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Review article

Journal of Micromanufacturing
1–19
Review of several precision finishing © The Author(s) 2018
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DOI: 10.1177/2516598418777315
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Gourhari Ghosh1, Ajay Sidpara1, P. P. Bandyopadhyay1

Abstract
The ultrasmooth optical components with atomic-order surface roughness and nanometre-level shape accuracy are in
immense demand with the rapid advancement of modern optical technology. In recent years, aspherical and free-form sur-
faces are gaining more interest for its favorable properties. Moreover, the new optical materials with immensely enhanced
mechanical properties are being developed to meet the stringent requirements of modern optics. Fabrication of com-
plex-shaped ultrasmooth optical components becomes a significant challenge as conventional finishing techniques are unable
to machine aspherical or free-form surfaces precisely. This situation demands some highly deterministic finishing processes.
Mostly, the optical components are fabricated by shaping or pre-finishing methods followed by final finishing processes. In
the shaping or pre-finishing methods, the rigid abrasive tools are used to remove the material at an enhanced rate and near
net shape of the elements can be attained. Surface finish and shape accuracy can also be improved to some extent. Owing
to the presence of residual finishing marks generated by shaping methods, the application of the components is limited to
the infrared (IR) optics. Final finishing processes include more deterministic and flexible polishing techniques that can achieve
desired surface finish, figure accuracy and surface integrity to make it suitable for shorter wavelength applications. In recent
years, single point diamond turning, precision grinding, plasma chemical vaporization machining and magnetorheological flu-
id-based finishing are widely used for fabricating ultrasmooth optics. In this article, principle, mechanism of material removal
and applicability of the aforementioned precision finishing processes to different materials are discussed.

Keywords
Optics fabrication, diamond turning, precision finishing, surface roughness, shape accuracy

Introduction properties as well as to improve the performance of optical


components.6,7 SSD has a detrimental effect on the stability
In recent days, the leading fields in science and technology of the optical system and image quality.2
demand of ultrasmooth optical components for many appli- The imaging quality of the optical components is also
cations. Ultraprecision optical components are widely used significantly affected by geometrical aberrations. The aspher-
in microelectromechanical system (MEMS), semiconductor ical optical components can improve the image quality by
industry, synchrotron beamline, astronomical telescopes, def- correcting the spherical aberrations. Furthermore, multiple
ence equipment, etc.1,2Moreover, high power laser systems, optical components can be replaced by a single asphere to
extreme ultraviolet lithography systems (EUVL) and syn- reduce the size and weight of the system, and that leads to the
chrotron radiation beamline demand less than 1 Å surface improvement of the image quality also.6,8 Characteristics of
roughness and nanometre-level shape accuracy.3,4 Therefore, the optical components also rely on its atomic structure and
fabrication of ultraprecision optical components becomes the chemical composition. Optical materials can be subdivided
major priority for the optical manufacturers. into following groups.9,10.
Optical components are the heart of an optical system.
Figure 1 shows the characteristics of optical components and
their effect on the performance of the components.5 The prop- Mechanical Engineering Department, Indian Institute of Technology
1

erties of the optical component have a significant impact on Kharagpur, Kharagpur, India
the direction of propagation, the intensity and the polarization
Corresponding author:
state of light rays.6 The fabrication techniques are selected
Ajay Sidpara, Mechanical Engineering Department, Indian Institute of
carefully to create an ultrasmooth surface without any sur- Technology Kharagpur, Kharagpur, India.
face or subsurface damage (SSD) to maintain the desirable Email: ajaymsidpara@mech.iitkgp.ernet.in
2 Journal of Micromanufacturing

1. Crystalline materials (sapphire, calcium fluoride (EUVL) system as they can retain their properties under the
[CaF2], germanium [Ge], silicon [Si], etc.) influence of high heat flux.11 Single crystal silicon becomes
2. Glasses (BK7, fused silica, etc.) most prominent material for front-end optics in synchrotron
3. Low thermal expansion materials (Ultra low expan- beamline owing to its high heat conductivity, low degradation
sion [ULE], Clearceram, Zerodur, etc.) quality and low thermal expansion coefficient. Zerodur, fused
4. Advanced ceramics (ALON, spinel, zinc sele- silica and metal mirror made of aluminium, copper with elec-
nide [ZnSe], cordierite, silicon carbide (SiC), zinc troless Ni-coating can be used where beam exposure is not
sulphide [ZnS], etc.) much intensive.12,13 Recently, beryllium (Be) is gaining inter-
5. Metals (aluminium [Al], copper [Cu] or GlidCop est for the space optics for its light weight and high strength.
with electroless nickel coating, etc.) Chemical vapor deposited (CVD) silicon carbide mirrors are
Low thermal expansion materials such as ULE glass and widely used for astronomical applications.12 Optical materials
Zerodur are mostly used in extreme ultraviolet lithography for manufacturing optical components and its application are
given in Table 1.

Figure 1. Characteristics of optical components.

Table 1. Optical materials and its application.

Optical components Material Application


Precision lenses Zinc selenide (ZnSe), zinc sulphide Dental imaging, dermatology, endoscopy, lasers, machine vision
(ZnS), germanium (Ge), silicon (Si) inspection, metrology, projection, surveillance, thermal imaging.
Synchrotron mirror Single crystal silicon, Zerodur, fused Synchrotron beamline, X-ray free electron laser (XFEL).
silica, ultra low expansion glass (ULE),
SiC, Cu and Al with electroless Ni layer
EUVL mirror ULE, Zerodur EUVL lithography, high-order harmonics applications.
Optical windows and ZnSe, ZnS, Ge, common glasses, fused Biomedical instrumentation, corrosive chemistry, infrared (IR)
flats silica, glass ceramics imaging, laser cavities, machine vision, multiphoton imaging.
Waveplates Crystal quartz, magnesium fluoride Aerospace, astronomy, biomedical, military, optical isolation,
(MgF2) remote sensing, semiconductor metrology, spectroscopy, surveil-
lance.
Infrared Optics ZnSe, ZnS, Ge, calcium fluoride (CaF2), Hyperspectral imaging, IR microscopy, laser scanning microscopy,
MgF2, Si, sapphire range finding, surveillance, target identification, thermal imaging.
(Table 1 Contianued)
Ghosh et al. 3

(Table 1 Contianued)

Optical components Material Application


Optical Domes ZnSe, ZnS, Ge Seeker head optics, submersibles, underwater cameras, missiles.
Precision Mirrors Metallic coating: Gold (Au), Platinum Laser cavities, laser range finders, target designators.
(Pt), Al others
Sources: https://goochandhousego.com/product-categories/precisionoptics (accessed 25 December 2017); http://www.standaphotonics.com/off-axis-mir-
rors/synchrotron-radiation-and-extra-uv-mirrors.php1 (accessed 25 December 2017).

Figure 2. Precision finishing processes for fabrication of optical components.

SPDT: single point diamond turning, ASJM: abrasive slur- material is used for finishing in electrochemical/chemical fin-
ry jet machining, NCJM: nanoparticle colloid jet machining, ishing processes. The hybrid finishing technique combines the
SAG: shape adaptive grinding, ERF: electrorheological finish- working principle of many processes.
ing, MRF: magnetorheological finishing, EAMF: electrolytic In past years, a new finishing process, namely comput-
abrasive mirror finishing, HECM: hydroxyl electrochemical er-controlled polishing (CCP) has been developed to finish the
machining, CMP: chemomechanical polishing, IBF: ion beam complex-shaped surface efficiently. The CCP is a well-defined,
figuring, PJCE: plasma jet chemical etching, PCVM: plasma deterministic material removal process with sub-aperture and
chemical vaporization machining. conformal finishing tool. The small polishing tool enables the lo-
Since 1980, many polishing techniques have been devel- cal material removal from the surface. The polishing procedure
oped to meet the demand of optics fabrication. Many conven- is evaluated prior to the processing based on the residual surface
tional finishing processes were used previously to perform profile errors and material removal function (i.e., influence func-
initial finishing of the components. However, they are unable tion). Material removal is controlled by varying the dwell time.
to generate and polish aspherical or free-form surfaces owing Greater material removal is achieved by moving the polishing
to the lack of determinism, long interactive time and unsta- tool slowly over the surface and vice versa.18
ble convergence in the process. Furthermore, a large rigid tool The overview of the technique, material removal
cannot fit with the very small and steep curvatures of the sur- mechanism, process parameters, advantage and limitation,
faces. Surface or subsurface defects such as dislocations and and the applicability of deterministic micro/ultraprecision
micro cracks cannot be avoided as the material is removed grinding, ion beam figuring (IBF), nanoparticle colloid jet
through the plastic deformation or brittle fracture.16,17 Figure 2 machining (NCJM) and elastic emission machining (EEM)
shows the classification of the precision finishing techniques are reported previously in detail by Ghosh et al.19 In this
based on their working principle. In mechanical precision fin- present study, principle, mechanism of material removal
ishing processes, the abrasive particles interact with the work and applicability to different materials of single point dia-
surface either as a rigid tool or a tool with flexible backing, mond turning (SPDT), precision grinding, plasma chemical
or with a fluid medium. In electrorheological/magnetorhe- vaporization machining (PCVM) and ER/MR fluid-based
ological (ER/MR) fluid-based processes, ER or MR fluid is finishing processes are discussed.
used for finishing. A suitable chemical etchant for a particular
4 Journal of Micromanufacturing

Precision finishing techniques used for enough without any defects.23 Lower cutting force is expected
fabrication of optical components as the feed and depth of cut are much lower as compared to
the conventional machining. It has the ability to finish metal
Multiple finishing processes are often required to finish the such as Cu and Al to achieve nanometre-range surface rough-
components suitably. Fabrication of super smooth optical ness and figure accuracy. Furthermore, high stiffness, accu-
components consists of shaping or pre-finishing mode racy and lower cutting force associated with the diamond
followed by final finishing mode. Near net shape can be turning machine make it suitable for precision finishing of
imparted by shaping or pre-finishing mode where the surface brittle materials. Figure 4 shows the fishbone diagram of
roughness and form error are reduced to some acceptable parameters that have a significant effect on surface rough-
level. In this study, SPDT and precision grinding with elec- ness and form accuracy.Chip removal mechanism of brittle
trolytic in-process dressing (ELID) are discussed as shaping material in diamond turning can be classified into two modes:
or pre-finishing processes. The final polishing of the optical one is plastic deformation along the slip plane and the other
components is performed using more deterministic and flex- is cleavage fracture on cleavage plane as shown in Figure 5.22
ible finishing processes to achieve the desired level of surface The mode of material removal mechanism depends on the
roughness, form accuracy and without any SSD. PCVM and resolved shear stress on slip plane (Figure 5 (a)) and the tensile
ER/MR fluid-based finishing are discussed as the final step stress on the cleavage plane (Figure 5 (b)). The densities of the
polishing of optical components. defects and dislocation have a significant effect on the critical
values of cleavage and plastic deformation. In case of brittle
Single point diamond turning (SPDT) materials, the critical value of fracture depends on the size of
the stress field only as the density of defects which leads to the
SPDT of optics was started in 1960, but it became an impor- cleavage is small. Besides the density of the dislocations in a
tant fabrication technique for optical components after 1970. small stress field is also enough to cause the plastic deforma-
Even though it looks like a normal lathe operation (mostly tion.24 Figure 6 shows chip removal model with a size effect.
facing), the machine is equipped with nanometric controller
accuracies, fast machining algorithm and sophisticated auxil-
iary system.20 SPDT is a precision machining technique
and has the ability to produce an aspherical or free-form
surface with deterministic form accuracy. It is performed
by engaging a single point diamond tool in a high preci-
sion lathe under controlled environment.21 The efficiency of
this process depends on the stiffness of the machine, accu-
racy of feedback control system with laser metrology and
reliability of single crystal diamond tool.22 Diamond turning
machine must be stiff enough to avoid the effect of vibration
or other external disturbances on the cutting tool movement.
A schematic diagram of a diamond turning machine is shown
in Figure 3.20 To produce high quality optical components,
the cutting tool should move precisely, and it should be sharp Figure 3. Schematic diagram of diamond turning machine.

Figure 4. Fishbone diagram of process parameters affecting SPDT operation.


Ghosh et al. 5

When the depth of cut is very small, the size of the crit- Figure 7. It is observed that the region of plastic deforma-
ical stress field is sufficiently small to avoid the initiation of tion is separated from the region of brittle fracture by a crit-
cleavage failure which starts from the defects. Hence, the ical chip thickness (dc). Plastic deformation is predominant
brittle–ductile transition of material removal mechanism below (dc) and microfracture is dominant above (dc). It is
may take place when the uncut chip thickness is small. conceived that the microfracture damage is initiated at
the critical chip thickness (dc) and it propagates to a depth
(yc). The ductile-mode machining is executed until the
microfracture damage penetrates the machined surface. The
remaining fracture damages in the uncut shoulder, which do
not penetrate the machined surface, can be removed during
subsequent tool passes.27

(a)    (b)
Figure 5. Model of chip removal: (a) plastic deformation on slip
plane and (b) cleavage fracture on cleavage plane.
Source: Nakasuji et al.22

Figure 7. Model for ductile-regime machining.


Source: Blackley and Scattergood.27

Hence, it can be concluded that the brittle materials which


possess a short crack length can be machined successfully us-
ing SPDT. The parameters such as tool rake angle, clearance
angle and feed have significant effects on the critical chip
thickness. For executing ductile-regime machining, high neg-
(a)    (b) ative rake angle is desirable because it can produce sufficient
hydrostatic pressure in the cutting zone which leads to plastic
Figure 6. Chip removal model with a size effect in terms of defects deformation.28 Moreover, the brittle–ductile transition also re-
distribution: (a) small depth of cut and (b) large depth of cut. lies on the relation between the crystallographic orientation of
Source: Nakasuji et al.22 the grains of the workpiece and the cutting direction.22 SPDT
is successfully used to machine varieties of materials such as
Bifano et al.25 proposed that at a low depth of cut, the Al, Cu, Be, electroless Ni, CaF2, MgF2, ZnSe, ZnS, Ge, po-
energy required for plastic yielding is less to propagate a tassium dihydrogen phosphate (KDP), single crystal Si, single
crack. Hence, plastic deformation will become predomi- crystal SiC, reaction bonded-SiC (RB-SiC), CVD coated SiC,
nant. Scattergood and Blake26 suggested a model for the etc.23 Processing of different materials by SPDT and major
ductile regime machining of brittle materials as shown in finding of the reported works are mentioned in Table 2.

Table 2. Literature survey of processing of different materials by SPDT.

Authors Materials Major findings


Cheung et al.29 Aluminium alloy • P ower spectrum analysis of roughness profile can be employed to correlate different process
parameters and mechanisms of surface generation.
• Tool interference and materials swelling have a significant effect on the surface roughness.
Chao et al.30 Single crystal • The tool geometry has significant effects on the material removal and the tool wear rate.
silicon • Better surface finish (Ra ≤ 5 nm) and no obvious tool wear were observed by using a ruling
tool. Whereas, very poor surface finish and rapid tool wear rate were perceived by using
round-nosed tools.
(Table 2 Contianued)
6 Journal of Micromanufacturing

(Table 2 Contianued)

Authors Materials Major findings


Zhong et al.31 Oxygen-free high • Feed rate and cutting depth have a significant influence on machining.
thermal conduc- • A 2.6 nm (Sq) surface roughness is achieved using 1.4 µm rev-1 feed rate and 1 µm cutting depth.
tivity copper
Zhou et al.32 Al 6061 • B y adjusting tool offset and tool height precisely, spherical surface a nano-scale form accuracy
was accomplished.
• The tool edge roundness and tool set-up error have a profound effect on form accuracy.
Yan et al.28 Single crystal CaF2 • Under the wet condition, two types of microfracturing are noticed: one in high tool feed and
the other in low tool feed.
• The tool with –20° rake angle is most suited for ductile machining. Dry machining leads the
possibility of the ductile cut.
• Crystallographic orientation has a significant effect on machining. The largest fracture was ob-
served on the (112) orientations, while the (101) orientations show ductile machining.
Yan et al.33 RB-SiC • Grain size has a significant effect on machine surface roughness rather than the feed.
• No phase transformation of the 6H-SiC grains was observed during machining while amorphiza-
tion of Si bond component was taken place.
• The mechanism of material removal involves ductile cutting, cleavage cracking and grain
dislodgement.
• Large fractures were not observed owing to the ductile response of the Si bond and fracture
energy releasing effects at the grain boundaries.
Chon et al.34 Electroless nickel • A surface roughness of 0.95 nm (rms) was accomplished within the stable cutting mode
• Cutting speed and the depth of cut have very less effect on the surface roughness.
• When the depth of cut and the feed rate were less than 0.5 µm and 0.5 µm rev-1, respectively,
the surface roughness was increased.
Luo et al.35 CaF2 • Surface roughness (Ra) of 2 nm and form accuracy (p-v) of 26 nm have accomplished using 1 μm
rev-1 feed rate and white spirit as a coolant.
• To obtain better surface quality, feed rate up to 5 μm rev-1 is recommended.
Goel et al.36 Single crystal SiC • A surface roughness of 9.2 nm (Ra) was attained using distilled water with a pH value of 7 as a
coolant.
• The mechanism for material removal involves ductile deformation and brittle fracture.
• The cutting force during machining of SiC was 2.5 times higher than the single crystal Si.
Vaclavík et al.37 Gallium phosphide • Cutting speed has less effect on the surface quality of the workpiece.
• The good quality surface was observed at a low depth of cut (1 μm) and low feed rate (2 μmrev-1).
Beaucamp Electroless • Aspheric surface with form accuracy of 100 nm p-v was generated.
et al.38 nickel plating • Turning marks were visible on the finished surface.

Recently, SPDT is coupled with the micro-laser assisted turning is the employment of simultaneous coordinated mo-
machining to improve the machining efficiency. During the tion at a high spindle speed and feed motion in the z-direction.
machining of brittle material, high-pressure phase transfor- The interesting surface features like diffraction gratings can
mation (HPPT) occurs in the machining zone owing to the be generated using such coordinated motion.20 Yuan et al.41
high compressive stresses induced by the tool tip. A laser developed a technique to monitor the surface roughness
beam is propagated through an optically transparent diamond during the diamond turning process. It is observed that the
tool and focused precisely at the HPPT zone (i.e., tool–work- surface undulations are highly correlated to the force vari-
piece interface). The material in the HPPT zone gets soften ations. Hence, the variation in surface roughness can be
by absorbing the laser radiation and that leads to the lower assessed by monitoring the force signals. Little advancement
cutting forces.39 Furthermore, this hybrid machining tech- in the development of a new form of polycrystalline diamond
nique increases the critical depth of cut to perform the duc- tool is reported by Dubrovinskaia et al.42 This is accomplished
tile-mode machining, resulting in a higher material removal by aggregating nano-crystalline diamond particles without
rate. Odorless mineral spirit (OMS) is used as a cutting fluid any binder. This new material named as aggregated diamond
to minimize the tool wear and to flush away the minute chips nanorod (ADNR) has better wear resistance, hardness, frac-
from the machining zone.39,40 Mohammadi et al.40 have suc- ture toughness than the single crystal diamond. Chan et al.43
cessfully reduced the surface roughness (Ra) of single crys- investigated the use of nano-droplet-enriched cutting fluids
tal silicon (111) from 770 nm to 3.2 nm using this process. (NDCF) in diamond turning. NDCF is a mixture of water
Radial spokes are eliminated completely which generally oc- and mineral oil, and the fluid oil exists in the form of nano-
curs during diamond turning owing to the crystallographic droplets. The formation of nanodroplets reduces the viscosity
orientation effect. Another recent advancement of diamond of the fluid that leads to the better spreading of the fluids.
Ghosh et al. 7

As a result, the NDCF has the ability to penetrate deeply into layer. Hence, the diamond-turned surface should be further
the tool–chip and tool–work interfaces, resulting in a better polished to remove the turning marks as well as SSD for mak-
lubrication effect at these interfaces. Furthermore, it can cool ing them suitable for shorter wavelength application.
the surface much better by taking the latent heat of vaporiza-
tion, and hence a surface without any defect can be attained. Precision grinding with electrolytic in-process dressing
Guan et al.44 have reported the diamond turning of potassi- (ELID)
um dihydrogen phosphate (KDP) crystal. The KDP possesses
very low fracture toughness, and is very sensitive to thermal ELID, is an electrochemical technique for tool conditioning,
damage and also it absorbs water easily. A polishing chain is used to improve the performance of microgrinding.46 A
consists of diamond turning followed by polishing, and at the metal bonded (i.e., cast iron) grinding wheel, a power source,
last IBF is identified to give desired shape and surface finish. an electrode and an electrolytic coolant are the main compo-
Abou-El-Hossein et al.45 reported the diamond turning of a nents of the ELID system as shown in Figure 8 (a).47
Cu–Cr–Zr alloy which is used in die, molds and optical com- The cast iron-bonded grinding wheel is connected to the
ponents. The presence of hard precipitates and surface oxides positive pole of the power supply unit and it acts as an anode.
in the alloy makes it difficult to machine. The negative electrode is made of highly conductive materi-
Besides to perform efficient machining operation, a very al such as graphite and copper and located 0.1 mm–0.3 mm
sharp cutting tool with an edge radius of a few tens of nano- apart from the grinding wheel.48 The electrode covers at least
metres is recommended. Such uniform properties can be ob- one-sixth of the grinding wheel surface. The electrolytic cool-
tained in the single crystal materials and too much attention ant is supplied to the grinding zone using a nozzle. During an
is required to prepare the cutting edges with a desired crys- ELID cycle, voltage, dressing current and pulse width can be
tallographic orientation. This process involves remarkable controlled by power supply unit for improving the effective-
expertise for the tool developments, resulting in increases in ness of the process. In ELID, the metal bond is dissolved due
the tooling cost. To impart smooth cutting motion and feed to which the blunt grits are dislodged from the wheel and new
motion, the tool and the work materials have to be mount- sharp grits are exposed continuously.
ed on vibration-free high precision-sliding bearing systems. In the first stage, sharp abrasive grits along with the bond-
In those bearing system, temperature controlled pressurized ing material of the grinding wheel are flattened out by truing.
fluids (such as oil or air) is used in the small gap between Thereafter, ELID pre-dressing starts to expose the sharp grits
the contacting elements to eliminate the mechanical contact. on the trued wheel. As the pre-dressing continues, the bonding
The need of such specialized bearing system possesses high material dissolves continuously and an oxide layer is formed
capital investment. Although SPDT is an efficient finishing on the wheel surface. The oxide layer has an insulating proper-
process for fabrication of aspheric or free-form optical com- ty; as a result, the electrical conductivity of the grinding wheel
ponents, its application is confined to the IR optics owing is reduced and the further dissolution of bonding material is
to the presence of residual turning marks and induced SSD prevented. When grinding starts, sharp grits are becoming
during plastic deformation in ductile machining. Yan et al.33 blunt and wear out. The oxide layer is also removed; as a result,
have reported the SSD of single crystal silicon during diamond the electrical conductivity of the grinding wheel increases and
turning. The SSD consists of the amorphous layer near to the the dressing process starts again. This process is repeated for
machined surface and dislocation layer below the amorphous proper conditioning of the grinding wheel.49 Hence, an ELID

(a) (b)
Figure 8. (a) Schematic of the ELID grinding components; (b) mechanism of action.
Source: Lim et al.47
8 Journal of Micromanufacturing

with microgrinding becomes an important process for optical Plasma chemical vaporization machining (PCVM)
component fabrication. By this process, 0.33 nm (Ra) surface
PCVM is a precision finishing process to generate a prefin-
roughness (Ra) of BK7 glass is accomplished.50
ished surface for further processing by EEM. It utilizes the
In ELID grinding, it is difficult to maintain the figure
chemical reaction between the neutral radicals and the surface
accuracy precisely for a large surface. Another alternative
atoms to achieve precision surface without any geometric
approach is reported to reduce the tool wear during micro-
and crystallographic damage.17,58 Highly reactive neutral
grinding. Heinzel and Rickens51 reported that engineered
radicals are generated under the influence of atmospheric
grinding wheels of coarse grain size (grain size ≥ 100 µm) pressure radio frequency (RF) plasma by decomposing the
has the ability to perform ductile mode grinding to obtain supplied reactive gas (composition: He, SF6 or CF4 and O2)
better surface quality than ELID grinding without occurring in the working gap (gap between the electrode and workpiece
substantial tool wear. Processing of different materials by surface).59 The material is removed as volatile molecules
ELID grinding and major findings are mentioned in Table 3. owing to the reaction between generated radicals and surface
With the recent advancement in ELID grinding technique, atoms as shown in Figure 9.
the mirror quality surface can be attained on various hard and
brittle optical materials. The application of this process is
extended from plane surface finishing to internal, cylindrical and
spherical-shape grinding. Moreover, the aspheric-shaped lens or
molds can also be suitably finished. For this purpose, an efficient
ultraprecision-grinding machine and various wheel forms are re-
quired. A large-scale telescope mirror, parabolic mirror for use in
Raman spectroscopy and synchrotron mirror can be efficiently
fabricated by ultraprecision- and nanoprecision-ELID grinding
techniques.56 The developed machine is mainly composed of the
high stiffness machine frame, NC controller and ELID system.
The mirror-quality surface of silicon wafers, which are used in
fabrication of integrated circuits and other micro-devices, can be Figure 9. Material removal mechanism in PCVM.
obtained by a cup-type grinding wheel. A straight grinding wheel
Source: Mori et al.17
is used to finish large silicon wafers. ELID-lap grinding with a
metal-resinoid hybrid-bonded diamond wheel having finer grain Plasma etching process is also working on the same prin-
size is used to finish monocrystalline silicon and chemical vapor ciple, but it has low material removal ability as it works under
deposition (CVD)-SiC.56 However, as it is a bonded rigid abra- very low pressure (1–10–3 Torr).17 In case of PCVM (working
sive finishing, SSD and microcracks cannot be avoided. A gentle pressure ≥ 1 atm), machining efficiency is higher owing to the
polishing process is needed to apply for the removal of those high radical density and small mean free path of ions which
damages. Magnetorheological finishing (MRF) can be used as a leads to low kinetic energy.60 Surface roughness in atomic or-
final finishing stage to achieve desired surface finish and shape der without any surface or subsurface damage may be accom-
accuracy without any SSD.57 The p-v height of around λ/2–λ/5 plished owing to the isotropic etching.17
can be attained by ELID grinding, and it can be further improved Different types of electrodes (spherical, cylindrical,
around of λ/10–λ/20 using MRF. blade type, flat-bar, etc.) are used in PCVM based on the

Table 3. Literature survey of processing of different materials by ELID grinding.

Authors Materials Major findings


Ohmori et al. 52
Monocrystalline • Using #40,000 wheel, surface finish with 2.8 nm Ra and 18 nm Rmax was accomplished.
silicon, BK-7 • Constant pressure ELID grinding has ability to produce better surface quality than by
constant depth of cut.
Zhao et al.53 Fused silica, fused • 2 nm–3 nm (rms) surface roughness was achieved with 0.5 µm SSD for fused quartz.
quartz • Fused silica was finished to 30 nm–40 nm (rms) surface roughness and around 1 µm SSD
is reported.
Islam et al.54 Si • Better surface finish (Ra 4 nm) and good grinding performance was observed.
• Comparatively small SSD was induced.
Yin et al.55 Zerodur • Smooth surface with a surface roughness of 5 nm–10 nm Ra and 1.5 nm in flatness was
accomplished using #4,000 wheel.
• The depth of cut has a significant effect on the surface quality.
Ghosh et al. 9

requirement. For rough finishing, a cylindrical rotary elec- efficiency.61 High material removal rate (few microns to few
trode is placed near the work surface and the reactive gas is hundred microns per minute) such as lapping can be obtained
dragged to the plasma zone.17 Figure 10 (a) and 10 (b) shows and precision surface quality can also be maintained by rotat-
the schematic of a rotary electrode and material removal func- ing electrode. Single crystal Si, SiC, fused silica have been
tion, respectively. Thereafter, high-density neutral radicals are successfully processed by this process.61 Generally, Al alloy
generated by decomposing reactive gas and the chemically is used to make the rotary electrode and the electrode is coat-
active radical will react with the surface atom to remove the ed with a dielectric material such as alumina to prevent the
material as volatile molecules. When the rotational speed of secondary electron emission which leads to arc discharge.17
electrode increases, the feed rate (drag) of reactive gas to the It also can produce stable and low temperature plasma, and
working gap increases and RF power for producing radicals it also has high corrosion resistance against fluorine radical
is also increased to some extent due to the substantial cool- which is used for chemical reaction.61,62
ing effect of rotating electrode.59,61 Therefore, the density of Long spatial wavelength figure errors can be elimi-
generated radicals in the working gap increases which leads nated efficiently using rotary electrode. To remove spatial
to high machining efficiency. But beyond a certain limit, ma- wavelength near about 1 mm, very small diameter pipe
terial removal will not increase with the rotational speed of electrode is placed adjacent to the rotary electrode.63 The
electrode proportionally because the RF power will be insuf- portion of work surface which comes in contact with the
ficient to decompose the greater amount of reactive gas. The plasma gets heated and other portion remains cool compar-
effect of working gap on the material removal is less signifi- atively. As a result, there is a possibility of cracks gener-
cant. Adequate RF power and a substantial amount of reac- ation owing to the induced thermal stress. This limitation
tive gas supply are required to preserve the high machining of the rotary electrode can be overcome by using a flat-bar

(a) (b)
Figure 10. (a) Schematic drawing of rotary electrode supplying reactive gas to the machining zone and (b) material removal function using
rotary electrode.
Source: Mori et al.17

(a) (b)
Figure 11. (a) Schematic of NC-PCVM process and (b) electrode raster scanning and removal function.
Source: Yamamura et al.65
10 Journal of Micromanufacturing

electrode with multiple gas nozzles.64 Moreover, the size of The depth and the volume of removal function (influence
the removal function (Figure 10 (b)) is in millimetre order function) increase as the finishing time increases. Hence,
which restricts rotary electrode-type PCVM to accomplish dwelling time distribution has a very important role to
ultraprecision surface. Hence, to improve the spatial reso- remove figure errors selectively. Dwelling time distribution
lution of machining, submillimetre order removal function is calculated by deconvoluting removal volume distribution
is desirable as shown in Figure 11 (b). That can be attained and the influence function as shown in Figure 12. Therefore,
by supplying the plasma through small diameter orifice to scanning speed distribution of work table is determined and
the working gap.60 Therefore, a spatial resolution of process raster scanning is performed to figure the whole surface.65
improves as a very small region of the surface will come Processing of different materials by PCVM and major finding
in contact with the plasma. To avoid the gas replacement of the reported works are mentioned in Table 4.
requirement and to make it more economical, open-air-type During finishing using PCVM, the process parameters
NC-PCVM is gaining interest as shown in Figure 11 (a).65 must be controlled properly to minimize the thermal effect
In NC-PCVM system, a very small diameter (3 mm) of the workpiece.66 Furthermore, during finishing of poly-
aluminium alloy electrode is used and the electrode is sur- crystalline material like reaction sintered-SiC (RS-SiC), a
rounded by Teflon cover through which process gas is sup- differential finishing was observed owing to the presence of
plied as shown in Figure 11 (a). By applying RF power α-SiC grain, newly synthesized β-SiC grain and the residual
supply (f = 13.56 MHz), a stable plasma is produced in the Si. The removal rate of Si was many times greater than the
small working gap.65 Thickness variation can be eliminated other phases. The non-uniform removal of RS-SiC compo-
efficiently by a single raster scanning (Figure 11 (b)) as the nents leads to the degradation of surface integrity by forming
material removal rate is high. In this system, no gas evacua- pores.68 Hence, optimization of the process parameters is req-
tion system is needed as the reactive gas is supplied directly uired to achieve the desired surface integrity. In NC-PCVM,
to the working gap around the electrode. a figure error with the spatial wavelength larger than 10 mm
can be easily eliminated by the rotary electrode and a spa-
tial wavelength close to 1 mm can be removed efficiently by
employing the pipe electrode. Hence, it is essential to select
the size or type of electrode based on the spatial wavelength
to be removed. Besides residual figure error with the spatial
wavelength near to 0.1 mm can be corrected by EEM as it
utilizes the chemical reaction between ultrafine particles and
the workpiece surface for the atomic removal of the mate-
rial.59,60 By EEM, nanometre-order figure accuracy and an
Figure 12. Principle of the numerically controlled (NC) figuring.
atomic-order surface finish can be achieved successfully.
Source: Yamamura et al.65 However, the removal rate in EEM is many times smaller

Table 4. Literature survey of processing of different materials by PCVM.

Authors Material Major finding


Yamamura Si • To improve the spatial resolution of finishing, high flow rate and small working gap are desirable.
et al.60 • 30 µm finishing spot is accomplished by maintaining the working gap around 60 µm.
Sano et al.59 SiC • Oxidation has a significant role in the etching of SiC.
• Material removal rate as high as 0.18 mm min-1 was reported.
• Surface roughness of C and Si face decrease and increase, respectively, during this process.
Sano et al.66 SiC and Si • Surface temperature has greater effect on material removal of SiC than Si.
• Surface roughness of Si face of SiC increases at high RF due to the high temperature but not due
to high radical density.
• High etch rate of Si face can be attained without surface roughness degradation by subsequent
cooling of the surface.
Ueda et al.67 Quartz crystal • The correction of thickness variation is performed efficiently by compensating the scanning speed
in respect of surface temperature.
• Removal rate can be increased by heating the work surface.
Sano et al.64 SiC • Both C and Si faces possess around same etching rate at different surface temperature.
• Surface roughness degradation is very high for Si face at high temperature.
• Surface temperature and etch rate both have a significant effect on surface roughness evolution.
Ghosh et al. 11

than in the PCVM.65 Hence, in recent days, to achieve ultra- near the tip. It forms a flexible abrasive brush having large
precision-optical components, NC-PCVM followed by NC- shear stress and high apparent viscosity. When relative mo-
EEM is employed. tion between tool and workpiece is employed, the abrasive
particles are dragged through the working gap. As a result, the
ER and MR fluid-based finishing processes ultrafine abrasive particles interact with the work surface and
the asperities are sheared off. The gap between the workpiece
The stringent requirements of the micro-aspherical optical and tool tip must be maintained precisely as it has significant
components can be accomplished by both ER and MR fluid- importance in the finishing process. Too less working gap
based finishing processes. The rheological properties of may lead to the possibility of short-circuiting and too far may
both the processes can be altered significantly by applying reduce the strength of the electric field.76
external fields and hence, they are well known as field-as-
sisted finishing processes. It is possible to obtain stress-free
optical surface as flexible abrasive brushes or ribbons interact
with the surface to remove the asperities.69

Electrorheological finishing (ERF). ER finishing becomes an


important process for optics fabrication. It was first proposed
by Kuriyagawa and Syoji70 in 1999 for the polishing of small
three-dimensional shapes such as micro-aspheric lenses
and metallic dies. ER polishing slurry is the heart of this
process. ER slurry consists of a dispersed phase, a basal fluid
(continuous phase), polishing abrasives and additives. Solid
particles having high permittivity are selected as a dispersed
phase to generate the ER effect easily under an electric field.
Generally, starch, silica, titanium dioxide and alumina are
used as the dispersed phase of ER fluids. The basal fluid is a Figure 13. Schematic of ER fluid-assisted finishing for conductive
liquid with some distinct properties such as low permittivity, workpiece.
low conductivity, high breakdown voltage and low viscosity. Source: Zhang et al.76
Silicone oil is widely used as a basal fluid. Additives are mostly
used as a dispersing agent and a stabilizer for preventing During finishing of a non-conductive material such as
particle coagulation and particle sedimentation, respectively.71 optical glass, an auxiliary electrode is placed near the sur-
Ultra-fine abrasive particles such as diamond, ceria and green face of the workpiece. The location of the tool relative to
carborundum are usually used as polishing abrasives. The the auxiliary electrode changes continuously, when the tool
rheological properties such as apparent viscosity and yield moves over the surface of the workpiece to polish it. As
stress are greatly enhanced by applying external electric fields.72 a result, electric field strength changes which leads to the
The ER polishing slurry is changed from liquid to visco-plastic possibility of unstable and non-uniform material removal.77
solid instantly.73–75 Suspended dielectric ER particles of the To overcome this limitation, an advanced ER tool by
ER fluid become polarized owing to the application of electric incorporating cathode and anode together was developed by
field. As a consequence, a transformation from the uniform Chen et al.77 The schematic diagram of this tool is shown in
distribution of the particles to a chin-like structure is taken Figure 14. The tool tip diameter is maintained within 1 mm
place. ER particles experience an attraction force which leads and the edge of the tool must be round-shaped to avoid elec-
to the apparent enhancement of rheological properties of the tric charge concentration at the edge.
ER fluid. The change in properties occurs in milliseconds, and
it is also reversible.
The schematic diagram of ER fluid-assisted polishing
for the conductive workpiece is shown in Figure 13. The
workpiece and the micro tool both act as electrodes. The ER-
polishing slurry is supplied in the working gap between the
workpiece and tool. The electric force line radiate from the
tool tip to the surface of the workpiece as the electric field is
applied between the electrodes. The dense ribbons consist of
ER particles and abrasive particles around the tool are formed Figure 14. Schematic diagram of ER finishing tool for non-conduc-
along those force lines. A large number of particles are con- tive workpiece.
centrated at the tool tip as the electric field strength is highest Source: Chen et al.77
12 Journal of Micromanufacturing

Table 5. Literature survey of processing of different materials by ERF.

Authors Material Major finding


Kuriyagawa et al.73 BK7 glass • ERF is successfully applied for the first time to achieve nanolevel finishing of micro-aspheric
lens, die and mirror.
• The roughness is reduced from 18.6 nm Ra to 4.4 nm Ra.
Kim et al.78 Si • Average surface roughness is reduced from 50 nm to 2.9 nm.
Kim et al. 79
Borosilicate glass • Diamond-mixed ER fluid was used.
• Average surface roughness is reduced from 28 nm to 2.8 nm.
Cheng et al.74 K9 glass • Peak-to-valley (p-v) is reduced to 25 nm from 58 nm at 0.5 mm working gap and 2,000 volt
supply voltage.
• The final surface roughness (Ra) achieved was as low as 2.5 nm.
Su et al.69 BK7 glass • Wheel-like integrated tool is used for fabricating miniaturized optical parts. Higher linear
speed is expected in the working zone.
• The surface roughness is achieved at 0.86 nm rms.

This central rotating rod acts as the cathode and the con-
centric edges of the static cylindrical tube near the rod end
act as an anode. Under the influence of the high electric field,
the field lines are formed between the rod and the concentric
tube in the radial direction. The suspended ER particles and
abrasive particles are polarized and form a chain along the
field lines as shown in Figure 14. As the tool rotation is ap-
plied, the chains are also rotated and the abrasive particles
abrade the surface to finish it precisely. By volume, 35.2%
starch particles, 52.8% silicone oil and 12% CeO2 particles
are used to make the ER-polishing fluid slurry for this study.77
Processing of different materials by ERF and major finding of
the reported works are mentioned in Table 5.

Magnetorheological finishing (MRF). MRF is a widely used fin-


Figure 15. Schematic diagram of magnetorheological finishing
ishing process to fabricate the precision optical components. (MRF) process.
It has the ability to achieve the desired level of figure accu-
Source: https://qedmrf.com/en/mrfpolishing/mrf-technology/how-it-works
racy and surface roughness on a wide range of optical mate- (accessed 5 December 2017).
rials such as single crystalline materials (Si, sapphire, CaF2,
etc.), glass/glass ceramics (fused silica, ULE, Zerodur, etc.) When the stiffened MR fluid ribbon interacts with the
and polycrystalline materials (SiC).80–83 The conformal and workpiece, the ribbon gets compressed and the workpiece ex-
sub-aperture nature of polishing tool make it suitable for fin- periences a shear force consequently that leads to shear-mode
ishing of flats, cylinders, spheres, aspheres and free-form op- material removal.87 By changing the applied magnetic field
tics also.82 The mid-spatial frequency error (ripple) and SSD strength, the magnitude and distribution of pressure on the
produced by previous finishing process (i.e., shaping methods workpiece can be controlled. As the workpiece experiences
or other conventional polishing processes) can be eliminat- a low normal force, the possibility of SSD formation in this
ed effectively by MRF to make it suitable for shorter wave- process is less. By controlling the process parameters (i.e.,
length applications.84 MRF uses MR fluid, which consists of working gap, wheel speed, magnetic field strength, etc.), high
non-magnetic abrasive particles (MAPs), magnetic carbon- material removal rate compared to other finishing processes
yl iron particles (CIPs), carrier liquid and some additives or can be obtained. Owing to the flexibility, determinism and
stabilizers. Figure 15 shows the schematic diagram of MRF high removal rate of the MRF process, high-efficiency figure
process. The MR fluid is supplied through a nozzle onto a correction on a wide range of optical surface shape can be per-
rotating wheel to carry the fluid through the tool–workpiece formed in a cost-effective manner.88 Basic mechanism, com-
interface.85 Under the influence of magnetic field, the mag- position of MR fluid and its rheological properties, important
netic particles are attracted towards the wheel and the abra- process parameters, material removal function (i.e., influence
sive particles move to the top.86 It creates a conformal and function), theoretical and experimental investigations of as-
sub-aperture polishing lap which perfectly conforms the local sociated forces and applications of MRF process are reported
topography of the workpiece to be polished. previously in detail by Sidpara et al.89–91 and Jain et al.92,93
Ghosh et al. 13

Table 6. Literature survey of processing of different materials by MRF.

Authors Material Shape Major finding


Ci et al.96 K9 glass Aspheric • High convergence ratio of the surface figure is observed.
mirrors • Peak-to-valley (p-v) is reduced to 0.179λ from 0.216λ and the root mean square
(rms) is reduced to 0.017λ from 0.027λ (λ = 633 nm) in 2 hours.
Yin et al.97 BK7 glass Concave • At first, ELID grinding is performed to reduce the micro-roughness and figure
surface accuracy to some extent.
• Form accuracy is improved to λ/18 p-v and micro-roughness of 0.56 nm rms is
achieved using MRF within 17 min.
Lormeau et al.94 Fused silica Free-form • A novel ultrafine MR fluid (C30) is employed to fabricate EUVL optics.
surfaces • The surface roughness of about 1 Å range is achieved.
Catrin et al.84 Fused silica Disks • MRF has the ability to remove surface and subsurface damage on the previously
machined surface.
• An increase in roughness value is observed as the removal thickness of the
deformed layer increases. No SSD-induced damage is observed.
Beier et al.98 Electroless Free-form • Long-wave and fine figure errors are corrected efficiently using larger (dia = 370
Ni-coated Al surfaces mm) and smaller (dia = 50 mm) polishing wheel, respectively.
mirror • Shape accuracy and micro-roughness are reduced to 150 nm p-v and 0.5 nm rms,
respectively.
Maloney et al.95 CaF2, Si Aspherical • Low and mid spatial frequency errors are corrected by employing three different
and free-form sizes wheel (i.e., 150 mm, 50 mm and 50 mm, sequentially) and C30 MR fluid.
optics • Figure accuracy is corrected from 12λ to λ/30 p-v and surface roughness less
than 1.5 Å is achieved.
Zhong et al.99 Electroless Ni Aspheric • Surface roughness around 0.3 nm Ra is achieved to meet the requirement of
X-ray optics.
• Cyclic residual marks or ripples are removed significantly by MRF.
Piché et al.100 Fused silica Deep concave • A new high–NA (numerical aperture) MRF mode is used to correct the figure
aspheres errors efficiently.
• Figure accuracy around 5 nm rms is achieved.
Deng et al.101 Al mirror Paraboloid • MRF is combined with small tool polishing (STP) technique to remove the residu-
al figure errors of diamond-turned surface.
• Surface roughness and figure accuracy of around 3 nm and 0.025λ rms,
respectively are attained.
Zhong et al.102 CaF2 Concave asph- • Surface roughness of 0.3 nm Ra and surface accuracy of 4 nm rms are obtained.
eric mirrors • Flexible smoothing process (FSP) is employed to reduce the mid spatial
frequency errors.

The shape and size (may vary from a few mm2 to a few as SiC.103,104 During finishing with a conventional MR fluid,
cm ) of removal function (i.e., influence function) can be
2
the abrasive particles interact with the workpiece to remove
controlled efficiently by changing the magnetic field strength. the materials (they are forced to move away from the magnet
A stable removal function can be attained by controlling the owing to the magnetic levitation force) by moving between
process parameters precisely. Careful characterization of the the workpiece and the stiffen CIP chain that imparts the re-
work surface is carried out to identify the distribution and quired fluid pressure and relative motion. Hence, it can be
magnitude of figure errors. Based on the removal function expressed as a three-body abrasion mechanism. As a result,
and figure errors, dwell time and CNC tool paths are fixed the conventional MR fluid may not provide adequate shear
using advanced algorithms to perform finishing preferen- stress to finish a very hard surface. Furthermore, the abrasives
tially.87 Processing of different materials by MRF and major used in this fluid, possess a high escaping tendency from the
finding of the reported works are mentioned in Table 6. finishing zone at a high rotational speed owing to the weak
Two types of abrasives are generally used for preparing bonding strength of abrasives and the action of centrifugal
the MR fluid. The first one is the micron-sized CeO2 pow- force. As the process continues, material removal rate tends
der which is extensively used for the finishing of soft or hard to decrease which is called as tool aging. A uniform finishing
optical glasses. The second one is nanodiamond powder cannot be maintained owing to the tool aging effect, and it
which is well suited for the finishing of sapphire crystals, affects the productivity as a frequent change of MR fluid be-
single crystal Si, CaF2 and hard polycrystalline ceramics such comes essential.
14 Journal of Micromanufacturing

Jung et al.105 introduced a magnetizable abrasive to machine types and wheel sizes.94,95 Recent advancements in
overcome the aforementioned limitations related to materi- MRF process make it suitable for improving low, mid- and
al removal rate. Besides the magnetizable characteristic, the high-spatial frequency errors to meet the ultra-high require-
abrasive must be adequately hard to remove the irregulari- ments of modern optics.
ties from the hard workpiece. Carbon nanotubes (CNTs) have
exceptional mechanical and thermal properties, and it also MR jet finishing. MR jet finishing is another sub-aperture
possess a very stable structure both thermally and chemical- finishing process which is developed by the QED Technologies
ly. Therefore, a new sintered iron particles-carbon nanotube for the fabrication of precision optics. Conformal, steep
(I-CNT) compound was developed. Under the action of the concave and free-form optics become integral parts of the
external magnetic field, the I-CNT compound abrasives also advanced optical system which are difficult to polish using
actively participate in the formation of chain-like structures other conventional finishing processes owing to the steep
along with CIPs. Therefore, I-CNT compound abrasives are local slopes and tool–workpiece shape interferences.107,108
strongly bonded with the surrounding CIPs as well as other Furthermore, the outside convex shape of a conformal optics
sintered I-CNT compound particles. As a result, the finishing (such as ogive dome) used in missiles can be finished by
operation using I-CNT compound abrasives can be consid- MRF process, but the concave (i.e., inside portion) side must
ered as a two-body abrasion mechanism, and it can impart also be finished precisely to make it suitable for transmission
a much higher shear stress on the workpiece owing to the purpose.108 MR jet finishing process has the ability to reach
combined action of both the fluid pressure and the mutual the internal surface to correct the figure error suitably.
magnetic force. This leads to the higher removal rate in this
The kinetic energy of conventional abrasive jet polishing
case. Furthermore, the tool aging effect also reduces remark-
is sufficient to remove the asperities from the impact zone.
ably as the magnetic force of attraction between the abrasives
However, the jet loses its coherence property after exit from
and its surrounding remains active throughout the finishing
a nozzle owing to the presence of aerodynamic disturbances,
process. Recently, Niranjan and Jha106 introduced a magnetic
pressure gradient and surface tension force. As a result, the jet
abrasive which is a compound of CIPs and SiC. It was used to
flow becomes highly unstable over the impact zone that leads
finish mild steel workpiece, and it was observed that the fin-
to the instability of removal function which is not desirable
ishing rate was significantly increased by the use of sintered
for the optics fabrication.109 A stable, coherent and collimated
magnetic abrasive.
jet having high velocity and low viscosity is expected for
MRF can be successfully employed to finish wide veri-
deterministic ultra-precision finishing of complex-shaped
ties of optical materials. However, the application of the MRF
optics.110
process should be extended to metals, composites, thermal
spray coating, etc. The components used in automobiles,
medical, aerospace, nuclear reactors, etc., require a very high
surface finish. MRF and allied processes can be efficiently
used for finishing of few such components as prosthesis imp-
lants, aircraft bearings, dies or molds, etc. MRF is very effi-
cient for finishing of non-magnetic materials, but the appli-
cation of MRF should be explored to the magnetic materials
also. Furthermore, the aggressiveness of the MR fluid may be
enhanced by adding a suitable chemical etchant to soften the
metallic surface and that leads to the higher material removal
rate.89,91 Molecular dynamic simulation (MDS) approach can
be undertaken for further understanding of the material re-
moval mechanism at nanoscale, abrasive particle interaction,
stress analysis and chemical as well as the mechanical aspect   (a)   (b)   (c)
of MRF. Figure 16. Jet snapshot images (a) water, (b) MR fluid with magnet
To meet the desired requirement of deep-UV or ext- off and (c) MR fluid with magnet on (velocity = 30 m s-1 and nozzle
reme-UV system, the QED Technologies has developed a diameter = 2 mm).
novel super-fine MR fluid called C30. It has the ability to Source: Tricard et al.109
attain an ultra-low roughness (ULR) with very low remov-
al rate for fine figure corrections of mid-spatial frequency In MR jet finishing, the MR fluid is magnetized by apply-
errors. It is possible to achieve < 1.5 Å rms roughness on ing an axial magnetic field when it comes out from a nozzle.
fused silica, Si, glass, CaF2 and other materials using this Figure 16 shows the snapshot images of water, MR fluid with
fluid. The surface roughness in the range of 1 Å–2 Å can be magnet off and on condition. The water jet and the MR fluid
obtained throughout the fluid life and over a wide variety of break up at a short distance from the nozzle exit as shown in
Ghosh et al. 15

Figure 16 (a) and 16 (b), respectively. Besides, it is possible to Magnetic abrasive finishing. Magnetic abrasive finishing
maintain a coherent jet of MR fluid over several tens of centi- (MAF) is also used for optical surface finishing. The
metres by applying magnetic field as shown in Figure 16 (c). magnetic field strength and the working gap between the
The applied magnetic field induces a uniform structure within workpiece and magnet are the most important process
the fluid and the apparent viscosity increases consequently. parameters in MAF. The finishing forces can be controlled
The highly coherent MR fluid induces radial flow upon im- by altering the magnetic field strength.113 The workpiece is
pingement on the surface and hence, stable and reproducible placed between the S-pole and N-pole of the magnet and the
removal function is generated.109,110 The components are fin- working gap is filled with MAPs as shown in Figure 18. The
ished in the rotational mode. The part rotates as well as sweeps abrasive particles are made by sintering of abrasive powder
around its centre of curvature to retain the MR jet normal to and iron powder under a very high temperature and pressure
the surface. Thus, this unique tool overcomes the problem of in the inert gas atmosphere. A little amount of lubricant
ultra-high finishing of steep concave surfaces and cavities. is added to distribute iron powder and abrasive powder
uniformly.113,114 Under the influence of magnetic field, the
Ultrasonic MRF compound finishing. Ultrasonic MRF compound MAPs are joined along the magnetic force lines between N
finishing offers a new way to fabricate optical components to and S poles to form a FMAB. The flexible brush confirms
take the advantage of both MRF as well as ultrasonic polishing, the local shape of the surface and behaves as a multipoint
simultaneously. The concave surface with a small radius and cutting tool. During finishing, the cylindrical workpiece
the free-form optical surface can be precisely finished by rotates and at the same time magnetic pole or workpiece
this process. The MR fluid is supplied to a small spherical vibrates to improve the polishing efficiency.
polishing head to form a flexible magnetic abrasive brush
(FMAB) by applying a magnetic field to the polishing head
as shown in Figure 17. Ultrasonic vibration to the finishing
zone along the polishing head (i.e., vertical direction) is also
applied to improve the polishing efficiency.111

Figure 18. Schematic diagram of cylindrical magnetic abrasive


finishing.
Source: Shinmura et al.113

Riveros et al.115–117 and Yamaguchi et al.118 have emp-


Figure 17. Schematic of the polishing zone of ultrasonic MRF loyed MAF to finish a Si MEMS micro-pore X-ray optic.
compound finishing. The sidewalls of micro-pore act as X-ray focusing mirrors,
but it possess a non-uniform surface texture. Hence, it needs
The polishing head also rotates on its own spindle axis to be suitably finished to improve its performance. An MEMS
simultaneously with a specified speed. A small and uniform micro-pore optic is kept into a container where it is fully
working gap is maintained between the polishing head and submerged in a homogeneous fluid mixture of iron particles
workpiece. The workpiece is rotated in the opposite direction and abrasive particles. The container is placed between two
to the polishing head. Hence, the finishing zone experiences electromagnets. An alternating magnetic field with around
a shear force and the material is removed consequently.111,112 20 Hz frequency is applied to impart oscillatory motion. The
The whole surface is finished by employing a linear motion abrasive particles randomly interact with the sidewalls of
to the workpiece on the horizontal plane. Thus, the combined the micro-pore and remove the material. Thus, the peaks of
action of the magnetic field and ultrasonic vibration improves micro-asperities are sheared off preferentially and a surface
the polishing efficiency. roughness of around 4 nm rms is obtained.
16 Journal of Micromanufacturing

Summary 6. Faehnle OW and Brug HH. Novel approaches to generate


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Declaration of conflicting interests Opt Express 2003; 11: 958–964.
The author(s) declared no potential conflicts of interest with respect 17. Mori Y, Yamamura K, Endo K, et al. Creation of perfect
to the research, authorship and/or publication of this article. surfaces. J Cryst Growth 2005; 275: 39–50.
18. Schinhaerl M, Smith G, Stamp R, et al. Mathematical model-
Funding
ling of influence functions in computer-controlled polishing:
The funding support from IIT Kharagpur under ISIRD grant and Part I. Appl Math Modelling 2008; 32: 2888–2906.
Board of Research in Nuclear Sciences (BRNS), Bombay, is
19. Ghosh G, Sidpara A and Bandyopadhyay PP. Fabrication of
acknowledged.
optical components by ultraprecision finishing processes. In:
Gupta K (eds) Micro and precision manufacturing: Engineering
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