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+ 2008 Quantum Efficiency of Ambipolar Light-Emitting Polymer Field-Effect
+ 2008 Quantum Efficiency of Ambipolar Light-Emitting Polymer Field-Effect
transistors
Jana Zaumseil, Christopher R. McNeill, Matt Bird, Darryl L. Smith, P. Paul Ruden et al.
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JOURNAL OF APPLIED PHYSICS 103, 064517 共2008兲
I. INTRODUCTION through the channel to the drain electrode and vice versa by
changing the applied gate 共Vg兲 or source-drain voltage
Organic light-emitting field-effect transistors 共LFETs兲
共Vds兲.7–9,11 Theoretical models supported by optical reso-
are a new type of bifunctional organic electronic devices
lution of the emission zone showed that this ambipolar re-
combining the switching behavior of transistors with the
gime can be thought of as a saturated electron channel and a
emissive behavior of light-emitting diodes 共LEDs兲. Due to
their planar structure allowing spatial resolution of the re- saturated hole channel in series within the overall transistor
combination and emission zone and properties such as higher channel. In the simplest case, an infinite recombination rate
charge carrier mobilities and current densities compared to and, thus, an infinitesimal width of the recombination zone
LEDs, they have received increased attention in recent are assumed such that the hole 共Ih兲 and electron current 共Ie兲
years.1 A number of LFETs have been demonstrated using a equal the source-drain current Ids = Ih = Ie.10,12–14 Even for a
wide range of materials from small molecules to conjugated finite recombination rate, for example, based on Langevin-
polymers and blends thereof. Some of the demonstrated type recombination and, hence, a certain interpenetration of
LFETs operate solely as unipolar transistors, being only ca- holes and electrons,15,16 this assumption holds true, if the
pable of conducting either holes or electrons.2–4,4,5 Injection channel length is sufficiently long compared to the width of
and recombination of opposite charges occurs only in the the recombination zone. As long as light is emitted from well
direct vicinity of the drain electrodes and is often inefficient. within the channel, the external quantum efficiency 共EQE兲 of
Recently, however, a number of ambipolar LFETs were ambipolar light-emitting transistors is expected to be con-
reported.6–11 For suitable biasing conditions, these ambipolar stant and should only depend on the singlet-triplet ratio, ra-
FETs can accumulate both positive and negative charge car- diative yield of formed excitons, and light outcoupling effi-
riers in spatially separate regions of the device. They allow ciency irrespective of, for example, the ratio of hole to
observation of a narrow recombination and emission zone electron mobility or voltage conditions.
where the hole and electron accumulation layers meet. This In this paper, we test this assumption and investigate the
zone can be moved and positioned from the source electrode emission characteristics and EQEs of ambipolar LFETs in
bottom contact/top gate geometry, illustrated in Fig. 1共a兲,
a兲
Electronic mail: hs220@cam.ac.uk. based on two different conjugated polymers. One of them,
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064517-2 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
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064517-3 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
expected to be delocalized along the backbone. Such a dif- ported for F8BT 共Ref. 9兲 and other ambipolar LFETs.7,8,11
ference between the electron and hole polaron wavefunctions Figure 3共c兲 shows the position of the emission zone and
has been predicted by quantum chemical calculations on source-drain current 共Ids兲 of a F8BT LFET during a transfer
F8BT,20 and a similar behavior is expected for F8TBT.21 The scan with respect to the applied gate voltage and at constant
distance between BT units in F8TBT is much larger than in source-drain voltage. The symmetric form of the sigmoidal
F8BT due to the additional thiophene units in the polymer position curve centered around the current minimum ob-
backbone. This increased hopping distance is likely to be served in the transfer characteristics is expected for a device
responsible for lowering the electron mobility in F8TBT sig- with balanced hole and electron mobilities.10 Light-emitting
nificantly, while in F8BT, the hopping distance for electrons carbon nanotube FETs show an equivalent dependence of the
is sufficiently small so that electron and hole mobilities re- emission spot position on gate voltage.22 The shift of the
main approximately balanced. center point of the curve away from the ideal condition of
In our device configuration containing gold source-drain Vg = Vds / 2 is due to the somewhat different threshold volt-
electrodes, ambipolar F8TBT transistors exhibit high contact ages for holes 共−29 V兲 and electrons 共25 V兲 and the reduced
resistance indicated by suppressed drain currents at low effective Vds due to contact resistance. For the F8TBT LFET,
source-drain voltages as seen in the output characteristics on the other hand, a very asymmetric position-versus-gate-
关Fig. 2共c兲 and 2共d兲兴. The contact resistance for hole injection, voltage curve is observed reflecting the disparity of mobili-
however, is notably lower than that of F8BT transistors 共see ties 关Fig. 3共d兲兴. Since electrons exhibit a lower mobility than
Ref. 9兲. This is due to the smaller bandgap of F8TBT 共Egap holes in F8TBT, a larger voltage drop across the electron
= 2.2 eV兲 共Ref. 18兲 compared to F8BT 共Egap = 2.6 eV兲 and accumulation layer is needed to obtain an electron current
the improved alignment of the F8TBT highest occupied mo- equivalent to the hole current. For equivalent voltage condi-
lecular orbital 共HOMO兲 level 共⬃5.4 eV兲 to the work func- tions the electron channel must be shorter than in the case of
tion of the injecting gold electrodes 共Au ⬃ 4.8 eV兲 and, thus, balanced mobilities. Hence, for a wide range of gate volt-
lower injection barrier compared to F8BT 共HOMO level of ages, the emission zone is located closer to the electron in-
⬃5.9 eV兲. The injection barrier for electrons into F8TBT is jecting electrode, and only for a very narrow voltage range, it
only slightly lower, due to the more similar lowest unoccu- remains closer to the hole injecting electrode 关Fig. 3共d兲兴.
pied MO levels of F8TBT 共3.15 eV兲 and F8BT 共3.3 eV兲. Note that in both cases, there is a wide range of gate voltages
Both F8BT and F8TBT ambipolar FETs show light for which the emission zone is located away from the inject-
emission from within the channel region, as shown in Figs. ing electrodes and, thus, complete recombination of holes
3共a兲 and 3共b兲. For both transistors, the position of the emis- and electrons is expected. This notion is further supported by
sion zone can be adjusted from close to the source electrode the narrow shape of both emission zones. In the case of
through the entire channel to the drain electrode by changing F8BT LFETs, the width at half maximum is about 4 m. The
the applied gate or source-drain voltage as previously re- intensity profile along the recombination zone shows a
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064517-4 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
grainy texture reflecting the polycrystalline morphology of efficiency but rather a peak that becomes broader as Vds in-
the F8BT film. This polycrystalline texture also leads to creases. From Fig. 3共d兲, one would expect the emission zone
some broadening of the emission zone. In contrast, the amor- of the F8TBT LFET to be located within the channel, away
phous F8TBT films shows a much narrower emission zone from the electrodes, for a gate voltage range from about
with a width at half maximum of about 2 m with no visible 50 to 80 V for Vds = 100 V. Thus, complete recombination of
asymmetry. The correlation of emission images and micro- holes and electrons should take place resulting in a constant
structure of the polymer films suggests that the linewidth QE. However, clearly in Fig. 4共f兲, the efficiency is already
observed by optical microscopy reflects the true width of the significantly lowered at about 65 V even before the drain
recombination zone and is not determined by limited reso- current reaches its minimum and, thus, before the emission
lution of the microscope setup. zone has reached the drain electrode. There is, however, a
Figure 4 shows the current-voltage and corresponding kink in the efficiency curve at the gate voltage with the low-
light output characteristics of F8BT and F8TBT LFETs to- est drain current and the emission efficiency decreases less
gether with their EQEs as a function of gate and source-drain steeply from there. Notably, as the source-drain voltage in-
voltages. The EQE of the F8BT LFET reaches a plateau at creases, the shape of the efficiency curve becomes broader
around 0.55% centered around the source-drain current mini- and seems to approach a plateau. While the maximum QE at
mum for Vds = −100 V. However, at Vds = −80 V, the maxi- each Vds remains unchanged, the efficiency at higher gate
mum efficiency is lower than that by almost 20%. The EQE, voltages increases with respect to the maximum value lead-
thus, seems to increase with increasing Vds. Furthermore, for ing to a more plateaulike curve shape.
Vds = −80 and −90 V, a dip in efficiency coincident with the It is highly unlikely that a hole or electron can pass
current minimum is evident where the emission zone should through several micrometers of an accumulation layer of op-
be in the middle of the channel, as shown in Fig. 3共c兲. posite charge without recombining, and the narrowness of
A similar behavior of the external efficiency has been the emission zone supports the assertion that all charges are
described recently by Smits et al. for a bottom-gate near- recombining in a LFET with sufficient channel length. Thus,
infrared light-emitting ambipolar FET based on a solution- as long as the emission is located within the channel, hole
processable small-bandgap squarylium dye.10 This suggests and electron currents must be balanced irrespective of the
that this dependence is a common feature among ambipolar source-drain voltage or mobility ratio. Increased gate leakage
LFETs irrespective of their geometry or organic semiconduc- as a possible source of additional emission can be excluded.
tor. A similar apparent increase of efficiency with source- The gate-source current in these LFETS is always two to
drain voltage can be found for F8TBT light-emitting transis- three orders of magnitude lower than the source-drain cur-
tors 关Fig. 4共f兲兴. F8TBT transistors show generally lower QEs rent, and there is no correlation between gate leakage and
compared to F8BT LFETs due to the lower PL efficiency of emission. The origin of the changing EQE must, therefore,
F8TBT 共34%兲 and the maximum EQE is reached at 0.4%. In be due to a change of either outcoupling efficiency or radia-
contrast to the F8BT case, however, this maximum is not tive yield. An effect of source-drain voltage on the outcou-
centered around the current minimum but shifted toward pling efficiency is unlikely as the lateral position of the emis-
lower Vds and higher Ids. There is also no clear plateau of sion zone is always far away from the source-drain
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064517-5 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
FIG. 4. 共a兲 Source-drain current, 共b兲 light output, and 共c兲 external quantum efficiency vs gate voltage 共forward and reverse兲 of a light-emitting F8BT 共green兲
transistor with L = 20 m, W / L = 500, Ci = 5.9 nF cm−2, e = 5 ⫻ 10−4 cm2 V−1 s−1, h = 6 ⫻ 10−4 cm2 V−1 s−1. 共d兲 Source-drain current, 共e兲 light output, and 共f兲
external quantum efficiency vs gate voltage 共forward and reverse兲 of a light-emitting F8TBT 共red兲 transistor with L = 20 m, W / L = 1000, Ci = 6.8 nF cm−2,
e = 3 ⫻ 10−5 cm2 V−1 s−1, h = 6 ⫻ 10−4 cm2 V−1 s−1.
electrodes and remains localized at the gate dielectric inter- = 20 V, VT,h = −20 V and Ve = 100 V, Vh = 100 V for F8TBT.
face excluding interference effects.23 A dependence of the Saturation mobilities corresponded to the experimental satu-
radiative yield on applied field and, thus, Vds could be pos- ration mobilities 共Fig. 4兲, as did the other independently de-
sible at very high fields; however, no corresponding correla- termined device parameters, i.e., gate-channel capacitances
tion of efficiency with the channel length and, thus, field and channel lengths and widths. With the “source” grounded,
could be found. The pronounced dip of efficiency for the
the source is the electron injecting contact 共large contact re-
F8BT LFETs at lower Vds and the lowered efficiency at lower
sistance兲 and the drain injects holes for positive drain and
drain currents in the case of F8TBT LFETs suggest that the
observed changes of EQE might be caused by different cur- gate biases, while negative drain and gate biases imply that
rent densities rather than source-drain voltage or lateral field. the source is the hole injecting contact 共smaller contact re-
Before looking more closely at a possible charge density sistance兲 and the drain injects electrons.
dependence of the QE, we will compare the experimental First, we explore the dependence of the recombination
device characteristics to a recently developed analytical position as a function of gate voltage for fixed Vds in com-
model for organic ambipolar LFETs.16,14,24 We calculated the parison with the experimental data in Figs. 3共c兲 and 3共d兲.
salient device characteristics using the gradual channel ap- Figures 5共a兲 and 5共b兲 show results for F8BT and F8TBT
proximation based approach described in Ref. 16 and in- devices with Vds = 100 and −120 V, respectively. Evidently,
cluded the effects of nonvanishing contact resistances. The the model reproduces well the qualitative differences in the
contact resistance values were chosen to be Re = 3
shapes of these curves that are directly attributable to the
⫻ 106 ⍀ cm and Rh = 105 ⍀ cm for both F8BT and F8TBT
significantly different electron and hole mobility ratios of the
devices, reflecting the expected larger contact resistance for
electron injection compared to hole injection from the gold two materials as described above.
contacts. Carrier density dependent and, hence, gate voltage Next we examine the drain current, light output, and QE
dependent, mobilities for electrons and holes were modeled results for the two different devices. For both F8BT and
as in Refs. 16 and 14, with threshold 共VT,e and VT,h兲 and F8TBT devices, the calculated transfer curves shown in Figs.
slope 共Ve and Vh兲 parameters given by VT,e = 15 V, VT,h = 6共a兲 and 6共d兲 are in satisfactory agreement with the measured
−20 V and Ve = 100 V, Vh = 200 V for F8BT, and by VT,e data 关Figs. 4共a兲 and 4共d兲兴. Qualitative differences, i.e., the
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064517-6 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
FIG. 6. 共a兲 Calculated source-drain current, 共b兲 light output, and 共c兲 quantum efficiency vs gate voltage of a light-emitting F8BT 共green兲 transistor with
balanced hole and electron mobilities 共h / e = 1.2兲. 共d兲 Calculated source-drain current, 共e兲 light output, and 共f兲 quantum efficiency vs gate voltage of a
light-emitting F8TBT 共red兲 transistor with unbalanced hole and electron mobilities 共h / e = 20兲.
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064517-7 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
F8BT and F8TBT in contrast to the experimental efficiency current, the emission zone is again moved through the entire
curves. Competing mechanisms, possibly with different car- channel; for a certain gate voltage range, the emission zone
rier density dependencies,25 may reduce the internal QE. The must be located within the channel away from either elec-
slopes of the calculated total recombination rate and QE trode and complete charge recombination should take place.
curves are steeper than those of the experimental results for For both polymer transistors, this regime is indicated by a
light output and EQE. We attribute this difference primarily nearly constant maximum light output and, hence, QE 关pla-
to the width of the calculated recombination profile teau region in Figs. 7共b兲 and 7共d兲兴. For values of Vg at the
共⬃0.5 m兲, which is significantly narrower than the experi- edges of the plateau 共corresponding to lower and higher Vg兲,
mentally observed width of the light emission zone here the efficiency is reduced as the emission zone is located next
共2 – 4 m兲 and in other LFETs.26 The width of the calculated to the source or drain electrode resulting in incomplete re-
recombination profile is underestimated in the present model, combination and/or luminescence quenching by energy
primarily because the use of the gradual channel approxima- transfer. At the plateau, the light output is nearly constant for
tion throughout the recombination region neglects the carrier a range of Vg and Vds, as shown in Figs. 7共b兲 and 7共d兲, unlike
spreading away from the semiconductor/insulator interface in the transfer curves of Figs. 4共c兲 and 4共f兲. For example,
and the associated lowering of the longitudinal electric field while in Fig. 4共c兲, a change of Vds from −80 to − 100 V
in that region. causes an increase of QE of about 20%, in Fig. 7共b兲, the light
Evidently, device models that include only a single 共ra- output and, hence, the QE for a constant source-drain current
diative兲 recombination mechanism cannot reproduce the in- of 500 nA remains unchanged for source-drain voltages be-
crease of QE with Vds and the dip of efficiency at the plateau tween 80 and 100 V. This suggests again that Vds is not
demonstrated in Figs. 4共c兲 and 4共f兲, which again suggests directly responsible for the increasing QE in Figs. 4共c兲 and
that other charge density dependent recombination processes 4共f兲 but rather indirectly through increasing the current den-
could play a role. In order to deconvolute the influences of sity.
Vds and source-drain current on QE in LFETs, we performed From these constant current measurements, one can ex-
constant current measurements on both types of polymer tract the light output and QE for a range of source-drain
transistors. For these measurements, the source-drain current currents encompassing more than two orders of magnitude
was kept constant while sweeping the gate voltage, adjusting from 20 nA cm−1 up to 8 A cm−1, as shown in Fig. 8共a兲 for
the source-drain voltage accordingly and recording the emit- F8BT and from 20 nA cm−1 up to 1.5 A cm−1 in Fig. 8共b兲
ted light. Figure 7 shows the corresponding Vds 关共a兲 and 共c兲兴 for F8TBT. In Fig. 8, the source-drain current was normal-
and light output 关共b兲 and 共d兲兴 versus Vg characteristics of a ized against channel width in order to be able to compare
F8BT and F8TBT LFET. devices with different W / L ratios and give a measure of cur-
During a gate voltage sweep with constant source-drain rent density. The QE of both types of LFETs initially in-
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064517-8 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
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064517-9 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
8, we can now easily explain the observed variations of ef- in F8BT and F8TBT as well as the hysteresis of the current-
ficiency shown in Fig. 4. The source-drain current for which voltage characteristics in Figs. 2 and 4 indicate that there is a
the emission zone is located within the transistor channel significant number of charge traps present at the interface.
increases with Vds, explaining the concomitant increase in Whether those charge traps or other chemical or structural
EQE. As experimentally observed at very high Vds, the effi- defects of the polymer chains at the interface are responsible
ciency increases less with Vds than at lower values because it for non-radiative recombinations remains to be investigated,
starts to saturate at higher currents. Likewise, when the for example, by means of temperature-dependent QE mea-
source-drain current reaches its minimum during a transfer surements. The fact that there is always a perfect balance
scan 关for example, −230 nA for Vds = −80 V in Fig. 4共a兲兴, the between holes and electrons and a known position of the
efficiency goes down as well, causing the dip in the effi- recombination zone within the devices will be helpful to
ciency plateau 关Fig. 4共c兲兴. When the source-drain voltage is study the nature of this nonradiative recombination process.
increased to −100 V and, thus, the minimum source-drain In order to compare the observed QEs of F8BT and
current increases to about −1 A, this dip becomes less pro- F8TBT LFETs and their dependence on the source-drain cur-
nounced because EQE already approaches saturation. rent to those of other LFETs and polymer LEDs, one needs
In this way, the asymmetric efficiency plots for the to determine the current density within the emission zone.
F8TBT transistors become comprehensible as well. Because Calculating the actual current density in a light-emitting tran-
the electron mobility is so much lower than the hole mobil- sistor is not straightforward. It is not known how much holes
ity, the source-drain currents at high Vg in Fig. 4共d兲 are much and electrons remain confined to the interface within the re-
lower than at lower Vg, which leads to a lower light output combination zone compared to their respective accumulation
but also lower QE at this point despite total charge recombi- regions 共within about 1 – 2 nm of the interface35兲 or how
nation. The maximum QE of 0.4% for the F8TBT LFET in much they spread out away from the interface and, if so, how
Fig. 4共f兲 is achieved for source-drain currents of about this depends on voltage conditions. Nevertheless, it is helpful
8 – 10 A 共that is, 4 – 5 A cm−1兲 and is almost independent to estimate a lower and an upper limit for the current density
of source-drain voltage. As the source-drain current increases in light-emitting transistors taking into account the current
with increasing source-drain voltage in Fig. 4共f兲, the QE also flow through an area that is defined by the channel width and
starts to approach this maximum value in the high Vg region the height of the emission zone. For a normalized source-
leading to a more plateaulike efficiency curve shape. drain current of 1 A cm−1, the corresponding upper limit is
This behavior is reminiscent of the increasing QE of 10 A cm−2 共assuming all charges are confined to within 1 nm
polymer LEDs at low forward bias and, thus, current at the active interface兲, while the lower limit of current den-
densities.33 This increase of efficiency in single layer poly- sity is calculated to be 0.2– 0.14 A cm−2 using the thickness
mer LEDs, however, was explained with nonradiative recom- of the polymer film 共50– 70 nm兲. However, this calculation
bination losses when the emission is predominantly located does not yet take into account the finite width of the emission
next to the metal cathode at low biases.34 This effect can be zone in LFETs 共2 – 4 m兲, which indicates that charge re-
ruled out for ambipolar light-emitting transistors where emis- combination is less spatially confined in a LFET than in a
sion takes place far away from the source-drain electrodes. polymer LED,15,16 and that the exciton concentration within
The distance of 400– 500 nm to the gate electrode given by the recombination zone of the LFET is not as high as indi-
the thickness of the gate dielectric excludes emission cated by the calculated current densities. Therefore, one
quenching by energy transfer to the metal. However, light could expect the QE to be noticeably affected by a fixed
emission in a LFET is anticipated to predominantly take number of quenching sites as described above and, thus, to
place close to the interface between the gate dielectric and increase with increasing source-drain current. Higher current
the emitting polymer. Nonradiative recombination processes densities at which such a quenching mechanism ceases to be
at this interface could, thus, play a large role. predominant are possible in LFETs with shorter channel
Hsieh et al. investigated the influence of nonradiative lengths and thinner gate dielectrics. The upper limits of QE
recombination processes on the QE of light-emitting carbon in polymer LFETs, peak brightness, and possible quenching
nanotube transistors and found that a trap-assisted Shockley– mechanisms at high current densities are currently under in-
Read–Hall-type nonradiative recombination mechanism vestigation.
would lead to an increase of efficiency with current density.25
A similar process could be responsible for the increasing QE IV. CONCLUSIONS
in polymer LFETs. If a charge is trapped at the interface or at
a defect in the bulk of the emitting polymer, recombination We have demonstrated experimentally and using an ana-
with an opposite charge is likely to be nonradiative assuming lytical device model that ambipolar LFETs based on two
that a charged trap is also a luminescence quenching site. As conjugated polymers with either balanced 共F8BT兲 or strongly
the source-drain current increases the number of defects at unbalanced 共F8TBT兲 hole and electron mobilities show fun-
the interface, or in the bulk, thus, the fraction of nonradiative damentally the same emission characteristics. The emission
recombination events become less significant compared to zone of both transistor types can be moved through the chan-
the number of radiative recombination events between mo- nel by changing the applied gate voltage, thus, adjusting the
bile charge carriers resulting in increased QE. The exact na- point at which recombination of charge carriers takes place.
ture of such traps, however, remains unclear. The relatively Balanced hole and electron mobilities are not necessary for
large threshold voltages for both hole and electron transport achieving a well-controlled ambipolar regime in organic
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064517-10 Zaumseil et al. J. Appl. Phys. 103, 064517 共2008兲
9
FETs. The ratio of hole channel length to electron channel J. Zaumseil, C. L. Donley, J. S. Kim, R. H. Friend, and H. Sirringhaus,
Adv. Mater. 共Weinheim, Ger.兲 18, 2708 共2006兲.
length for certain voltage conditions simply shifts according 10
E. C. P. Smits, S. Setayesh, T. D. Anthopoulos, M. Buechel, W. Nijssen, R.
to the mobility ratio. For very unbalanced mobilities, this Coehoorn, P. W. M. Blom, B. de Boer, and D. M. de Leeuw, Adv. Mater.
means that the voltage range must be extended significantly 共Weinheim, Ger.兲 19, 734 共2007兲.
11
in order to observe the emission zone moving through the K. Yamane, H. Yanagi, A. Sawamoto, and S. Hotta, Appl. Phys. Lett. 90,
transistor channel and not being solely localized at the drain 162108 共2007兲.
12
R. Schmechel, M. Ahles, and H. von Seggern, J. Appl. Phys. 98, 084511
electrodes. For both F8BT and F8TBT LFETs, the EQE was
共2005兲.
found to depend on current density. At low current densities, 13
E. C. P. Smits, T. D. Anthopoulos, S. Setayesh, E. vanVeenendaal, R.
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EQE, the value of which is consistent with complete charge 73, 205316 共2006兲.
14
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15
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This dependence of efficiency on current density explains the nert, J. Appl. Phys. 98, 084505 共2005兲.
observed emission characteristics of organic LFETs, such as 16
D. L. Smith and P. P. Ruden, J. Appl. Phys. 101, 084503 共2007兲.
17
an apparent dependence of efficiency on applied source-drain C. L. Donley, J. Zaumseil, J. W. Andreasen, M. M. Nielsen, H. Sir-
voltage or the dip in QE at the drain current minimum of the ringhaus, R. H. Friend, and J. S. Kim, J. Am. Chem. Soc. 127, 12890
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