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B. Filter Design
Fig. 3. Fabricated filters for 28-GHz band. (a) Ninth-order LPF.
Two types of filters, low-pass filter (LPF) and bandpass (b) Fifth-order interdigital BPF. (c) Fifth-order hairpin BPF.
filter (BPF), are chosen for this letter. Quasi-lumped elliptical
LPFs are selected for their sharpest rolloff. The BPFs are
further subdivided into two structures: interdigital and hairpin.
These filters are based on λ/4 short and λ/2 open resonators,
respectively, making them ideal for small footprint. The design
process of elliptical LPFs starts with a low-pass prototype with
an elliptical response. The prototype is shown in Fig. 1(b) and
the design methodology is summarized in the following.
1) Select g-values for the desired order, then scale them to
the desired impedance and operating frequency to find Fig. 4. Simulated and measured results of fabricated LPFs. (a) Fifth, seventh,
LC values using the following equation: and ninth orders for 28-GHz band. (b) Ninth order for 39-GHz band.
1 1 1
Li = Z 0 g Li Ci = gCi (1) C. Fabrication Process
2π f c 2π f c Z 0
The fabrication process utilizes the SAP process to pattern
where f c is the cutoff frequency of LPF, Z 0 is the the copper structures. Fig. 2 illustrates the SAP process
characteristic impedance (usually 50 ), and g Li and through schematic cross sections of each step. The process
gCi are the g-values of the filter corresponding to starts with a bare glass panel on which copper is electrolyti-
inductors and capacitors. cally deposited. Next, the dielectric film is laminated, vias are
2) The following equation can be used to find the physical drilled in it, and a copper seed layer is deposited. The panel
length corresponding to each lumped LC for microstrip is photolithographically patterned, followed by photoresist
structure: development and electrolytic plating. Critical process steps
are exposure (dose) time, via ablation conditions, photoresist
λg L ( f c ) Li
l Li = arcsin 2π f c development speed, and electrolytic plating. Finally, the pho-
2π Z 0L
toresist is removed and the seed layer is etched away to obtain
λgC ( f c )
lCi = arcsin(2π f c Z 0C Ci ) (2) the desired circuit. After the fabrication process, the measured
2π copper thickness is 8.5±0.5 μm. Three of the fabricated filters
where λg L ( f c ) and λgC ( f c ) are the guide wavelengths, are shown in Fig. 3.
and Z 0L (> Z 0 ) and Z 0C (< Z 0 ) are the characteristic
impedances of inductor and capacitor transformations III. C HARACTERIZATION R ESULTS AND A NALYSIS
(set by the designer). This section discusses the characterization results of the
The design rules enable the highest impedance to be 127 fabricated filters. The measurements are performed using a
(15 μm), which aids in modeling inductors in LPFs more Keysight E8361C PNA in the frequency range of 14–50 GHz
effectively. However, the minimum width during Keysight using ACP50 GSG probes and short-open-load-through cali-
ADS simulations is restricted to 20 μm (119 ) to mitigate the bration. The comparison of the simulated and measured results
effects of process variations on filter performance. BPF filter of LPFs for 28 and 39 GHz band is shown in Fig. 4.
design methodology is given in detail in [4] and [5]. Several Similarly, the results of the fabricated third- and fifth-order
LPFs and BPFs of different orders are synthesized for this interdigital and hairpin BPFs for 28- and 39-GHz band are
demonstration. shown in Figs. 5 and 6, respectively. The filters exhibit
1112 IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, VOL. 28, NO. 12, DECEMBER 2018
TABLE II
C OMPARISON W ITH S IMILAR F ILTERS
Fig. 6. Simulated and measured results of hairpin BPFs for 28 and 39-GHz
band. (a) Third order. (b) Fifth order.