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  • Quiz 5 Vlsi Sea19015 Mohd Ikhwan A Rahman

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    This document is a quiz taken by Mohd Ikhwan Bin Abdul Rahman for the course BEE4553 - VLSI Design & Process. The quiz contains two questions about photolithography. Photolithography is [1] the process of transferring a designed circuit pattern onto a silicon wafer, [2] it is the most important process in integrated circuit fabrication as it consumes 40-50% of total wafer processing time, and [3] determines the minimum feature size such as 0.18um in 2000 and 70nm in 2004. The requirements for photolithography include [1] high resolution, [2] high photoresist sensitivity, [3] precision alignment within 10% of minimum feature size,

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    Quiz 5 vlsi sea19015 mohd ikhwan a rahman

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    This document is a quiz taken by Mohd Ikhwan Bin Abdul Rahman for the course BEE4553 - VLSI Design & Process. The quiz contains two questions about photolithography. Photolithography is [1] the process of transferring a designed circuit pattern onto a silicon wafer, [2] it is the most important process in integrated circuit fabrication as it consumes 40-50% of total wafer processing time, and [3] determines the minimum feature size such as 0.18um in 2000 and 70nm in 2004. The requirements for photolithography include [1] high resolution, [2] high photoresist sensitivity, [3] precision alignment within 10% of minimum feature size,

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    7 views1 page

    Quiz 5 Vlsi Sea19015 Mohd Ikhwan A Rahman

    Uploaded by

    Muhammad Naguib
    This document is a quiz taken by Mohd Ikhwan Bin Abdul Rahman for the course BEE4553 - VLSI Design & Process. The quiz contains two questions about photolithography. Photolithography is [1] the process of transferring a designed circuit pattern onto a silicon wafer, [2] it is the most important process in integrated circuit fabrication as it consumes 40-50% of total wafer processing time, and [3] determines the minimum feature size such as 0.18um in 2000 and 70nm in 2004. The requirements for photolithography include [1] high resolution, [2] high photoresist sensitivity, [3] precision alignment within 10% of minimum feature size,

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    of 1

    BEE/2223I

    FAK. TEK. KEJURUTERAAN ELEKTRIK & ELEKTRONIK


    UNIVERSITI MALAYSIA PAHANG
    26300 KUANTAN, PAHANG.

    BEE4553 – VLSI Design & Process


    Quiz 5

    Name: Mohd Ikhwan Bin Abdul Rahman

    ID: SEA19015

    Question:
    1. What is photolithography?
    i. Temporarily coat photoresist on wafer and Transfers designed pattern to photoresist
    …………………………………………………………………………
    ………………………………………………………………………………
    ii. The most important process in IC fabrication
    ………………………………………………………………………………
    ………………………………………………………………………………
    iii. To consume 40 to 50% total wafer process time
    ………………………………………………………………………………
    ………………………………………………………………………............
    iv. Determines the minimum feature size, e.g. 0.18um technology in 2000,
    ………………………………........................................................................
    70nm technology in 2004, 30nm
    ........................................................................................................................

    2. What are the requirements of photolithography?

    i. High Resolution
    ………………………………………………………………………………
    ………………………………………………………………………………
    ii. High PR Sensitivity
    ………………………………………………………………………………
    ………………………………………………………………………………
    iii. Precision Alignment, say within 10% of minimum feature size
    ………………………………………………………………………………
    ………………………………………………………………………………
    iv. Precise Process Parameters Control •Low Defect Density
    ………………………………………………………………………………
    ………………………………………………………………………………

    DRFBS @ FTKEE UMP

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