldwide applications
transmittance of the photovoltaic glass is improved, the photovoltaic glass has stain resistance, and
the continuous power generation efficiency of the photovoltaic power station is improved. 2020

CN

Classifications Application CN202011498274.XA events

2020-12-17 Application filed by Chengdu New Keli Chemical



H01L31/18
Processes or apparatus specially adapted for the manufacture or treatment of Science Co Ltd
these devices or of parts thereof
2020-12-17 Priority to CN202011498274.XA
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2021-03-30 Publication of CN112582502A

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Claims (10) Hide Dependent

1. A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing to obtain silica sol, and uniformly mixing the silica sol and sodium chloride
to obtain a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of the photovoltaic glass to form a coating, solidifying the photovoltaic glass and the coating, then carrying out
toughening heat treatment, and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer to obtain the photovoltaic glass with the micro-film for later use;

and step four, spraying a fluorine-containing resin powder coating on the micro-film, and curing to obtain the antifouling antireflection layer.

2. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps: in
the first step, 50-100 parts of tetraethyl orthosilicate, 1-5 parts of ammonia water, 5-30 parts of ethanol, 100-200 parts of water and 10-15 parts of sodium chloride are
sequentially used.

3. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps: in
the first step, the heating hydrolysis temperature is 70-80 ℃, and the stirring speed of the heating hydrolysis is 100-150 rpm.

4. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps: in
the second step, the curing temperature is 120-180 ℃, and the curing time is 1-2 h; the temperature of the toughening heat treatment is 600-750 ℃, and the treatment
time is 1-5 min.

5. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps:
the thickness of the coating formed by the liquid coating in the second step is 300-500 μm.

6. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps: in
the second step, the curing temperature is 150 ℃, and the curing time is 1-2 h; the temperature of the tempering heat treatment is 650-700 ℃, and the treatment time is
2-3 min.

7. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following
steps:the spraying amount of the sodium hydroxide in the step three is 5-10g/m2。

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8/22/2021 CN112582502A - Preparation method of antifouling antireflection layer for solar photovoltaic panel - Google Patents
8. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps:
the curing process in the fourth step is as follows: curing at 130-180 ℃ for 30-60 min, and continuously heating to 180-220 ℃ for curing for 5-20 min.

9. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps:
the thickness of the coating formed by the fluorine-containing resin powder coating in the step four is 10-30 mu m.

10. The method for preparing the antifouling antireflection layer for the solar photovoltaic panel according to claim 1, wherein the method comprises the following steps:
in the fourth step, the fluorine-containing resin powder coating comprises the following components in parts by weight: 3-8 parts of FEVE fluorocarbon resin, 45-55 parts
of epoxy resin, 1-5 parts of dicyandiamide and 3-8 parts of mica powder.
Description

Preparation method of antifouling antireflection layer for solar photovoltaic panel

Technical Field

The invention relates to the technical field of solar photovoltaic panels, in particular to a preparation method of an antifouling antireflection layer for a solar photovoltaic
panel.

Background

The photovoltaic cell is a solar cell, and the photovoltaic power generation is power generation by using the solar cell. Photovoltaic power generation is receiving
worldwide attention, and photovoltaic technology has been widely applied to solar cells. The solar photovoltaic glass is a special glass which is laminated into a solar
cell, can generate electricity by utilizing solar radiation and is provided with a relevant current leading-out device and a cable. The solar cell is sealed between a piece of
low-iron glass and a piece of back glass through the film, and is the most novel high-tech glass product for buildings. The low-iron glass is covered on the solar cell, so
that high solar light transmittance can be ensured, and the low-iron glass subjected to toughening treatment also has stronger wind pressure resistance and the
capability of bearing great day and night temperature difference change.

At present, the solar cell is usually installed in outdoor conditions, although the glass substrate on the surface of the solar cell can play roles of dust prevention, moisture
prevention and external impact avoidance, pollutants accumulated on the glass substrate can easily absorb sunlight and enable the sunlight to be scattered, and the
refractive index between atmosphere and the glass substrate is mismatched, so that a large amount of reflection and refraction can be generated when incident light
reaches the surface of the solar cell, and the photoelectric conversion rate of the solar cell is further reduced.

In recent years, the loading capacity of photovoltaic power stations is increased year by year, and the service life and the efficiency of photovoltaic panels become
bottlenecks which restrict the application. Besides the problem of low conversion rate of the material, the photovoltaic efficiency is also very important to be improved in
the photovoltaic plate material. Crystalline silicon requires photovoltaic glass encapsulation protection because crystalline silicon cannot be exposed to air for long
periods of time. Because the photovoltaic glass has strong reflection, the light transmittance is low, and the photovoltaic performance is affected.

With the continuous optimization of solar cell photovoltaic modules, the conversion efficiency of crystalline silicon cells in the solar cell photovoltaic modules
approaches the limit value, and it becomes very difficult to improve the actual output power of the photovoltaic modules by continuously improving the efficiency of the
cells, but the efficiency can be improved by other modes such as increasing the light intensity. At present, people generally adopt photovoltaic glass with low iron content
as packaging glass for a photovoltaic module of a solar cell, and the glass has high transmittance in a visible light wave band. However, due to the difference in refractive
index between photovoltaic glass and air, there is still about 8% reflection of visible light by photovoltaic glass. The transmittance of light can be effectively improved by
coating a layer of antireflection film on the surface of the photovoltaic glass, so that the output power of the photovoltaic module of the solar cell is improved.

The main production technology of the antireflection film for the photovoltaic glass comprises a chemical corrosion method and a magnetron sputtering method. U.S.
patent US4019884 discloses a technique of manufacturing an antireflection film on a glass surface by chemical etching by corning corporation in the united states, which
can reduce the reflectivity of the glass surface to 0.5%. In addition, U.S. Pat. No. 4,149,5026 discloses an optical antireflection film with 5% transmittance increase on
both sides of a photovoltaic glass by depositing a SiO2 thin film on a substrate and then forming holes by chemical etching to achieve antireflection. However, the
chemical etching method is complicated in process and high in cost, and uses hydrofluoric acid-based chemical agents which are liable to pollute the environment. The
anti-reflection film plated by the magnetron sputtering method has excellent performance and can realize a broad-spectrum anti-reflection effect, but the cost is relatively
expensive.

In addition, a layer of antireflection coating is coated on the surface of the photovoltaic glass to increase the light transmittance of the photovoltaic glass. The most
common technique is to form micropores in the coating. As disclosed in the prior art, by forming a silicon dioxide film, the refractive index of the film can be reduced by
increasing the porosity of the silicon dioxide film, so as to achieve the purpose of antireflection. The more pores of the antireflection film layer, the better the antireflection
effect. However, the coating is very easy to form larger open pores during heat treatment to influence the antireflection effect; meanwhile, the hardness and adhesion of
the coating film are reduced by heat treatment. In addition, the microporous coating formed on the surface of the photovoltaic glass is easy to absorb water and attach
stains, and the light transmittance of the photovoltaic glass is influenced. Although the use of self-cleaning materials has been disclosed for use in the photovoltaic
industry, they are susceptible to corrosion delamination and poor pore retention and emission reduction.

Disclosure of Invention

In view of the above disadvantages of the prior art, the present invention aims to provide a method for preparing an anti-fouling antireflection layer for a solar
photovoltaic panel, which is used to solve the problem that the antireflection coating of photovoltaic glass in the prior art is easy to adsorb stains and affects light
transmission. According to the invention, the anti-reflection layer with micropores is obtained on the surface of the photovoltaic glass, and then the fluorine-containing
resin powder coating is sprayed on the anti-reflection layer, so that the anti-fouling anti-reflection coating is obtained. The process is simple and suitable for mass
production; in addition, when the light transmittance of the photovoltaic glass is improved, the photovoltaic glass has stain resistance, and the continuous power
generation efficiency of the photovoltaic power station is improved.

In order to attain the above and other related objects,

the preparation method of the antifouling antireflection layer for the solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing to obtain silica sol, and uniformly mixing the silica sol and sodium
chloride to obtain a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of the photovoltaic glass to form a coating, solidifying the photovoltaic glass and the coating, then carrying out
toughening heat treatment, and washing to obtain the photovoltaic glass with the antireflection layer for later use;

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8/22/2021 CN112582502A - Preparation method of antifouling antireflection layer for solar photovoltaic panel - Google Patents
thirdly, spraying sodium hydroxide on the antireflection layer to obtain the photovoltaic glass with the micro-film for later use;

and step four, spraying a fluorine-containing resin powder coating on the micro-film, and curing to obtain the antifouling antireflection layer.

According to the preparation method, tetraethyl orthosilicate, ammonia water, ethanol and water are mixed and then heated and hydrolyzed to obtain silicon dioxide sol,
sodium chloride is added into the silicon dioxide sol to form a coating by spraying, an antireflection layer is formed by curing and toughening heat treatment (the silicon
dioxide is firmly attached to photovoltaic glass to form the antireflection layer by curing and toughening heat treatment), then sodium chloride in the antireflection layer is
removed by washing (the sodium chloride in the antireflection layer is removed to form the antireflection layer with micropores), and the formed antireflection layer has
uniform micropores. And spraying sodium hydroxide on the surface of the antireflection layer, so that the sodium hydroxide reacts with silicon dioxide in the antireflection
layer, and the antireflection layer is slightly soluble to form a micro-film. And finally, spraying the fluorine-containing resin powder coating on the micro-film to obtain the
anti-fouling and anti-reflection coating. The process is simple and suitable for mass production; in addition, when the light transmittance of the photovoltaic glass is
improved, the photovoltaic glass has stain resistance, and the continuous power generation efficiency of the photovoltaic power station is improved.

In an embodiment of the invention, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 50-100 parts, 1-5
parts, 5-30 parts, 100-200 parts and 10-15 parts in sequence.

And step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating, stirring the solution while heating, and promoting the hydrolysis of tetraethyl
orthosilicate to form silica sol. The sodium chloride is added into the silica sol, so that uniform micropores can be formed in the later period conveniently, the formation
process of the micropores is simple, and mass production is facilitated.

In an embodiment of the present invention, the temperature of the heating hydrolysis in the first step is 70 to 80 ℃, and the stirring speed of the heating hydrolysis is 100
to 150 rpm.

And in the second step, the curing temperature is 120-180 ℃, and the curing time is 1-2 h.

And in the second step, the temperature of the toughening heat treatment is 600-750 ℃, and the treatment time is 1-5 min.

And step two, treating a coating formed by the liquid coating, namely firstly carrying out curing treatment in an oven, and then putting the oven into a muffle furnace for
toughening heat treatment, so that the silicon dioxide is firmly attached to the photovoltaic glass to form an antireflection layer. And then washing the antireflection layer
with water, wherein sodium chloride is easily dissolved in water, and removing the sodium chloride in the antireflection layer with water to obtain the antireflection layer
with uniform micropores.

And step two, ultrasonic spraying is adopted, wherein the ultrasonic spraying is carried out by using an ultrasonic spraying machine, the liquid coating (the mixture of the
silica sol and the sodium chloride) is atomized into fine particles by an ultrasonic atomization device, and then the fine particles are uniformly coated on the surface of
the photovoltaic glass by a certain amount of carrier gas to form a coating.

In an embodiment of the invention, the thickness of the coating formed by the liquid coating in the second step is 300 to 500 μm.

In an embodiment of the invention, the curing temperature in the second step is 150 ℃, and the curing time is 1-2 hours.

And in the second step, the temperature of the toughening heat treatment is 650-700 ℃, and the treatment time is 2-3 min.

In one embodiment of the present invention, the spraying amount of the sodium hydroxide in the third step is 5-10g/m2。

In the third step, the sodium hydroxide is sprayed on the surface of the antireflection layer to form the micro-film, because the sodium hydroxide reacts with the silicon
dioxide in the antireflection layer to make the antireflection layer slightly soluble to form the micro-film, the fluorine-containing resin powder coating can be conveniently
and uniformly adhered to the antireflection layer. In addition, only a small amount of sodium hydroxide can be sprayed in the third step so as to avoid damaging the
antireflection layer.

The curing process in the fourth step comprises the following steps: curing at 130-180 ℃ for 30-60 min, and continuously heating to 180-220 ℃ for curing for 5-20 min.

The thickness of the coating formed by the four-fluorine resin powder coating in the step is 10-30 mu m.

In an embodiment of the present invention, the fluorine-containing resin powder coating in step four includes the following components in parts by weight: 3-8 parts of
FEVE fluorocarbon resin, 45-55 parts of epoxy resin, 1-5 parts of dicyandiamide and 3-8 parts of mica powder.

As described above, the method for preparing the antifouling antireflection layer for the solar photovoltaic panel has the following beneficial effects: according to the
preparation method, tetraethyl orthosilicate, ammonia water, ethanol and water are mixed and then heated and hydrolyzed to obtain silicon dioxide sol, sodium chloride is
added into the silicon dioxide sol to form a coating by spraying, an antireflection layer is formed by curing and toughening heat treatment (the silicon dioxide is firmly
attached to photovoltaic glass to form the antireflection layer by curing and toughening heat treatment), then sodium chloride in the antireflection layer is removed by
washing (the sodium chloride in the antireflection layer is removed to form the antireflection layer with micropores), and the formed antireflection layer has uniform
micropores. And then the sodium hydroxide is sprayed on the surface of the antireflection layer, so that the sodium hydroxide reacts with silicon dioxide in the
antireflection layer, the antireflection layer is slightly soluble to form a micro-film, and the antireflection layer and the antifouling paint are convenient to adhere. And
finally, spraying the fluorine-containing resin powder coating on the micro-film to obtain the anti-fouling and anti-reflection coating. The process is simple and suitable for
mass production; in addition, when the light transmittance of the photovoltaic glass is improved, the photovoltaic glass has stain resistance, and the continuous power
generation efficiency of the photovoltaic power station is improved.

Drawings

Fig. 1 is a flow chart of a method for preparing an anti-fouling antireflection layer for a solar photovoltaic panel according to the present invention.

Detailed Description

The present invention will be described in further detail with reference to specific embodiments, but it should not be construed that the scope of the present invention is
limited to the following examples. Various substitutions and alterations can be made by those skilled in the art and by conventional means without departing from the
spirit of the method of the invention described above.

Example 1

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

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8/22/2021 CN112582502A - Preparation method of antifouling antireflection layer for solar photovoltaic panel - Google Patents
step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 70 ℃, the time is 5 hours, and the stirring speed
is 150 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a coating
(the thickness is 300 mu m), curing the photovoltaic glass and the coating (the temperature is 120 ℃ and the time is 2 h), then carrying out toughening heat treatment
(the temperature is 600 ℃ and the time is 5 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer, wherein the spraying amount of the sodium hydroxide is 5g/m2Obtaining photovoltaic glass with the micro-
film for later use;

and step four, spraying a fluorine-containing resin powder coating (the thickness of the coating is 10 microns) on the microfilm, curing for 60min at 130 ℃, and
continuously heating to 180 ℃ for curing for 20min to obtain the antifouling antireflection layer.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 50 parts, 1 part, 5 parts, 100 parts and 10
parts in sequence;

the fluorine-containing resin powder coating in the fourth step comprises the following components in parts by weight: 3 parts of FEVE fluorocarbon resin, 45 parts of
epoxy resin, 1 part of dicyandiamide and 3 parts of mica powder.

Example 2

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 80 ℃, the time is 2 hours, and the stirring speed
is 100 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

step two, ultrasonically spraying a liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a
coating (the thickness is 500 mu m), curing the photovoltaic glass and the coating (the temperature is 180 ℃ and the time is 1 h), then carrying out toughening heat
treatment (the temperature is 750 ℃ and the time is 2 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer, wherein the spraying amount of the sodium hydroxide is 6g/m2Obtaining photovoltaic glass with the micro-
film for later use;

and step four, spraying a fluorine-containing resin powder coating (the thickness of the coating is 20 microns) on the microfilm, curing for 30min at 180 ℃, and
continuously heating to 220 ℃ for curing for 5min to obtain the antifouling antireflection layer.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 100 parts, 5 parts, 30 parts, 200 parts and
15 parts in sequence;

the fluorine-containing resin powder coating in the fourth step comprises the following components in parts by weight: 8 parts of FEVE fluorocarbon resin, 55 parts of
epoxy resin, 5 parts of dicyandiamide and 8 parts of mica powder.

Example 3

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 75 ℃, the time is 3 hours, and the stirring speed
is 120 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

ultrasonically spraying a liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a coating (the
thickness is 400 mu m), curing the photovoltaic glass and the coating (the temperature is 150 ℃, the time is 1.5 h), then carrying out toughening heat treatment (the
temperature is 700 ℃, the time is 2 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer, wherein the spraying amount of the sodium hydroxide is 5g/m2Obtaining photovoltaic glass with the micro-
film for later use;

and step four, spraying a fluorine-containing resin powder coating (the thickness of the coating is 10 microns) on the microfilm, curing for 30min at 150 ℃, and
continuously heating to 200 ℃ for curing for 15min to obtain the antifouling antireflection layer.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 70 parts, 3 parts, 15 parts, 130 parts and
12 parts in sequence;

the fluorine-containing resin powder coating in the fourth step comprises the following components in parts by weight: 5 parts of FEVE fluorocarbon resin, 50 parts of
epoxy resin, 3 parts of dicyandiamide and 5 parts of mica powder.

Example 4

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 75 ℃, the time is 3 hours, and the stirring speed
is 120 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a coating
(the thickness is 400 mu m), curing the photovoltaic glass and the coating (the temperature is 150 ℃, the time is 1.5 h), then carrying out toughening heat treatment (the
temperature is 650 ℃, the time is 3 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer, wherein the spraying amount of the sodium hydroxide is 8g/m2Obtaining photovoltaic glass with the micro-
film for later use;

and step four, spraying a fluorine-containing resin powder coating (the thickness of the coating is 20 microns) on the microfilm, curing for 45min at 150 ℃, and
continuously heating to 200 ℃ for curing for 10min to obtain the antifouling antireflection layer.

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Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 80 parts, 4 parts, 25 parts, 150 parts and
13 parts in sequence;

the fluorine-containing resin powder coating in the fourth step comprises the following components in parts by weight: 5 parts of FEVE fluorocarbon resin, 50 parts of
epoxy resin, 3 parts of dicyandiamide and 5 parts of mica powder.

Example 5

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 75 ℃, the time is 3 hours, and the stirring speed
is 120 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a coating
(the thickness is 400 mu m), curing the photovoltaic glass and the coating (the temperature is 150 ℃, the time is 1.5 h), then carrying out toughening heat treatment (the
temperature is 680 ℃, the time is 3 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer, wherein the spraying amount of the sodium hydroxide is 10g/m2To obtainPhotovoltaic glass with a micro-
film is ready for use;

and step four, spraying a fluorine-containing resin powder coating (the thickness of the coating is 30 microns) on the microfilm, curing for 40min at 150 ℃, and
continuously heating to 200 ℃ for curing for 12min to obtain the antifouling antireflection layer.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 75 parts, 3 parts, 20 parts, 130 parts and
12 parts in sequence;

the fluorine-containing resin powder coating in the fourth step comprises the following components in parts by weight: the fluorine-containing resin powder coating in the
fourth step comprises the following components in parts by weight: 5 parts of FEVE fluorocarbon resin, 50 parts of epoxy resin, 3 parts of dicyandiamide and 5 parts of
mica powder.

Example 6

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 75 ℃, the time is 3 hours, and the stirring speed
is 130 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a coating
(the thickness is 400 mu m), curing the photovoltaic glass and the coating (the temperature is 150 ℃, the time is 1.5 h), then carrying out toughening heat treatment (the
temperature is 680 ℃, the time is 3 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer, wherein the spraying amount of the sodium hydroxide is 8g/m2Obtaining photovoltaic glass with the micro-
film for later use;

and step four, spraying a fluorine-containing resin powder coating (the thickness of the coating is 20 microns) on the microfilm, curing for 45min at 150 ℃, continuously
heating to 200 ℃, and curing for 15min to obtain the antifouling antireflection layer.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 75 parts, 2 parts, 20 parts, 140 parts and
13 parts in sequence;

the fluorine-containing resin powder coating in the fourth step comprises the following components in parts by weight: 5 parts of FEVE fluorocarbon resin, 50 parts of
epoxy resin, 3 parts of dicyandiamide and 5 parts of mica powder.

Comparative example 1

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 75 ℃, the time is 3 hours, and the stirring speed
is 130 rpm) to obtain silicon dioxide sol, and obtaining a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a coating
(the thickness is 400 mu m), curing the photovoltaic glass and the coating (the temperature is 150 ℃, the time is 1.5 h), then carrying out toughening heat treatment (the
temperature is 680 ℃, the time is 3 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

thirdly, spraying sodium hydroxide on the antireflection layer, wherein the spraying amount of the sodium hydroxide is 8g/m2Obtaining photovoltaic glass with the micro-
film for later use;

and step four, spraying a fluorine-containing resin powder coating (the coating thickness is 20 microns) on the microfilm, curing for 45min at 150 ℃, and continuously
heating to 200 ℃ for curing for 15min to obtain the micro-membrane.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol and water in the first step are 75 parts, 2 parts, 20 parts and 140 parts in sequence;

the fluorine-containing resin powder coating in the fourth step comprises the following components in parts by weight: 5 parts of FEVE fluorocarbon resin, 50 parts of
epoxy resin, 3 parts of dicyandiamide and 5 parts of mica powder.

Comparative example 1 in comparison with example 6, in comparative example 1, sodium chloride was not dissolved in the silica sol, and the silica sol was directly
ultrasonically sprayed on the surface of the photovoltaic glass as a liquid coating.

Comparative example 2

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

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step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 75 ℃, the time is 3 hours, and the stirring speed
is 130 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

and step two, ultrasonically spraying the liquid coating on the surface of photovoltaic glass (the solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to
form a coating (the thickness is 400 mu m), curing the photovoltaic glass and the coating (the temperature is 150 ℃, the time is 1.5 h), then carrying out toughening heat
treatment (the temperature is 680 ℃, the time is 3 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 75 parts, 2 parts, 20 parts, 140 parts and
13 parts in sequence.

Comparative example 2 in comparison with example 6, comparative example 2 did not spray-coat the fluororesin powder coating on the antireflection layer, and at the
same time, did not provide a microfilm.

Comparative example 3

A preparation method of an antifouling antireflection layer for a solar photovoltaic panel comprises the following steps:

step one, mixing tetraethyl orthosilicate, ammonia water, ethanol and water, heating and hydrolyzing (the temperature is 75 ℃, the time is 3 hours, and the stirring speed
is 130 rpm) to obtain silica sol, and uniformly mixing the silica sol and sodium chloride to obtain a liquid coating for later use;

ultrasonically spraying the liquid coating on the surface of photovoltaic glass (solar photovoltaic glass with the size of 300mm multiplied by 3.5 mm) to form a coating
(the thickness is 400 mu m), curing the photovoltaic glass and the coating (the temperature is 150 ℃, the time is 1.5 h), then carrying out toughening heat treatment (the
temperature is 680 ℃, the time is 3 min), and washing to obtain the photovoltaic glass with the antireflection layer for later use;

and thirdly, spraying a fluorine-containing resin powder coating (the coating thickness is 500 mu m) on the antireflection layer, curing for 45min at 150 ℃, and
continuously heating to 200 ℃ for curing for 15min to obtain the antifouling antireflection layer.

Specifically, the weight parts of tetraethyl orthosilicate, ammonia water, ethanol, water and sodium chloride in the step one are 75 parts, 2 parts, 20 parts, 140 parts and
13 parts in sequence;

the fluorine-containing resin powder coating in the third step comprises the following components in parts by weight: 5 parts of FEVE fluorocarbon resin, 50 parts of
epoxy resin, 3 parts of dicyandiamide and 5 parts of mica powder.

Comparative example 3 in comparison with example 6, comparative example 3 did not provide a microfilm, so the adhesion strength of the fluororesin-containing powder
coating to the antireflective layer was not sufficiently high.

The photovoltaic glasses with the antireflection layers prepared in examples 1 to 6 and comparative examples 1 to 3 were subjected to the following tests, and the test
results are shown in table 1. Testing the light transmittance of the photovoltaic glass sample by a photovoltaic light transmittance tester; and testing the water contact
angle of the photovoltaic glass sample by using a contact angle tester. The photovoltaic glass with the antireflection layer prepared in examples 1 to 6 and comparative
examples 1 to 3 was immersed in water for 60 days, and whether the coating on the surface fell off was observed.

Table form

As can be seen from table 1, the photovoltaic glasses with the antireflection layers prepared in examples 1 to 6 have very high light transmittance, water contact angles
of the photovoltaic glasses with the antireflection layers are significantly greater than 90 °, and the photovoltaic glasses with the antireflection layers prepared in
examples 1 to 6 have obvious hydrophobicity, and have excellent high-light transmittance super-hydrophobic antireflection functions.

Comparative example 1 in comparison with example 6, in comparative example 1, sodium chloride was not dissolved in the silica sol, and the silica sol was directly
ultrasonically sprayed on the surface of the photovoltaic glass as a liquid coating. Since no sodium chloride forms uniform micropores in the anti-reflective layer, its light
transmittance is significantly reduced.

Comparative example 2 in comparison with example 6, comparative example 2 did not spray-coat the fluororesin powder coating on the antireflection layer, and at the
same time, did not provide a microfilm. The photovoltaic glass with the antireflection layer prepared in comparative example 2 has a poor antifouling effect because the
hydrophobic antifouling layer is not provided and the water contact angle becomes small.

Comparative example 3 in comparison with example 6, comparative example 3 did not provide a microfilm, so the adhesion strength of the fluororesin-containing powder
coating to the antireflective layer was not sufficiently high. Because sodium hydroxide is not used, the fluorine-containing resin powder coating is firmly bonded with the
antireflection layer, and the fluorine-containing resin powder coating falls off or cracks after being soaked for a long time.

In conclusion, the anti-reflection coating with the antifouling and anti-reflection functions is obtained by obtaining the anti-reflection layer with the micropores on the
surface of the photovoltaic glass and then spraying the fluorine-containing resin powder coating on the anti-reflection layer. The process is simple and suitable for mass
production; in addition, when the light transmittance of the photovoltaic glass is improved, the photovoltaic glass has stain resistance, and the continuous power
generation efficiency of the photovoltaic power station is improved. Therefore, the invention effectively overcomes various defects in the prior art and has high industrial
utilization value.

The foregoing embodiments are merely illustrative of the principles and utilities of the present invention and are not intended to limit the invention. Any person skilled in
the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Accordingly, it is intended that all
equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be
covered by the claims of the present invention.

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Priority And Related Applications

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Application Priority date Filing date Title

CN202011498274.XA 2020-12-17 2020-12-17 Preparation method of antifouling antireflection layer for solar photovoltaic panel

Applications Claiming Priority (1)

Application Filing date Title

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Legal Events

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2021-03-30 PB01 Publication

2021-03-30 PB01 Publication

2021-04-16 SE01 Entry into force of request for substantive examination

2021-04-16 SE01 Entry into force of request for substantive examination

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Concepts

machine-extracted Download Filter table

Name Image Sections Count Query match


anti-fouling title,claims,abstract,description 44 0.000


preparation method title,claims,description 16 0.000


coating agent claims,abstract,description 119 0.000


coating method claims,abstract,description 119 0.000


glass claims,abstract,description 107 0.000


sodium hydroxide claims,abstract,description 81 0.000

HO- Na+


sodium chloride claims,abstract,description 67 0.000

+ -
NaCl


spraying claims,abstract,description 51 0.000


heat treatment claims,abstract,description 50 0.000


powder claims,abstract,description 46 0.000


resin claims,abstract,description 41 0.000


resin claims,abstract,description 41 0.000


sodium chloride claims,abstract,description 33 0.000


fluorine claims,abstract,description 31 0.000


fluorine claims,abstract,description 31 0.000


fluorine atom claims,abstract,description 30 0.000


mixing claims,abstract,description 23 0.000


washing claims,abstract,description 15 0.000


method claims,abstract,description 11 0.000


water claims,description 33 0.000

H2O


liquid claims,description 28 0.000


Silicic acid claims,description 27 0.000
HO
OH
Si
HO
OH


Tetraethyl orthosilicate claims,description 26 0.000
O O
Si
O O


ammonium hydroxide claims,description 25 0.000

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+ -
NHHO
4


ammonium hydroxide claims,description 25 0.000


ethanol claims,description 20 0.000

OH


azane;ethanol claims,description 15 0.000
NH3

OH


stirring claims,description 12 0.000


hydrolyzing claims,description 11 0.000


Fluoromethane claims,description 10 0.000


cyanoguanidine claims,description 10 0.000
N
NH2
N

NH2


epoxy resin claims,description 10 0.000


mica claims,description 10 0.000


mica group claims,description 10 0.000


polyepoxide claims,description 10 0.000


hydrolysis reaction claims,description 5 0.000


tempering claims 1 0.000


silicium dioxide abstract,description 30 0.000

O Si O


transmittance abstract,description 17 0.000


silicon dioxide abstract,description 15 0.000


silicon dioxide abstract,description 15 0.000


manufacturing process abstract,description 8 0.000


power generation abstract,description 8 0.000


biological transmission abstract,description 2 0.000


mixture abstract,description 2 0.000

Show all concepts from the description section


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