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Nanotechnology

Nanotechnology 32 (2021) 455705 (8pp) https://doi.org/10.1088/1361-6528/ac1756

A simple fabrication strategy for


orientationally accurate twisted
heterostructures
Rahul Debnath1,4, Shaili Sett1,4 , Rabindra Biswas3,
Varun Raghunathan3 and Arindam Ghosh1,2
1
Department of Physics, Indian Institute of Science, Bangalore 560012, India
2
Centre for Nano Science and Engineering, Indian Institute of Science, Bangalore 560012, India
3
Department of Electrical and Communication Engineering, Indian Institute of Science, Bangalore 560012,
India

E-mail: rahuldebnath@iisc.ac.in

Received 22 April 2021, revised 13 July 2021


Accepted for publication 23 July 2021
Published 18 August 2021

Abstract
Van der Waals (vdW) heterostructure is a type of metamaterial where multiple layers of 2D
materials are vertically aligned at controlled misorientation. The relative rotation in between the
adjacent layers, or the twist angle between them plays a crucial role in changing the electronic
band structure of the superlattice. The assembly of multi-layers of precisely twisted two
dimensional layered materials requires knowledge of the atomic structure at the edge of the flake.
It may be artificially created by the ‘tear and stack’ process. Otherwise, the crystallographic
orientation needs to be determined through invasive processes such as transmission electron
microscopy or scanning tunneling microscopy, and via second-harmonic generation (SHG).
Here, we demonstrate a simple and elegant transfer protocol using only an optical microscope as
a edge identifier tool through which, controlled transfer of twisted homobilayer and heterobilayer
transition metal dichalcogenides is performed with close to 100% yield. The fabricated
twisted vdW heterostructures have been characterized by SHG, Raman spectroscopy and
photoluminiscence spectroscopy, confirming the desired twist angle within ∼0.5° accuracy. The
presented method is reliable, quick and prevents the use of invasive tools which is desirable for
reproducible device functionalities.
Supplementary material for this article is available online
Keywords: Moiré superlattice, heterostructure, transition metal dichalcogenides

(Some figures may appear in colour only in the online journal)

Introduction band structure [15, 16]. In twisted van der Waals hetero-
structures (tvdWHs), the angular mismatch between two
Van der Waals (vdW) heterostructures, where dissimilar similar lattices generates a large scale interference pattern,
atomically thin vdW crystals are vertically assembled have known as Moiré pattern, which strongly impact the electronic
initiated a new paradigm to create multifunctional devices band structure of the superlattice. The Moiré pattern in
with exciting novel physical properties [1–11]. In spite of the tvdWH creates a periodic potential for electrons and excitons
weak nature of vdW interactions, unusually strong interlayer to yield many interesting phenomena such as Hofstadter
coupling and hybridization in these heterostructures lead to butterfly spectrum [17], Moiré excitons [18], tunable
interfacial stress fields [12–14] and modification of electronic Mott insulator phases [19–22], and unconventional super-
conductivity [23]. The twist angle has been shown to play a
4
These authors have contributed equally to the work. crucial role in the optical properties of CVD grown twisted

0957-4484/21/455705+08$33.00 1 © 2021 IOP Publishing Ltd Printed in the UK


Nanotechnology 32 (2021) 455705 R Debnath et al

MoS2 [24], twisted WSe2 [25] and various heterobilayers Our method involves quick edge identifications using an
[18, 26, 27], and stabilizes exotic correlated phases when optical microscope only and a transfer plan for aligning the
maintained between 1° and 5°. At twist angles near 0°and respective layers. The process relies on observation of unique
near 60°, ultraflat band in twisted bilayers of MoS2 has been in-plane cleavage features in a TMDC flake, using which the
theoretically predicted [15, 28], and the computed bandwidths atomic termination at the edge of the flake can be identified
are comparable to twisted bilayer graphene [16]. Addition- and then stacked on top of each other using dry transfer
ally, low frequency interlayer shear and breathing mode technique. We primarily concentrate on two TMDCs, MoS2
[29–32] can emerge in twisted bilayer MoS2 (tBLM), where and WSe2 as simple prototypes. Because of broken sublattice
periodic potential of Moiré pattern modifies the properties of symmetry, the Moiré pattern landscape [28] is different near
phonon of its monolayer constituent MoS2 to generate Moiré 0° and 60°. Hence we demonstrate three transfer processes,
phonons [33]. homobilayer of relative twist angle near zero degree, homo-
This new paradigm of vertically stacked Lego structures bilayer with relative twist angle near sixty degree and het-
with precise twist angles between the adjoining TMDC layers erobilayer near zero degree. Post-transfer, we identify the
requires an advanced and more generalized stacking mech- angle of the artificially created Moiré lattice through a com-
anism. A core problem in the fabrication of these structures is bination of SHG, Raman spectroscopy and PL spectroscopy
the identification of crystallographic edges of the individual technique. Preliminary transport measurements show mobility
layers. The fabrication process of these tvdWH has been >300 cm2 V−1 s−1 at a bias voltage of 10 mV illustrating the
mainly concentrated on the tear and stack technique and pristine quality of the devices.
invasive atomic force microscopy (AFM) cutting technique
which is limited to homobilayers [34]. The process of
obtaining similar atomic termination is accomplished by Results and discussion
using an AFM tip to cut a large flake prior to the transfer
process [35]. This process is not always feasible since it Edge identification
requires a large flake of at least 20–30 μm. Also, the AFM tip
may introduce dust particles on the flake and the process of Crystalline layers of MoS2 and WSe2 were mechanically
cutting is highly dependent on the instrument parameters and exfoliated on 285 nm SiO2 on p++ doped Si substrate using
may lead to damage of the flake itself. In the case of twisted scotch tape technique. Single layers of MoS2 were identified
bilayer graphene, usually the process of tear and stack using Raman spectroscopy, invoking the difference in Raman
[36–38] is used to align two graphene layers. Since the edge shift between in-plane E12g and out-of-plane A1g mode, which
of an exfoliated flake can be any crystallographic orientation, is the least for a single layer (18–19 cm−1). For, WSe2, single
it is essential to align flakes with similar crystallographic layers show a highly reduced second-order Raman mode due to
orientation, otherwise, the twist angle between the two layers LA phonons (at the M point) around 260 cm−1 while a low
have an arbitrary angle, and is not the desired one. To avoid intensity peak at 308 cm−1 attributed to the rigid layer shear is
this uncertainty, usually a hexagonal boron nitride (hBN) absent. See supporting information (SI) section 1 (available
flake with a sharp edge is used to partially tear a large piece of online at stacks.iop.org/NANO/32/455705/mmedia) for ele-
graphene flake which is then stacked upon the remaining part. mentary data for Raman spectra of monolayer flakes. Each
This ensures that both the top and bottom graphene have same exfoliated flake was then observed using an optical microscope
atomic orientation at the edges. Only then can they be aligned for signatures of edge termination. MoS2 shows a high prob-
as desired. A similar process works for twisted homobilayer ability to cleave along zigzag direction if angles between two
TMDC, but with the restriction that it will be encapsulated by straight, sharp edges are 60° or multiples of 60° [43]. This was
hBN. Usually, this is an issue since edge contacts in TMDCs further confirmed from SHG measurements on the same edge.
are unfeasible and impractical for electronic property studies For all SHG mapping the horizontal axis shown in white is
because of high contact resistance [39]. Thus, prior identifi- along the armchair direction. The zigzag orientation of the
cation of the crystallographic orientation of a monolayer flakes are parallel to the edges and armchair orientations are
TMDC flake is a necessary condition for fabrication of perpendicular to the edges as shown in figure 1(a). Polarization
tvdWH. Other techniques, like second-harmonic generation dependence of SHG signal is given in SI, section 1. Even in
(SHG) spectroscopy [18], scanning tunneling microscopy WSe2, we observed similar behavior of zigzag edge termina-
[40, 41] and transmission electron microscopy [42] is tion. The edge termination determined by an optical image and
necessary for this identification. These processes are costly, through SHG map in MoS2 and WSe2 are given in
time consuming and mostly invasive in nature. figures 1(a)–(d). This in-plane cleavage behavior can be
In this study, we introduce a transfer technique that understood by the competition between the release of elastic
provides a better control for fabrication of homobilayers and energy and increase of surface energy. It is true for all other
heterobilayers of tvdWHs. For exploring the electronic and TMDC materials. It is possible that some edge angles are not
optical properties of tvdWH, two key aspects are necessary: exactly 60° but are very close to it. Since the cleavage process
(1) layer-by-layer transfer that minimizes the incorporation of is random it leads to a statistical distribution of edge angles.
residues at the interface which usually gather up as a ‘blister’ For example, in figure 1(a), the edge angle is ≈60°. There are
between layers, leading to effective decoupling between the also certain exfoliations in which the edge angles are not 60° or
layers and (2) control of the crystal axes rotational alignment. its multiples. In such cases we look for other signatures such as

2
Nanotechnology 32 (2021) 455705 R Debnath et al

Figure 1. Crystallographic orientation of MoS2 and WSe2 monolayers determined optically from edges and verified by polarization-resolved
second-harmonic generation spectroscopy. (a) WSe2 monolayer with edge angle of 60° with orientation directions determined optically. (b)
SHG spectroscopy map of the same flake with horizontal axis showing armchair edge. The sharp edges forming 60° are zigzag. (c) MoS2
monolayer with edge angle of 60° with orientation directions determined optically. (d) SHG spectroscopy map of the same flake with
horizontal axis showing armchair edge. The sharp edges forming 60° are zigzag. (e) An MoS2 flake showing no sharp edges that form 60° but
has a clean smooth crack propagating along the flake, forming a zigzag edge. (f) SHG spectroscopy map of the same flake with horizontal
axis showing armchair edge. The crack makes 30° with the horizontal axis and is along the zigzag edge. (g) A WSe2 flake showing no sharp
edges that form 60° but has a nano scroll propagating at 90° from the bulk crystal zigzag axis, and therefore an armchair edge. (h) SHG
spectroscopy map of the same flake with horizontal axis showing armchair edge and the nano scroll making 120° with the horizontal axis.

a crack or a fold in the flake. In figure 1(e) an optical image of Figures 2(a)–(e) shows overlaid micrograph of the design
a MoS2 monolayer shows a crack propagating along the flake, plan near 0°, 60° and 180°. Since the commensurate struc-
making a 120° angle. The crack propagates along the zigzag tures near 0° and 60° are different in TMDCs, it is essential to
edge as has been shown in the optical image. The SHG map of fabricate structures near 60°. We can also obtain a near 60°
the flake in figure 1(e) has horizontal axis in the armchair structure by stacking it in anti-parallel configuration, which is
direction and the crack is 30° rotated from it, confirming zigzag a 180° rotation of one flake with respect to another. This
termination. It makes ≈60° with a sharp edge of the flake. In results in AB stacking because of its three-fold crystal
another example, in figure 1(g) we show the optical image of a symmetry.
WSe2 monolayer with no sharp edges making 60° angles.
Here, the flake shows a fold or nano scroll [44]. These features We have used the dry transfer technique to prepare ver-
are usually along a crystallographic direction. We observe from tically stacked heterostructures. We first prepare poly-
the optical image, that the zigzag edge makes a 90° angle with dimethylsiloxane (PDMS) stamp by mixing SYLGARD 10
the direction of the nano scroll, proving that it is indeed along parts and curing agent 1 part and putting one small droplet of
the armchair direction. Another important observation is that, it on a clean glass cover slip. It is then baked at 150 °C for
the zigzag terminated edges are generally atomically smooth 30 min. Onto this PDMS coated glass cover slip, we spin coat
while flake termination along other crystallographic directions
polypropylene carbonate (PPC) and cure it at 70 °C for
are disordered with dangling bonds, which in turn increase the
10 mins. The PPC is then used to pick up a flake (at 60 °C)
edge roughness. We use these parameters for quick identifi-
and capture it at 40° and then released at 100 °C onto a clean
cation of atomic orientation in a monolayer TMDC through an
optical micrograph. SiO2/Si++ substrate. For aligning two layers, we use a micro-
manipulation stage, which allows rotation within an accuracy
of ≈0.1°. Figures 2(f)–(i) shows a schematic of this process.
Transfer process One monolayer is first picked by PPC, and is then aligned
The transfer process involves mapping out the alignment of with a micro-manipulator stage with respect to the second
the flakes to create a relative rotation between the two layers layer which is stationary. The bottom flake is then picked up.
and transferring them according to the design plan. After The stack is then transferred onto a clean SiO2/Si++ sub-
identification of the zigzag edges, we proceed to plan an strate. Figures 2(j)–(m) shows the real time optical images of
alignment of the flakes with a relative twist between them. the transfer process.

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Nanotechnology 32 (2021) 455705 R Debnath et al

Figure 2. Transfer process showing stacking of two layers of MoS2 at a desired twist angle. (a) and (b) Shows two monolayers with the
zigzag edges marked with arrows. (c)–(e) Shows the overlaid images of the two flakes with (c) near 0° twist, (d) near 60° twist and (e) near
180° twist angle between them. (f)–(i) Shows the schematic of the transfer process showing pick up of flakes and stacking them up followed
by release on SiO2/Si++ substrate. (f) 1st flake is being picked up by PPC/PDMS stamp. (g) The captured flake on the PPC layer. (h) The
second flake being picked up following the first one, after twisting. (i) The stack being transferred onto the substrate. (j)–(m) Shows the real
time optical images of the transfer process by PPC/PDMS stamp.

Avoiding of blisters during assembly SHG characterization of tvdWH

To avoid blister formation between the interfaces of the 2D To validate the twist angle between the heterostructure we use
materials we tried the transfer technique at different tem- SHG measurement and find an agreement between the opti-
peratures, and find that the cleanliness of the interface cally determined twist angle and that determined from SHG
depends on both the speed and temperature of the stacking microscopy within experimental error. Polarization-resolved
process. Stacking at 40 °C is apparently blister-free but after second-harmonic generation microscopy technique setup [45]
heating it above 70 °C, moisture from the surrounding air is is used for the edge identification of monolayers and the
trapped at the interface. These eventually vaporize and leads stacking angle measurement in artificially stacked TMDCs. In
to formation of an undulating landscape visible as blisters on general, monolayer TMDCs is expected to have D3h sym-
a multilayer tvdWH. The blisters are upto 50 nm tall and 2 μm metry with nonvanishing second-order nonlinear optical
susceptibility elements given as:
across, and evenly distributed over the sample, reducing the
interlayer coupling of the Moiré superlattice [37]. In contrast, c(yyy
2)
= - c(xxy
2)
= - c(yxx
2)
= - c(yyy
2)
. (1 )
stacking at high temperature such as 110 °C results in a
complete absence of such blisters, but at high temperature the Here,‘x’ and ‘y’ correspond to zigzag and armchair direction
in the crystal axis, respectively. Therefore, SHG from each
folding of the flakes and lateral shift of the materials also
monolayer response will exhibit a six-fold symmetry for both
increase due to the reduction of viscosity of PPC, increasing
parallel and perpendicular polarization with SHG signal given
the difficulty in the sequential assembly process. Hence, we
by [46]
optimized the stacking process by reducing the drop down
temperature to 60 °C and pick up temperature to 40 °C, I = I◦ + cos2 (3 (f + f◦)) , I^ = I◦ + sin2 (3 (f + f◦)). (2)
meanwhile limiting the speed of the contact area front to Here, f0 is the initial offset between the laboratory axis and
„2 μm s−1 (video given in SI) by controlling the z-height of crystal y axis and f is the azimuthal angle. We have used
the stage, resulting in a blister-free interface. AFM image of a parallel polarization configuration for edge determination
monolayer MoS2 flake before and after the transfer process is by keeping the laser polarization, and the detector analyzer
given in SI, section 2 showing the ultra-clean transfer. fixed and parallel to the lab axis. the SHG images are

4
Nanotechnology 32 (2021) 455705 R Debnath et al

Figure 3. Determination of twist angle post transfer process optically and by SHG. (A) Panel shows a near zero degree twisted bilayer MoS2.
(i) and (ii) are the two monolayers used for this transfer. Their zigzag edges are verified optically by observing the angle between two sharp
edges. (iii) Shows the twisted bilayer with the zigzag axis of both flakes. The angle between the zigzag edges of the two flakes determined
from optical image is 3 ± 0.5°. (iv) SHG map showing enhancement in SHG at the overlap region, due to formation of a near zero twisted
structure. (v) Identifying the lattice direction by SHG signal on two monolayers of MoS2 (green and red circles) and the corresponding fitting
shown in curves which confirms the near zero twist angle between them. (B) Panel shows a near sixty twisted bilayer MoS2. (i) and (ii) are
the two monolayers used for this transfer. Their zigzag edges are verified optically by observing the angle between two sharp edges. (iii)
Shows the twisted bilayer transferred by anti-parallel cinfiguration. The flakes were rotated such that 180° angle forms in between the zigzag
edges. The angle between the zigzag edges of the two flakes determined from optical image is 5 ± 0.5°, corresponding to a twist angle of 55°
in between the two layers (iv) SHG map showing low intensity in SHG at the overlap region, due to formation of AB stacking. (v) Identifying
the lattice direction by SHG signal on two monolayers of WSe2 (green and red circles) and the corresponding fitting shown in curves which
confirms the near sixty twist angle between them.

obtained from the microscopy setup over an angle range of Since the net SHG emission in the stacking region can be
90° degrees with respect to the lab axis by rotating the a result of constructive or destructive interference between the
sample placed on a rotatory mount with 5° steps. Sample two SHG field emissions depending on the stacking angle
image with maximum SHG signal is then identified θ = 0° and 60°, we can easily distinguish between the AB and
corresponding to the armchair direction within an angle AA stacking for the angle-aligned bilayer sample by com-
error of ±0.2°. paring the SHG signal of the stacking region with the isolated
For twist angle measurement of a tvdWH, the same monolayer region. Figure 3(A) shows a tBLM transfer near
method is used where SHG image for the whole twisted 0°. The zigzag directions of both flakes are shown in
bilayer sample is obtained for different f. In case of twisted figure 3(Ai-ii). The angle between the edges, post transfer as
bilayer, the net SHG emission from the stacking region will seen from the optical image is 3 ± 0.5°. It shows uniform,
be a coherent superposition of layers (E1µ I1 , E2µ I2 ), clean transfers with no blisters in between the two TMDC
along with a phase difference dependent on the stacking angle layers. The SHG map shows a higher intensity in the twisted
(θ), as shown below [47] region, corresponding to AA type stacking. From the SHG
signal, the fit curves reveal a twist angle of 3°. For a near 60°
I (q ) = I1 + I2 + 2 I1I2 cos (3q ). (3 ) transfer, we use the anti-parallel configuration technique. The

5
Nanotechnology 32 (2021) 455705 R Debnath et al

Figure 4. Characterization of twisted bilayer TMDCs using Raman and PL Spectroscopy. (a) Red shift in the E2g peak and blue shift in the
A1g peak for monolayer MoS2 and twisted bilayers at various angles. (b) Room temperature PL Spectroscopy of MoS2 twisted layers
showing presence of indirect excition peak I, which is absent in monolayer. The 60° twisted sample refers to a natural bilayer which has
indirect exciton peak at 1.5 eV. (c) Low temperature PL Spectroscopy of WSe2. The natural bilayer (60° shows indirect exciton peak XI) at
1.56 eV which is highly reduced for the homobilayer twisted at 20° and completely absent for the monolayer. The other peaks between 1.7
and 1.8 eV are intralayer excitions (X0).

zigzag edges are aligned at 180° to each other as shown in coupling between layers. Figure 4(a) shows the Raman peak
figure 3(B). The twist angle between the two edges post separation in twisted bilyaer MoS2 which has a larger
transfer is determined optically to be 5°. This corresponds to a separation compared to monolayer by almost 3–4 cm−1 and is
twist of 60–5 = 55° in real space. The fit to SHG signal shows similar or greater than bilayer MoS2. PL spectrum (shown in
a 5° twist angle between the layers. Other transfer plans and figure 4(b)) of a monolayer MoS2 [24, 49, 50] shows a high
results using WSe2, MoS2, WS2 and heterobilayers are given intensity peak at ∼1.85 eV and a lower intensity peak at
in SI (section 3). SHG on the twisted bilayer heterostructures ∼2.05 eV, which may be fitted by three Lorentzians
reveals the exact angle between the two layers within an corresponding to A exciton, A− trion and B exciton (fits to the
accuracy of 0.2° which matches well with the optically PL data are given in SI, section). It corresponds to the well
determined twist angle within an accuracy of 0.5°. The twist known excitonic transition at the K-valley of the Brillouin
angle is measured during the transfer process through the zone [51]. For a bilayer TMDC, in addition to this, we
rotational stage, post-transfer from the optical image as well observe a lower intensity peak around 1.5 eV corresponding
as after overlapping the image of the monolayers on the to a momentum indirect interlayer exciton [24, 52] (XI) peak
optical image of the heterostructure. Multiple measurements which reflects the electronic coupling strength and leads to
introduce a total error of ±0.5° to the twist angle from the hybridization of the electronic band in the Brilloiun zone. The
optical micrograph. tBLM transfers near 0° and 60° show the XI peak between
1.45 and 1.55 eV. The presence of this peak is a clear indi-
Twisted bilayer characterizations cation that the twisted layers have strong coupling between
them [52]. Figure 4(c) shows similar PL spectra of the
The twisted homobilayer TMDCs, MoS2 and WSe2 has been monolayer WSe2 as well as twisted WSe2 at 7 K temperature,
characterized by Raman, PL and SHG. We show that SHG is showing prominent indirect exciton [53–55] which indicates
not necessary to ascertain the twist angle between two layers. strong interlayer hybridization due to Moiré potential.
It can be adjudged from the optical micrograph image of the
twisted flakes and from Raman and PL spectroscopy. Inter-
Electrical characterization
action between two layers not only modifies the electronic
band structure but also the phonon vibrations in them. Raman The quality of transfer in the tvdWH were confirmed through
studies on MoS2 shows that the separation between the two electrical measurements in field-effect transistor (FET) con-
peaks (E2g and A1g) can effectively characterize the interlayer figuration. Figure 5(a) shows the optical micrograph of tBLM
mechanical coupling between layers [45]. Larger separation at an angle of 55°. Figure 5(d) shows linear output char-
[48] (25 cm−1, seen in bulk MoS2) corresponds to greater acteristics between electrodes 1 and 3 as shown in figure 5(b)

6
Nanotechnology 32 (2021) 455705 R Debnath et al

Figure 5. Electrical characterization of 55° twisted bilayer MoS2 at room temperature. (a) Optical image of the twisted bilayer MoS2.
(b) Optical image after fabrication of Cr/Au electrodes. (c) Schematic of the device structure. (d) Ids versus Vds curves for different back gate
voltages. (e) Transfer characteristics for Vds = 10 mV. (f) Field effect mobility of the twisted MoS2 device as a function of gate voltage.

of the twisted bilayer FET at different gate voltages, showing rapid and ultra-clean transfer process will be beneficial to
the absence of Schottky barrier at room temperature. In fabricate twisted TMDCs where correlated physics is still
figure 5(e) We show the variation of source-drain current (Ids) largely unexplored.
as a function of backgate voltage (Vbg) with forward and
backward sweep. It shows negligible hysteresis, implying
minimal potential fluctuations. The conductance was achieved Materials and methods
at the positive gate voltage implying n-type transport
behavior. Field effect mobility is also extracted from the Experiment
transfer characteristics, showing values >300 cm2 V−1 s−1
(figure 5(f)) at 10 mV source-drain bias (Vds), implying less PL and Raman spectroscopy: Raman and PL spectra of
scattering due to impurity [56–58]. This demonstrates the MoS2 flakes were done by using Horiba LabRAM HR
quality of devices which is essential for low temperature spectrometer. 532 nm laser with laser power less than 1.5 mW
electronic transport measurements. was used for spectroscopy measurement.
SHG measurements: A femtosecond laser (Fidelity HP-
10 laser, 80 MHz repetition rate, wavelength at 1040 nm and
pulse duration of 140 fs) was used as the light source. We
Conclusion used 4 mW linearly polarized light focused to a diameter of
1 μm for excitation, and collected the SHG signal using a
In summary, we have presented a simple, controllable method spectrometer coupled with a charge-coupled device.
for rapid fabrication of tvdWH, with a twist angle measure-
ment accuracy of 0.5° which can be determined solely by
optical microscopy. This generalized method can pave the Acknowledgments
way for fabrication of high quality, controllable twisted
tvdWH without use of expensive and elaborate edge identi- The authors thank the financial support from the Department
fication tools. For accurate crystallographic edge identifica- of Science and Technology, Government of India and
tion, observing the optical micrograph for unique features is Supercomputer Education and Research Center (SERC) at
sufficient. We have illustrated the validity of the technique by IISc for providing computational resources. The authors also
performing SHG spectrosocpy on these tvdWHs and it is in thank the Ministry of Electronics and Information Technol-
quantitaive agreement with what is determined optically. The ogy, Government of India. The authors acknowledge financial
tvdWH show high mobility at room temperature which support from U.S. Army International Technology Center
authenticates a clean transfer process. Our comprehensive Pacific (ITC-PAC).

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Nanotechnology 32 (2021) 455705 R Debnath et al

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