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Blllletin of Electrochemistry 16 (9) September 2000, pp 388-391 0256-1654/2000/$ 3-50

© 2000 CECRI

ELECTROPOLISHING OF STAINLESS STEEL

G JEYASHREE, A SUBRAMANIAN, T VASUDEVAN, S MOHAN· AND R VENKATACHALAM·

Department of Industrial Chemistry, Alagappa University, Karaikudi 630 003. INDIA


* Central Electrochemical Research Institute, Karaikudi 630 006. INDIA

[Received: 24 July 1998 Accepted: 07 May 1999]

Three diITerent electropolishing baths were formulated in H 3P0 4 -H2S04 medium with mono, di and
triethanolamines as additives for polishing of stainless steel panels. For each bath, the polishing
current densities were fixed through Hull Cell experiments. The eITect of varying current density,
temperature and electroplating duration were studied for these baths. The specular reflectance
measurements were made to assess the extent of polishing under different experimental conditions.
A detailed analysis of the experimental results is presented.

Keywords: Electropolishing and stainless steel

INTRODUCTION caustic) at 323 K for 2 minutes at 7-8 A.dm-;!. The


specimens were wJshed in running water and rinsed in
dei~)l1ised water and then dried. Table I presents the
Electropolishing is an electrochemical process wherein
composition of various baths used.
preferential dissolution takes place from macro and micro
peaks that appear on the surface. Elimination of the large Hull cell studies
scale irregularities (> I !! m) causes smoothening of the The Hull cell of volume 267 ml was used. The polishing
surface while the removal of the smaller irregularities solution was poured into the cell upto the brim. Hull cell
« 0.0 I !! m) results in brightening. patterns were obtained using lead as a cathode and
Innumerable reports on the electropolishing compOSitIOns stainless steel as anode. The cell currents of I, 2 and
based on phosphoric acids and non-phosphoric acid 3 A.dm-;! were used for 5 minutes. Experiments were
solutions containing organic substances are available [1-5]. carried out at 333, 343 and 353 K.
These baths contain higher amount of H 3P04 and
TABLE I: Composition of
hazardous chemicals. The present paper deals with the
various electropolishing baths
development of H3 P04 - H 2S04 electropolishing baths
containing ethanol amines for AISI 304 stainless steel. Bath Constituent Concentration
The extent of polishing was assessed by specular (mVIitre)
reflectivity measurements.
A ~P~ 500
H 2S04 360
EXPERIMENTAL
Monoethanolamine 20
The stainless steel specimens (0.8% max. carbon, 18-20% B H 3P04 500
chromium, 8-11 % nickel and remaining iron) of size H2S04 360
2.5 x 2.5 x 0.1 cm were cut and the sides of the Diethanolamine 20
specimens were ground to remove the burrs. They were C H3P04 500
degreascd with benzene or trichloroethylene and H2S04 360
electrocleaned cathodically in an alkaline solution (10% Triethanolamine 20

388
JEYASHREE et al. - Electropolishing of stainless steel

RESULTS

o~~~~I
00 DO 6
6 M6 6
6 ~ I 4­ 3A
o ~ 66 666 6 6 6 ~I
4 2A 333K Hull cell studies
DO 6 6 6 6 6 6 666
6666~1 4 lA In Hull cell experiments, a specified current is passed for
66 6 66

OO~I~ 0 0 0 0~1 6 6 6 6 6 6 61
a duration of five minutes. The current density at a
000 DO 0 0 0 0 6 6 6 6 6.l:>. 6 4­ 3A
specified point on the specimen is
~I~O
bo DO ~ 16 66 6 66~1
DO DOD 6 6 6 6 6 ts6 4 2A 343K

~I 4 lA
A = I (5.102-5.24 log L) (1)
000~10 ~ 16 666 66 6 6 1 4 3A
0000 0 0 6 6 6 6 6 6 6 6

~ 4 2A 353K where A is the current density (A.dm-;l), I is the current


I~ 4 lA passed through the cell and L is the length of the
polishing region from the nearest end of the anode.
Various cell currents (1-3 A.dm-;l) were passed at
Fig. J: Hull cell pattern for different cell currents and
different bath temperatures.
temperatures 333, 343 and 353 K for bath A
(1) Very bright; (2) Bright; (3) Dull bright; (4) Dull Monoethanolamine
At all temperatures mostly dull region dominated followed
by a dull bright zone when 1 and 2 Amp currents were
Reflectivity measurements passed. At 353 Kthe passage of 3 Amp has resulted in
The stainless steel specimens were electropolished at a very bright region to a considerable extent (Fig. 1).
333 K using 15.5, 31 and 46.5 A.dm-;l at different time
intervals. They were washed in running water and dried. .,
Diethanolamine
At 333 K very bright polishing regions were seen when
The reflectivity of the specimens were measured using
ML 4B gloss/reflectance meter.
1- 3 Amp. currents were passed. At 343 K and 3 Amp.
current, very bright polishing was obtained at the nearest
Weight loss measurements end of the anode. Again at 353 K, only at higher currents
The specimens were kept at different anodic polishing 'very bright polishing could be obtained (Fig. 2).
current densities for specified time intervals at desired
Triethanolamine
temperatures in the polishing bath using lead cathode. The
At 333 and 343 K bright polishing was obtained at 2 and
changes in weights were recorded.
3 Amp. Very bright polishing was seen at the nearest end
of the anode at 353 K when 2 or 3 Amp currents were
passed (Fig. 3).
OOOO~I
00000
DO 000 ~ 1666 6 ~ 1
0 0 0 0 0 0 666 6 6 4 3A
0~1 0 0 0 16 6 6 6 66 6 61 4 2A 333 K
00 DO 0 66666666
000010000,I6A6 6 6 6 661 A­ 3A
000~100 0~166 661 lA 0000000066666666
00000000 6 6 6 6 4­ 0000~166666666~1 4 2A 333K
DO DO 0 66l\ 6 6 6 66A
0~1.0 DODD 00000 0 166~1 4 3A 66~ lA
00 0 0 0 0 0 DO DO 0 0 666
666 4­
0~16 6 6 6 6 6 6 6 6 1 2A 343K
DO 6 6 6 6 6 6 6 6 6 4­ ~"8f000 0000~1666 666614
3A
6 66~1
0000000006666666

666 6 4 lA
00~1~ 00 0,166666 6 ~I
A 2A 343K
000 0 0 0 6 6 6 6 6 6 6
~I DODD 0 ~166 6 6 66.~ 4 3A ~1666 66 6 6~1 lA
000 000 DOC 6 6 6 6 6 6 066666 66l> 4
~O 0 0 0~16
6 666~1 4­ 2A 353K
DO 0 DO 666666 O~O ODD OJ66 6 6 6 6 6 6 1 3A
00 DO ODD 6 6 6 6 6 6 6 6
4
66~1
1D.66 1­ lA
~OO 0001166 6 6 66~1

00000 6 6 6 6 6 6 6 4 2A 353K
0-1 0-2. Ll-3
666~1
6666 ~- lA

Fig 2: Hull cell pattern for different cell currents and Fig. 3: Hull cell pattern for different cell currents and

temperatures 333, 343 and 353 K for bath B tempcraturcs 333, 343 and 353 K for bath C

(l) Very bright; (2) Bright; (3) Dull bright; (4) Dull (1) Vel:v bright; (2) Bright; (3) Dull bright; (4) Dull

389

I
lEY ASHREE et al. - Electropolishing of stainless steel

Bath B
At 333 K maximum reflectance was seen only at
46.5 Adm-2 (Fig. 5). Both at 343 and 353 K maximum
reflectance was observed at lower current density of
31 Adm-z.
a
Bath C
b At 333 K maximum of 99% reflectance occurred at the
end of 12 minutes when 15.5 A.dm-z was passed (Fig. 6).
c At 343 and 353 K, the maximum reflectance occurred at
the same current density but at lower polishing time of
9 minutes.
84

To conclude, at 333 K both the baths A and C were


found to be better than bath B from the current
80

requirement points of view. Among the two, bath A is


76J.--~Ir--_j.-----k------hl"---·---i-- superior to achieve maximum reflectance in 9 minutes.
TIME (SE'C) For 343 K, bath C is the best among the three and the
maximum reflectance is achieved at the end of 9 minutes.
For 353 K bath A is superior from current requirement
and electropolishing time points of view.
Fig. 4: Relationship between specular reflectivity and
tillle of electropolishing at current densities Weight loss measurements
~
15.5. 31.0 and 46.5 A.dm at 333 K for bath A At a constant polishing time of 5 minutes, the specimens
were anodically kept at different current densities. Losses
in weight of anodes were calculated. It was found that
Reflectance studies
losses in weight were linearly related to the applied
Bath A current density and time of electropolishing (Fig. 7).
A maximum reflectance of 98% was obtained at 333 and
353 K when a current density o'f 15.5 Adm-z was passed
through the cell for 9 minutes (Fig. 4). However at 343 K
it was found that the current requirement is 31 A.dm-2• 100 a

~80
;::

~~
ex

60

50
70
0 3 6 9 12 15
TIME (m)
TIME (min)

Fig. 5: Relatio/lship between specular reflectivity and Fig. 6: Relationship between specular reflectivity and

time of electropolishing at current densities time of electropolishing at current densities

~ ~
15.5. 31,0 and 46.5 A.dm at 333 K for bath B 15.5. 31.0 and 46.5 A.dlll at 333 K for bath C

390
JEYASHREE et al. - Electropolishing of stainless steel

TABLE II: Reflectivity of electropolished specimens

- Effect of bath ageing at 333 K

a
Time duration 1 hour

90 Bath Current (A) Reflectivity (%)


N

- E
u
~ 70
A 1
2
86
89
~ 50
3 94
B 1 83
2 87
3 93
c 1 83
10 2 84
3 86

surface takes place. The adsorption on the surface of


Fig. 7: Typical relationship between current density and crevices was hindered due to the existence of the thick
weight loss at constant time of 5 lI1inutews for bath A electrolyte layer. The inhibition of metal dissolution from
the peaks of the surface causes levelling. The passive
Ageing of the bath films on the crevices are stable and the uniform rate of
To study whether the electrolyte is stable during the dissolution from crevices and from the peaks causes the
experimental conditions of electrolysis, electropolishing appearance of bright surface.
experiments were carried out at different turrents of 1-3
for a longer duration of electrolysis namely one hour
CONCLUSION
against the normal requirements of 3-15 minutes of
polishing time. The results are presented in Table II. Hull cell studies, reflectivity measurements and weight
loss measurements revealed that electropolishing bath
DISCUSSION
containing monoethanolamine offered very bright surface
When an anodic current passes through the solution, a at all temperatures compared to di and triethanol amines.
liquid layer of anodic dissolution products is formed on This electropolishing bath offered maximum retlected
the surface. This layer has a higher viscosity and a greater surface with minimum electrical power consumption.
electrical resistivity than the bulk of the solution. The
layer thickness is greater on crevices than on projections.
REFERENCES
Due to the non-uniform current density, metal from the
projection dissolves more rapidly than from crevices, I. JEdwards. J Electrodep Tech Soc. 28 (1952) 133
which produces a surface levelling effect. The preferential 2. PA Jacquet, C R Acad Sci. 202 (1936) 402
dissolution may be due to [6-9] 3. PMichel. Met lnd, 26 (1949) 2175
4. P A Jacquet, Metal Finishing. 47 (1949) 6
J:l differences of the metal ion concentration in peaks and
5. H E Zen tIer-Gorden. J Electrodepositors Tech Soc, 26
crevices tor)
(1950) 55
J:l differences in resistivities of peaks and crevices (or) 6. P A Jacquet. Metal Finishing. 47 (1949) 5-10; 48 (1950)
J:l concentration of the electric field lines on peak in the 1-2
rough surface which leads to a change in the surface 7. W C Elmore, J Appl Physics. 10 (1939) 724; 11 (1940)
7970
tension of the films covering the peaks.
8. J Edwards. J Electrochell1 Soc, 100 (1953) 7; 189c (1953)
When organic compounds viz., ethanolamines are added, 8; 223 c
the adsorption of these compounds on the peaks of the 9. G S Vozdvizhanskii, Dall SSSR. 59 (1948) 1587

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