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DOI: 10.1039/c2jm35041f
Copper nanoparticles are an alternative for the currently used silver and gold nanoparticles in inkjet
printing of conductive patterns because of the low cost and high electrical conductivity. However, a
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serious impediment to using copper nanoparticles for conductive inks is their spontaneous oxidation.
This paper describes a simple, large-scale and high-throughput (0.2 M) process for the synthesis of
copper nanoparticles in aqueous solution at room temperature in a short reaction period. The well-
dispersed antioxidative copper pastes were prepared by dispersing the nanoparticles in an ethanol
solution of lactic acid, and then depositing on glass slides. The resistivity of the conductive copper film
was 14.0 4.5 mU cm after annealing at 200 C for 30 min in nitrogen, which was about eight times of
the resistivity of bulk copper (1.7 mU cm). The copper nanoparticles and films were characterized by
TEM, UV-vis, SEM, XRD and XPS. Lactic acid-stabilized copper nanoparticles showed relatively
better disperse stability and resistance to oxidation than the other carboxylic acids. Furthermore, the
copper film after annealing at 200 C for 30 min in nitrogen showed antioxidative characteristics. It was
experimentally proven that lactic acid could react with the copper oxides surrounding copper
nanoparticles to form copper lactate, which was then reduced to copper in the annealing process.
This journal is ª The Royal Society of Chemistry 2012 J. Mater. Chem., 2012, 22, 23989–23995 | 23989
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effective and environmental friendly solvent, to prepare copper Synthesis of copper nanoparticles
nanoparticles in aqueous solution is very attractive. However,
Copper nanoparticles were synthesized by chemical reduction of
the obstacle for the aqueous synthesis is the enhanced surface
copper ions in aqueous solution at room temperature in nitrogen.
oxidation of the copper nanoparticles. Copper nanoparticles in
Copper acetate monohydrate (0.1 mol), CTAB (13 mmol) and
high concentration have been synthesized by the reduction of
PVP (0.4–1.0 mmol) were dissolved in 500 mL of deionized
cupric chloride with hydrazine in aqueous CTAB solution.16 The
water. The solution was stirred with a magnetic stirrer for 20 min
copper nanoparticles were capped by a mass of CTAB molecules
to ensure that the copper acetate monohydrate, CTAB and PVP
that TGA showed 70% weight losses below 600 C. Besides, the
were dissolved completely. The pH of the solution was adjusted
XRD results showed that the copper nanoparticles were easily
to 10.0 by adding ammonia water with continuous stirring.
oxidized after sintering. Recently, the poly(allylamine)-stabilized
Hydrazine hydrate solution (0.2 mol) was added into the solu-
colloidal copper nanoparticles and polyacrylate-assisted copper
tion, the color of the solution turned from deep blue to brown
nanoparticles were synthesized in aqueous solution, respec-
within 3–5 min, indicating the formation of copper nano-
tively.17,18 However, further research about the oxidation of the
Published on 26 September 2012 on http://pubs.rsc.org | doi:10.1039/C2JM35041F
The copper nanoparticles were redispersed into an ethanol Preparation of copper films
solution of carboxylic acids, and then deposited on glass slides.
Copper nanoparticles obtained above were dispersed in ethanol
The antioxidative conductive copper films were obtained after
by ultrasonication for 1 h to prepare the copper nanoparticle
sintering in nitrogen. The mechanism of lactic acid on the
pastes (10 wt%). Carboxylic acids were added into the solution in
reduction of copper oxide was experimentally studied.
3 wt% to assist the redispersion. The copper pastes were depos-
ited on glass slides by a drop-coating method, dried under
Experimental vacuum for 1 h, and then annealed in nitrogen at a suitable
Materials temperature for 30 min. The film thickness was controlled by
dropping a fixed amount of copper pastes on the glass slides
Copper(II) acetate monohydrate, cetyltrimethylammonium within a fixed area.
bromides (CTAB), polyvinylpyrrolidone (PVP, K-30), hydrazine
hydrate solution (50%), acetic acid, propionic acid, oleic acid,
glycolic acid, lactic acid and ammonia water were purchased Results and discussion
from Sinopharma Chemical Reagent Co., Ltd. All chemicals Synthesis and characterization of copper nanoparticles
were used as received without further purification.
By using PVP and CTAB as the double capping agents, copper
Characterization nanoparticles were synthesized in aqueous solutions on a large-
scale (500 ml) and with high-throughput (0.2 M) at room
Thermogravimetric analysis (TGA) was carried out using a temperature in a short reaction period. In the case of using
thermal gravimetric analysis instrument (SHIMAZU, DTG- CTAB or PVP as the only protective agent, visible particles were
60H) with a heating rate of 10 C min1 in nitrogen. UV-vis generated and deposited on the bottom of reactor. The homo-
absorption spectra were recorded on a Hitachi U-4100 spectro- geneous and stable brown solutions were obtained only when
photometer. TEM were performed on a Hitachi H600 trans- both CTAB and PVP were used. It was reported that the
mission electron microscope. The crystal structures were coupling interaction between the two surfactants made the
determined by X-ray diffraction (XRD) using a Rigaku D/max- copper nanoparticles suspended in the solution well.15 We believe
rB advanced X-ray diffractometer with Cu Ka radiation. Fourier that the electrostatic repulsion of the cationic CTAB and the
transform infrared (FT-IR) spectra were recorded on a Nicolet steric hindrance of PVP restrict the growth of copper nano-
Nenus 470 FTIR spectrophotometer operating at a resolution of particles cooperatively. Thermal gravimetric analysis (TGA)
4 cm1. X-ray photoelectron spectroscopy (XPS) was recorded reveals that the amount of the adsorbed capping agents on the
on a Kratos axis ultra DLD photoelectron spectrometer using Al synthesized copper nanoparticles is about 16% as shown in
Ka X-ray as the excitation source. The microstructure of the Fig. 1a. After washing with methanol and drying under vacuum,
sintered copper film was analyzed using a field-emission scanning the copper nanoparticles show sharp weight losses in the range of
electron microscope (JEOL, JEM-6701F). The thickness of the 50–150 C and 250–400 C (Fig. 1b), which are related to the
film was measured using a surface profiler (Tencor instruments, evaporation of residual solvent and the decomposition of
alpha-step 200). The resistivity of the copper film was measured capping agents, respectively. The amount of the residual capping
by using a Shanghai Qianfeng SB100A/2 four-point probe meter agent and solvent on the copper nanoparticles is approximately
and calculated by the following equation:19 6.5% by weight estimated by TGA. Thus, 4.8 g of copper
nanoparticles prepared from 0.10 moles of copper acetate
p V
r¼ t corresponds to a reaction yield of 70%.
ln 2 I UV-vis absorption peaks are sensitive to the size of metal
where I, V, and t represent the current, voltage and thickness of nanoparticles. The absorption bands for copper nanoparticles
film, respectively. have been reported to be in the range of 550–600 nm.20 Fig. 2
23990 | J. Mater. Chem., 2012, 22, 23989–23995 This journal is ª The Royal Society of Chemistry 2012
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Published on 26 September 2012 on http://pubs.rsc.org | doi:10.1039/C2JM35041F
This journal is ª The Royal Society of Chemistry 2012 J. Mater. Chem., 2012, 22, 23989–23995 | 23991
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can react with copper oxides to form organic copper salts which
will be reduced into elemental copper at a certain temperature.11
Carboxylic acids can also bind on the surface of copper nano-
particles to prevent them from oxidation.10
The as prepared copper nanoparticles were washed and
dispersed in ethanol by ultrasonication to prepare the copper
nanoparticles pastes in a concentration of 10 wt%. Carboxylic
acids (3 wt%) were added into the pastes to assist the redis-
persion. When acetic acid and propionic acid were used, the
copper nanoparticles pastes completely turned into green solu-
tion. In the case of oleic acid, the color of the pastes turned
greenish. There was no obvious color change during the redis-
Published on 26 September 2012 on http://pubs.rsc.org | doi:10.1039/C2JM35041F
23992 | J. Mater. Chem., 2012, 22, 23989–23995 This journal is ª The Royal Society of Chemistry 2012
View Article Online
Published on 26 September 2012 on http://pubs.rsc.org | doi:10.1039/C2JM35041F
Fig. 6 XRD patterns of copper pastes (before annealing) and films (after Fig. 8 FT-IR spectrum of the blue solution of lactic acid with the
annealing). (a) Copper paste without lactic acid, (b) copper paste with lactic oxidized copper nanoparticles.
acid, (c) copper film without lactic acid, (d) copper film with lactic acid.
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Fig. 9b and c. The results confirm that lactic acid reacts with the
was present on the surface of the annealed copper films, XPS
copper oxides surrounding copper nanoparticles to form copper
analysis was performed. Fig. 7 shows the Cu2p3/2 spectrum with
lactate that is then reduced to copper in the annealing process as
peak fitting of the copper films after annealing at 200 C for 30
described by the following equations:
min in nitrogen. The insets show the Cu2p doublet spectrum. The
obvious peak around 934.8 eV is attributed to CuO (Fig. 7a),
2CH3CHOHCOOH + CuO / Cu(CH3CHOHCOO)2 + H2O
while the peak fitting of the copper film with lactic acid does not
show any indications for the presence of CuO (Fig. 7b). The Cu Cu(CH3CHOHCOO)2 / Cu + 2CO2 + H2 + 2CH3CHO + ..
2p3/2 binding energy for pure Cu, Cu2O and CuO is 932.1, 932.6
and 934.6 eV, respectively.6 Electrical properties of the sintered copper films
To understand the effect of lactic acid in the preparation of the
copper film, the following experiments were conducted. A certain The electrical properties of the copper films are further studied.
amount of lactic acid was added to the copper nanoparticles that Fig. 10 shows the resistivity of the films after annealing in
had been oxidized as shown in Fig. 9a. A light blue lactic acid nitrogen for 30 min at different temperatures in the absence/
solution was obtained after ultrasonication and centrifugation. presence of lactic acid, respectively. In the absence of lactic acid,
Fig. 8 shows the FT-IR spectrum of the light blue lactic acid the resistivity of the film decreases from 7800 500 mU cm to 600
solution. The peaks at 1607 cm1 and 1410 cm1 are attributed 100 mU cm as the temperature increases from 150 C to 300 C.
to the asymmetric and symmetric stretching of the conjugate The decrease of resistivity with the increase of sintering
carboxylate. The carbonyl stretching of the free lactic acid is at temperature may be due to the sintering of copper nanoparticles
1750 cm1. The light blue lactic acid solution was deposited after decomposition of the stabilizers. However, the resistivity of
on glass slides and sintered in nitrogen for 30 min at 200 C and the film annealed at 350 C cannot be measured and the surface
250 C, respectively. The XRD patterns of the obtained films are of film looks black, probably due to the oxidation of copper
shown in Fig. 9. Compared with Fig. 9a, the (111) diffraction of nanoparticles at high temperature. The SEM images of the film
Cu2O disappears and only the diffractions of copper exist in sintered at different temperatures in Fig. 11 confirm the sintering
of the nanoparticles at elevated temperatures.
Fig. 7 Peak fitting of the Cu2p3/2 spectrum of copper film after Fig. 9 XRD pattern of the reaction products of lactic acid and the
annealing at 200 C for 30 min. The insets show the Cu2p doublet oxidized copper nanoparticles. (a) Oxidized copper nanoparticles, (b)
spectrum. (a) Without lactic acid, (b) with lactic acid. sintered at 200 C, (c) sintered at 250 C.
This journal is ª The Royal Society of Chemistry 2012 J. Mater. Chem., 2012, 22, 23989–23995 | 23993
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Published on 26 September 2012 on http://pubs.rsc.org | doi:10.1039/C2JM35041F
23994 | J. Mater. Chem., 2012, 22, 23989–23995 This journal is ª The Royal Society of Chemistry 2012
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Cu-to-Cu joining for electronic component assembly instead of 8 S. Magdassi, M. Grouchko and A. Kamyshny, Materials, 2010, 3,
soldering. 4626.
9 V. Engels, F. Benaskar, D. A. Jefferson, B. F. G. Johnson and
A. E. H. Wheatley, Dalton Trans., 2010, 39, 6496.
Acknowledgements 10 J. Yang, Y. Zhou, T. Okamoto, T. Bessho, S. Satake and M. Okido,
Chem. Lett., 2006, 35, 1190.
This study was supported by National Science and Technology 11 K. Woo, Y. Kim, B. Lee, J. Kim and J. Moon, ACS Appl. Mater.
Major Project with Contract nos. 2009ZX02038 and Interfaces, 2011, 3, 2377.
12 I. Kim and J. Kim, J. Appl. Phys., 2010, 108, 102807.
2011ZX02602. 13 S. Jeong, K. Woo, D. Kim, S. Lim, J. S. Kim, H. Shin, Y. Xia and
J. Moon, Adv. Funct. Mater., 2008, 18, 679.
Notes and references 14 Y. Lee, J. Choi, K. J. Lee, N. E. Stott and D. Kim, Nanotechnology,
2008, 19, 415604.
1 A. Dearden, P. Smith, D. Shin, N. Reis, B. Derby and P. O’Brien, 15 X. F. Tang, Z. G. Yang and W. J. Wang, Colloids Surf., A, 2010, 360,
Macromol. Rapid Commun., 2005, 26, 315. 99.
2 C. Lu, P. Lin, H. Lin and S. Wang, Jpn. J. Appl. Phys., 2006, 45, 6987. 16 S. H. Wu and D. H. Chen, J. Colloid Interface Sci., 2004, 273,
Published on 26 September 2012 on http://pubs.rsc.org | doi:10.1039/C2JM35041F
E. D. Kim, C. H. Paik, S. H. Oh and B. H. Ryu, Langmuir, 2011, 20 P. K. Khanna, T. S. Kale, M. Shaikh, N. K. Rao and
27, 3144. C. V. V. Satyanarayana, Mater. Chem. Phys., 2008, 110, 21.
7 J. L. C. Huaman, K. Sato, S. Kurita, T. Matsumoto and 21 K. Woo, D. Kim, J. S. Kim, S. Lim and J. Moon, Langmuir, 2009, 25,
B. Jeyadevan, J. Mater. Chem., 2011, 21, 7062. 429.
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