201541511 i (19)? #RAGEUAR A; Vo (12) AREA A (ly amaee : TW 201541511 A al = (43)2012 PAE RBI 104 (2015) #11 AOL a (21) P 3 FAR | 104109219 (22) 358 = RRB 104 (2015) #03 B23 8 (S1)Int. Cl. + HOIL21/306 (2006.01) HOIL21/3065 (2006.01) (30) 4% : 2014/03/31 x8 61/973,077 2014/09/15 xa 14/486,105 (71) aA SARA ELAR GA FR 3] (8B) APPLIED MATERIALS, INC. (US) xB (72)8€88 A + de ait KIM, SUNG JE (KR) + £41848 347K KALITA, LAKSHESWAR (IN) ; 8 4) RAH PAREEK, YOGITA (IN) i -¢/ KADAM, ANKUR (IN) + i 438 45 AABN 3 HEA] ge GORADIA, PRERNA SONTHALIA (IN) + 3 #2 THAKUR, BIPIN (IN) ; #848 @ 3% Jkib ok 4} LUBOMIRSKY, DMITRY (US) (TARE A: Rpt BE PREREE SR PUPA MRK 14 HAKIS HSA (54) 4% 58 TMM LE RR Ca GENERATION OF COMPACT ALUMINA PASSIVATION LAYERS ON ALUMINUM PLASMA EQUIPMENT COMPONENTS (57,482 FSR SE EEL AE BCBG AE de: ART OR RAMEE ED 1 OE He RAE ED 1 GPA + SAAR 10°C 2 TR AEF ESTE IR EAS RN me PAE | B30 SAR + FAL HL PALI | EMT RAED 1 SE HORAEPER 1 SB > A LIES Aa NHJOH PEL BEL PR: RNR —F Ots AAT OREM ED 1 aR ASEH EES Ds ERIE RODEN OAS: ARETE > LAST EH A RES F AlyOy SQ > BLAPIE AlyOy 14 BAY Gi tai HLA AAT Al\Oy SOREL ARSE AY A AL So WE 0.05 fH © A process for generating a compact alumina passivation layer on an aluminum component includes rinsing the component in deionized water for at least one minute, drying it for at least one minute, and exposing it to concentrated nitric acid, at a temperature below 10°C, for one to 30 minutes. The process also includes rinsing the component in deionized water for at least one minute, drying it for at least one minute, and exposing it to NHyOH for one second to one minute. The process further includes rinsing the component in deionized water for at least one minute and drying it for at least one minute. 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