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Abstract
Highly transparent crystalline manganese sulfide (c-MnS) thin films were prepared on glass substrate by chemical bath deposition
(CBD) method at room temperature (27 °C). The refractive index n(k), extinction coefficient k(k) and film thickness t are evaluated from
spectrophotometric transmittance spectrum by using envelope method. The optical band gap of the film was estimated to be 3.88 eV.
XRD measurements show that the MnS films are crystallized in the wurtzite phase and present a preferential orientation along the
c-axis. The effect of trisodium citrate on crystalline films has been determined. The grain size of the film is estimated to be 29.8 nm using
by the Scherrer’s formula.
Ó 2006 Elsevier B.V. All rights reserved.
*
Corresponding author. Tel.: +90 322 338 62 69; fax: +90 322 338 60
Manganese sulfide thin films were deposited on commer-
70. cial microscope slides using CBD method at room temper-
E-mail address: cgumus@cu.edu.tr (C. Gümüsß). ature. Before the deposition the substrate was etched with
0925-3467/$ - see front matter Ó 2006 Elsevier B.V. All rights reserved.
doi:10.1016/j.optmat.2006.04.012
1184 C. Gümüsß et al. / Optical Materials 29 (2007) 1183–1187
diluted hydrochloric acid (5%), cleaned in deionized water, trum for the first 24 h deposition due to very thin film, but
with propanol, methanol, washed with deionized water and the following deposition periods of 48, 72 and 96 h give
finally dried in air. Aqueous solutions of manganese ace- good transmission spectra with interference fringes. In
tate [Mn(CH3COO)2] was used as manganese source, thi- order to explain the growth mechanism of MnS film the
oacetamide (CH3CSNH2) as sulfur source, ammonia/ three competing processes can be considered; homogenous
ammonium chloride (NH3/NH4Cl) (pH = 10.55) as buffer, deposition, heterogeneous precipitation and ion-by-ion
triethanolamine [N(CH2CH2OH)3] and trisodium citrate growth. Homogenous deposition makes poorly performing
(C6H5Na3O7) as complexing agents for depositing MnS films because they are formed from adsorption of MnS par-
thin films. Each deposition was carried for 24 h. The depo- ticles and not by ion–ion deposition [26]. We have opti-
sition rate was about 8.6 nm/h. For thicker films the sam- mized the heterogeneous process by preparation of the
ples were placed in new unused bath. This step was glass surface with adequate cleaning and etching. As a
repeated for 24 h periods until the required thickness was result of good substrate, film quality is strongly affected
obtained. The physical characterization of the films have by the initial nucleation process. Under the suitable process
been reported elsewhere [23]. The optical transmission data conditions, nucleation centers took place on the substrate
in the wavelength range of 200–1100 nm were recorded on surface results from preferential adsorption of either
Lambda 2S ultraviolet/visible spectrophotometer (Perkin Mn2+ or S2 ions. Condensation of Mn and S ions on this
Elmer) at room temperature. initial layer results in faster deposition rate after the first
24 h. The basic mechanism of film formation was supposed
3. Results and discussion to be an ion-by-ion condensation of Mn2+ and S2 on the
substrate from an aqueous medium. Multiple dips in fresh
MnS thin films or powders can be found in several poly- baths every 24 h period were successful in obtaining thicker
morphic forms: the cubic modification having the rock-salt ordered films. Fresh complexing agent provides us with
type structure (a-MnS) which is the most common form at enough amounts of manganese and sulfide ions which
ambient conditions, by low temperature growing tech- resulted in a continuous increase of the film thickness.
niques it crystallizes into the zinc-blende-type (b-MnS) or Growing mechanism of MnS thin films by CBD was
wurtzite-type structure (c-MnS) [24,25]. The CBD derived reported in Lokhande et al. [20] and in Fan et al. [19]. In
MnS films in the previous studies at room temperature contrast to our results they are reporting very fast deposi-
were amorphous [19,20]. We have succeeded to prepare tion rate at room temperature with homogenous precipita-
crystalline c-MnS thin film by CBD at room temperature tion resulting in amorphous films. The reported MnS films
and suitable deposition conditions to obtain MnS film were growth rate are 200 nm [19] and 300 nm for 120 and 30 min
identified [23]. [20] deposition time respectively. In the present case, we
The variation of film thickness with time is shown in have deposited 1120 nm MnS film in 96 h at room temper-
Fig. 1. Initially for the first 24 or 45 h the increase of the ature. Our deposition rate was slower than the previous
film thickness is slow, deposition rate goes up and the film studies [19,20] and the process was based on the slow
thickness increases linearly with deposition time. We could release of Mn2+ and S2 ions in solution, which then con-
not observe the interference fringes from transmission spec- densed in an ion–ion basis on the substrate. The deposition
of MnS takes place through the condensation of the man-
ganese and sulfide ions on this initial layer which acts as a
1200 catalytic surface resulting well ordered films.
o
27 C The thickness of the film was calculated using the fol-
1000
lowing relation:
1
nðk1 Þ nðk2 Þ
800 t¼ 2 ð1Þ
k1 k2
Thickness (nm)
600 where n(k1) and n(k2) are the refractive indices at the two
adjacent maxima (or minima) at k1 and k2.
Fig. 2 shows X-ray diffraction (XRD) patterns of the
400
MnS thin films, which were prepared using two different
complexing agents at room temperature. The film prepared
200 using solutions of manganese acetate [Mn(CH3COO)2] as
manganese source, thioacetamide (CH3CSNH2) as sulfur
40 50 60 70 80 90 100 source, ammonia/ammonium chloride (NH3/NH4Cl) as
Time (hours) buffer, triethanolamine [N(CH2CH2OH)3] as complexing
Fig. 1. Film thickness versus duration of deposition for MnS thin films agent was mainly amorphous or poor crystalline (see
obtained by the chemical bath deposition technique. The bath temperature Fig. 2a). In contrast, another film prepared by adding triso-
is indicated in the figure. dium citrate (C6H5Na3O7) into the complexing agents was
C. Gümüsß et al. / Optical Materials 29 (2007) 1183–1187 1185
(002)
approximately 325 nm agrees well with the previous results
[29,30]. It is important to note that transmission spectrum
Intensity (arb. units)
2.06
Tm
2.04
Transmission (%)
2.02
Refractive index, n
50 2.00
1.98
1.96
1.94
1.92
0
200 300 400 500 600 700 800 900 1000 1100 1.90
Wavelength, λ (nm) 300 400 500 600 700 800 900 1000 1100 1200
Wavelength, λ (nm)
Fig. 3. Optical transmittance spectrum of MnS with envelope. The peak
maximum points TM and peak minimum points Tm, are indicated. Film Fig. 4. Variation of refractive index n versus wavelength at room
possess high optical transmission in the visible range. Deposition temperature for MnS film. The value of n is nearly constant for the
temperature is indicated in the figure. Visible–IR region.
1186 C. Gümüsß et al. / Optical Materials 29 (2007) 1183–1187
Extinction coefficient, k
0.18
mined from transmittance measurements. The calculation 0.16
of the absorption coefficient of the film in this region was
calculated using the following expression: 0.14
1 0.12
a¼ lnðT Þ ð3Þ
t 0.10
3. 0 12.0
Reflectance (%)
2. 5
11.5
2. 0
α2.1010 (cm-2)
11.0
1. 5
1. 0 10.5
0. 5
10.0
0. 0 300 400 500 600 700 800 900 1000 1100 1200
Wavelength, λ (nm)
3.0 3.2 3.4 3.6 3.8 4.0 4.2
Energy (eV) Fig. 7. Calculated reflection spectra of crystalline (d) and poor crystalline
(j) MnS thin films. Poor crystalline film has higher value of reflectivity
Fig. 5. Plot of a2 versus photon energy hm for the MnS thin film. than crystalline film.
C. Gümüsß et al. / Optical Materials 29 (2007) 1183–1187 1187
2
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