Table below presents consecutive measurements on the resistivity of 25 silicon

wafers after an epitaxial layer is deposited in a single-wafer deposition process.

Construct an individuals control chart for this process.

Sample i Resistivity (xi) Ln (xi) MR

1 216
2 290
3 236
4 228
5 244
6 210
7 139
8 310
9 240
10 211
11 175
12 447
13 307
14 242
15 168
16 360
17 226
18 253
19 380
20 131
21 173
22 224
23 195
24 199
25 226